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    • 5. 发明授权
    • Method for producing an optoelectronic semiconductor component
    • 光电半导体元件的制造方法
    • US08569079B2
    • 2013-10-29
    • US13322662
    • 2010-05-03
    • Elmar BaurAlexander HeindlBernd BohmPatrick RodeHeribert Zull
    • Elmar BaurAlexander HeindlBernd BohmPatrick RodeHeribert Zull
    • H01L21/00
    • H01L33/22B82Y10/00B82Y40/00G03F7/0002H01L33/005H01L33/20
    • A method for producing an optoelectronic semiconductor component includes providing a first wafer having a patterned surface, wherein the patterned surface is formed at least in places by elevations having first and second heights, wherein the first height is greater than the second height; providing a second wafer; applying a photoresist to outer areas of the second wafer; patterning a surface of the photoresist facing away from the second wafer by impressing the patterned surface of the first wafer into the photoresist, wherein the elevations are impressed as trenches having a first and second depth into the photoresist; applying a patterning method to the patterned surface of the photoresist, wherein the structure applied on the photoresist is transferred at least in places to the outer area of the second wafer.
    • 一种用于制造光电子半导体部件的方法包括提供具有图案化表面的第一晶片,其中所述图案化表面至少在具有第一和第二高度的高度的位置形成,其中所述第一高度大于所述第二高度; 提供第二晶片; 将光致抗蚀剂施加到第二晶片的外部区域; 通过将第一晶片的图案化表面压印到光致抗蚀剂中,将光致抗蚀剂的表面图案化为远离第二晶片,其中,将高度作为具有第一和第二深度的沟槽印刷到光致抗蚀剂中; 将图案化方法应用于光致抗蚀剂的图案化表面,其中施加在光致抗蚀剂上的结构至少在第二晶片的外部区域被转移。
    • 9. 发明申请
    • Radiation-Emitting Semiconductor Chip
    • 辐射发射半导体芯片
    • US20110272728A1
    • 2011-11-10
    • US12991864
    • 2009-04-17
    • Patrick RodeLutz HoeppelKarl EnglTony Albrecht
    • Patrick RodeLutz HoeppelKarl EnglTony Albrecht
    • H01L33/36
    • H01L25/167H01L33/0079H01L33/382H01L2924/0002H01L2924/00
    • A radiation-emitting semiconductor chip (1) is provided, which comprises a carrier (5), a semiconductor body (2) with a semiconductor layer sequence, a first contact (35) and a second contact (36). The semiconductor layer sequence comprises an active region (20) provided for generating radiation, which is arranged between a first semiconductor layer (21) and a second semiconductor layer (22). The carrier (5) comprises a major surface (51) facing the semiconductor body (2). The first semiconductor layer (21) is arranged on the side of the active region (20) facing the major surface (51) of the carrier (5) and is electrically contactable by means of the first contact (35). The second semiconductor layer (22) is electrically contactable by means of the second contact (36). A protection diode (4) is formed in a current path extending between the first contact (35) and the second contact (36) through the carrier (5).
    • 提供了一种辐射发射半导体芯片(1),其包括载体(5),具有半导体层序列的半导体本体(2),第一触点(35)和第二触点(36)。 半导体层序列包括设置在第一半导体层(21)和第二半导体层(22)之间的用于产生辐射的有源区(20)。 载体(5)包括面向半导体本体(2)的主表面(51)。 第一半导体层(21)布置在与载体(5)的主表面(51)相对的有源区域(20)的侧面上,并且可通过第一触点(35)电接触。 第二半导体层(22)可通过第二接触件(36)电接触。 保护二极管(4)形成在通过载体(5)在第一接触件(35)和第二接触件(36)之间延伸的电流通路中。