专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

IL179936D0 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 未知
公开(公告)号：IL179936D0
公开(公告)日：2007-05-15
申请号：IL17993606
申请日：2006-12-10
申请人： NIKON CORP , HIROYUKI NAGASAKA , MINORU ONDA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： An exposure apparatus EX has a projection optical system PL. The projection optical system PL has a first optical element LS1 closest to an image plane thereof and a second optical element LS2 which is second closest to the image plane with respect to the first optical element LS1. The first optical element LS1 has a lower surface T1 arranged opposite to a surface of a substrate P and an upper surface T2 arranged opposite to the second optical element LS2. A space between the second optical element LS2 and the upper surface T2 of the first optical element LS1 is filled with a second liquid LQ2 so that a liquid immersion area is formed in an area of the upper surface T2, the area including an area AR' through which an exposure light beam EL passes. The substrate P is exposed by radiating the exposure light beam EL onto the substrate P through a first liquid LQ1 on a side of the lower surface T1 of the first optical element LS1 and the second liquid LQ2 on a side of the upper surface T2. It is possible to avoid any deterioration of the exposure accuracy caused by the pollution of the optical element, and to suppress any enormous expansion of the liquid immersion area.

2. 发明授权

US06522390B2 Projection exposure method and apparatus 失效
公开(公告)号：US06522390B2
公开(公告)日：2003-02-18
申请号：US09819724
申请日：2001-03-29
申请人： Kousuke Suzuki , Minoru Onda
发明人： Kousuke Suzuki , Minoru Onda
IPC分类号： G03B2752
CPC分类号： G03F7/701 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate; a plane-parallel plate disposed on a side of the photosensitive substrate of the projection optical system, almost perpendicularly to an optical axis of the projection optical system; and a adjustment device for adjusting at least one of an inclination angle of a normal line of the plane-parallel plate relative to the optical axis of the projection optical system and an inclination angle of the plane-parallel plate.

3. 发明申请

US20070222959A1 Exposure apparatus, exposure method, and method for producing device 审中-公开
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20070222959A1
公开(公告)日：2007-09-27
申请号：US11802062
申请日：2007-05-18
申请人： Hiroyuki Nagasaka , Minoru Onda
发明人： Hiroyuki Nagasaka , Minoru Onda
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341
摘要： A lithographic projection apparatus projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
摘要翻译：光刻投影设备通过限制在与衬底相邻的空间的液体将图案从图案形成装置投射到衬底上。平面上的空间比底物小。该装置包括基本上平行于基板的板，以将空间分成两部分，该板具有孔，以允许将图案传输到基板上。

4. 发明授权

US06235438B1 Projection exposure method and apparatus 失效
标题翻译：投影曝光方法及装置
公开(公告)号：US06235438B1
公开(公告)日：2001-05-22
申请号：US09166884
申请日：1998-10-06
申请人： Kousuke Suzuki , Minoru Onda
发明人： Kousuke Suzuki , Minoru Onda
IPC分类号： G03F900
CPC分类号： G03F7/701 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate; a plane-parallel plate disposed on a side of the photosensitive substrate of the projection optical system, almost perpendicularly to an optical axis of the projection optical system; and a adjustment device for adjusting at least one of an inclination angle of a normal line of the plane-parallel plate relative to the optical axis of the projection optical system and an inclination angle of the plane-parallel plate.
摘要翻译：投影曝光装置包括：投影光学系统，用于将光敏图案的图案投影在感光基板上; 平面平行板，布置在投影光学系统的感光基板的一侧上，几乎垂直于投影光学系统的光轴; 以及用于调整平面平行板的法线相对于投影光学系统的光轴的倾斜角和平面平行板的倾斜角中的至少一个的调节装置。

5. 发明申请

US20080068567A1 Exposure Apparatus, Exposure Method, and Method for Producing Device 审中-公开
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20080068567A1
公开(公告)日：2008-03-20
申请号：US11628507
申请日：2005-06-08
申请人： Hiroyuki Nagasaka , Minoru Onda
发明人： Hiroyuki Nagasaka , Minoru Onda
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70225 , G03F7/70316 , G03F7/70825 , G03F7/70916 , G03F7/7095 , G03F7/70958
摘要： An exposure apparatus has a projection optical system. The projection optical system has a first optical element closest to an image plane thereof and a second optical element which is second closest to the image plane with respect to the first optical element. The first optical element has a lower surface arranged opposite to a surface of a substrate and an upper surface arranged opposite to the second optical element. A space between the second optical element and the upper surface of the first optical element is filled with a second liquid so that a liquid immersion area is formed in an area of the upper surface, the area including an area through which an exposure light beam passes. The substrate is exposed by radiating the exposure light beam onto the substrate through a first liquid on a side of the lower surface of the first optical element and the second liquid on a side of the upper surface. It is possible to avoid any deterioration of the exposure accuracy caused by the pollution of the optical element, and to suppress any enormous expansion of the liquid immersion area.
摘要翻译：曝光装置具有投影光学系统。投影光学系统具有最靠近其图像平面的第一光学元件和相对于第一光学元件第二最接近像面的第二光学元件。第一光学元件具有与基板的表面相对布置的下表面和与第二光学元件相对布置的上表面。第二光学元件与第一光学元件的上表面之间的空间填充有第二液体，使得在上表面的区域中形成液浸区域，该区域包括曝光光束通过的区域。通过在第一光学元件的下表面的一侧的第一液体和上表面的一侧上的第二液体将曝光光束照射到基板上来曝光基板。可以避免由于光学元件的污染引起的曝光精度的任何劣化，并且抑制液浸区域的任何巨大的膨胀。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式