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1. 发明申请

WO2011056521A1 FLUID DISTRIBUTION MANIFOLD INCLUDING BONDED PLATES 审中-公开
标题翻译：流体分配管道包括粘结板
公开(公告)号：WO2011056521A1
公开(公告)日：2011-05-12
申请号：PCT/US2010/053993
申请日：2010-10-26
申请人： EASTMAN KODAK COMPANY , KERR, Roger, Stanley , LEVY, David, Howard
发明人： KERR, Roger, Stanley , LEVY, David, Howard
IPC分类号： C23C16/455
CPC分类号： C23C16/45565 , C23C16/45551 , Y10T137/8593 , Y10T156/10
摘要： A fluid distribution manifold includes a first plate and a second plate. At least a portion of at least the first plate and the second plate define a relief pattern. A metal bonding agent is disposed between the first plate and the second plate such that the first plate and the second plate form a fluid flow directing pattern defined by the relief pattern.
摘要翻译：流体分配歧管包括第一板和第二板。至少第一板和第二板的至少一部分限定浮雕图案。金属粘合剂设置在第一板和第二板之间，使得第一板和第二板形成由浮雕图案限定的流体流动引导图案。

2. 发明申请

WO2011056405A1 FLUID DISTRIBUTION MANIFOLD INCLUDING COMPLIANT PLATES 审中-公开
标题翻译：流体分配管理包括合规板
公开(公告)号：WO2011056405A1
公开(公告)日：2011-05-12
申请号：PCT/US2010/053096
申请日：2010-10-19
申请人： EASTMAN KODAK COMPANY , KERR, Roger, Stanley , LEVY, David, Howard
发明人： KERR, Roger, Stanley , LEVY, David, Howard
IPC分类号： C23C16/54 , C23C16/455 , H01L21/314 , H01L51/00
CPC分类号： C23C16/545 , C23C16/45551 , C23C16/45574 , Y10T137/8593 , Y10T156/10
摘要： A fluid distribution manifold includes a first plate and a second plate. The first plate includes a length dimension, a width dimension, and a thickness that allows the first plate to be deformable over at least one of the length dimension and the width dimension of the first plate. The second plate includes a length dimension, a width dimension, and a thickness that allows the second plate to be deformable over at least one of the length dimension and the width dimension of the second plate. At least a portion of at least the first plate and the second plate define a relief pattern that defines a fluid flow directing path. The first plate and the second plate are bonded together to form a non-planar shape in a height dimension along at least one of the length dimension and the width dimension.
摘要翻译：流体分配歧管包括第一板和第二板。第一板包括长度尺寸，宽度尺寸和允许第一板在第一板的长度尺寸和宽度尺寸中的至少一个上可变形的厚度。第二板包括长度尺寸，宽度尺寸和允许第二板在第二板的长度尺寸和宽度尺寸中的至少一个上可变形的厚度。至少第一板和第二板的至少一部分限定了限定流体流动引导路径的浮雕图案。第一板和第二板结合在一起，以沿着长度尺寸和宽度尺寸中的至少一个在高度尺寸上形成非平面形状。

3. 发明申请

WO2011053446A1 FLUID CONVEYANCE SYSTEM INCLUDING FLEXIBLE RETAINING MECHANISM 审中-公开
标题翻译：流体输送系统，包括柔性保持机构
公开(公告)号：WO2011053446A1
公开(公告)日：2011-05-05
申请号：PCT/US2010/052219
申请日：2010-10-12
申请人： EASTMAN KODAK COMPANY , KERR, Roger, Stanley , LEVY, David, Howard , SUTTON, James, Edward
发明人： KERR, Roger, Stanley , LEVY, David, Howard , SUTTON, James, Edward
IPC分类号： C23C16/458 , C23C16/54 , C23C16/455
CPC分类号： C23C16/458 , C23C16/45551 , C23C16/545 , Y10T137/8593
摘要： A fluid conveyance system for thin film material deposition includes a fluid distribution manifold and a substrate transport mechanism. The fluid distribution manifold includes an output face that includes a plurality of elongated slots. The output face of the fluid distribution manifold is positioned opposite a first surface of the substrate such that the elongated slots face the first surface of the substrate and are positioned proximate to the first surface of the substrate. The substrate transport mechanism causes a substrate to travel in a direction and includes a flexible mechanism that contacts a second surface of the substrate in a region that is proximate to the output face of the fluid distribution manifold.
摘要翻译：用于薄膜材料沉积的流体输送系统包括流体分配歧管和基底输送机构。流体分配歧管包括包括多个细长槽的输出面。流体分配歧管的输出面与衬底的第一表面相对定位，使得细长的槽面对衬底的第一表面并且靠近衬底的第一表面定位。衬底传送机构使衬底沿一个方向行进，并且包括在靠近流体分配歧管的输出面的区域中接触衬底的第二表面的柔性机构。

4. 发明申请

WO2011053445A1 DISTRIBUTION MANIFOLD 审中-公开
标题翻译：分销管理
公开(公告)号：WO2011053445A1
公开(公告)日：2011-05-05
申请号：PCT/US2010/052217
申请日：2010-10-12
申请人： EASTMAN KODAK COMPANY , KERR, Roger, Stanley , LEVY, David, Howard , NELSON, Shelby, Forrester
发明人： KERR, Roger, Stanley , LEVY, David, Howard , NELSON, Shelby, Forrester
IPC分类号： C23C16/455
CPC分类号： C23C16/45551 , C23C16/45563 , C23C16/45574 , C23C16/45591 , Y10T137/87571
摘要： A fluid conveyance device for thin film material deposition includes a fluid distribution manifold (10), a primary chamber (610, 612), and a secondary fluid source (620). The fluid distribution manifold includes an output face (36) that is connected in fluid communication to the primary chamber. The secondary fluid source is connected in fluid communication to the primary chamber through a plurality of conveyance ports (630).
摘要翻译：用于薄膜材料沉积的流体输送装置包括流体分配歧管（10），主室（610,612）和次流体源（620）。流体分配歧管包括与主室流体连通地连接的输出面（36）。二次流体源通过多个输送口（630）与第一室流体连通。

5. 发明申请

WO2009067154A1 MULTICOLORED MASK PROCESS FOR MAKING DISPLAY CIRCUITRY 审中-公开
标题翻译：用于制作显示电路的MULTICOLORA MASK PROCESS
公开(公告)号：WO2009067154A1
公开(公告)日：2009-05-28
申请号：PCT/US2008/012662
申请日：2008-11-10
申请人： EASTMAN KODAK COMPANY , IRVING, Lyn Marie , LEVY, David Howard , THAI, Lan Bach
发明人： IRVING, Lyn Marie , LEVY, David Howard , THAI, Lan Bach
IPC分类号： G03F7/20 , H01L21/77
CPC分类号： H01L27/1288 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/3244 , H01L29/66765 , H01L29/7869 , H01L2227/323 , Y10T428/24802
摘要： A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.
摘要翻译：公开了一种用于形成像素电路的工艺，包括：（a）提供透明支撑体; （b）形成具有至少四种不同颜色图案的多色蒙版; （c）形成像素电路的集成电子部件，其具有至少四层图案化的功能材料，其包括第一导体，电介质，半导体和第二导体，每层图案化的功能材料层对应于四个不同颜色图案多色面膜使用对应于每个颜色图案的光图案来对功能材料进行图案化。

6. 发明申请

WO2009042147A1 PROCESS AND DEPOSITION SYSTEM FOR THIN FILM FORMATION WITH GAS DELIVERY HEAD HAVING SPATIAL SEPARATION OF REACTIVE GASES AND MOVEMENT OF THE SUBSTRATE PASSED THE DELIVERY HEAD 审中-公开
标题翻译：具有气体输送头的薄膜形成工艺和沉积系统，具有反应性气体的空间分离和通过输送头的基体的运动
公开(公告)号：WO2009042147A1
公开(公告)日：2009-04-02
申请号：PCT/US2008/011065
申请日：2008-09-24
申请人： EASTMAN KODAK COMPANY , LEVY, David Howard , KERR, Roger Stanley , CAREY, Jeffrey Todd
发明人： LEVY, David Howard , KERR, Roger Stanley , CAREY, Jeffrey Todd
IPC分类号： C23C16/455 , C23C16/458
CPC分类号： C23C16/45551 , B33Y80/00 , C23C16/458 , H01L29/4908 , Y10S438/908
摘要： A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed.
摘要翻译：公开了一种在衬底上沉积薄膜材料的方法，其中包括同时引导一系列气体流从薄膜沉积系统的输送头的输出面朝向衬底的表面，并且其中一系列气体流包括至少第一反应性气体材料，惰性吹扫气体和第二反应性气体材料，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应。还公开了能够进行这种处理的系统。

7. 发明申请

WO2009042051A2 PROCESS FOR DEPOSITING ORGANIC MATERIALS 审中-公开
标题翻译：沉积有机材料的工艺
公开(公告)号：WO2009042051A2
公开(公告)日：2009-04-02
申请号：PCT/US2008010801
申请日：2008-09-17
申请人： EASTMAN KODAK CO , FREEMAN DIANE CAROL , LEVY DAVID HOWARD , COWDERY-CORVAN PETER JEROME
发明人： FREEMAN DIANE CAROL , LEVY DAVID HOWARD , COWDERY-CORVAN PETER JEROME
IPC分类号： H01L21/469
CPC分类号： C23C16/30 , B05D1/60 , B05D2252/02 , C23C16/45551 , C23C16/45553 , C23C16/545
摘要： A process of making an organic thin film on a substrate by atomic layer deposition is disclosed, the process comprising simultaneously directing a series of gas flows along substantially parallel elongated channels, and wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, optionally repeated a plurality of times, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material wherein the first reactive gaseous material, the second reactive gaseous material or both is a volatile organic compound. The process is carried out substantially at or above atmospheric pressure and at a temperature under 250°C, during deposition of the organic thin film.
摘要翻译：公开了通过原子层沉积在衬底上制造有机薄膜的方法，该方法包括同时引导一系列沿着大致平行的细长通道的气流，并且其中一系列气流依次包括至少第一反应性气态材料，惰性吹扫气体和第二反应性气体材料，任选重复多次，其中第一反应性气态材料能够与用第二反应性气态材料处理的基底表面反应，其中第一反应性气态材料，第二反应性气体物质或两者都是挥发性有机化合物。该方法在沉积有机薄膜的过程中基本上在大气压以下和250℃以下进行。

8. 发明申请

WO2009042044A1 PROCESS AND DEPOSITION SYSTEM FOR THIN FILM FORMATION WITH GAS DELIVERY HEAD HAVING SPATIAL SEPARATION OF REACTIVE GASES AND MOVEMENT OF THE SUBSTRATE PASSED THE DELIVERY HEAD 审中-公开
标题翻译：具有气体输送头的薄膜形成工艺和沉积系统，具有反应性气体的空间分离和通过输送头的基体的运动
公开(公告)号：WO2009042044A1
公开(公告)日：2009-04-02
申请号：PCT/US2008/010752
申请日：2008-09-16
申请人： EASTMAN KODAK COMPANY , LEVY, David Howard , KERR, Roger Stanley , CAREY, Jeffrey Todd
发明人： LEVY, David Howard , KERR, Roger Stanley , CAREY, Jeffrey Todd
IPC分类号： C23C16/455
CPC分类号： C23C16/45551 , B33Y80/00 , C23C16/45519 , C23C16/545
摘要： A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material, wherein one or more of the gas flows provides a pressure that at least contributes to the separation of the surface of the substrate from the face of the delivery head. A system capable of carrying out such a process is also disclosed.
摘要翻译：公开了一种在衬底上沉积薄膜材料的方法，其中包括同时引导一系列气体流从薄膜沉积系统的输送头的输出面朝向衬底的表面，并且其中一系列气体流包括至少第一反应性气体材料，惰性吹扫气体和第二反应性气体材料，其中第一反应性气体材料能够与用第二反应性气态材料处理的基底表面反应，其中一个或多个气体流动提供至少有助于将衬底的表面与输送头的表面分离的压力。还公开了能够进行这种处理的系统。

9. 发明申请

WO2007136656A3 COLORED MASKING FOR FORMING TRANSPARENT STRUCTURES 审中-公开
标题翻译：用于形成透明结构的彩色遮蔽
公开(公告)号：WO2007136656A3
公开(公告)日：2008-07-10
申请号：PCT/US2007011734
申请日：2007-05-16
申请人： EASTMAN KODAK CO , IRVING LYN MARIE , LEVY DAVID HOWARD , IRVING MARK EDWARD
发明人： IRVING LYN MARIE , LEVY DAVID HOWARD , IRVING MARK EDWARD
IPC分类号： G03F1/10 , G03F7/09 , G03F7/20
CPC分类号： G03F7/2018 , G03F1/56 , G03F7/0035 , G03F7/027 , G03F7/2014 , Y10T428/24802 , Y10T428/24917
摘要： The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible light to cure the layer curable by light in exposed portions to form a cured pattern.
摘要翻译：本发明涉及一种用于形成层叠透明结构的方法，包括提供支撑体，用多色面罩涂覆所述支撑体的一侧，用可见光固化的层涂覆支撑体的另一侧，并将可光固化层通过具有可见光的掩模来固化由暴露部分中的光可固化的层以形成固化图案。

10. 发明申请

WO2007126585A3 PROCESS FOR ATOMIC LAYER DEPOSITION 审中-公开
标题翻译：原子层沉积过程
公开(公告)号：WO2007126585A3
公开(公告)日：2008-04-24
申请号：PCT/US2007006415
申请日：2007-03-14
申请人： EASTMAN KODAK CO , LEVY DAVID HOWARD
发明人： LEVY DAVID HOWARD
IPC分类号： C23C16/455
CPC分类号： C23C16/545 , B33Y80/00 , C23C16/403 , C23C16/407 , C23C16/45504 , C23C16/45519 , C23C16/45551 , C23C16/45591
摘要： The present invention relates to a deposition process for thin film deposition onto a substrate comprising providing a plurality of gaseous materials comprising at least first, second, and third gaseous materials, wherein the first and second gaseous materials are reactive with each other such that when one of the first or second gaseous materials are on the surface of the substrate the other of the first or second gaseous materials will react to deposit a layer of material on the substrate and wherein the third gaseous material is inert with respect to reacting with the first or second gaseous materials. The process comprises flowing the gaseous materials along the length direction of a plurality of elongated channels across the surface of the substrate surface in close proximity thereto.
摘要翻译：本发明涉及一种用于薄膜沉积到衬底上的沉积工艺，包括提供至少包括第一，第二和第三气态材料的多种气态材料，其中第一和第二气态材料彼此反应，使得当一个第一或第二气体材料的第一或第二气体材料在基材的表面上，另一个第一或第二气态材料将反应以在基材上沉积一层材料，并且其中第三气态材料相对于与第一或第二气态材料反应第二种气态物质。该方法包括使气态材料沿多个细长通道的长度方向流过基板表面的紧邻其表面。

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