会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Method for making an electromechanical component on a plane substrate
    • 在平面基板上制造机电部件的方法
    • US07625772B2
    • 2009-12-01
    • US11904859
    • 2007-09-27
    • Fabrice CassetCedric DurandPascal Ancey
    • Fabrice CassetCedric DurandPascal Ancey
    • H01L21/00
    • B81C1/0065B81B2201/0271B81B2207/015H03H3/0073H03H9/1057H03H9/2405H03H2009/02496
    • Method for making an electromechanical component on a plane substrate and comprising at least one structure vibrating in the plane of the substrate and actuation electrodes. The method comprises at least the following steps in sequence: formation of the substrate comprising one silicon area partly covered by two insulating areas, formation of a sacrificial silicon and germanium alloy layer by selective epitaxy starting from the uncovered part of the silicon area, formation of a strongly doped silicon layer by epitaxy, comprising a monocrystalline area arranged on said sacrificial layer and two polycrystalline areas arranged on insulating areas, simultaneous formation of the vibrating structure and actuation electrodes, by etching of a predetermined pattern in the monocrystalline area designed to form spaces between the electrodes and the vibrating structure, elimination of said sacrificial silicon and germanium alloy layer by selective etching.
    • 一种用于在平面基板上制造机电部件并且包括在所述基板和致动电极的平面中振动的至少一个结构的方法。 该方法至少包括以下步骤:基底的形成,其包括由两个绝缘区域部分覆盖的一个硅区域,通过从硅区域的未覆盖部分开始的选择性外延形成牺牲硅和锗合金层,形成 通过外延的强掺杂硅层,包括布置在所述牺牲层上的单晶区域和布置在绝缘区域上的两个多晶区域,同时形成振动结构和致动电极,通过在设计成形成空间的单晶区域中蚀刻预定图案 在电极和振动结构之间,通过选择性蚀刻消除所述牺牲硅和锗合金层。