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    • 1. 发明申请
    • ULTRAVIOLET CURING APPARATUS FOR CONTINUOUS MATERIAL
    • 用于连续材料的ULTRAVIOLET固化装置
    • WO2010039945A3
    • 2011-01-13
    • PCT/US2009059212
    • 2009-10-01
    • NORDSON CORPBRASSELL ROBERTMCGHEE EDWARD CSCHMITKONS JAMES W
    • BRASSELL ROBERTMCGHEE EDWARD CSCHMITKONS JAMES W
    • F26B3/28F26B13/00
    • H01J65/044B05D3/029B05D3/067B05D7/20B29C35/0888B29C35/10B29C71/04B29C2035/0827F26B3/28F26B13/002
    • An ultraviolet radiation curing system (10) is disclosed for treating a substrate (26), such as fiber optic cable or silicone tubing. The system (10) comprises a processing chamber (12) allowing transport of a continuous piece of substrate (26) to be treated. As the substrate (26) moves through the processing chamber (12), ultraviolet radiation from a plasma lamp (34) activated by a microwave generator (36) treats the surface of the substrate (26). The system (10) comprises two elliptical reflectors (42, 46) of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system (10) may also comprise an ultraviolet-transmissive conduit (54) enclosing the substrate (26) and split into a first portion (84) and a second portion (86), where the second portion (86) is movable from the first portion (84) to open the conduit (54) and allow insertion or alignment of the substrate (26) within the conduit (54) and processing chamber (12).
    • 公开了用于处理诸如光纤电缆或硅胶管的基底(26)的紫外线辐射固化系统(10)。 系统(10)包括允许输送待处理的连续的基底片(26)的处理室(12)。 当基板(26)移动通过处理室(12)时,来自由微波发生器(36)激活的等离子体灯(34)的紫外线辐射处理基板(26)的表面。 系统(10)包括两个不同尺寸的椭圆形反射器(42,46),从而可以用紫外线辐射有效地处理较大直径的基板。 系统(10)还可以包括封装基板(26)并分成第一部分(84)和第二部分(86)的紫外线透射导管(54),其中第二部分(86)可从 第一部分(84)以打开导管(54)并允许衬底(26)在导管(54)和处理室(12)内的插入或对准。
    • 2. 发明申请
    • APPARATUS AND METHOD FOR GENERATING ULTRAVIOLET RADIATION
    • 用于产生超紫外线辐射的装置和方法
    • WO0122783A3
    • 2001-09-07
    • PCT/US0025282
    • 2000-09-15
    • NORDSON CORPSCHMITKONS JAMES WBORSUK JAMES M
    • SCHMITKONS JAMES WBORSUK JAMES M
    • H01J65/04H01J17/26H01J61/28
    • H01J65/044
    • An apparatus (10) for generating ultraviolet radiation includes a pair of magnetrons (12) coupled to a longitudinally extending microwave chamber (14) for generating standing microwave energy waves within the chamber (14). Microwave energy from the magnetrons (12) is directly coupled to the microwave chamber (14) without the use of coupling slots, antennas or other coupling structures. A longitudinally extending electrodeless plasma bulb (20) is mounted within the microwave chamber (14) and is operable to emit ultraviolet radiation (24) in response to excitation by the microwave energy generated by the pair of magnetrons (12). The microwave chamber (14) includes a pair of longitudinally extending tuning walls (42) positioned on opposite sides of the plasma lamp bulb (20) and capable of overlapping the standing microwave energy waves generally along the longitudinal length of the plasma bulb (20).
    • 用于产生紫外线辐射的装置(10)包括耦合到纵向延伸的微波室(14)的一对磁控管(12),用于在腔室(14)内产生静止的微波能量波。 来自磁控管(12)的微波能量直接耦合到微波室(14),而不使用耦合槽,天线或其它耦合结构。 纵向延伸的无电极等离子体灯泡(20)安装在微波室(14)内并且可操作以响应于由一对磁控管(12)产生的微波能量的激发而发射紫外线辐射(24)。 微波室(14)包括位于等离子体灯泡(20)的相对侧上的一对纵向延伸的调谐壁(42),并能够沿着等离子体灯泡(20)的纵向长度重叠站立的微波能量波, 。
    • 3. 发明申请
    • MICROWAVE EXCITED ULTRAVIOLET LAMP SYSTEM WITH IMPROVED LAMP COOLING
    • MICROWAVE EXCIF ULTRAVIOLET LAMP系统与改进的灯泡冷却
    • WO0180271A3
    • 2002-07-04
    • PCT/US0111409
    • 2001-04-06
    • NORDSON CORPSCHMITKONS JAMES WBORSUK JAMES M
    • SCHMITKONS JAMES WBORSUK JAMES M
    • F21V29/00F21S2/00F21V7/20F21V29/02F21Y103/00H01J61/52H01J65/04H05B41/24H01J61/12F21V7/00H01J61/20
    • F21V29/505F21V29/02H01J61/52H01J61/523H01J65/044H05B41/24
    • A reflector (42) for use in a microwave excited ultraviolet lamp system (10) having a plasma lamp bulb (20). The reflector (42) includes a pair of longitudinally extending reflector panels (46) that are mounted in opposing, i.e., mirror facing relationship, and in space relationship to the plasma lamp bulb (20). A longitudinally extending intermediate member (52) is mounted in spaced relationship to the pair of reflector panels (46) and to the plasma lamp bulb (20). The reflector panels (46) and the intermediate member (52) form a pair of longitudinally extending slots (64) that are operable to pass air toward the plasma lamp bulb (20) to envelop the bulb (20) effectively entirely about its outer surface. Alternatively, the pair of reflector panels (46e) are connected to longitudinally extending edges (58e) of the intermediate member (52e). The intermediate member (52e) includes multiple apertures (78) formed therethrough that are operable to pass air toward the bulb (20) to envelope the bulb (20) effectively entirely about its outer surface. A method of cooling a plasma lamp bulb (20) in a microwave excited ultravoilet lamp system (10) is also disclosed.
    • 一种用于具有等离子体灯泡(20)的微波激发的紫外线灯系统(10)中的反射器(42)。 反射器(42)包括一对纵向延伸的反射器面板(46),其以相对的,即镜面的关系安装,并且与等离子体灯泡(20)处于空间关系。 纵向延伸的中间构件(52)以与该对反射板(46)和等离子体灯泡(20)间隔开的关系安装。 反射器面板(46)和中间构件(52)形成一对纵向延伸的狭槽(64),其可操作以将空气传递到等离子体灯泡(20),以有效地完全围绕灯泡(20)围绕其外表面 。 或者,一对反射器面板(46e)连接到中间构件(52e)的纵向延伸的边缘(58e)。 中间构件(52e)包括穿过其形成的多个孔(78),其可操作以将空气朝向灯泡(20)通过,从而有效地完全围绕灯泡(20)围绕其外表面包围灯泡(20)。 还公开了一种在微波激发的超小型灯系统(10)中冷却等离子体灯泡(20)的方法。
    • 7. 发明专利
    • ELECTROSTATIC DISTRIBUTOR AND METHOD THEREFOR
    • JPH11221507A
    • 1999-08-17
    • JP33346198
    • 1998-11-25
    • NORDSON CORP
    • BORSUK JAMES MSCHMITKONS JAMES W
    • B05D3/14B05B5/10B05B5/14B05C5/00B05C5/02B05C9/08
    • PROBLEM TO BE SOLVED: To lessen the generation of an arc and to supply the electrostatic power to attract a flowable material to a nonconductive base in an iterative form by supporting a distribution nozzle in a contactless relation on one side of a moving base and supporting an electrostatic field generator in a contactless relation on the other side. SOLUTION: The electrostatic distributor 10 electrostatically distributes the flowable material 12, like an adhesive, onto the moving base 14. The elongated distribution nozzle 16 consisting of die bodies 30a, 30b making a pair is mounted in the contactless relation above the moving base 14. The base 14 moves toward an arrow 22 and receives the pattern of a continuous bead (the stream of the flowable material) 24 from the nozzle 16. The electrostatic field generator 26 is mounted in the contactless relation below the moving base 14. The electrostatic field of 5 to 50 kV is generated from an electrostatic power source 86. The generated electrostatic field attracts and pulls the bead 24 over the entire part from the front ends 116 of adjacent teeth 80 apart spaced intervals in a direction intersecting with the moving base 14.