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    • 2. 发明申请
    • ULTRAVIOLET LAMP SYSTEM AND METHOD FOR CONTROLLING EMITTED ULTRAVIOLET LIGHT
    • 超紫外灯系统和控制发射超紫外线灯的方法
    • WO2012009353A1
    • 2012-01-19
    • PCT/US2011/043706
    • 2011-07-12
    • NORDSON CORPORATIONBORSUK, James, M.KHOURY, JamesMCGHEE, Edward, C.SMITH, James
    • BORSUK, James, M.KHOURY, JamesMCGHEE, Edward, C.SMITH, James
    • H05B41/24
    • H05B41/38H05B41/2806Y02B20/22
    • Embodiments of the invention provide an apparatus, method, and program product to control a lamp system. The apparatus comprises a plasma lamp bulb (20) and a microwave generator (12) operable to generate a microwave energy field to excite the plasma lamp bulb (20) to emit ultraviolet light (24). The apparatus further comprises a sensor (70) to measure the intensity of the ultraviolet light (24) and a reflector (42) positioned between the plasma lamp bulb (20) and the sensor (70) The reflector (42) is operable to reflect at least a portion of the ultraviolet light (24) generated by the plasma lamp bulb (20). The method comprises receiving a target intensity for the ultraviolet light (24) and measuring an intensity of the ultraviolet light (24) using a sensor (70). The method further comprises comparing the target intensity to the measured intensity and, in response to the comparison, adjusting power to a microwave generator (12) to adjust the intensity of the ultraviolet light (24).
    • 本发明的实施例提供一种用于控制灯系统的装置,方法和程序产品。 该装置包括等离子体灯泡(20)和微波发生器(12),其可操作以产生微波能场以激发等离子体灯泡(20)发射紫外光(24)。 该装置还包括用于测量紫外光强度的传感器(70)和位于等离子体灯泡(20)和传感器(70)之间的反射器(42)。反射器(42)可操作以反射 由等离子体灯泡(20)产生的紫外线(24)的至少一部分。 该方法包括使用传感器(70)接收紫外光(24)的目标强度和测量紫外光(24)的强度。 该方法还包括将目标强度与测量的强度进行比较,并且响应于比较,调整对微波发生器(12)的功率以调节紫外光的强度(24)。
    • 3. 发明申请
    • ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL
    • 用于连续材料的ULTRAVIOLET固化装置
    • WO2010039945A3
    • 2011-01-13
    • PCT/US2009059212
    • 2009-10-01
    • NORDSON CORPBRASSELL ROBERTMCGHEE EDWARD CSCHMITKONS JAMES W
    • BRASSELL ROBERTMCGHEE EDWARD CSCHMITKONS JAMES W
    • F26B3/28F26B13/00
    • H01J65/044B05D3/029B05D3/067B05D7/20B29C35/0888B29C35/10B29C71/04B29C2035/0827F26B3/28F26B13/002
    • An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).
    • 公开了用于处理诸如光纤电缆或硅胶管的基底(26)的紫外线辐射固化系统(10)。 系统(10)包括允许输送待处理的连续的基底片(26)的处理室(12)。 当基板(26)移动通过处理室(12)时,来自由微波发生器(36)激活的等离子体灯(34)的紫外线辐射处理基板(26)的表面。 系统(10)包括两个不同尺寸的椭圆形反射器(42,46),从而可以用紫外线辐射有效地处理较大直径的基板。 系统(10)还可以包括封装基板(26)并分成第一部分(84)和第二部分(86)的紫外线透射导管(54),其中第二部分(86)可从 第一部分(84)以打开导管(54)并允许衬底(26)在导管(54)和处理室(12)内的插入或对准。
    • 4. 发明申请
    • ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL
    • 用于连续材料的ULTRAVIOLET固化装置
    • WO2010039945A2
    • 2010-04-08
    • PCT/US2009/059212
    • 2009-10-01
    • NORDSON CORPORATIONBRASSELL, RobertMcGHEE, Edward, C.SCHMITKONS, James, W.
    • BRASSELL, RobertMcGHEE, Edward, C.SCHMITKONS, James, W.
    • G21K5/00
    • H01J65/044B05D3/029B05D3/067B05D7/20B29C35/0888B29C35/10B29C71/04B29C2035/0827F26B3/28F26B13/002
    • An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).
    • 公开了用于处理诸如光纤电缆或硅胶管的基底(26)的紫外线辐射固化系统(10)。 系统(10)包括允许输送待处理的连续的基底片(26)的处理室(12)。 当基板(26)移动通过处理室(12)时,来自由微波发生器(36)激活的等离子体灯(34)的紫外线辐射处理基板(26)的表面。 系统(10)包括两个不同尺寸的椭圆形反射器(42,46),从而可以用紫外线辐射有效地处理较大直径的基板。 系统(10)还可以包括封装基板(26)并分成第一部分(84)和第二部分(86)的紫外线透射导管(54),其中第二部分(86)可从 第一部分(84)以打开导管(54)并允许衬底(26)在导管(54)和处理室(12)内的插入或对准。