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1. 发明申请

US20110096316A1 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 有权
标题翻译：微观照明系统
公开(公告)号：US20110096316A1
公开(公告)日：2011-04-28
申请号：US12984078
申请日：2011-01-04
申请人： Markus BROTSACK
发明人： Markus BROTSACK
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70116
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.
摘要翻译：用于利用来自分配的光源的光照射照明场的微光刻投影曝光装置的照明系统包括：光瞳成形单元，用于从所分配的光源接收光，并且用于在照明的光瞳平面中产生可预定的基本光分布系统和分配给光瞳整形单元的传输滤波器，并且具有至少一个独立驱动的单独元件阵列，用于在照明系统的光瞳平面内或附近照射在透射滤光片上的光的空间分辨透射滤波。发送滤波器生成基本配光的预定校正。这种类型的照明系统可以在照明系统的光瞳平面中产生多个位置相关的强度分布，并确保高透射率。

2. 发明授权

US08767181B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US08767181B2
公开(公告)日：2014-07-01
申请号：US12946380
申请日：2010-11-15
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

3. 发明授权

US07460206B2 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US07460206B2
公开(公告)日：2008-12-02
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Guenter Scheible, legal representative , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner
发明人： Patrick Scheible
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

4. 发明申请

US20060146384A1 Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
标题翻译：光束变换系统和包括光束变换系统的照明系统
公开(公告)号：US20060146384A1
公开(公告)日：2006-07-06
申请号：US11271976
申请日：2005-11-14
申请人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
发明人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
IPC分类号： G03H1/08
CPC分类号： G03F7/70183 , G02B5/32 , G02B27/09 , G02B27/0927 , G02B27/0944 , G02B27/095 , G02B27/0977 , G03F7/70108 , G03F7/70566
摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.
摘要翻译：可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射用于转化面。光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。具有转轴表面的Axicon元件可用作转换元件。

5. 发明授权

US08792082B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US08792082B2
公开(公告)日：2014-07-29
申请号：US12984078
申请日：2011-01-04
申请人： Markus Brotsack
发明人： Markus Brotsack
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70116
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.
摘要翻译：用于利用来自分配的光源的光照射照明场的微光刻投影曝光装置的照明系统包括：光瞳成形单元，用于从所分配的光源接收光，并且用于在照明的光瞳平面中产生可预定的基本光分布系统和分配给光瞳整形单元的传输滤波器，并且具有至少一个独立驱动的单独元件阵列，用于在照明系统的光瞳平面内或附近照射在透射滤光片上的光的空间分辨透射滤波。发送滤波器生成基本配光的预定校正。这种类型的照明系统可以在照明系统的光瞳平面中产生多个位置相关的强度分布，并确保高透射率。

6. 发明授权

US07884922B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US07884922B2
公开(公告)日：2011-02-08
申请号：US11860193
申请日：2007-09-24
申请人： Markus Brotsack
发明人： Markus Brotsack
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70116
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.
摘要翻译：用于利用来自分配的光源的光照射照明场的微光刻投影曝光装置的照明系统包括：光瞳成形单元，用于从所分配的光源接收光，并且用于在照明的光瞳平面中产生可预定的基本光分布系统和分配给光瞳整形单元的传输滤波器，并且具有至少一个独立驱动的单独元件阵列，用于在照明系统的光瞳平面内或附近照射在透射滤光片上的光的空间分辨透射滤波。发送滤波器生成基本配光的预定校正。这种类型的照明系统可以在照明系统的光瞳平面中产生多个位置相关的强度分布，并确保高透射率。

7. 发明授权

US07847921B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

8. 发明授权

US07714983B2 Illumination system for a microlithography projection exposure installation 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US07714983B2
公开(公告)日：2010-05-11
申请号：US10571475
申请日：2004-09-13
申请人： Jess Koehler , Johannes Wangler , Markus Brotsack , Wolfgang Singer , Damian Fiolka , Manfred Maul
发明人： Jess Koehler , Johannes Wangler , Markus Brotsack , Wolfgang Singer , Damian Fiolka , Manfred Maul
IPC分类号： G03B27/54 , G03B27/72 , G03B27/42
CPC分类号： G03F7/70116 , G03F7/702
摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
摘要翻译：用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中。配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

9. 发明申请

US20080273186A1 Illumination System, In Particular For A Projection Exposure Machine In Semiconductor Lithography 审中-公开
标题翻译：照明系统，特别是用于半导体光刻中的投影曝光机
公开(公告)号：US20080273186A1
公开(公告)日：2008-11-06
申请号：US11814685
申请日：2006-01-21
申请人： Markus Brotsack
发明人： Markus Brotsack
IPC分类号： G03B27/54
CPC分类号： G03F7/70075 , G03F7/70108 , G03F7/70141
摘要： An illumination system is provided with a light produced by a light source, with an optical axis and with optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light. For an asymmetric pupil distribution at least the optical elements that produce non-rotationally symmetrical light distributions, and/or the homogenizing element are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.
摘要翻译：照明系统具有由光源产生的光，具有光轴和光学元件，特别是用于半导体光刻中的投影曝光机，具有至少一个用于产生光束的光瞳分布的光学元件，并具有用于使光的强度均匀化的均质元件。对于不对称瞳孔分布，至少产生非旋转对称光分布的光学元件和/或均质元件围绕形成x- / y坐标系的z轴的光轴可旋转地支撑，它是可以设置至少一个旋转角度α，使得瞳孔分布位于轴上或相对于由旋转角度a新形成的x'/ y'坐标系的轴线对称地借助于将x / y坐标系旋转角度a。

10. 发明授权

US07283209B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US07283209B2
公开(公告)日：2007-10-16
申请号：US11175172
申请日：2005-07-07
申请人： Markus Brotsack
发明人： Markus Brotsack
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70116
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field (65) with the light from an assigned light source (11) comprises a pupil shaping unit (15, 30) for receiving light from the assigned light source (11) and for generating a predeterminable basic light distribution in a pupil plane (31) of the illumination system and a transmission filter (36) assigned to the pupil shaping unit (15, 30) and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane (31, 35) of the illumination system, the transmission filter (36) being designed for generating a predeterminable correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, a high transmittance being ensured. The location-dependent intensity distribution in the pupil plane generates an angle-dependent intensity distribution on the illumination field of the illumination system which can be optimized for a mask structure to be imaged.
摘要翻译：用于利用来自所分配的光源（11）的光照射照明场（65）的微光刻投影曝光设备的照明系统包括用于接收来自所分配的光源（11）的光的光瞳成形单元（15,30）和用于在照明系统的光瞳平面（31）中产生可预定的基本光分布，以及分配给光瞳成形单元（15,30）的透射滤光片（36），并且具有用于空间的单独驱动的各个元件的至少一个阵列解决在照明系统的光瞳平面（31,35）附近或附近照射到发射滤波器上的光的透射滤波，所述透射滤光器（36）被设计用于产生基本光分布的可预定校正。这种类型的照明系统可以在照明系统的光瞳平面中产生多个位置相关的强度分布，确保高透射率。光瞳平面中的位置相关强度分布在照明系统的照明场上产生角度依赖的强度分布，该强度分布可针对待成像的掩模结构进行优化。

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