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1. 发明授权

US07018455B2 Ink composition, recording medium, ink jet recording method, and printed matter 失效
标题翻译：油墨组合物，记录介质，喷墨记录方法和印刷品
公开(公告)号：US07018455B2
公开(公告)日：2006-03-28
申请号：US10103651
申请日：2002-03-21
申请人： Kazuhiko Kitamura , Yasuhiro Oki , Tetsuya Aoyama , Kyoichi Oka , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
发明人： Kazuhiko Kitamura , Yasuhiro Oki , Tetsuya Aoyama , Kyoichi Oka , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
IPC分类号： C09D11/00 , B32B3/00 , B41J2/01
CPC分类号： C09D11/38 , C09D11/03
摘要： An ink composition, a recording medium or printed matter containing a compound expressed by General Formula 1 The compound has a weight reduction after 1 hour at 60°C. of no more than 1%. This makes it possible to provide the ink composition, a recording medium, printed matter, and an ink jet recording method wherein a light resistance of the printed matter is excellent, there is no ink clogging, and a high-quality image with almost no yellowing of the printed matter can be obtained.
摘要翻译：含有由通式1表示的化合物的油墨组合物，记录介质或印刷品化合物在60℃下1小时后重量减轻。不超过1％。这使得可以提供油墨组合物，记录介质，印刷物和喷墨记录方法，其中印刷物的耐光性优异，没有油墨堵塞，并且几乎没有黄化的高质量图像的印刷品。

2. 发明授权

US06989054B2 Ink jet white ink and titanium dioxide slurry therefor 失效
公开(公告)号：US06989054B2
公开(公告)日：2006-01-24
申请号：US10096089
申请日：2002-03-12
申请人： Seiichi Tanabe , Kiyohiko Takemoto , Seiji Mochizuki , Yasunori Yamazaki , Toshimasa Mori , Kasumi Nakamura , Nobuo Uotani , Toshio Koshikawa , Katsura Ito
发明人： Seiichi Tanabe , Kiyohiko Takemoto , Seiji Mochizuki , Yasunori Yamazaki , Toshimasa Mori , Kasumi Nakamura , Nobuo Uotani , Toshio Koshikawa , Katsura Ito
IPC分类号： C09D11/00 , G01D11/00
CPC分类号： C09D11/322 , C01P2004/51 , C01P2006/22 , C09C1/3661 , C09D17/008
摘要： A titanium dioxide slurry for ink jet ink, which comprises water and surface-treated titanium dioxide particles dispersed in the water, the surface treatment being a treatment with an inorganic phosphoric acid compound. Also disclosed is an ink comprising the titanium dioxide slurry.

3. 发明授权

US06844263B2 LSI device polishing composition and method for producing LSI device 失效
标题翻译： LSI器件抛光组合物和LSI器件的制造方法
公开(公告)号：US06844263B2
公开(公告)日：2005-01-18
申请号：US10370603
申请日：2003-02-24
申请人： Yoshitomo Shimazu , Takanori Kido , Nobuo Uotani
发明人： Yoshitomo Shimazu , Takanori Kido , Nobuo Uotani
IPC分类号： C09G1/02 , C09K3/14 , H01L21/321 , H01L21/302 , C09K13/00
CPC分类号： C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/3212
摘要： The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.
摘要翻译：本发明提供一种含有水，磨粒，有机酸，氧化剂，pH值为5.5〜10.0的碱性物质的LSI装置研磨用组合物，所述LSI装置用研磨用组合物用于研磨铜 - 其中通过由Ta或TaN形成的阻挡金属将铜沉积在绝缘膜上的含金属布线层; 以及通过使用该研磨用组合物来制造LSI器件的方法。在对Ta，TaN等阻挡金属和铜布线层进行研磨的过程中，可以提高Ta，TaN的研磨速度，从而防止凹陷和侵蚀。

4. 发明授权

US06761759B2 Ink composition, ink jet recording method and recorded matter 失效
标题翻译：油墨成分，喷墨记录方法和记录物
公开(公告)号：US06761759B2
公开(公告)日：2004-07-13
申请号：US10103657
申请日：2002-03-21
申请人： Yasuhiro Oki , Kazuhiko Kitamura , Tetsuya Aoyama , Kyoichi Oka , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
发明人： Yasuhiro Oki , Kazuhiko Kitamura , Tetsuya Aoyama , Kyoichi Oka , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
IPC分类号： C09D1100
CPC分类号： C09D11/38
摘要： The ink composition of the present invention contains a coloring agent, water, a water-soluble organic solvent which is a liquid at least at temperatures of 40° C. or less, and which has a solubility of 1 wt % or greater with respect to water at a temperature of 20° C., and a saturation vapor pressure of 1.7 Pa or less at a temperature of 20° C. (with said organic solvent being contained in the ink composition at the rate of 10 to 35 wt %), and one or more amidine type compounds. As a result, the present invention provides an ink composition, a recording medium, recorded matter and an ink jet recording method that make it possible to obtain images with a high image quality which are superior in terms of the gas resistance of the recorded matter.
摘要翻译：本发明的油墨组合物含有着色剂，水，水溶性有机溶剂，其至少在40℃以下的温度下为液体，相对于本发明的溶解度为1重量％以上温度为20℃的水，饱和蒸气压在20℃的温度下为1.7Pa以下（油墨组合物中的所述有机溶剂的含量为10〜35重量％），和一种或多种脒型化合物。结果，本发明提供了一种油墨组合物，记录介质，记录物质和喷墨记录方法，使得可以获得在记录物质的气体阻力方面优异的图像质量高的图像。

5. 发明授权

US06362348B1 Additive for inkjet printing, recording solution, method for preventing discoloration and fading of image, and recording sheet 失效
标题翻译：用于喷墨印刷，记录溶液，防止图像变色和褪色的方法以及记录纸的添加剂
公开(公告)号：US06362348B1
公开(公告)日：2002-03-26
申请号：US09496647
申请日：2000-02-03
申请人： Hiroshi Takahashi , Nobuo Uotani , Yuji Itoh , Toshio Koshikawa
发明人： Hiroshi Takahashi , Nobuo Uotani , Yuji Itoh , Toshio Koshikawa
IPC分类号： C07D30762
CPC分类号： B41M5/5227 , B41M7/0027 , C09D11/38
摘要： An additive for inkjet printing, comprising a stabilized ascorbic acid derivative. Also disclosed are a recording solution, a method for preventing discoloration and fading of an image, and a recording sheet, each using the additive. The color change of an image can be prevented by incorporating the stabilized ascorbic acid derivative into an inkjet-printed image.
摘要翻译：一种用于喷墨印刷的添加剂，其包含稳定的抗坏血酸衍生物。还公开了各种使用添加剂的记录溶液，防止图像的变色和褪色的方法和记录片材。可以通过将稳定的抗坏血酸衍生物并入喷墨打印图像中来防止图像的颜色变化。

6. 发明申请

US20090093118A1 POLISHING COMPOSITION 审中-公开
标题翻译：抛光组合物
公开(公告)号：US20090093118A1
公开(公告)日：2009-04-09
申请号：US11911508
申请日：2006-04-14
申请人： Nobuo Uotani , Hiroshi Takahashi , Takashi Sato , Hajime Sato
发明人： Nobuo Uotani , Hiroshi Takahashi , Takashi Sato , Hajime Sato
IPC分类号： H01L21/461 , C09G1/02
CPC分类号： H01L21/3212 , B24B37/044 , C09G1/02 , C09K3/1463
摘要： In order to polish a wiring metal, a polishing composition ensuring that etching and erosion are suppressed and the residual wiring metal on the portion other than wiring is decreased, is provided, in which a polishing composition comprising (A) an azole group-containing compound having 3 or more azole groups within the molecule and a molecular weight of 300 to 15,000, (B) an oxidant, and (C) one, two or more acids selected from the group consisting of an amino acid, an organic acid and an inorganic acid is provided.
摘要翻译：为了研磨布线金属，可以提供确保蚀刻和侵蚀的抛光组合物，并且布线以外的部分上的残留布线金属减少，其中包含（A）含唑类化合物在分子内具有3个或更多个唑基，分子量为300至15,000，（B）氧化剂，和（C）选自氨基酸，有机酸和无机酸的一种或多种酸提供酸。

7. 发明申请

US20070128872A1 Polishing composition and polishing method 审中-公开
标题翻译：抛光组合物和抛光方法
公开(公告)号：US20070128872A1
公开(公告)日：2007-06-07
申请号：US10579335
申请日：2004-11-15
申请人： Yuji Itoh , Ayako Nishioka , Nobuo Uotani
发明人： Yuji Itoh , Ayako Nishioka , Nobuo Uotani
IPC分类号： H01L21/44 , H01L21/302
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/32115 , H01L21/3212 , H01L21/7684
摘要： As a polishing composition which allows high-speed polishing while dishing and erosion are prevented and the flatness of metal film is maintained, there is provided a polishing composition for polishing a metal film provided on a substrate having trenches such that the metal film fills the trenches, so as to provide a planarized surface, wherein the composition comprises water, a phosphate ester having a C≧6 carbon atom alkyl group in its molecule, and an etchant for the metal, and has a pH of 5 to 11.
摘要翻译：作为能够防止凹陷和侵蚀而进行高速抛光并且保持金属膜的平坦度的抛光组合物，提供了一种用于抛光设置在具有沟槽的基底上的金属膜的抛光组合物，使得金属膜填充沟槽，以提供平坦化的表面，其中组合物包含水，分子中具有C> = 6个碳原子烷基的磷酸酯和金属的蚀刻剂，并且具有5至11的pH。

8. 发明授权

US06676735B2 Aqueous ink 失效
标题翻译：水性油墨
公开(公告)号：US06676735B2
公开(公告)日：2004-01-13
申请号：US09886949
申请日：2001-06-21
申请人： Yasuhiro Oki , Kazuhiko Kitamura , Tetsuya Aoyama , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
发明人： Yasuhiro Oki , Kazuhiko Kitamura , Tetsuya Aoyama , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
IPC分类号： C09D1100
CPC分类号： C09D11/38 , C09D11/03
摘要： An aqueous ink comprising at least a colorant, a water-soluble organic solvent and a compound represented by general formula (I) shown below, wherein said water-soluble organic solvent stays liquid at a temperature of not higher than 40° C., exhibits a water solubility of not lower than 1% by weight at a temperature of 20° C. and a saturated vapor pressure of not higher than 1.7 Pa at a temperature of 20° C. and is contained in an amount of from 5 to 35% by weight: wherein Y represents a nonmetallic atom group required to form a 5- to 7-membered ring with C and N; X represents a hydrogen atom, oxyradical group, hydroxyl group, alkyl group, alkenyl group, alkinyl group, aryl group, acyl group, sulfonyl group, sulfinyl group, alkoxy group, aryloxy group or acyloxy group; and R1 to R4 may be the same or different and each represent a hydrogen atom or alkyl group, with the proviso that any two of R1 to R4 and Y may be connected to each other to form a 5- to 7-membered ring.
摘要翻译：一种含有至少着色剂，水溶性有机溶剂和下述通式（I）表示的化合物的水性油墨，其中所述水溶性有机溶剂在不高于40℃的温度下保持液体，表现出在20℃的温度下的水溶解度不低于1重量％，在20℃的温度下的饱和蒸汽压不高于1.7Pa，并且含量为5〜35％：其中Y表示与C和N形成5-至7-元环所需的非金属原子团; X代表氢原子，二酰基，羟基，烷基，烯基，炔基，芳基，酰基，磺酰基，亚磺酰基，烷氧基，芳氧基或酰氧基; R 1至R 4可以相同或不同，各自表示氢原子或烷基，条件是R 1至R 4和Y中的任何两个可以彼此连接形成5-至7-元环。

9. 发明授权

US4833231A Polymer having isoindole structure 失效
标题翻译：具有异吲哚结构的聚合物
公开(公告)号：US4833231A
公开(公告)日：1989-05-23
申请号：US92916
申请日：1987-08-06
申请人： Haruo Yoshida , Nobuo Uotani , Yoshihiro Saida
发明人： Haruo Yoshida , Nobuo Uotani , Yoshihiro Saida
IPC分类号： C08G73/06 , C08G61/12 , H01B1/12
CPC分类号： C08G61/124 , H01B1/127
摘要： A polymer having an isoindole structure represented by the following general formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 independently represent a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms X.sup.- represents an anion of an electrolyte, y is a number of from 0.01 to 1, which indicates the proportion of the anion to 1 mole of the monomer, and n is a number of from 5 to 500, which indicates the degree of polymerization,shows a high electroconductivity when doped, and the stability of the polymer in the oxidized state is high. This polymer is obtained by subjecting an isoindole compound represented by the following general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, to (1) electrochemical polymerization in the presence of an electrolyte in a solvent or (2) oxidative polymerization in a solvent by the action of an oxidant.

10. 发明授权

US06299659B1 Polishing material composition and polishing method for polishing LSI devices 有权
标题翻译：用于抛光LSI器件的抛光材料组成和抛光方法
公开(公告)号：US06299659B1
公开(公告)日：2001-10-09
申请号：US09564205
申请日：2000-05-04
申请人： Takanori Kido , Fumio Tsujino , Kagetaka Ichikawa , Nobuo Uotani
发明人： Takanori Kido , Fumio Tsujino , Kagetaka Ichikawa , Nobuo Uotani
IPC分类号： C09K314
CPC分类号： C09G1/02 , C09K3/1463
摘要： A polishing-material composition, for polishing of LSI devices, which is a polishing-material composition comprising water and cerium oxide which has been surface-treated with a coupling agent, wherein the maximum value is no greater than about 5 &mgr;m and the average value is about 0.01-1.0 &mgr;m in the secondary particle size distribution of the cerium oxide. Also, a polishing method for LSI devices which employs the polishing-material composition.
摘要翻译：一种用于抛光LSI器件的抛光材料组合物，其是用偶联剂表面处理的包含水和氧化铈的抛光材料组合物，其中最大值不大于约5μm，平均值在氧化铈的二次粒径分布中为约0.01〜1.0μm。另外，采用该研磨材料组合物的LSI装置的研磨方法。

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