专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07632613B2 Levenson type phase shift mask and manufacturing method thereof 失效
标题翻译：莱文森型相移掩模及其制造方法
公开(公告)号：US07632613B2
公开(公告)日：2009-12-15
申请号：US11583797
申请日：2006-10-20
申请人： Yosuke Kojima , Toshio Konishi , Keishi Tanaka , Masao Otaki , Jun Sasaki
发明人： Yosuke Kojima , Toshio Konishi , Keishi Tanaka , Masao Otaki , Jun Sasaki
IPC分类号： G03F1/00
CPC分类号： G03F1/30 , G03F1/36
摘要： A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.
摘要翻译：莱文森型相移掩模具有形成在透明基板上的遮光部分和开口。开口处的透明基板被部分地挖出，或者在开口处部分地设置在透明基板上的透明膜，以形成移位开口和非移位开口。移位器开口和非移位开口在掩模中重复存在。移位器开口反转透射光的相位。莱文森型相移掩模具有从相同类型的相邻开口之间的两侧插入的遮光部图案。对遮光部图案进行偏置校正，使得遮光部图案的两侧相对于由掩模的设计设定的规定的设计线宽度以规定量进行扩展。

2. 发明授权

US5196960A Lenticular lens sheet 失效
标题翻译：透明镜片
公开(公告)号：US5196960A
公开(公告)日：1993-03-23
申请号：US784513
申请日：1991-10-29
申请人： Ichiro Matsuzaki , Hiroshi Kuwada , Masao Otaki , Ken Abe
发明人： Ichiro Matsuzaki , Hiroshi Kuwada , Masao Otaki , Ken Abe
IPC分类号： G03B21/62
CPC分类号： B29D11/00288 , G03B21/625
摘要： A double-sided lenticular lens sheet has an entrance lens layer and an exit lens layer, at least said exit lens layer containing light-diffusing fine particles, and has parameters satisfying the following expressions (I) and (II). ##EQU1## wherein t.sub.1 represents a thickness of the entrance lens layer; t.sub.2, a thickness of the exit lens layer; .DELTA.n.sub.1, a difference in refractive index between the thermoplastic resin and the light-diffusing fine particles in the entrance lens layer; .DELTA.n.sub.2, a difference in refractive index between the thermoplastic resin and the light-diffusing fine particles in the exit lens layer; c.sub.1, a weight concentration of the light-diffusing fine particles in the entrance lens layer; c.sub.2, a weight concentration of the light-diffusing fine particles in the exit lens layer; .rho..sub.1, a gravity of the light-diffusing fine particles in the entrance lens layer; .rho..sub.2, a gravity of the light-diffusing fine particles in the exit lens layer; d.sub.1, an average particle diameter of the light-diffusing fine particles in the entrance lens layer; and d.sub.2, an average particle diameter of the light-diffusing fine particles in the exit lens layer.The lenticular lens sheet of the present invention can be used in transmission-type projection screens. It can be stably manufactured even when its pitch is made very small, and yet can ensure a sufficient visual field angle, and also can improve the transmission efficiency of light to obtain a bright picture.

3. 发明申请

US20070037072A1 Levenson type phase shift mask and manufacturing method thereof 失效
标题翻译：莱文森型相移掩模及其制造方法
公开(公告)号：US20070037072A1
公开(公告)日：2007-02-15
申请号：US11583797
申请日：2006-10-20
申请人： Yosuke Kojima , Toshio Konishi , Keishi Tanaka , Masao Otaki , Jun Sasaki
发明人： Yosuke Kojima , Toshio Konishi , Keishi Tanaka , Masao Otaki , Jun Sasaki
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/30 , G03F1/36
摘要： A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.
摘要翻译：莱文森型相移掩模具有形成在透明基板上的遮光部分和开口。开口处的透明基板被部分地挖出，或者透明膜部分地设置在开口处的透明基板上，以形成移位开口和非移位开口。移位器开口和非移位开口在掩模中重复存在。移位器开口反转透射光的相位。莱文森型相移掩模具有从相同类型的相邻开口之间的两侧插入的遮光部图案。对遮光部图形进行偏光校正，使得遮光部图案的两侧相对于由掩模的设计设定的规定的设计线宽度以规定量进行扩展。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式