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1. 发明授权

US09217916B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09217916B2
公开(公告)日：2015-12-22
申请号：US13568645
申请日：2012-08-07
申请人： Paul Christiaan Hinnen , Marcus Adrianus Van De Kerkhof , Reiner Maria Jungblut , Koenraad Remi André Maria Schreel
发明人： Paul Christiaan Hinnen , Marcus Adrianus Van De Kerkhof , Reiner Maria Jungblut , Koenraad Remi André Maria Schreel
IPC分类号： G03B27/32 , G03B27/34 , G03F7/207 , G03F7/20
CPC分类号： G03B27/32 , G03B27/34 , G03F7/70625 , G03F7/70641
摘要： A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values.
摘要翻译：平版印刷系统包括被设置为将图案化的光束投影到基底上的被监视的光刻投影装置。散射仪测量转移到衬底的图案的多个参数，包括至少一个CD轮廓参数和传送到衬底的图案的至少一个另外的参数，其指示所监视的光刻投影设备的机器设置。匹配系统包括存储表示参考CD值的信息的数据库和用于另外的特征的参考值。比较装置将测量值与对应的存储值进行比较，光刻参数计算装置根据测量值和参考值之间的差异来计算被监测光刻设备的校正的机器设置集合。

2. 发明申请

US20110128520A1 ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS 有权
标题翻译：对比系统和方法的LITHOGRAPHIC系统
公开(公告)号：US20110128520A1
公开(公告)日：2011-06-02
申请号：US12977541
申请日：2010-12-23
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G03B27/54 , G01B11/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

3. 发明授权

US09182682B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US09182682B2
公开(公告)日：2015-11-10
申请号：US13140292
申请日：2009-12-17
申请人： Hugo Augustinus Joseph Cramer , Paul Christiaan Hinnen
发明人： Hugo Augustinus Joseph Cramer , Paul Christiaan Hinnen
IPC分类号： G03B27/68 , G03F7/20 , G03F1/00 , G03F1/44
CPC分类号： G03F7/70683 , G03F1/14 , G03F1/44 , G03F7/70625 , G03F7/70641 , Y10T428/24802
摘要： In order to determine whether an exposure apparatus is outputting the correct dose of radiation and a projection system of the exposure apparatus is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker may be measured by an inspection apparatus, such as, for example, a scatterometer to determine whether errors in focus, dose, and other related properties are present. The test pattern is arranged such that changes in focus and dose may be easily determined by measuring properties of a pattern that is exposed using the mask. The test pattern of the mask is arranged so that it gives rise to a marker pattern on the substrate surface. The marker pattern contains structures that have at least two measurable side wall angles. Asymmetry between side wall angles of a structure is related to focus (or defocus) of the exposure radiation from the exposure apparatus. The extent of defocus may thereby be determined by measuring an asymmetry in side wall angle of the printed marker pattern structures.
摘要翻译：为了确定曝光装置是否输出正确的辐射剂量，并且曝光装置的投影系统正确地对准辐射，在掩模上使用测试图案将特定的标记印刷到基板上。该标记可以通过诸如散射仪的检查装置来测量，以确定是否存在焦点，剂量和其它相关属性的误差。测试图案被布置成使得可以通过测量使用掩模曝光的图案的性质容易地确定焦点和剂量的变化。掩模的测试图案被布置成使得其在基板表面上产生标记图案。标记图案包含具有至少两个可测量的侧壁角度的结构。结构的侧壁角度之间的不对称性与来自曝光设备的曝光辐射的焦点（或散焦）有关。由此可以通过测量印刷的标记图案结构的侧壁角度的不对称来确定散焦的程度。

4. 发明申请

US20080180668A1 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus 失效
标题翻译：用于基板的光学取向的标记结构，包括这种标记结构的基板，用于与这种标记结构对准的对准方法以及平版印刷设备
公开(公告)号：US20080180668A1
公开(公告)日：2008-07-31
申请号：US12003377
申请日：2007-12-21
申请人： Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Sanjay Lalbahadoersing , Henry Megens , Maurits Van Der Schaar
发明人： Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Sanjay Lalbahadoersing , Henry Megens , Maurits Van Der Schaar
IPC分类号： G01J4/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： A marker structure on a substrate for optical alignment of the substrate includes a plurality of first structural elements and a plurality of second structural elements. In use, the marker structure allows the optical alignment based upon providing at least one light beam directed on the marker structure, detecting light received from the marker structure at a sensor, and determining alignment information from the detected light, the alignment information comprising information relating a position of the substrate to the sensor.
摘要翻译：用于基板的光学取向的基板上的标记结构包括多个第一结构元件和多个第二结构元件。在使用中，标记结构允许基于提供指向标记结构的至少一个光束的光学对准，在传感器处检测从标记结构接收的光，以及从检测到的光确定对准信息，对准信息包括与基板到传感器的位置。

5. 发明授权

US07329888B2 Alignment systems and methods for lithographic systems 有权
公开(公告)号：US07329888B2
公开(公告)日：2008-02-12
申请号：US11294476
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G01N21/86 , G01B11/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

6. 发明授权

US08685626B2 Method of measuring a characteristic 有权
标题翻译：测量特性的方法
公开(公告)号：US08685626B2
公开(公告)日：2014-04-01
申请号：US12711176
申请日：2010-02-23
申请人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
发明人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
IPC分类号： G03F7/26
CPC分类号： G03F7/0035 , G03F7/70466
摘要： During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
摘要翻译：在多次图案化处理期间，除去图案的每个第n个元素。在将图案印刷到辐射敏感材料中或蚀刻到基底中之后，去除图案的元素。有利地，原始掩模不变，并且使用另一曝光步骤来去除图案的元件。

7. 发明申请

US20120300182A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20120300182A1
公开(公告)日：2012-11-29
申请号：US13568645
申请日：2012-08-07
申请人： Paul Christiaan HINNEN , Marcus Adrianus VEN DE KERKHOF , Reiner Maria JUNGBLUT , Koenraad Remi André Maria SCHREEL
发明人： Paul Christiaan HINNEN , Marcus Adrianus VEN DE KERKHOF , Reiner Maria JUNGBLUT , Koenraad Remi André Maria SCHREEL
IPC分类号： G03B27/42
CPC分类号： G03B27/32 , G03B27/34 , G03F7/70625 , G03F7/70641
摘要： A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values.
摘要翻译：平版印刷系统包括被设置为将图案化的光束投影到基底上的被监视的光刻投影装置。散射仪测量转移到衬底的图案的多个参数，包括至少一个CD轮廓参数和传送到衬底的图案的至少一个另外的参数，其指示所监视的光刻投影设备的机器设置。匹配系统包括存储表示参考CD值的信息的数据库和用于另外的特征的参考值。比较装置将测量值与对应的存储值进行比较，光刻参数计算装置根据测量值和参考值之间的差异来计算被监测光刻设备的校正的机器设置集合。

8. 发明申请

US20120044472A1 Inspection Method for Lithography 有权
标题翻译：光刻检验方法
公开(公告)号：US20120044472A1
公开(公告)日：2012-02-23
申请号：US13264256
申请日：2010-05-04
申请人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Paul Christiaan Hinnen
发明人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Paul Christiaan Hinnen
IPC分类号： G03B27/52
CPC分类号： G03F7/70641
摘要： A method is used to determine focus of a lithographic apparatus used in a lithographic process on a substrate. The lithographic process is used to form at least two periodic structures on the substrate. Each structure has at least one feature that has an asymmetry between opposing side wall angles that varies as a different function of the focus of the lithographic apparatus on the substrate. A spectrum produced by directing a beam of radiation onto the at least two periodic structures is measured and ratios of the asymmetries are determined. The ratios and a relationship between the focus and the side wall asymmetry for each structure is used to determine the focus of the lithographic apparatus on the substrate.
摘要翻译：使用一种方法来确定在光刻工艺中使用的光刻设备在基板上的焦点。光刻工艺用于在衬底上形成至少两个周期性结构。每个结构具有至少一个特征，其具有相对的侧壁角度之间的不对称性，所述相对侧壁角度随着光刻设备在基底上的焦点的不同功能而变化。测量通过将辐射束引导到至少两个周期性结构上产生的光谱，并且确定不对称性的比率。使用每个结构的焦点和侧壁不对称之间的比率和关系来确定光刻设备在基底上的焦点。

9. 发明授权

US07880880B2 Alignment systems and methods for lithographic systems 有权
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US07880880B2
公开(公告)日：2011-02-01
申请号：US11294367
申请日：2005-12-06
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G01B11/00 , H01L23/544 , H01L21/76 , G01D5/36
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

10. 发明申请

US20100328636A1 Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus 审中-公开
标题翻译：产生曝光装置的曝光相关性质的标记图案和测量
公开(公告)号：US20100328636A1
公开(公告)日：2010-12-30
申请号：US12817315
申请日：2010-06-17
申请人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Eddy Cornelis Antonius Van Der Heijden , Michel Franciscus Johannes Van Rooy , Christian Marinus Leewis
发明人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Eddy Cornelis Antonius Van Der Heijden , Michel Franciscus Johannes Van Rooy , Christian Marinus Leewis
IPC分类号： G03B27/42 , G01N21/47
CPC分类号： G03F7/70641 , G03F7/70625 , G03F7/70683
摘要： In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is then measured by an inspection apparatus to determine whether there are errors in exposure-related properties such as focus and dose. The projection of the marker pattern is modified so as to accentuate the production of side lobe-induced features of the marker structure relative to the production of side lobe-inducted features of the product structure. The form of the marker structure is more responsive to exposure variation than the form of the product structure to exposure variation. The marker pattern includes both primary features and secondary features that augment the side lobe arising from the primary feature to print side lobe-induced features on either side of a primary marker structure. Alternatively, the marker pattern is modified by having a different attenuation factor with respect to the product pattern. Alternatively, the marker pattern is modified by providing a marker dose different from the product dose.
摘要翻译：为了确定曝光装置是否正确地投影图案，在掩模上使用标记图案将特定的标记结构印刷到基板上。然后通过检查装置测量该标记物，以确定曝光相关性质如焦点和剂量是否存在错误。修改标记图案的投影，以便相对于产品结构的旁瓣诱导特征的产生来强调标记结构的旁瓣诱导特征的产生。标记结构的形式比曝光变化对产品结构的形式更敏感。标记图案包括主要特征和次要特征，其增加从主要特征产生的旁瓣以在主标记结构的任一侧上印刷侧叶引起的特征。或者，通过相对于产品图案具有不同的衰减系数来修改标记图案。或者，通过提供与产品剂量不同的标记剂量来修饰标记图案。

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