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1. 发明专利

JP2005092432A Accounting program and system 审中-公开
标题翻译：会计程序和系统
公开(公告)号：JP2005092432A
公开(公告)日：2005-04-07
申请号：JP2003323226
申请日：2003-09-16
申请人： Numerical Technologies Inc , ニューメリカルテクノロジーズ株式会社
发明人： TORII HIDEYUKI
IPC分类号： G06Q10/06 , G06Q10/00 , G06Q50/00 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To provide an accounting program and system for allowing an expert who is familiar with internal accounting to easily design or change the accounting system. SOLUTION: An accounting program for outputting accounting performed based on the lapse of various kinds of transaction contracts as a slip is configured to convert a source file 11 of a transaction contract including at least description defining the reading of data necessary for a desired transaction contract and the rule of a transaction contract, description defining events generated between transactions related to the transaction contract and description defining a format to output the accounting result of the transaction contract, which are prepared by using describers describing the transaction contract following the rule of a preliminarily prepared describer system into an performance file 12 constituted of object files and processing logic programs relevant to each of those describers, which is analyzed on a general system program mounted on the accounting system so as to be made performable under a predetermined compiler 10a-1. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种会计程序和系统，用于允许熟悉内部会计的专家轻松设计或更改会计系统。解决方案：用于输出基于作为单据的各种交易合同的经过执行的会计的会计程序被配置为将交易契约的源文件11转换成至少包括描述所需数据所需数据的描述的描述交易合同和交易合同规则的描述，定义与交易合同相关的交易之间产生的事件的描述以及定义用于输出交易合同的会计结果的格式的描述的描述，这些描述是使用描述根据规则的交易合同的描述者将预先准备好的描述符系统转换成由目标文件构成的表演文件12和与每个描述者相关的处理逻辑程序，该文件在安装在会计系统上的一般系统程序上进行分析，以便在预定编译器10a- 1。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2003036346A Method for evaluating operational risk and its system 审中-公开
标题翻译：评估操作风险及其系统的方法
公开(公告)号：JP2003036346A
公开(公告)日：2003-02-07
申请号：JP2001220862
申请日：2001-07-23
申请人： Mitsubishi Trust & Banking Corp , Numerical Technologies Inc , ニューメリカルテクノロジーズ株式会社 , 三菱信託銀行株式会社
发明人： IORI EIJI , NAKAGIRI KEISUKE , NAKAGAWA HIDETOSHI , TORII HIDEYUKI , EGAWA OSAMU , SUZUKI SHINGO , SO JU , HIRANO MASAHIKO
IPC分类号： G06Q40/06 , G06Q10/00 , G06Q10/06 , G06Q40/00 , G06Q40/02 , G06Q50/00 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To provide a method for evaluating an operational risk and its system which creates a standard of comparison for an operational risk and evaluates a user's operational risk according to the standard and a method for evaluating an operational risk and its system which enables forecasting loss which has not occurred yet and evaluates an operational risk.
SOLUTION: The present invention is an operational risk evaluation system which accumulates occurrences of a plurality of events involving loss and evaluates an operational risk based on the accumulated events. Data related to the risk caused by the occurrence of events from a plurality of arbitrary member users 134 are sent to a data consortium 131 that has closed a nondisclosure agreement. A secretariat to which data processing is entrusted creates standard data of the operational risk according to the data from the plurality of users, compares the standard data and the user data of the operational risk created from the user data of each user and evaluates them, and returns the result 137 of the user data evaluation to the corresponding user.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种评估操作风险的方法及其系统，其创建操作风险的比较标准，并根据标准评估用户的操作风险，以及评估操作风险的方法及其系统，其使能尚未发生的预测损失，并评估操作风险。解决方案：本发明是一种操作风险评估系统，其累积涉及损失的多个事件的发生并且基于累积事件来评估操作风险。与来自多个任意成员用户134的事件的发生相关的风险的数据被发送到已经关闭了非公开协议的数据联盟131。托管数据处理的秘书处根据多个用户的数据创建操作风险的标准数据，比较从每个用户的用户数据创建的操作风险的标准数据和用户数据，并对其进行评估，将用户数据评估结果137返回给相应的用户。

3. 发明专利

JP2003036343A Method of operational risk management and its system 审中-公开
标题翻译：操作风险管理方法及其系统
公开(公告)号：JP2003036343A
公开(公告)日：2003-02-07
申请号：JP2001220861
申请日：2001-07-23
申请人： Mitsubishi Trust & Banking Corp , Numerical Technologies Inc , ニューメリカルテクノロジーズ株式会社 , 三菱信託銀行株式会社
发明人： IORI EIJI , NAKAGIRI KEISUKE , NAKAGAWA HIDETOSHI , TORII HIDEYUKI , EGAWA OSAMU , SUZUKI SHINGO , SO JU
IPC分类号： G06F17/18 , G06F19/00 , G06Q10/00 , G06Q10/04 , G06Q10/06 , G06Q50/00 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To provide a method of operational risk management and its system to heighten precision of quantitative simulation while accumulating data by merging accumulated occurrences of loss and quantitative simulation.
SOLUTION: The present invention is an operational risk management system which accumulates occurrences of a plurality of events involving loss and manages an operational risk based on the accumulated events. It accumulates the plurality of events and their loss as a loss data 2 and predicts a risk to occur by a predetermined method using a calculation engine 6 and decides precision of the prediction of the predicted risk and/or a magnitude of loss which has occurred using an analysis tool 7 or the like against an actual occurrence of the event.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种操作风险管理的方法及其系统，通过合并累积的损失和定量模拟的发生，提高定量模拟的精度，同时积累数据。解决方案：本发明是一种操作风险管理系统，其累积涉及损失的多个事件的发生并且基于累积事件来管理操作风险。它将多个事件及其损失累积为损失数据2，并且使用计算引擎6预测通过预定方法发生的风险，并且使用以下方式确定预测风险的预测精度和/或已经发生的损失的大小针对事件的实际发生的分析工具7等。

4. 发明专利

JP2009104190A Design and layout of phase shifting photolithographic mask 有权
标题翻译：相移图像的设计与布局
公开(公告)号：JP2009104190A
公开(公告)日：2009-05-14
申请号：JP2009025938
申请日：2009-02-06
申请人： Numerical Technologies Inc , ニューメリカルテクノロジーズインコーポレイテッド
发明人： COTE MICHEL LUC , PIERRAT CHRISTOPHE
IPC分类号： G03F1/29 , G03F1/68 , G03F1/70 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a design and layout of a phase shifting photolithographic mask, to be used to define, arrange and refine phase shifters to substantially define the layer using phase shifting. SOLUTION: Through the process, computer readable definitions of an alternating aperture, dark field phase shift mask and of a complimentary mask are generated. Masks can be made from the definitions and then used to fabricate a layer of material in an integrated circuit. The separations between phase shifters, or cuts, are designed for easy mask manufacturability while also maximizing the amount of each feature defined by the phase shifting mask. Cost functions are used to describe the relative quality of phase assignments and to select higher quality phase assignments and reduce phase conflicts. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供相移光刻掩模的设计和布局，用于限定，布置和修整移相器以使用相移基本上限定层。解决方案：通过该过程，产生交替孔径，暗场相移掩模和互补掩模的计算机可读定义。掩模可以由定义制成，然后用于在集成电路中制造一层材料。移相器或切口之间的分离被设计为便于掩模制造，同时还使由相移掩模限定的每个特征的量最大化。成本函数用于描述相位分配的相对质量，并选择较高质量的相位分配并减少相位冲突。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2004110035A Using second exposure to assist psm exposure in printing tight space adjacent to large feature 有权
标题翻译：使用第二次曝光来辅助PSM曝光打印紧密的空间来增加大特征
公开(公告)号：JP2004110035A
公开(公告)日：2004-04-08
申请号：JP2003323774
申请日：2003-09-16
申请人： Numerical Technologies Inc , ヌメリカルテクノロジーズ, インコーポレイテッド
发明人： PIERRAT CHRISTOPHE
IPC分类号： G03F1/00 , G03F1/26 , G03F7/20 , H01L21/027 , G03F1/08
CPC分类号： G03F7/70466 , G03F1/26 , G03F1/70 , G03F7/203 , H01L21/0274 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide a system using exposure through a second mask to assist exposure through a phase shifting mask in printing a tight space adjacent to a large feature. SOLUTION: During operation, the system exposes a photoresist layer on the surface of a semiconductor wafer through a phase shifting mask. The phase shifting mask includes a phase shifter defining a space between a first feature and a second feature, wherein the first feature is so large that the effectiveness of of phase shifting is degraded in defining the space. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提供一种使用第二掩模曝光的系统，以便在打印紧邻大尺寸特征的紧密空间中通过相移掩模来辅助曝光。解决方案：在操作期间，系统通过相移掩模在半导体晶片的表面上曝光光致抗蚀剂层。相移掩模包括限定第一特征和第二特征之间的空间的移相器，其中第一特征如此大，使得在限定空间时相移的有效性降低。版权所有（C）2004，JPO

6. 发明专利

TW200408792A 度量程序之自動產生 AUTOMATED CREATION OF METROLOGY RECIPES 审中-公开
简体标题：度量进程之自动产生 AUTOMATED CREATION OF METROLOGY RECIPES
公开(公告)号：TW200408792A
公开(公告)日：2004-06-01
申请号：TW092122024
申请日：2003-08-11
申请人：數位科技股份有限公司 NUMERICAL TECHNOLOGIES,INC
发明人：張芳誠 CHANG, FANG-CHENG
IPC分类号： G01B
CPC分类号： G03F7/70525 , G03F7/70625
摘要：說明一種製造程序之自動量度程序建立方法，其中，使用設計資料庫界定欲構製於裝置上之圖案。處理設計資料庫，以產生一特色之模擬影像，供量度工具用以量度該特色。模擬影像供應至量度工具，在此用作量度工具對齊之基礎。其他程序資料與模擬影像合併，以提全自動量度建立程序。
简体摘要：说明一种制造进程之自动量度进程创建方法，其中，使用设计数据库界定欲构制于设备上之图案。处理设计数据库，以产生一特色之仿真影像，供量度工具用以量度该特色。仿真影像供应至量度工具，在此用作量度工具对齐之基础。其他进程数据与仿真影像合并，以提全自动量度创建进程。

7. 发明申请

WO2002101464A3 OPTICAL PROXIMITY CORRECTION FOR PHASE SHIFTING PHOTOLITHOGRAPHIC MASKS 审中-公开
公开(公告)号：WO2002101464A3
公开(公告)日：2002-12-19
申请号：PCT/US2002/017667
申请日：2002-06-07
申请人： NUMERICAL TECHNOLOGIES, INC. , PIERRAT, Christophe , COTE, Michel, Luc
发明人： PIERRAT, Christophe , COTE, Michel, Luc
IPC分类号： G03F1/00
摘要： A method for producing a computer readable definition of photolithographic mask used to define a target pattern is provided. The phase shift mask patterns include phase shift windows, and the trim mask patterns include trim shapes, which have boundaries defined by such sets of line segments. For a particular pair of phase shift windows used to define a target feature in a target pattern, each of the phase shift windows in the pair can be considered to have a boundary that includes at least one line segment that abuts the target feature. Likewise, a complementary trim shape used in definition of the target feature, for example by including a transmissive region used to clear an unwanted phase transition between the particular pair of phase shift windows, includes at least one line segment that can be considered to abut the target feature. Proximity correction is provided by adjusting the position of the at least one line segment on the boundary of a phase shift windows in said pair which abuts the target feature, and by adjusting the position of the at least one line segment on the boundary of the complementary trim shape which abuts the target feature.

8. 发明申请

WO2002073312A1 ALTERNATING PHASE SHIFT MASKING FOR MULTIPLE LEVELS OF MASKING RESOLUTION 审中-公开
标题翻译：替代相位移动屏幕的多个屏幕分辨率水平
公开(公告)号：WO2002073312A1
公开(公告)日：2002-09-19
申请号：PCT/US2001/007413
申请日：2001-03-08
申请人： NUMERICAL TECHNOLOGIES, INC. , WU, Shao-Po
发明人： WU, Shao-Po
IPC分类号： G03F1/00
CPC分类号： G03F1/30 , G03F1/28
摘要： A method and system produce alternating phase shift masks multiple phase shift mask resolution levels for multiple feature classes. The method comprises: processing a pattern for a photolithographic mask that defines a layer, wherein said pattern defines features in first and second feature classes in the layer; defining first layout dimensions for phase shift window pairs for a first feature resolution level, and second layout dimensions for phase shift window pairs for a second feature resolution level; laying out a plurality of phase shift window pairs, including using said first layout dimensions for phase shift window pairs for the first feature class, and using said second layout dimensions for phase shift window pairs for the second feature class; and assigning first and second phase shift values to phase shift windows in the plurality of phase shift window pairs. The process results in the production of set of masks for defining a layer of material in an integrated circuit or other work piece. The set of masks comprises a first mask having a plurality of phase shifting window pairs in an opaque field for defining respective phase shift window defined structures in the layer. The first mask has a plurality of phase shifting windows in an opaque field for defining respective phase-shift window defined structures in said layer. The phase shift windows in said plurality comprise respective first and second classes of windows, the first class having a width dimension based upon a first layout width, and the second class having a width dimension based on a second layout width, said layout width being greater than said second layout width.
摘要翻译：一种方法和系统为多个要素类产生交替相移掩模多个相移掩模分辨率级别。该方法包括：处理限定层的光刻掩模的图案，其中所述图案限定所述层中的第一和第二特征类中的特征; 为第一特征分辨率级别定义用于相移窗口对的第一布局尺寸，以及用于第二特征分辨率级别的相移窗口对的第二布局尺寸; 布置多个相移窗对，包括对所述第一特征类使用所述第一布局尺寸用于相移窗对，以及使用所述第二布局尺寸用于所述第二特征类的相移窗对; 以及将第一和第二相移值分配给所述多个相移窗对中的相移窗口。该过程导致生产用于在集成电路或其它工件中定义材料层的一组掩模。所述掩模组包括在不透明场中具有多个相移窗口对的第一掩模，用于限定所述层中各自的相移窗口限定的结构。第一掩模在不透明场中具有多个相移窗口，用于限定所述层中各自的相移窗口限定的结构。所述多个相移窗包括相应的第一和第二类窗口，第一类具有基于第一布局宽度的宽度尺寸，第二类具有基于第二布局宽度的宽度尺寸，所述布局宽度更大比所述第二布局宽度。

9. 发明申请

WO2002101468A2 DESIGN AND LAYOUT OF PHASE SHIFTING PHOTOLITHOGRAPHIC MASKS 审中-公开
标题翻译：相移图像的设计和布局
公开(公告)号：WO2002101468A2
公开(公告)日：2002-12-19
申请号：PCT/US2002/017668
申请日：2002-06-07
申请人： NUMERICAL TECHNOLOGIES, INC. , COTE, Michel, Luc , PIERRAT, Christophe
发明人： COTE, Michel, Luc , PIERRAT, Christophe
IPC分类号： G03F7/20
CPC分类号： G03F7/70466 , G03F1/26 , G03F1/36 , G03F1/68 , G03F1/70 , G03F7/70425 , G03F7/70433 , G03F7/70558
摘要： A method for defining a full phase layout for defining a layer of material in an integrated circuit is described. The method can be used to define, arrange, and refine phase shifters to substantially define the layer using phase shifting. Through the process, computer readable definitions of an alternating aperture, dark field phase shift mask and of a complimentary mask are generated. Masks can be made from the definition and then used to fabricate a layer of material in an integrated circuit. The separations between phase shifters, or cuts, are designed for easy mask manufacturability while also maximizing the amount of each feature defined by the phase shifting mask. Cost functions are used to describe the relative quality of phase assignments and to select higher quality phase assignments and reduce phase conflicts.
摘要翻译：描述了一种用于定义用于在集成电路中定义材料层的全相布局的方法。该方法可用于定义，排列和细化移相器以基本上使用相移限定层。通过该过程，产生交替光圈，暗场相移掩模和互补掩模的计算机可读定义。掩模可以从定义制成，然后用于在集成电路中制造一层材料。移相器或切口之间的分离被设计为便于掩模制造，同时还使由相移掩模限定的每个特征的量最大化。成本函数用于描述相位分配的相对质量，并选择较高质量的相位分配并减少相位冲突。

10. 发明申请

WO2002101466A3 EXPOSURE CONTROL FOR PHASE SHIFTING PHOTOLITHOGRAPHIC MASKS 审中-公开
公开(公告)号：WO2002101466A3
公开(公告)日：2002-12-19
申请号：PCT/US2002/018480
申请日：2002-06-07
申请人： NUMERICAL TECHNOLOGIES, INC. , PIERRAT, Christophe , COTE, Michel, Luc
发明人： PIERRAT, Christophe , COTE, Michel, Luc
IPC分类号： G03F1/00
摘要： Mask and integrated circuit fabrication approaches are described to facilitate use of so called "full phase" masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0

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