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1. 发明授权

US08982328B2 Method and apparatus for overlay measurement 有权
标题翻译：覆盖测量方法和装置
公开(公告)号：US08982328B2
公开(公告)日：2015-03-17
申请号：US12906960
申请日：2010-10-18
申请人： Henricus Johannes Lambertus Megens , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
发明人： Henricus Johannes Lambertus Megens , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
IPC分类号： G03F7/20
CPC分类号： G03F7/70466 , G03F7/705 , G03F7/70625 , G03F7/70633
摘要： A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function.
摘要翻译：分辨率覆盖偏移的测量方法可以在散射仪中实现。在晶片上提供至少三个靶，每个靶包括第一标记光栅和第二交错标记光栅，并且每个靶在其第一和第二标记之间具有不同的覆盖偏置。第一和第二标记由双重图案化光刻工艺中的后续光刻步骤提供。使用散射仪测量目标，并且对于每个目标，使用重建确定至少一个标记的测量CD。第一个标记的CD可以在重建中被固定。测量的CD和至少一个覆盖偏差用于确定对应于最小测量CD的覆盖结果。覆盖结果可以通过将诸如抛物线的函数拟合到所测量的CD和覆盖偏移来确定，并且以最小的拟合函数确定覆盖。

2. 发明申请

US20110141450A1 Method and Apparatus for Overlay Measurement 有权
标题翻译：覆盖测量方法与装置
公开(公告)号：US20110141450A1
公开(公告)日：2011-06-16
申请号：US12906960
申请日：2010-10-18
申请人： Henricus Johannes Lambertus MEGENS , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
发明人： Henricus Johannes Lambertus MEGENS , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
IPC分类号： G01B11/14 , G03B27/62
CPC分类号： G03F7/70466 , G03F7/705 , G03F7/70625 , G03F7/70633
摘要： A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function.
摘要翻译：分辨率覆盖偏移的测量方法可以在散射仪中实现。在晶片上提供至少三个靶，每个靶包括第一标记光栅和第二交错标记光栅，并且每个靶在其第一和第二标记之间具有不同的覆盖偏置。第一和第二标记由双重图案化光刻工艺中的后续光刻步骤提供。使用散射仪测量目标，并且对于每个目标，使用重建确定至少一个标记的测量CD。第一个标记的CD可以在重建中被固定。测量的CD和至少一个覆盖偏差用于确定对应于最小测量CD的覆盖结果。覆盖结果可以通过将诸如抛物线的函数拟合到所测量的CD和覆盖偏移来确定，并且以最小的拟合函数确定覆盖。

3. 发明授权

US08848195B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和用于确定基板性质的器件制造方法
公开(公告)号：US08848195B2
公开(公告)日：2014-09-30
申请号：US13123613
申请日：2009-10-22
申请人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
发明人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
IPC分类号： G01N21/47 , G03F7/20
CPC分类号： G03F7/70625
摘要： In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.
摘要翻译：在确定衬底的一个或多个特性的方法中，可以从衬底上的一个或多个靶测量散射光谱。可以通过将每个测量光谱的表示与使用可变参数值计算的光谱的一个或多个建模表示进行比较，来执行每个所述光谱的重建以导出衬底性质的一个或多个值。每个频谱的重建中至少有一个参数可以链接到在不同频谱的重构中使用的参数的值。

4. 发明授权

US08502955B2 Method of determining a characteristic 有权
标题翻译：确定特性的方法
公开(公告)号：US08502955B2
公开(公告)日：2013-08-06
申请号：US12641742
申请日：2009-12-18
申请人： Henricus Johannes Lambertus Megens , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
发明人： Henricus Johannes Lambertus Megens , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70466 , G03F7/70633
摘要： A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation is detected from both the targets and used to determine different characteristics of the underlying populations.
摘要翻译：形成包括叠加在第一种群上的第二种群的多个目标。在第一个目标中，第二个人口与第一批人口不相称。在第二个目标中，第二个人口与第一个人口有不同的不对称性。从两个目标检测到反射辐射，并用于确定潜在种群的不同特征。

5. 发明授权

US08891061B2 Lithographic focus and dose measurement using a 2-D target 有权
标题翻译：使用2-D目标的平版照相重点和剂量测量
公开(公告)号：US08891061B2
公开(公告)日：2014-11-18
申请号：US13062861
申请日：2009-10-02
申请人： Christian Marinus Leewis , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Johannes Anna Quaedackers , Christine Corinne Mattheus
发明人： Christian Marinus Leewis , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Johannes Anna Quaedackers , Christine Corinne Mattheus
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F1/38 , G03F7/706 , G03F7/70608 , G03F7/70625 , G03F7/70675 , G03F7/70683
摘要： In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such as a scatterometer, to determine whether there are errors in focus and dose and other related properties. The test pattern is configured such that changes in focus and dose may be easily determined by measuring the properties of a pattern that is exposed using the mask. The test pattern may be a 2D pattern where physical or geometric properties, e.g., pitch, are different in each of the two dimensions. The test pattern may also be a one-dimensional pattern made up of an array of structures in one dimension, the structures being made up of at least one substructure, the substructures reacting differently to focus and dose and giving rise to an exposed pattern from which focus and dose may be determined.
摘要翻译：为了确定曝光装置是否正在输出正确剂量的辐射，并且其投影系统正确地对准辐射，在掩模上使用测试图案将特定标记物印刷到基底上。然后通过诸如散射仪的检查装置测量该标记，以确定焦点和剂量以及其它相关性质是否存在错误。测试图案被配置为使得可以通过测量使用掩模曝光的图案的特性容易地确定聚焦和剂量的变化。测试图案可以是二维图案，其中物理或几何性质（例如间距）在两个维度的每一个中是不同的。测试图案也可以是由一维结构阵列组成的一维图案，该结构由至少一个子结构构成，该子结构与焦点和剂量不同地反应并产生暴露图案，可以确定焦点和剂量。

6. 发明申请

US20120033223A1 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method for Determining a Property of a Substrate 有权
标题翻译：检测方法和装置，平版印刷装置，光刻处理单元和用于确定基板特性的装置制造方法
公开(公告)号：US20120033223A1
公开(公告)日：2012-02-09
申请号：US13123613
申请日：2009-10-22
申请人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
发明人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
IPC分类号： G01N21/47 , B05C11/00 , C23C16/52
CPC分类号： G03F7/70625
摘要： In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.
摘要翻译：在确定衬底的一个或多个特性的方法中，可以从衬底上的一个或多个靶测量散射光谱。可以通过将每个测量光谱的表示与使用可变参数值计算的光谱的一个或多个建模表示进行比较，来执行每个所述光谱的重建以导出衬底性质的一个或多个值。每个频谱的重建中至少有一个参数可以链接到在不同频谱的重构中使用的参数的值。

7. 发明申请

US20100165312A1 Method of Determining a Characteristic 有权
标题翻译：确定特性的方法
公开(公告)号：US20100165312A1
公开(公告)日：2010-07-01
申请号：US12641742
申请日：2009-12-18
申请人： Henricus Johannes Lambertus Megens , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
发明人： Henricus Johannes Lambertus Megens , Johannes Anna Quaedackers , Christian Marinus Leewis , Peter Clement Paul Vanoppen
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70466 , G03F7/70633
摘要： A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation is detected from both the targets and used to determine different characteristics of the underlying populations.
摘要翻译：形成包括叠加在第一种群上的第二种群的多个目标。在第一个目标中，第二个人口与第一批人口不相称。在第二个目标中，第二个人口与第一个人口有不同的不对称性。从两个目标检测到反射辐射，并用于确定潜在种群的不同特征。

8. 发明授权

US08685626B2 Method of measuring a characteristic 有权
标题翻译：测量特性的方法
公开(公告)号：US08685626B2
公开(公告)日：2014-04-01
申请号：US12711176
申请日：2010-02-23
申请人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
发明人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
IPC分类号： G03F7/26
CPC分类号： G03F7/0035 , G03F7/70466
摘要： During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
摘要翻译：在多次图案化处理期间，除去图案的每个第n个元素。在将图案印刷到辐射敏感材料中或蚀刻到基底中之后，去除图案的元素。有利地，原始掩模不变，并且使用另一曝光步骤来去除图案的元件。

9. 发明申请

US20110295555A1 Method and System for Determining a Lithographic Process Parameter 审中-公开
标题翻译：确定平版印刷工艺参数的方法和系统
公开(公告)号：US20110295555A1
公开(公告)日：2011-12-01
申请号：US13120751
申请日：2009-09-15
申请人： Hieronymus Johannus Christiaan Meessen , Christine Corinne Mattheus , Christian Marinus Leewis
发明人： Hieronymus Johannus Christiaan Meessen , Christine Corinne Mattheus , Christian Marinus Leewis
IPC分类号： G06F17/18 , G01N23/225
CPC分类号： G03F7/70641 , G03F7/705 , G03F7/70516 , G03F7/70625
摘要： The present invention relates to a method for determining parameter value related to a lithographic process by which a marker structure has been applied on a product substrate based on obtaining calibration measurement data, with an optical detection apparatus, from a calibration marker structure set on a calibration substrate, including at least one calibration marker structure created using different known values of the parameter. The method further determines a mathematical model by using said known values of said at least one parameter and by employing a regression technique on said calibration measurement data, obtains product measurement data, with said optical detection apparatus, from a product marker structure on the product substrate, with at least one product marker structure being exposed with an unknown value of said at least one parameter. Furthermore, the method determines the unknown value of at least one parameter for the product substrate from the obtained product measurement data, wherein the optical detection apparatus may be a SEM and the obtained data includes an image obtained by the SEM.
摘要翻译：本发明涉及一种确定与光刻工艺有关的参数值的方法，通过该光刻工艺，使用光学检测装置从校准标记结构设置在校准上，通过该光刻工艺将标记结构应用于产品基板上衬底，包括使用参数的不同已知值创建的至少一个校准标记结构。该方法通过使用所述至少一个参数的所述已知值并通过对所述校准测量数据采用回归技术来进一步确定数学模型，使用所述光学检测装置从产品标记结构获得产品测量数据，至少一个产品标记结构用所述至少一个参数的未知值曝光。此外，该方法从所获得的产品测量数据确定产品基板的至少一个参数的未知值，其中光学检测装置可以是SEM，并且所获得的数据包括通过SEM获得的图像。

10. 发明申请

US20110249244A1 Lithographic Focus and Dose Measurement Using A 2-D Target 有权
标题翻译：使用2-D靶的光刻焦点和剂量测量
公开(公告)号：US20110249244A1
公开(公告)日：2011-10-13
申请号：US13062861
申请日：2009-10-02
申请人： Christian Marinus Leewis , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van de Kerkhof , Johannes Anna Quaedackers , Christine Corinne Mattheus
发明人： Christian Marinus Leewis , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van de Kerkhof , Johannes Anna Quaedackers , Christine Corinne Mattheus
IPC分类号： G03B27/52 , G03F1/00
CPC分类号： G03F7/70641 , G03F1/38 , G03F7/706 , G03F7/70608 , G03F7/70625 , G03F7/70675 , G03F7/70683
摘要： In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such as a scatterometer, to determine whether there are errors in focus and dose and other related properties. The test pattern is configured such that changes in focus and dose may be easily determined by measuring the properties of a pattern that is exposed using the mask. The test pattern may be a 2D pattern where physical or geometric properties, e.g., pitch, are different in each of the two dimensions. The test pattern may also be a one-dimensional pattern made up of an array of structures in one dimension, the structures being made up of at least one substructure, the substructures reacting differently to focus and dose and giving rise to an exposed pattern from which focus and dose may be determined.
摘要翻译：为了确定曝光装置是否正在输出正确剂量的辐射，并且其投影系统正确地对准辐射，在掩模上使用测试图案将特定标记物印刷到基底上。然后通过诸如散射仪的检查装置测量该标记，以确定焦点和剂量以及其它相关性质是否存在错误。测试图案被配置为使得可以通过测量使用掩模曝光的图案的特性容易地确定聚焦和剂量的变化。测试图案可以是二维图案，其中物理或几何特性，例如间距，在两个维度的每一个中是不同的。测试图案也可以是由一维结构阵列组成的一维图案，该结构由至少一个子结构构成，该子结构与焦点和剂量不同地反应并产生暴露图案，可以确定焦点和剂量。

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