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    • 6. 发明申请
    • METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
    • 制造半导体器件的方法
    • WO2004077498A2
    • 2004-09-10
    • PCT/IB2004/050113
    • 2004-02-13
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.VAN DUUREN, Michiel, J.VAN SCHAIJK, Robertus, T., F.PONOMAREV, YouriHOOKER, Jacob, C.
    • VAN DUUREN, Michiel, J.VAN SCHAIJK, Robertus, T., F.PONOMAREV, YouriHOOKER, Jacob, C.
    • H01L
    • H01L27/11521H01L21/28273H01L27/115H01L29/42328H01L29/66825
    • In the method for manufacturing a semiconductor device (100), which comprises a semiconducting body (1) having a surface (2) with a source region (3) and a drain region (4) defining a channel direction (102) and a channel region (101), a first stack (6) of layers on top of the channel region (101), the first stack (6) comprising, in this order, a tunnel dielectric layer (11), a charge storage layer (10) for storing an electric charge and a control gate layer (9), and a second stack (7) of layers on top of the channel region (101) directly adjacent to the first stack (6) in the channel direction (102), the second stack (7) comprising an access gate layer (14) electrically insulated from the semiconducting body (1) and from the first stack (6), initially a first sacrificial layer (90) is used, which is later replaced by the control gate layer (9). A second sacrificial layer (20) is used to protect the part (82) off the surface (2) adjacent to the second sidewall (81) and opposite to the position (83) of the second stack (7) when providing the access gate layer (14).
    • 在制造半导体器件(100)的方法中,其包括具有源极区(3)的表面(2)和限定沟道方向(102)的漏极区(4)的半导体(1)和通道 区域(101),在沟道区域(101)的顶部上的第一层叠层(6),第一堆叠(6)依次包括隧道介电层(11),电荷存储层(10) 用于在通道方向(102)上直接与第一堆叠(6)相邻的通道区域(101)的顶部上存储电荷和控制栅极层(9)以及第二堆叠(7), 第二堆叠(7)包括与半导电体(1)和第一堆叠(6)电绝缘的存取栅极层(14),最初使用第一牺牲层(90),其随后由控制栅极 层(9)。 当提供接入门(20)时,第二牺牲层(20)用于保护邻近第二侧壁(81)的表面(2)并且与第二堆叠(7)的位置(83)相对的部分(82) 层(14)。
    • 8. 发明申请
    • ELECTROCHEMICAL POTENTIOMETRIC SENSING WITHOUT REFERENCE ELECTRODE
    • 无参考电极的电化学电位感测
    • WO2010023611A1
    • 2010-03-04
    • PCT/IB2009/053710
    • 2009-08-24
    • NXP B.V.MERZ, MatthiasPONOMAREV, Youri, V.CURATOLA, Gilberto
    • MERZ, MatthiasPONOMAREV, Youri, V.CURATOLA, Gilberto
    • G01N27/403G01N27/333G01N27/414
    • G01N27/4148G01N27/4145
    • The invention relates to a method of determining a charged particle concentration in an analyte (100), the method comprising steps of: i) determining at least two measurement points of a surface-potential versus interface-temperature curve (c1, c2, c3, c4), wherein the interface temperature is obtained from a temperature difference between a first interface between a first ion-sensitive dielectric (Fsd) and the analyte (100) and a second interface between a second ion-sensitive dielectric (Ssd) and the analyte (100), and wherein the surface-potential is obtained from a potential difference between a first electrode (Fe) and a second electrode (Se) onto which said first ion-sensitive dielectric (Fsd) and said second ion-sensitive dielectric (Ssd) are respectively provided, And ii) calculating the charged particle concentration from locations of the at least two measurement points of said curve (c1, c2, c3, c4). This method, which still is a potentiometric electrochemical measurement, exploits the temperature dependency of a surface-potential of an ion-sensitive dielectric in an analyte. The invention further provides an electrochemical sensor for determining a charged particle concentration in an analyte. The invention also provides various sensors which can be used to determine the charged particle concentration, i.e. EGFET’s and EIS capacitors.
    • 本发明涉及一种测定分析物(100)中带电粒子浓度的方法,所述方法包括以下步骤:i)确定表面电位对界面温度曲线(c1,c2,c3,c3)的至少两个测量点, c4),其中界面温度是从第一离子敏感介质(Fsd)和分析物(100)之间的第一界面与第二离子敏感介质(Ssd)和分析物之间的第二界面 (100),并且其中所述表面电位由所述第一离子敏感电介质(Fsd)和所述第二离子敏感电介质(Ssd)上的第一电极(Fe)和第二电极(Se)之间的电位差获得, ),和ii)从所述曲线(c1,c2,c3,c4)的至少两个测量点的位置计算带电粒子浓度。 这种仍然是电位电化学测量的方法利用分析物中离子敏感电介质的表面电位的温度依赖性。 本发明还提供了一种用于测定分析物中带电粒子浓度的电化学传感器。 本发明还提供可用于确定带电粒子浓度的各种传感器,即EGFET和EIS电容器。