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    • 8. 发明授权
    • Integrated circuit having a gate oxide
    • 具有栅极氧化物的集成电路
    • US5654863A
    • 1997-08-05
    • US744684
    • 1996-11-07
    • Neil Davies
    • Neil Davies
    • H01L27/04G01R31/26G01R31/28H01L21/82H01L21/822H01L27/02H01L29/866H02H9/04
    • G01R31/2884G01R31/2621H01L27/0251
    • An integrated circuit having a gate oxide, preferably for a DMOS circuit having a protective device against electrostatic overvoltages (ESD), is to connect a limiting circuit in series with the protective device. This series circuit means that, during the wafer production, an increased voltage can be applied to the gate of the integrated circuit, for testing the gate oxide, without the circuit being limited to a lower value. After testing, the limiting circuit is connected irreversibly in its low-resistance state, with the result that subsequent ESD interference voltages are limited by the built-in protective device. A zener zapping diode is provided as the limiting circuit. An advantageous result of the arrangement is the fact that an additional bonding connection for connecting the gate connection to the protective device is no longer necessary.
    • 具有栅极氧化物的集成电路,优选用于具有防静电过电压(ESD)的保护装置的DMOS电路,是将限制电路与保护装置串联连接。 该串联电路意味着,在晶片生产期间,可以向集成电路的栅极施加增加的电压,用于测试栅极氧化物,而不将电路限制在较低的值。 测试后,限制电路在其低电阻状态下不可逆地连接,结果是后续ESD干扰电压受到内置保护装置的限制。 提供齐纳二极管作为限制电路。 该布置的有利结果是不再需要用于将栅极连接连接到保护装置的附加接合连接。
    • 9. 发明授权
    • Monolithically integrated circuit
    • 单片集成电路
    • US5432371A
    • 1995-07-11
    • US167839
    • 1993-12-20
    • Volkmar DennerWolfgang TroelenbergPeter BrauchleWilliam-Neil FoxNeil Davies
    • Volkmar DennerWolfgang TroelenbergPeter BrauchleWilliam-Neil FoxNeil Davies
    • H01L27/04H01L21/822H01L27/02H01L27/088H01L29/78
    • H01L29/7803H01L27/0251H01L2924/0002
    • A monolithically integrated circuit arrangement is arranged in a disc-shaped monocrystalline semiconductor body (100) of a first conductivity type, which semiconductor body consists of silicon and has a first and second main surface. The monolithically integrated circuit arrangement contains a vertical MOSFET power transistor (T1) which consists of a plurality of partial transistors connected in parallel and surrounded by a guard ring (4) of a second conductivity type opposite that of the semiconductor body (100). Proceeding from the first main surface (13), at least one zone (7, 8) of the conductivity type of the semiconductor body (100) but of increased impurity concentration is diffused into the guard ring (4) so as to form at least one active and/or passive peripheral circuit element (T2) which has a protective and/or regulating and/or control function.
    • PCT No.PCT / DE92 / 00479 Sec。 371日期:1993年12月20日 102(e)日期1993年12月20日PCT提交1992年6月10日PCT公布。 公开号WO93 / 00709 日期:1993年1月7日。单片集成电路布置在第一导电类型的盘状单晶体半导体本体(100)中,该半导体主体由硅组成并具有第一和第二主表面。 单片集成电路装置包括垂直MOSFET功率晶体管(T1),其由并联连接并由与半导体本体(100)相反的第二导电类型的保护环(4)包围的多个部分晶体管组成。 从第一主表面(13)开始,半导体主体(100)的导电类型的至少一个区域(7,8)扩散到保护环(4)中,以至少形成 具有保护和/或调节和/或控制功能的一个有源和/或无源外围电路元件(T2)。