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1. 发明授权

US5951771A Plasma jet system 失效
标题翻译：等离子喷射系统
公开(公告)号：US5951771A
公开(公告)日：1999-09-14
申请号：US719823
申请日：1996-09-30
申请人： Daniel V. Raney , Michael Scott Heuser , Stephen M. Jaffe , C. B. Shepard, Jr.
发明人： Daniel V. Raney , Michael Scott Heuser , Stephen M. Jaffe , C. B. Shepard, Jr.
IPC分类号： C30B29/04 , C23C16/27 , C23C16/44 , C23C16/455 , C23C16/513 , H05H1/42 , C23C4/00
CPC分类号： C23C16/4551 , C23C16/513 , H05H1/42
摘要： A plasma jet CVD system includes gas injectors and a stand-off ring. The gas injectors have outlet holes preferably flared to approach the expansion angle of the injected jet, thereby keeping the holes substantially free from entrained atomic hydrogen. The injectors are arranged counter-rotational to the swirl of the primary jet, providing a more uniform mixture of hydrocarbons and atomic hydrogen. The stand-off ring provides vents for cooler gases to enter the nozzle, thereby decreasing the overall temperature of the injectors and decreasing the temperature gradient experienced by the injectors, thereby preventing injector cracking. In addition the vents reduce shear, thereby increasing jet velocity and increasing the deposition rate for the coating. In addition, a new method of injector design permits optimal mixing characteristics to be obtained across various recipes whereby the ratio of the mass flux of the primary flow of the jet to the mass flux of the injected flow from the downstream injectors is kept constant.
摘要翻译：等离子体喷射CVD系统包括气体喷射器和支架环。气体喷射器具有出口孔，其优选地扩张以接近喷射射流的膨胀角，从而保持孔基本上不含夹带的原子氢。喷射器被布置成与主射流的漩涡相反旋转，提供烃和原子氢的更均匀的混合物。支座环为较冷气体提供通风口进入喷嘴，从而降低喷射器的总体温度并降低喷射器所经历的温度梯度，从而防止喷油器破裂。此外，通风口减少剪切，从而增加喷射速度并增加涂层的沉积速率。此外，喷射器设计的新方法允许在各种配方中获得最佳的混合特性，由此射流的一次流的质量流量与来自下游喷射器的喷射流的质量通量的比率保持恒定。

2. 发明授权

US5821492A Radiation and regeneratively cooled arc jet device for thin diamond film deposition 失效
标题翻译：用于薄金刚石膜沉积的辐射和再生冷却电弧喷射装置
公开(公告)号：US5821492A
公开(公告)日：1998-10-13
申请号：US800274
申请日：1997-02-14
申请人： Cecil Benjamin Shepard, Jr. , Michael Scott Heuser
发明人： Cecil Benjamin Shepard, Jr. , Michael Scott Heuser
IPC分类号： H05B7/18 , H05H1/48
CPC分类号： H05H1/48 , H05B7/185
摘要： A radiation and regeneratively cooled arc jet device includes improvements designed to provide higher gas enthalpy operation for thin diamond film deposition. A series of circumferentially and axially spaced gas injection holes are provided in the cylindrical inner walls of the arc chamber between a cathode and anode. This arc chamber wall is fabricated from a material having a high thermal shock parameter. The ratio of the spacing of the injection holes within each row as compared to the chamber diameter is set within a specific range. In the circumferential direction, a multiplicity of axial rows of holes are provided and spaced equally about the circumference of the chamber. The annular anode is isolated at the open end of the arc chamber by an insulator having a high thermal shock parameter, to conduct anticipated heat loads without mechanical failure.
摘要翻译：辐射和再生冷却电弧喷射装置包括为薄金刚石膜沉积提供更高的气体焓操作而设计的改进。在阴极和阳极之间的电弧室的圆柱形内壁中设置一系列周向和轴向间隔的气体注入孔。该电弧室壁由具有高热冲击参数的材料制成。每个行中的喷射孔的间距与室直径的比率设定在特定范围内。在圆周方向上，多个轴向排的孔被设置并围绕室的圆周等间隔开。环形阳极通过具有高热冲击参数的绝缘体在电弧室的开口端处隔离，以便在没有机械故障的情况下进行预期的热负荷。

3. 发明授权

US5846330A Gas injection disc assembly for CVD applications 失效
标题翻译：用于CVD应用的气体注射盘组件
公开(公告)号：US5846330A
公开(公告)日：1998-12-08
申请号：US883020
申请日：1997-06-26
申请人： George Quirk , Daniel V. Raney , Michael Scott Heuser , C. B. Shepard, Jr.
发明人： George Quirk , Daniel V. Raney , Michael Scott Heuser , C. B. Shepard, Jr.
IPC分类号： C23C16/455 , C23C16/44 , C23C16/513 , C23C16/00
CPC分类号： C23C16/4558 , C23C16/513
摘要： A gas injection disc is provided which includes an outer ring and a tubular modular insert which slips into the outer ring. The outer ring is provided with an inner bore, a ring-shaped plenum located around the inner bore, an outer gas sealing surface around the plenum, and two gas feed paths extending from the periphery of the outer ring to the plenum. The gas feed paths are each provided with a gas feed attachment for coupling gas supply tubes thereto. The insert is provided with a plurality of radially aligned injectant holes, an inner gas sealing surface, and an axial bore. The insert is seated in the inner bore of the outer ring such that the inner and outer gas sealing surface face each other with a small gap provided therebetween which enables the insertion of the insert into the inner bore. The insert thereby substantially encloses the plenum, and the injectant holes are aligned with the plenum to receive injectant gases and direct the injectant gases into the axial bore of the insert. During the CVD process, the heat generated by the arc jet causes the insert to expand and eliminate the gap between the inner and outer sealing surfaces to thereby prevent undesirable gas leakage. Once the CVD operation is stopped the insert is permitted to cool and contract and return to its cooled dimensions unencumbered by the outer ring. The insert may then be removed for cleaning or for replacement with an insert having different characteristics.
摘要翻译：提供了一种气体注射盘，其包括滑入外圈的外圈和管状模块化插入件。外环设置有内孔，位于内孔周围的环形增压室，围绕增压室的外部气体密封表面以及从外环的周边延伸到气室的两个气体供给路径。气体供给路径各自设置有用于将气体供给管连接到其上的气体供给附件。插入件设置有多个径向排列的注入孔，内部气体密封表面和轴向孔。插入件位于外环的内孔中，使得内外气体密封表面彼此面对，其间设置有小间隙，从而能够将插入件插入内孔。因此，插入件基本上封闭气室，并且注入孔与气室对准以接收注入气体并将注入气体引导到插入件的轴向孔中。在CVD过程中，由电弧喷射产生的热量使得插入件膨胀并消除内密封表面和外密封表面之间的间隙，从而防止不期望的气体泄漏。一旦CVD操作停止，允许插入件冷却和收缩并返回到其被外圈阻碍的冷却尺寸。然后可以将插入件移除以用于具有不同特征的插入件进行清洁或替换。

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