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1. 发明申请

WO2006057660A2 HIGH ENERGY PULSE SUPPRESSION METHOD 审中-公开
标题翻译：高能量脉冲抑制方法
公开(公告)号：WO2006057660A2
公开(公告)日：2006-06-01
申请号：PCT/US2005012517
申请日：2005-04-13
申请人： ELECTRO SCIENT IND INC , GRANT KEITH , STONE STEVE , NILSEN BRADY
发明人： GRANT KEITH , STONE STEVE , NILSEN BRADY
IPC分类号： H01S3/11
CPC分类号： H01S3/117 , B23K26/0622 , B23K26/0624 , B23K26/0853 , B23K26/40 , B23K2201/36 , B23K2203/50 , H01S3/10 , H01S3/10038 , H01S3/10069 , H01S3/1024 , H01S3/1611 , H01S3/1673 , H05K3/0026 , H05K3/0038
摘要： A laser (126) processes a workpiece (120) with laser pulses (192) delivered at random time intervals and at substantially constant energy levels by characterizing the laser cavity discharge behavior and utilizing that information for adjusting dummy pulse time periods to compensate for the energy errors. Dummy pulses (194) are laser pulses that are blocked from reaching a workpiece. A second way for providing constant pulse energies employs an AOM (10) for varying amounts of laser energy passed to the workpiece. A third way of providing constant pulse energies entails extending the pulse period (200) of selected pulses to allow additional laser cavity charging time whenever a dummy pulse is initiated.
摘要翻译：激光器（126）通过表征激光腔排放行为的随机时间间隔和基本上恒定的能量级的激光脉冲（192）处理工件（120），并利用该信息来调整虚拟脉冲时间周期以补偿能量错误。虚拟脉冲（194）是被阻止到达工件的激光脉冲。提供恒定脉冲能量的第二种方法使用AOM（10）来改变传递到工件的激光能量的量。提供恒定脉冲能量的第三种方式需要延长所选脉冲的脉冲周期（200），以便每当启动虚拟脉冲时允许额外的激光腔充电时间。

2. 发明申请

WO2007064947A3 OPTICAL COMPONENT CLEANLINESS AND DEBRIS MANAGEMENT IN LASER MICROMACHINING APPLICATIONS 审中-公开
公开(公告)号：WO2007064947A3
公开(公告)日：2007-06-07
申请号：PCT/US2006/046113
申请日：2006-11-30
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC. , BOLT, Bryan C. , HEMENWAY, David M. , KOSMOWSKI, Mark , LERNER, A. Grey , NILSEN, Brady E. , POPE, Richard
发明人： BOLT, Bryan C. , HEMENWAY, David M. , KOSMOWSKI, Mark , LERNER, A. Grey , NILSEN, Brady E. , POPE, Richard
IPC分类号： H01S3/10 , B23K26/02
摘要： Preferred embodiments of a purge gas port (74), laser beam attenuating input window (24), and laser shutter (20) constitute subsystems of a UV laser optical system (10) in which a laser beam is completely enclosed to reduce contamination of the optical system components (42, 60, 72). Purge gas is injected through multiple locations in a beam tube assembly (18) to ensure that the optical component surfaces (78) sensitive to contamination are in the flow path of the purge gas. The input window functions as a fixed level attenuator to limit photopolymerization of airborne molecules and particles. Periodically rotating optical elements asymmetrically in their holders (142) reduces burn damage to the optics.

3. 发明申请

WO2007064947A2 OPTICAL COMPONENT CLEANLINESS AND DEBRIS MANAGEMENT IN LASER MICROMACHINING APPLICATIONS 审中-公开
标题翻译：激光微机械应用中光学元件的清洁和碎屑处理
公开(公告)号：WO2007064947A2
公开(公告)日：2007-06-07
申请号：PCT/US2006046113
申请日：2006-11-30
申请人： ELECTRO SCIENT IND INC , BOLT BRYAN C , HEMENWAY DAVID M , KOSMOWSKI MARK , LERNER A GREY , NILSEN BRADY E , POPE RICHARD
发明人： BOLT BRYAN C , HEMENWAY DAVID M , KOSMOWSKI MARK , LERNER A GREY , NILSEN BRADY E , POPE RICHARD
CPC分类号： B23K26/12 , B23K26/064 , B23K26/0643 , B23K26/128 , B23K26/14 , B23K26/142
摘要： Preferred embodiments of a purge gas port (74), laser beam attenuating input window (24), and laser shutter (20) constitute subsystems of a UV laser optical system (10) in which a laser beam is completely enclosed to reduce contamination of the optical system components (42, 60, 72). Purge gas is injected through multiple locations in a beam tube assembly (18) to ensure that the optical component surfaces (78) sensitive to contamination are in the flow path of the purge gas. The input window functions as a fixed level attenuator to limit photopolymerization of airborne molecules and particles. Periodically rotating optical elements asymmetrically in their holders (142) reduces burn damage to the optics.
摘要翻译：净化气体端口（74），激光束衰减输入窗口（24）和激光快门（20）的优选实施例构成UV激光光学系统（10）的子系统，其中激光束被完全封闭以减少光学系统组件（42,60,72）。吹扫气体通过束管组件（18）中的多个位置注入以确保对污染敏感的光学部件表面（78）位于吹扫气体的流动路径中。输入窗口用作固定水平衰减器，以限制空气中分子和颗粒的光聚合作用。周期性地在它们的保持器（142）中不对称地旋转光学元件减少了对光学器件的烧伤。

4. 发明申请

WO2007011604A1 METHOD OF SUPPRESSING DISTORTION OF A WORKING LASER BEAM OF A LASER LINK PROCESSING SYSTEM 审中-公开
标题翻译：抑制激光链接处理系统的工作激光束失真的方法
公开(公告)号：WO2007011604A1
公开(公告)日：2007-01-25
申请号：PCT/US2006/027032
申请日：2006-07-11
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC. , HEMENWAY, David Martin , NILSEN, Brady , LO, Ho Wai , GRANT, Keith
发明人： HEMENWAY, David Martin , NILSEN, Brady , LO, Ho Wai , GRANT, Keith
IPC分类号： H01L21/027
CPC分类号： B23K26/0665 , B23K26/032 , B23K26/064 , B23K26/0648 , B23K2201/40
摘要： A method of suppressing distortion of a working laser beam (12') directed for incidence on a target specimen (14) presented for processing by a laser link processing system (100) uses a spatial filter (102) to remove stray light-induced distortion from the working laser beam.
摘要翻译：一种抑制用于入射到由激光连接处理系统（100）处理的目标样本（14）上的工作激光束（12'）的变形的方法使用空间滤波器（102）去除杂散光诱导失真从工作激光束。

5. 发明申请

WO2006057660A3 HIGH ENERGY PULSE SUPPRESSION METHOD 审中-公开
公开(公告)号：WO2006057660A3
公开(公告)日：2006-06-01
申请号：PCT/US2005/012517
申请日：2005-04-13
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC. , GRANT, Keith , STONE, Steve , NILSEN, Brady
发明人： GRANT, Keith , STONE, Steve , NILSEN, Brady
IPC分类号： H01S3/11 , H01S3/115 , H01S3/117 , H01S3/00
摘要： A laser (126) processes a workpiece (120) with laser pulses (192) delivered at random time intervals and at substantially constant energy levels by characterizing the laser cavity discharge behavior and utilizing that information for adjusting dummy pulse time periods to compensate for the energy errors. Dummy pulses (194) are laser pulses that are blocked from reaching a workpiece. A second way for providing constant pulse energies employs an AOM (10) for varying amounts of laser energy passed to the workpiece. A third way of providing constant pulse energies entails extending the pulse period (200) of selected pulses to allow additional laser cavity charging time whenever a dummy pulse is initiated.

6. 发明申请

WO2005006422A1 LASER PULSE PICKING EMPLOYING CONTROLLED AOM LOADING 审中-公开
标题翻译：激光脉冲采集控制的AOM装载
公开(公告)号：WO2005006422A1
公开(公告)日：2005-01-20
申请号：PCT/US2004/014013
申请日：2004-05-05
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC , SUN, Yunlong , NILSEN, Brady, E. , HEMENWAY, David, M. , SUN, Lei
发明人： SUN, Yunlong , NILSEN, Brady, E. , HEMENWAY, David, M. , SUN, Lei
IPC分类号： H01L21/268
CPC分类号： B23K26/06
摘要： A laser (126) and an AOM (10) are pulsed at substantially regular and substantially similar constant high repetition rates to provide working laser outputs (40) with variable noimpingement intervals (50) without sacrificing laser pulse-to-pulse energy stability. When a working laser output (40) is demanded, an RF pulse (38) is applied to the AOM (10) in coincidence with the laser output pulse (24) to transmit the laser pulse to a target. When no working laser output (40) is demanded, an RF pulse (38) is applied to the AOM (10) in noncoincidence with the laser output (24), so that the laser pulse is blocked. Thus, the average thermal loading on the AOM (10) remains substantially constant regardless of how randomly the working laser outputs (40) are demanded. The AOM (10) can also be employed to control the energy of the working laser output (40) by controlling the power of the RF pulse (38) applied. When the RF power is changed, the duration (44) of the RF pulse (38) is modified to maintain the constant average RF power.
摘要翻译：激光器（126）和AOM（10）以基本上规则和基本上类似的恒定高重复率脉冲，以提供具有可变打击间隔（50）的工作激光输出（40），而不牺牲激光脉冲对脉冲能量的稳定性。当要求工作的激光输出（40）时，与激光输出脉冲（24）一致地向AOM（10）施加RF脉冲（38），以将激光脉冲传输到目标。当不需要工作的激光输出（40）时，将RF脉冲（38）以与激光输出（24）不一致的方式施加到AOM（10），使得激光脉冲被阻挡。因此，无论工作激光输出（40）如何随机地要求，AOM（10）上的平均热负载保持基本恒定。 AOM（10）也可用于通过控制施加的RF脉冲（38）的功率来控制工作激光输出（40）的能量。当RF功率改变时，改变RF脉冲（38）的持续时间（44）以保持恒定的平均RF功率。

7. 发明申请

WO2008019252A1 SYSTEMS AND METHODS FOR DISTINGUISHING REFLECTIONS OF MULTIPLE LASER BEAMS FOR CALIBRATION FOR SEMICONDUCTOR STRUCTURE PROCESSING 审中-公开
标题翻译：用于确定用于半导体结构处理校准的多个激光束反射的系统和方法
公开(公告)号：WO2008019252A1
公开(公告)日：2008-02-14
申请号：PCT/US2007/074773
申请日：2007-07-30
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC. , LO, Ho Wai , HEMENWAY, David Martin , NILSEN, Brady , BRULAND, Kelly J.
发明人： LO, Ho Wai , HEMENWAY, David Martin , NILSEN, Brady , BRULAND, Kelly J.
IPC分类号： H01L21/66 , H01L21/82
CPC分类号： H01L23/5258 , G11C17/14 , G11C17/143 , H01L2924/0002 , H01L2924/00
摘要： A system (700A, 700B, 800) determines relative positions of a semiconductor substrate (240) and a plurality of laser beam spots on or within the semiconductor substrate (240) in a machine for selectively irradiating structures on or within the substrate using a plurality of laser beams. The system (700A, 700B, 800) comprises a laser source (220, 720), first and second laser beam propagation paths, first and second reflection sensors (798, 853), and a processor (680). The laser source (220, 720) produces at least the first and second laser beams, which propagate toward the substrate along the first and second propagation paths, respectively, which have respective first and second axes that intersects the substrate at respective first and second spots. The reflection sensors (798, 853) are positioned to detect reflection of the spots, as the spots moves relative to the substrate, thereby generating reflection signals. The processor (680) is configured to determine, based on the reflection signals, positions of the spots on or within the substrate (240).
摘要翻译：系统（700A，700B，800）确定半导体衬底（240）中的多个激光束斑点和半导体衬底（240）内的多个激光束斑点在机器中的相对位置，用于使用多个的激光束。系统（700A，700B，800）包括激光源（220,720），第一和第二激光束传播路径，第一和第二反射传感器（798,853）以及处理器（680）。所述激光源（220,720）至少产生所述第一和第二激光束，所述第一和第二激光束分别沿着所述第一和第二传播路径传播到所述衬底，所述第一和第二激光束具有相应的第一和第二轴线，所述第一和第二轴线在相应的第一和第二点。当反射传感器（798,853）相对于基板移动时，反射传感器（798,853）被定位成检测光斑的反射，从而产生反射信号。处理器（680）被配置为基于反射信号确定衬底（240）上或衬底（240）内的点的位置。

8. 发明申请

WO2006062766A2 EFFICIENT MICRO-MACHINING APPARATUS AND METHOD EMPLOYING MULTIPLE LASER BEAMS 审中-公开
标题翻译：使用多激光束的有效微加工设备和方法
公开(公告)号：WO2006062766A2
公开(公告)日：2006-06-15
申请号：PCT/US2005/043112
申请日：2005-11-29
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC. , CUTLER, Donald, R. , BAIRD, Brian, W. , HARRIS, Richard, S. , HEMENWAY, David, M. , LO, Ho Wai , NILSEN, Brady, E. , OSAKO, Yasu , SUN, Lei , SUN, Yunlong , UNRATH, Mark, A.
发明人： CUTLER, Donald, R. , BAIRD, Brian, W. , HARRIS, Richard, S. , HEMENWAY, David, M. , LO, Ho Wai , NILSEN, Brady, E. , OSAKO, Yasu , SUN, Lei , SUN, Yunlong , UNRATH, Mark, A.
IPC分类号： H01S3/10 , H01S3/08
CPC分类号： B23K26/0673 , B23K26/0622 , B23K26/067 , B23K26/082
摘要： A laser beam switching system (50) employs a laser (52) coupled to a beam switching device (58) that causes a laser beam to switch between first and second beam positioning heads such that while the first beam positioning head (60) is directing the laser beam to process a workpiece target location, the second beam positioning head (62) is moving to another target location and vice versa. A preferred beam switching device includes first and second AOMs. When RF is applied to the first AOM (72), the laser beam is diffracted toward the first beam positioning head, and when RF is applied to the second AOM (74), the laser beam is diffracted toward the second beam positioning head. A workpiece processing system (120) employs a common modular imaged optics assembly (122) and an optional variable beam expander (94) for optically processing multiple laser beams.
摘要翻译：激光束切换系统（50）采用耦合到光束切换装置（58）的激光器（52），该激光器使激光束在第一和第二光束定位头之间切换，使得当第一射束定位头（60）引导激光束来处理工件目标位置，第二射束定位头（62）移动到另一个目标位置，反之亦然。优选的射束切换装置包括第一和第二AOM。当RF施加到第一AOM（72）时，激光束被朝向第一光束定位头衍射，并且当RF被施加到第二AOM（74）时，激光束被衍射向第二光束定位头。工件处理系统（120）采用共同的模块化成像光学组件（122）和可选的可变光束扩展器（94），用于光学处理多个激光束。

9. 发明申请

WO2009145986A1 PHOTONIC CLOCK STABILIZED LASER COMB PROCESSING 审中-公开
标题翻译：光电时钟稳定激光加工
公开(公告)号：WO2009145986A1
公开(公告)日：2009-12-03
申请号：PCT/US2009/038170
申请日：2009-03-25
申请人： ELECTRO SCIENTIFIC INDUSTRIES, INC. , BAIRD, Brian, W. , BRULAND, Kelly, J. , VANDERGIESSEN, Clint, R. , UNRATH, Mark, A. , NILSEN, Brady , SWARINGEN, Steve
发明人： BAIRD, Brian, W. , BRULAND, Kelly, J. , VANDERGIESSEN, Clint, R. , UNRATH, Mark, A. , NILSEN, Brady , SWARINGEN, Steve
IPC分类号： H01L21/82 , B23K26/42
CPC分类号： H01S3/0007 , B23K26/042 , B23K26/0622 , B23K26/0853
摘要： Processing a workpiece with a laser includes generating laser pulses at a first pulse repetition frequency. The first pulse repetition frequency provides reference timing for coordination of a beam positioning system and one or more cooperating beam position compensation elements to align beam delivery coordinates relative to the workpiece. The method also includes, at a second pulse repetition frequency that is lower than the first pulse repetition frequency, selectively amplifying a subset of the laser pulses. The selection of the laser pulses included in the subset is based on the first pulse repetition frequency and position data received from the beam positioning system. The method further includes adjusting the beam delivery coordinates using the one or more cooperating beam position compensation elements so as to direct the amplified laser pulses to selected targets on the workpiece.
摘要翻译：用激光加工工件包括以第一脉冲重复频率产生激光脉冲。第一脉冲重复频率提供用于协调光束定位系统和一个或多个配合光束位置补偿元件的参考定时，以相对于工件对准光束传送坐标。该方法还包括在低于第一脉冲重复频率的第二脉冲重复频率下，选择性地放大激光脉冲的子集。包括在子集中的激光脉冲的选择基于从波束定位系统接收的第一脉冲重复频率和位置数据。该方法还包括使用一个或多个配合光束位置补偿元件来调整光束传送坐标，以便将放大的激光脉冲引导到工件上的选定目标。

10. 发明申请

WO2006062766A3 EFFICIENT MICRO-MACHINING APPARATUS AND METHOD EMPLOYING MULTIPLE LASER BEAMS 审中-公开
标题翻译：有效的微加工设备和使用多个激光束的方法
公开(公告)号：WO2006062766A3
公开(公告)日：2006-10-12
申请号：PCT/US2005043112
申请日：2005-11-29
申请人： ELECTRO SCIENT IND INC , CUTLER DONALD R , BAIRD BRIAN W , HARRIS RICHARD S , HEMENWAY DAVID M , LO HO WAI , NILSEN BRADY E , OSAKO YASU , SUN LEI , SUN YUNLONG , UNRATH MARK A
发明人： CUTLER DONALD R , BAIRD BRIAN W , HARRIS RICHARD S , HEMENWAY DAVID M , LO HO WAI , NILSEN BRADY E , OSAKO YASU , SUN LEI , SUN YUNLONG , UNRATH MARK A
IPC分类号： H01L21/26
CPC分类号： B23K26/0673 , B23K26/0622 , B23K26/067 , B23K26/082
摘要： A laser beam switching system (50) employs a laser (52) coupled to a beam switching device (58) that causes a laser beam to switch between first and second beam positioning heads such that while the first beam positioning head (60) is directing the laser beam to process a workpiece target location, the second beam positioning head (62) is moving to another target location and vice versa. A preferred beam switching device includes first and second AOMs. When RF is applied to the first AOM (72), the laser beam is diffracted toward the first beam positioning head, and when RF is applied to the second AOM (74), the laser beam is diffracted toward the second beam positioning head. A workpiece processing system (120) employs a common modular imaged optics assembly (122) and an optional variable beam expander (94) for optically processing multiple laser beams.
摘要翻译：激光束切换系统（50）采用耦合到光束切换装置（58）的激光器（52），其使激光束在第一和第二光束定位头之间切换，使得当第一光束定位头（60）指向激光束处理工件目标位置，第二光束定位头（62）移动到另一个目标位置，反之亦然。优选的光束切换装置包括第一和第二AOM。当RF施加到第一AOM（72）时，激光束朝向第一光束定位头衍射，并且当RF施加到第二AOM（74）时，激光束被朝向第二光束定位头衍射。工件处理系统（120）采用公共模块化成像光学组件（122）和用于光学处理多个激光束的可选可变光束扩展器（94）。

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