会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Air channel interconnects for 3-D integration
    • 空气通道互连用于3-D集成
    • US08198174B2
    • 2012-06-12
    • US12536176
    • 2009-08-05
    • Louis L. HsuBrian L. JiFei LiuConal E. Murray
    • Louis L. HsuBrian L. JiFei LiuConal E. Murray
    • H01L21/44
    • H01L23/467H01L21/76898H01L23/481H01L25/0657H01L25/50H01L2225/06513H01L2225/06541H01L2225/06589H01L2924/0002H01L2924/00
    • A three-dimensional (3D) chip stack structure and method of fabricating the structure thereof are provided. The 3D chip stack structure includes a plurality of vertically stacked chips which are interconnected and bonded together, wherein each of the vertically stacked chips include one or more IC device strata. The 3D chip stack structure further includes an air channel interconnect network embedded within the chip stack structure, and wherein the air channel interconnect network is formed in between at least two wafers bonded to each other of the vertically stacked wafers and in between at least two bonded wafers of the vertically stacked wafers at a bonding interface thereof. In addition, the 3D chip stack structure further includes one or more openings in a peripheral region of the chip stack structure that lead into and out of the air channel interconnect network, so that air can flow into and out of the air channel interconnect network through the one or more openings to remove heat from the chip stack structure.
    • 提供三维(3D)芯片堆叠结构及其结构的制造方法。 3D芯片堆叠结构包括互连并结合在一起的多个垂直堆叠的芯片,其中每个垂直堆叠的芯片包括一个或多个IC器件层。 3D芯片堆叠结构还包括嵌入在芯片堆叠结构内的空气通道互连网络,并且其中空气通道互连网络形成在至少两个晶片之间,所述至少两个晶片彼此接合在垂直堆叠的晶片之间,并且在至少两个结合 在其接合界面处的垂直堆叠的晶片的晶片。 此外,3D芯片堆叠结构还包括在芯片堆叠结构的外围区域中的一个或多个开口,其引入和流出空气通道互连网络,使得空气可以流入和流出空气通道互连网络,通过 一个或多个开口以从芯片堆叠结构移除热量。
    • 3. 发明申请
    • PROGRAMMABLE ANTI-FUSE STRUCTURES WITH CONDUCTIVE MATERIAL ISLANDS
    • 具有导电材料岛的可编程防结构
    • US20110254121A1
    • 2011-10-20
    • US12761780
    • 2010-04-16
    • Kangguo ChengLouis L. HsuWilliam R. TontiChih-Chao Yang
    • Kangguo ChengLouis L. HsuWilliam R. TontiChih-Chao Yang
    • H01L23/525H01L21/768G06F17/50
    • H01L23/5252G06F17/505H01L2924/0002H01L2924/00
    • Voltage programmable anti-fuse structures and methods are provided that include at least one conductive material island atop a dielectric surface that is located between two adjacent conductive features. In one embodiment, the anti-fuse structure includes a dielectric material having at least two adjacent conductive features embedded therein. At least one conductive material island is located on an upper surface of the dielectric material that is located between the at least two adjacent conductive features. A dielectric capping layer is located on exposed surfaces of the dielectric material, the at least one conductive material island and the at least two adjacent conductive features. When the anti-fuse structure is in a programmed state, a dielectric breakdown path is present in the dielectric material that is located beneath the at least one conductive material island which conducts electrical current to electrically couple the two adjacent conductive features.
    • 提供了电压可编程的抗熔丝结构和方法,其包括位于介于两个相邻导电特征之间的电介质表面上的至少一个导电材料岛。 在一个实施例中,反熔丝结构包括具有嵌入其中的至少两个相邻导电特征的电介质材料。 至少一个导电材料岛位于介电材料的位于至少两个相邻导电特征之间的上表面上。 电介质覆盖层位于电介质材料的暴露表面上,至少一个导电材料岛和至少两个相邻的导电特征。 当反熔丝结构处于编程状态时,介电击穿路径存在于介电材料中,介电材料位于至少一个导电材料岛之下,该导电材料岛传导电流以电耦合两个相邻导电特征。
    • 4. 发明授权
    • Techniques for impeding reverse engineering
    • 阻止逆向工程的技术
    • US07994042B2
    • 2011-08-09
    • US11924735
    • 2007-10-26
    • Louis L. HsuRajiv V. JoshiDavid W. Kruger
    • Louis L. HsuRajiv V. JoshiDavid W. Kruger
    • H01L21/00
    • H01L21/76816H01L21/76825H01L21/76831H01L21/76834H01L23/573H01L27/02H01L27/0203H01L2924/0002H01L2924/00
    • Anti-reverse engineering techniques are provided. In one aspect, a method for forming at least one feature in an insulating layer is provided. The method comprises the following steps. Ions are selectively implanted in the insulating layer so as to form at least one implant region within the insulating layer, the implanted ions being configured to alter an etch rate through the insulating layer within the implant region. The insulating layer is etched to, at the same time, form at least one void both within the implant region and outside of the implant region, wherein the etch rate through the insulating layer within the implant region is different from an etch rate through the insulating layer outside of the implant region. The void is filled with at least one conductor material to form the feature in the insulating layer.
    • 提供了反逆向工程技术。 一方面,提供了一种在绝缘层中形成至少一个特征的方法。 该方法包括以下步骤。 离子选择性地植入绝缘层中,以在绝缘层内形成至少一个注入区域,所述注入离子被配置为改变通过植入区域内的绝缘层的蚀刻速率。 蚀刻绝缘层,同时在植入区域内和植入区域外部形成至少一个空隙,其中通过绝缘层在植入区域内的蚀刻速率与通过绝缘体的蚀刻速率不同 在植入区域外侧。 空隙填充有至少一种导体材料以在绝缘层中形成特征。
    • 6. 发明授权
    • Robust cable connectivity test receiver for high-speed data receiver
    • 用于高速数据接收器的强大的电缆连接测试接收器
    • US07855563B2
    • 2010-12-21
    • US11766268
    • 2007-06-21
    • Huihao XuLouis L. HsuKevin G. KramerJames D. RockrohrMichael A. Sorna
    • Huihao XuLouis L. HsuKevin G. KramerJames D. RockrohrMichael A. Sorna
    • G01R31/00H04B3/46
    • G01R31/041G01R31/026
    • A system is provided for detecting a fault in a signal transmission path. In one embodiment, the system can include a variable amplitude signal attenuator which is operable to modify an input signal by variably attenuating a signal voltage swing of the input signal. Desirably, the input signal is attenuated only when transitioning from a high signal voltage level towards a low signal voltage level d variably, such that a larger high-to-low signal voltage swing is attenuated more than a smaller high-to-low signal voltage swing. Desirably, a comparator, which may apply hysteresis to the output signals, may detect a crossing of a reference voltage level by the modified input signal. In this way, when the comparator does not detect an expected crossing of the reference voltage level by the modified input signal, a determination can be made that a fault exists in the signal transmission path.
    • 提供了一种用于检测信号传输路径中的故障的系统。 在一个实施例中,系统可以包括可变幅度信号衰减器,其可操作以通过可变地衰减输入信号的信号电压摆幅来修改输入信号。 期望地,只有当从高信号电压电平转换到低信号电压电平d时,输入信号才被衰减,使得较高的高电平到低的信号电压摆幅比较小的高到低信号电压衰减 摇摆。 期望地,可能对输出信号施加迟滞的比较器可以检测参考电压电平与修改的输入信号的交叉。 以这种方式,当比较器没有检测到通过修改的输入信号的参考电压电平的预期交叉时,可以确定在信号传输路径中存在故障。
    • 8. 发明授权
    • Flexible row redundancy system
    • 灵活的行冗余系统
    • US07774660B2
    • 2010-08-10
    • US12131307
    • 2008-06-02
    • Louis L. HsuGregory J. FredemanRajiv V. JoshiToshiaki Kirihata
    • Louis L. HsuGregory J. FredemanRajiv V. JoshiToshiaki Kirihata
    • G11C29/00
    • G11C29/808
    • A row redundancy system is provided for replacing faulty wordlines of a memory array having a plurality of banks. The row redundancy system includes a remote fuse bay storing at least one faulty address corresponding to a faulty wordline of the memory array; a row fuse array for storing row fuse information corresponding to at least one bank of the memory array; and a copy logic module for copying at least one faulty address stored in the remote fuse bay into the row fuse array; wherein the copy logic module is programmed to copy the at least one faulty address into the row fuse information stored in the row fuse array corresponding to a predetermined number of banks in accordance with a selectable repair field size.
    • 提供了一种用于替换具有多个存储体的存储器阵列的有缺陷的字线的行冗余系统。 行冗余系统包括存储与存储器阵列的故障字线相对应的至少一个故障地址的远程熔丝架; 用于存储对应于所述存储器阵列的至少一个组的行熔丝信息的行熔丝阵列; 以及复制逻辑模块,用于将存储在所述远程保险丝盒中的至少一个故障地址复制到所述行保险丝阵列中; 其中所述复制逻辑模块被编程为根据可选择的修复字段大小将所述至少一个故障地址复制到对应于预定数量的存储体的行熔丝阵列中的行熔丝信息。