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    • 10. 发明申请
    • Plasma generator and workpiece processing apparatus using the same
    • 等离子发生器和工件加工设备使用相同
    • US20080296268A1
    • 2008-12-04
    • US12154384
    • 2008-05-22
    • Masaaki MikeHirofumi MankawaShigeru MasudaHirofumi Hayashi
    • Masaaki MikeHirofumi MankawaShigeru MasudaHirofumi Hayashi
    • H05H1/34
    • H01L21/67069H01J37/32192H01J37/32825H05H1/46
    • Disclosed are a plasma generator and a workpiece processing apparatus, wherein an adapter 38 is attached to a distal end of each of a plurality of plasma generation nozzles 31 to convert a spot-shaped spout port of the plasma generation nozzle 31 to a lengthwise sport port 387, and a cover member 93 is provided to cover the plasma generation nozzles 31 so as to allow a narrow space to be defined between the cover member 93 and a workpiece, whereby plasma spouted from the spout port 387 is retained in the space in such a manner as to hit against and rebound from the workpiece into the space. This makes it possible to subject a workpiece having a relatively large surface area to plasma exposure in a uniform manner, while suppressing cooling of plasma in the space to allow the plasma to survive for a relatively long period of time (reduce a plasma disappearance rate) so as to provide enhanced efficiency of plasma exposure.
    • 公开了一种等离子体发生器和工件处理装置,其中适配器38连接到多个等离子体产生喷嘴31中的每一个的远端,以将等离子体产生喷嘴31的点状喷口端口转换成纵向运动端口 387,并且设置盖构件93以覆盖等离子体产生喷嘴31,以便在盖构件93和工件之间限定狭窄的空间,从而从喷口387喷出的等离子体保持在该空间中 一种从工件撞击和反弹到空间的方式。 这使得可以以均匀的方式对具有相对大的表面积的工件进行等离子体曝光,同时抑制空间中的等离子体的冷却,以允许等离子体存活相当长的时间段(降低等离子体消失速率) 从而提高等离子体曝光的效率。