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    • 7. 发明申请
    • FILM BULK ACOUSTIC RESONATOR STRUCTURE AND METHOD OF PRODUCING IT
    • 电影大容量声学谐振器结构及其生产方法
    • WO2003052927A1
    • 2003-06-26
    • PCT/US2002/040511
    • 2002-12-17
    • INTEL CORPORATION
    • MA, QingWANG, Li-PengRAO, Valluri
    • H03H3/02
    • H03H9/172H03H3/02H03H9/586Y10T29/42
    • A film bulk acoustic resonator is formed on a substrate having a major surface. The film bulk acoustic resonator includes an elongated stack. The elongated stack includes a layer of piezoelectric material positioned between a first conductive layer deposited on a first surface of the layer of piezoelectric material, and a second conductive layer deposited on a second surface of the layer of piezoelectric material. The elongated stack is positioned substantially perpendicular with respect to the major surface of the substrate. The first and second conductive layers are placed on the layer of piezoelectric material substantially simultaneously and in one processing step. The major surface of the substrate is in a horizontal plane and the stack of the film bulk acoustic resonator is in a substantially vertical plane. The resonator structure formed may be used either as a resonator or a filter.
    • 在具有主表面的基板上形成膜体声波谐振器。 薄膜体声波谐振器包括细长的叠层。 细长堆叠包括一层位于压电材料层的第一表面上的第一导电层和沉积在该压电材料层的第二表面上的第二导电层之间的压电材料。 细长的堆叠被定位成相对于基底的主表面基本垂直。 第一和第二导电层基本上同时并在一个处理步骤中放置在压电材料层上。 衬底的主表面处于水平面,膜体声波谐振器的堆叠处于基本垂直的平面。 形成的谐振器结构可以用作谐振器或滤波器。
    • 10. 发明公开
    • FILM BULK ACOUSTIC RESONATOR STRUCTURE AND METHOD OF PRODUCING IT
    • VERFAHREN ZU IHRER HERSTELLUNG FILM-HAUPTKÖRPER-SCHALLRESONATORSTRUKTUR
    • EP1456946A1
    • 2004-09-15
    • EP02805206.6
    • 2002-12-17
    • INTEL CORPORATION
    • MA, QingWANG, Li-PengRAO, Valluri
    • H03H3/02H03H9/15
    • H03H9/172H03H3/02H03H9/586Y10T29/42
    • A film bulk acoustic resonator is formed on a substrate having a major surface. The film bulk acoustic resonator includes an elongated stack. The elongated stack includes a layer of piezoelectric material positioned between a first conductive layer deposited on a first surface of the layer of piezoelectric material, and a second conductive layer deposited on a second surface of the layer of piezoelectric material. The elongated stack is positioned substantially perpendicular with respect to the major surface of the substrate. The first and second conductive layers are placed on the layer of piezoelectric material substantially simultaneously and in one processing step. The major surface of the substrate is in a horizontal plane and the stack of the film bulk acoustic resonator is in a substantially vertical plane. The resonator structure formed may be used either as a resonator or a filter.
    • 在具有主表面的基板上形成膜体声波谐振器。 薄膜体声波谐振器包括细长的叠层。 细长堆叠包括位于沉积在压电材料层的第一表面上的第一导电层和沉积在压电材料层的第二表面上的第二导电层之间的压电材料层。 细长的堆叠被定位成相对于衬底的主表面基本垂直。 第一和第二导电层基本上同时并在一个处理步骤中放置在压电材料层上。 衬底的主表面处于水平面,并且膜体声波谐振器的堆叠处于基本垂直的平面中。 形成的谐振器结构可以用作谐振器或滤波器。