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1. 发明专利

IL221687D0 POSITION MEASURMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT METHOD, LOADING METHOD, EXPOSURE METHOD AND EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：IL221687D0
公开(公告)日：2012-10-31
申请号：IL22168712
申请日：2012-08-29
申请人： NIKON CORP , MASAHIKO YASUDA , TARO SUGIHARA
IPC分类号： G01B11/00 , G03F7/20 , H01L20060101 , H01L21/027 , H01L21/68
摘要： A part of a plate (50) of a predetermined shape detachably mounted on a moving body (WST) is detected by an alignment system (ALG) while the position of the moving body is measured by a measurement unit (18 or the like) that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate (50) is obtained. Therefore, even if there are no alignment marks (fiducial marks) on the moving body (WST) for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

2. 发明专利

IL221687A Liquid immersion exposure apparatus and method that exposes a substrate via an optical system and a liquid 未知
公开(公告)号：IL221687A
公开(公告)日：2013-11-28
申请号：IL22168712
申请日：2012-08-29
申请人： NIKON CORP , MASAHIKO YASUDA , TARO SUGIHARA
IPC分类号： G01B11/00 , G03F7/20 , H01L21/027 , H01L21/68
摘要： A part of a plate (50) of a predetermined shape detachably mounted on a moving body (WST) is detected by an alignment system (ALG) while the position of the moving body is measured by a measurement unit (18 or the like) that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate (50) is obtained. Therefore, even if there are no alignment marks (fiducial marks) on the moving body (WST) for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

3. 发明专利

IL221688D0 POSITION MEASURMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT METHOD, LOADING METHOD, EXPOSURE METHOD AND EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：IL221688D0
公开(公告)日：2012-10-31
申请号：IL22168812
申请日：2012-08-29
申请人： NIKON CORP , MASAHIKO YASUDA , TARO SUGIHARA
IPC分类号： G01B11/00 , G03F7/20 , H01L20060101 , H01L21/027 , H01L21/68
摘要： A part of a plate (50) of a predetermined shape detachably mounted on a moving body (WST) is detected by an alignment system (ALG) while the position of the moving body is measured by a measurement unit (18 or the like) that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate (50) is obtained. Therefore, even if there are no alignment marks (fiducial marks) on the moving body (WST) for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

4. 发明专利

IL174854D0 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 未知
公开(公告)号：IL174854D0
公开(公告)日：2006-08-20
申请号：IL17485406
申请日：2006-04-06
申请人： NIKON CORP , MASAHIKO YASUDA , TAKAHIRO MASADA , YUHO KANAYA , TADASHI NAGAYAMA , KENICHI SHIRAISHI
IPC分类号： G03F7/20 , G03F9/00 , H01L20100101
摘要： An exposure apparatus (EX) for exposing a substrate (P) through liquid (LQ) in a liquid immersion area (AR2) formed locally on an upper surface of the substrate, the exposure apparatus comprising: a projection optical system (PL) for projecting an image onto the substrate; a substrate stage (PST) having a substrate holder (PSH) for holding the substrate, which is movable while holding the substrate with the substrate holder; and a reference member (3) having a first reference and a second reference for performing an alignment process, which reference member is provided on the substrate stage. At least part of an upper surface of the reference member includes a liquid repellent material.

5. 发明授权

US09063438B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US09063438B2
公开(公告)日：2015-06-23
申请号：US13354899
申请日：2012-01-20
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
摘要翻译：液浸曝光装置包括具有最后光学元件的投影系统，投影系统通过浸没液体将光束投射到基板上; 可动台，具有保持基板的保持架; 测量构件，设置在所述可移动台上，所述测量构件具有覆盖有透光材料的测量部分; 第一对准系统，通过该第一对准系统不通过浸没液体检测对准标记; 以及第二对准系统，其使用所述测量构件，通过所述浸没液体，光学地获得由所述投影系统投影的所述光束的第一位置信息。为了获得第一位置信息，移动台被移动，使得测量构件在投影系统下方，并且投影系统和测量构件之间的间隙被浸没液体填充。

6. 发明授权

US08947665B2 Measurement method, measurement apparatus, exposure method, and exposure apparatus 有权
标题翻译：测量方法，测量装置，曝光方法和曝光装置
公开(公告)号：US08947665B2
公开(公告)日：2015-02-03
申请号：US13495284
申请日：2012-06-13
申请人： Mitsuru Kobayashi , Masahiko Yasuda
发明人： Mitsuru Kobayashi , Masahiko Yasuda
IPC分类号： G01B11/00 , G03F9/00
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7084
摘要： To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
摘要翻译：通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。在曝光装置的对准传感器中，在对多个采样拍摄进行位置测量的情况下，通过根据测量轴方向改变测量条件，进行测量的标记或层，进行测量存在此时，对于在相同测量条件下测量的测量对象，例如，Y轴方向的位置和X轴方向上的位置，连续进行测量。当测量条件改变时，重新测量基准值。可变的测量条件是测量光的波长，减速器的使用和选择，NA和＆sgr; 的光学系统，光量测量光，照明形状，信号处理算法等。

7. 发明授权

US08576379B2 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method 有权
标题翻译：位置测量方法，位置控制方法，测量方法，加载方法，曝光方法和曝光装置以及装置制造方法
公开(公告)号：US08576379B2
公开(公告)日：2013-11-05
申请号：US12701014
申请日：2010-02-05
申请人： Masahiko Yasuda , Taro Sugihara
发明人： Masahiko Yasuda , Taro Sugihara
IPC分类号： G03B27/58 , G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70691 , G03F7/707 , G03F7/70725 , G03F7/70775 , G03F7/70975 , G03F9/7011 , G03F9/7088 , Y10T29/49002
摘要： A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.
摘要翻译：通过对准系统检测可拆卸地安装在移动体上的预定形状的板的一部分，同时通过设置移动体的移动坐标系的测量单元测量移动体的位置，并且基于检测结果和与检测结果对应的测量单元的测量结果，获得板的外周边缘的位置信息。因此，即使在移动体上没有对准标记来进行位置测量，也可以基于由测量单元设定的移动坐标系来控制板的位置，即移动体的位置，基于板的外周缘的位置信息。

8. 发明授权

US08130361B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08130361B2
公开(公告)日：2012-03-06
申请号：US11399537
申请日：2006-04-07
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
摘要翻译：一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。

9. 发明申请

US20060158632A1 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20060158632A1
公开(公告)日：2006-07-20
申请号：US11281544
申请日：2005-11-18
申请人： Masahiko Yasuda , Taro Sugihara
发明人： Masahiko Yasuda , Taro Sugihara
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70691 , G03F7/707 , G03F7/70725 , G03F7/70775 , G03F7/70975 , G03F9/7011 , G03F9/7088 , Y10T29/49002
摘要： A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

10. 发明授权

US06876946B2 Alignment method and apparatus therefor 失效
标题翻译：对准方法及其装置
公开(公告)号：US06876946B2
公开(公告)日：2005-04-05
申请号：US10299819
申请日：2002-11-20
申请人： Masahiko Yasuda , Osamu Furukawa , Masaharu Kawakubo , Hiroki Tateno , Nobutaka Magome
发明人： Masahiko Yasuda , Osamu Furukawa , Masaharu Kawakubo , Hiroki Tateno , Nobutaka Magome
IPC分类号： G03F9/00 , G03B27/42
CPC分类号： G03F9/7003
摘要： A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement of a plurality of shot areas on the substrate, and the parameters in the other set relate to the shot areas per se. The mask and the substrate are moved relatively in accordance with the determined parameters.
摘要翻译：将掩模的图案转移到基板上的拍摄区域的方法在单个模型方程式中确定两组参数。两组之一中的参数涉及衬底上的多个照射区域的布置，而另一组中的参数涉及拍摄区域本身。掩模和基板根据确定的参数相对移动。

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