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    • 2. 发明授权
    • Multi-output DC-DC converter and electronic apparatus using the same
    • 多输出DC-DC转换器和使用其的电子设备
    • US06486567B2
    • 2002-11-26
    • US09985723
    • 2001-10-15
    • Naoto SanoShingo Kunii
    • Naoto SanoShingo Kunii
    • H02J100
    • H02M3/158H02M2001/009Y10T307/414
    • A multi-output DC-DC converter includes a step-down DC-DC converter circuit which includes a switching device for switching an input DC voltage to convert it to a pulse voltage, a choke coil and a smoothing capacitor for smoothing the pulse voltage to obtain a first output lower than the input DC voltage, and a flywheel rectifying device for causing a current to flow through the choke coil when the switching device is off; and a rectifying circuit for processing and rectifying the pulse voltage in the DC-DC converter circuit to obtain a second output. Since the flywheel rectifying device is a bi-directional synchronous rectifying device which is turned on when the switching device is off, even when the load current of the first output decreases, the amplitude of the source voltage of the switching device is not reduced. Therefore, the second output obtained from the rectifying circuit always maintains a normal value.
    • 多输出DC-DC转换器包括降压DC-DC转换器电路,其包括用于切换输入DC电压以将其转换成脉冲电压的开关装置,扼流线圈和用于使脉冲电压平滑的平滑电容器 获得低于输入直流电压的第一输出;以及飞轮整流装置,用于当切换装置关闭时使电流流过扼流线圈; 以及整流电路,用于处理和整流DC-DC转换器电路中的脉冲电压以获得第二输出。 由于飞轮整流装置是开关装置关闭时导通的双向同步整流装置,所以即使第一输出的负载电流减小,开关装置的源极电压的振幅也不会降低。 因此,从整流电路获得的第二输出总是保持正常值。
    • 5. 发明授权
    • Switching power-supply module
    • 开关电源模块
    • US07403397B2
    • 2008-07-22
    • US10746660
    • 2003-12-26
    • Tadahiko MatsumotoSyuichi HondaYasuo OhashiNaoto Sano
    • Tadahiko MatsumotoSyuichi HondaYasuo OhashiNaoto Sano
    • H05K1/14
    • H02M7/003H02M3/33538H02M2001/0074H05K1/144H05K3/3405H05K3/3421H05K3/368H05K2201/10386
    • A switching power-supply module includes circuit boards, power conversion circuit sections provided on the respective circuit boards, conductor land patterns provided with spacing therebetween along edges of the circuit boards, conductor terminals for interconnecting the conductor land patterns. The circuit boards are stacked with spacing therebetween with the corresponding conductor land patterns being aligned, and the aligned conductor land patterns are interconnected by the corresponding conductor terminals. At least one of the conductor terminals includes an interboard-connection portion for interconnecting the conductor land patterns of the circuit boards and a leg portion that extends from the interboard-connection portion in the stacking direction of the circuit boards and that defines an external-connection portion, and the other conductor terminals each function as an interboard-connection dedicated terminal for providing connection between the circuit boards.
    • 开关电源模块包括电路板,设置在各个电路板上的功率转换电路部分,沿着电路板的边缘设置有间隔的导体焊盘图案,用于互连导体焊盘图案的导体端子。 电路板之间具有间隔地堆叠,相应的导体焊盘图案对准,并且对准的导体焊盘图案通过相应的导体端子互连。 至少一个导体端子包括用于互连电路板的导体焊盘图案的板间连接部分和从电路板的堆叠方向上从板间连接部分延伸的脚部分,并且限定外部连接 部分,其他导体端子各自用作板间连接专用端子,用于提供电路板之间的连接。
    • 9. 发明授权
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US5846678A
    • 1998-12-08
    • US576694
    • 1995-12-21
    • Hidetoshi NishigoriNaoto Sano
    • Hidetoshi NishigoriNaoto Sano
    • G03F7/20H01L21/027G03B27/72
    • G03F7/70058G03F7/70358G03F7/70558
    • An exposure apparatus for transferring, by exposure, a pattern of a mask onto a wafer, includes a pulse light source and a scanning system for relatively and scanningly moving the mask and the wafer relative to an illumination region to be defined by pulses of light to be sequentially provided by the pulse light source, wherein the number of pulses for exposure of the wafer is determined on the basis of information representing a relation between the pulse number and exposure non-uniformness, and wherein the pulse number is expressed by L/.DELTA.X where L is the width of the illumination region in a scan direction and .DELTA.X is the amount of relative displacement of the illumination region moving in the light emission interval of one pulse.
    • 用于通过曝光将掩模图案曝光于晶片上的曝光装置包括脉冲光源和扫描系统,用于相对于扫描和扫描地移动掩模和晶片相对于由光脉冲定义的照明区域的扫描系统 由脉冲光源依次提供,其中基于表示脉冲数和曝光不均匀性之间的关系的信息确定用于晶片曝光的脉冲数,并且其中脉冲数由L / DELTA X,其中L是扫描方向上的照明区域的宽度,DELTA X是在一个脉冲的发光间隔中移动的照明区域的相对位移量。