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1. 发明申请

US20050157237A1 Substrate for liquid crystal display, liquid crystal display having the same, and method of manufacturing the same 失效
标题翻译：用于液晶显示器的基板，具有该液晶显示器的液晶显示器及其制造方法
公开(公告)号：US20050157237A1
公开(公告)日：2005-07-21
申请号：US11064463
申请日：2005-02-23
申请人： Seiji Doi , Tetsuya Fujikawa , Naoshige Itami , Yoshinori Tanaka , Atsuyuki Hoshino , Yoshio Kurosawa
发明人： Seiji Doi , Tetsuya Fujikawa , Naoshige Itami , Yoshinori Tanaka , Atsuyuki Hoshino , Yoshio Kurosawa
IPC分类号： G02F1/1335 , G02F1/1362 , G02F1/1343
CPC分类号： G02F1/1362 , G02F1/133553
摘要： The invention relates to a substrate for a liquid crystal display used in a display section of an information apparatus, a liquid crystal display having the same, and a method of manufacturing the same. There is provided a substrate for a liquid crystal display which achieves good display quality with reduced manufacturing steps, a liquid crystal display having the same, and a method of manufacturing the same. TFTs are formed on a glass substrate. A protective film is formed on the TFTs, and a resist pattern is formed on the protective film, the resist pattern having openings located above source electrodes, gate bus line terminals, and drain bus line terminals. The resist pattern is baked at a baking temperature of 200 (or more after irradiating the surface thereof with ultraviolet light to form a wrinkled resin layer having a wrinkled surface. The protective film and an insulation film are etched using the wrinkled resin layer as an etching mask to form reflective electrodes and protective conductive films on the wrinkled resin layer.
摘要翻译：本发明涉及用于信息装置的显示部分的液晶显示器用基板，具有该液晶显示器的液晶显示器及其制造方法。提供了一种用于液晶显示器的基板，其通过降低的制造步骤实现了良好的显示质量，具有该液晶显示器的液晶显示器及其制造方法。 TFT形成在玻璃基板上。在TFT上形成保护膜，在保护膜上形成抗蚀剂图案，抗蚀剂图案具有位于源电极上方的开口，栅极总线端子和漏极总线端子。抗蚀剂图案在200℃的烘烤温度下烘烤（在用紫外线照射其表面后，以形成起皱表面的起皱树脂层以上进行烘烤），使用起皱树脂层作为蚀刻对保护膜和绝缘膜进行蚀刻掩模在起皱树脂层上形成反射电极和保护性导电膜。

2. 发明申请

US20090148616A1 REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：反射型液晶显示装置及其制造方法
公开(公告)号：US20090148616A1
公开(公告)日：2009-06-11
申请号：US12323843
申请日：2008-11-26
申请人： Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
发明人： Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
IPC分类号： B05D3/06
CPC分类号： G02F1/133553 , G02F1/133504 , G02F2001/133507 , G02F2001/133541 , G02F2001/133616 , G02F2001/133626
摘要： The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.
摘要翻译：本发明是一种制造液晶显示装置的方法，其中具有曝光能量的光照射在具有预定膜厚的光敏树脂层的表面上，并且在厚度方向上的热变形特性分布或平面方向），然后进行热处理，以在光敏树脂层的表面上形成随机起伏（微槽或微皱纹）。

3. 发明授权

US5975098A Apparatus for and method of cleaning substrate 失效
标题翻译：清洗基板的方法及方法
公开(公告)号：US5975098A
公开(公告)日：1999-11-02
申请号：US775712
申请日：1996-12-17
申请人： Mitsuaki Yoshitani , Kazuo Kinose , Satoru Tanaka , Kenya Morinishi , Masahiro Miyagi , Naoshige Itami , Kazuhiro Watanabe
发明人： Mitsuaki Yoshitani , Kazuo Kinose , Satoru Tanaka , Kenya Morinishi , Masahiro Miyagi , Naoshige Itami , Kazuhiro Watanabe
IPC分类号： B08B3/02 , B08B3/12 , G02F1/1333 , H01L21/00
CPC分类号： H01L21/67051 , B08B3/02 , B08B3/12 , B08B2203/0288 , G02F1/1333 , Y10S134/902
摘要： A substrate rinsing apparatus of a non-contact type having a high rinsing ability. An ultrasonic rinsing nozzle and a high-pressure rinsing nozzle are both disposed within the same rinsing apparatus. The ultrasonic rinsing nozzle ejects ultrasonic rinsing liquid as a curtain through a slit, while the high-pressure rinsing nozzle ejects a high-pressure rinsing jet toward the ultrasonic rinsing liquid which is ejected toward a substrate. Not only is foreign matter removed by ultrasonic rinsing, but foregoing matter is removed by the high-pressure rinsing jet and is carried away by a flow of the ultrasonic rinsing liquid and washed off the substrate toward a downstream side of rotation of the substrate.
摘要翻译：具有高冲洗能力的非接触型衬底漂洗装置。超声波清洗喷嘴和高压冲洗喷嘴均设置在同一冲洗装置内。超声波冲洗喷嘴通过狭缝喷射超声波冲洗液体作为帘幕，同时高压冲洗喷嘴向朝向基板喷射的超声波冲洗液喷射高压冲洗喷嘴。通过超声波冲洗除去异物，但是通过高压冲洗喷嘴除去上述物质，并且通过超声波冲洗液体的流动而被排出，从而将基板从基板的下游侧洗出。

4. 发明授权

US07697106B2 Liquid crystal display device and method of manufacturing the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US07697106B2
公开(公告)日：2010-04-13
申请号：US09759424
申请日：2001-01-12
申请人： Manabu Sawasaki , Takashi Takagi , Yoji Taniguchi , Hiroyasu Inoue , Susumu Nakano , Tomonori Tanose , Naonobu Matsui , Kazuyuki Hosokawa , Kazuhiko Sumi , Masahiro Ikeda , Naoshige Itami
发明人： Manabu Sawasaki , Takashi Takagi , Yoji Taniguchi , Hiroyasu Inoue , Susumu Nakano , Tomonori Tanose , Naonobu Matsui , Kazuyuki Hosokawa , Kazuhiko Sumi , Masahiro Ikeda , Naoshige Itami
IPC分类号： G02F1/1339 , G02F1/1333 , G02F1/1335
CPC分类号： G02F1/133707 , G02F1/133512 , G02F1/133514 , G02F1/13394 , G02F2001/13712
摘要： A liquid crystal display device of the present invention has a structure in which vertically aligned liquid crystal is sealed between a TFT substrate and a CF substrate. Pixel electrodes in which slits are provided are formed on the TFT substrate, while cell gap holding spacers and domain defining projections are formed on the CF substrate. For example, positive type photoresist is coated on a common electrode. Then, first exposure is executed by using a mask for light-shielding spacer forming regions and projection forming regions, and then second exposure is executed by using a mask for light-shielding the spacer forming regions. Then, the photoresist is developed. Accordingly, the spacers and the projections, each having a different height, can be formed simultaneously.
摘要翻译：本发明的液晶显示装置具有垂直排列的液晶被密封在TFT基板和CF基板之间的结构。在TFT基板上形成有设置有狭缝的像素电极，在CF基板上形成单元间隙保持用间隔物和区域限定突起。例如，在公共电极上涂覆正型光致抗蚀剂。然后，通过使用遮光间隔物形成区域和投影形成区域的掩模来执行第一曝光，然后通过使用用于遮蔽间隔物形成区域的掩模来执行第二曝光。然后，显影光致抗蚀剂。因此，可以同时形成各自具有不同高度的间隔件和突起。

5. 发明授权

US07692740B2 Liquid crystal display having a reflective electrode formed on an organic resin film 失效
标题翻译：具有形成在有机树脂膜上的反射电极的液晶显示器
公开(公告)号：US07692740B2
公开(公告)日：2010-04-06
申请号：US11064463
申请日：2005-02-23
申请人： Seiji Doi , Tetsuya Fujikawa , Naoshige Itami , Yoshinori Tanaka , Atsuyuki Hoshino , Yoshio Kurosawa
发明人： Seiji Doi , Tetsuya Fujikawa , Naoshige Itami , Yoshinori Tanaka , Atsuyuki Hoshino , Yoshio Kurosawa
IPC分类号： G02F1/1335 , G02F1/1345
CPC分类号： G02F1/1362 , G02F1/133553
摘要： The invention relates to a substrate for a liquid crystal display used in a display section of an information apparatus, a liquid crystal display having the same, and a method of manufacturing the same. There is provided a substrate for a liquid crystal display which achieves good display quality with reduced manufacturing steps, a liquid crystal display having the same, and a method of manufacturing the same. TFTs are formed on a glass substrate. A protective film is formed on the TFTs, and a resist pattern is formed on the protective film, the resist pattern having openings located above source electrodes, gate bus line terminals, and drain bus line terminals. The resist pattern is baked at a baking temperature of 200 (or more after irradiating the surface thereof with ultraviolet light to form a wrinkled resin layer having a wrinkled surface. The protective film and an insulation film are etched using the wrinkled resin layer as an etching mask to form reflective electrodes and protective conductive films on the wrinkled resin layer.
摘要翻译：本发明涉及用于信息装置的显示部分的液晶显示器用基板，具有该液晶显示器的液晶显示器及其制造方法。提供了一种用于液晶显示器的基板，其通过降低的制造步骤实现了良好的显示质量，具有该液晶显示器的液晶显示器及其制造方法。 TFT形成在玻璃基板上。在TFT上形成保护膜，在保护膜上形成抗蚀剂图案，抗蚀剂图案具有位于源电极上方的开口，栅极总线端子和漏极总线端子。抗蚀剂图案在200℃的烘烤温度下烘烤（在用紫外线照射其表面之后，以形成起皱表面的起皱树脂层以上进行烘烤，使用起皱树脂层作为蚀刻来对保护膜和绝缘膜进行蚀刻掩模在起皱树脂层上形成反射电极和保护性导电膜。

6. 发明授权

US07480019B2 Method of manufacturing a substrate for an lcd device 有权
标题翻译：液晶显示器件用基板的制造方法
公开(公告)号：US07480019B2
公开(公告)日：2009-01-20
申请号：US10698994
申请日：2003-10-31
申请人： Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
发明人： Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
IPC分类号： G02F1/1335
CPC分类号： G02F1/133553 , G02F1/133504 , G02F2001/133507 , G02F2001/133541 , G02F2001/133616 , G02F2001/133626
摘要： The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.
摘要翻译：本发明是一种制造液晶显示装置的方法，其中具有曝光能量的光照射在具有预定膜厚的光敏树脂层的表面上，并且在厚度方向上的热变形特性分布或平面方向），然后进行热处理，以在光敏树脂层的表面上形成随机起伏（微槽或微皱纹）。

7. 发明授权

US07973893B2 Method of manufacturing a substrate for a liquid crystal display device 有权
标题翻译：制造液晶显示装置用基板的方法
公开(公告)号：US07973893B2
公开(公告)日：2011-07-05
申请号：US12323843
申请日：2008-11-26
申请人： Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
发明人： Naoshige Itami , Tetsuya Fujikawa , Atuyuki Hoshino
IPC分类号： G02F1/1335
CPC分类号： G02F1/133553 , G02F1/133504 , G02F2001/133507 , G02F2001/133541 , G02F2001/133616 , G02F2001/133626
摘要： The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.
摘要翻译：本发明是一种制造液晶显示装置的方法，其中具有曝光能量的光照射在具有预定膜厚的光敏树脂层的表面上，并且在厚度方向上的热变形特性分布或平面方向），然后进行热处理，以在光敏树脂层的表面上形成随机起伏（微槽或微皱纹）。

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