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    • 9. 发明申请
    • A RADIATION EMITTING ELEMENT AND A METHOD OF PROVIDING IT
    • 辐射发射元件及其提供方法
    • WO2010052305A1
    • 2010-05-14
    • PCT/EP2009/064753
    • 2009-11-06
    • BLACKBRITE ApSØSTERGAARD, Jens Wagenblast StubbeSVENSSON, DavidLARSEN, Niels Agersnap
    • ØSTERGAARD, Jens Wagenblast StubbeSVENSSON, DavidLARSEN, Niels Agersnap
    • G02B26/02C09K11/00G02B6/00G02B6/35
    • F21V14/003B60Q1/076F21S8/04F21S41/62F21S41/645F21V9/40G02B6/001G02B6/3538G02B26/005G02F1/133605Y10T29/49002
    • A radiation emitting element comprising a radiation transmissive element having a first refractive index, a first surface, a second, opposite surface, a radiation emitter adapted to emit radiation of a predetermined wavelength into the radiation transmissive element, and a plurality of radiation controlling elements, wherein each radiation controlling element comprises: - a first liquid having a second refractive index, - a second fluid having a third refractive index being lower than the second refractive index, the second refractive index being closer to the first refractive index than the third refractive index, - means for altering a shape of the first liquid between two modes wherein: • in a first mode, the first liquid being in contact with the first surface at a first surface part, and an interface between the first liquid and the second fluid, at the first surface part, is not parallel to the first surface part and • in a second mode, a surface of the second fluid, at the first surface part, is at least substantially parallel to the shape of the first surface part, wherein the first liquid has a transmittance of at least 10 % at the predetermined wavelength.
    • 一种辐射发射元件,包括具有第一折射率的辐射透射元件,第一表面,第二相对表面,适于将预定波长的辐射发射到辐射透射元件中的辐射发射器,以及多个辐射控制元件, 其中每个辐射控制元件包括: - 具有第二折射率的第一液体, - 具有低于所述第二折射率的第三折射率的第二流体,所述第二折射率比所述第三折射率更接近所述第一折射率 - 用于在两种模式之间改变第一液体的形状的装置,其中:在第一模式中的第一液体在第一表面部分与第一表面接触,第一液体和第二流体之间的界面, 在第一表面部分处不平行于第一表面部分,并且在第二模式中为第二流体的表面,在冷杉 所述第一表面部分至少基本上平行于所述第一表面部分的形状,其中所述第一液体在所述预定波长处具有至少10%的透射率。
    • 10. 发明申请
    • METHOD AND APPARATUS FOR OPTICALLY MEASURING THE TOPOGRAPHY OF NEARLY PLANAR PERIODIC STRUCTURES
    • 用于光学测量近期平面周期结构的地形的方法和装置
    • WO2004008069A1
    • 2004-01-22
    • PCT/DK2003/000457
    • 2003-07-01
    • LUKA OPTOSCOPE ApSLARSEN, Niels, AgersnapHANSEN, Poul-Erik
    • LARSEN, Niels, AgersnapHANSEN, Poul-Erik
    • G01B11/30
    • G01B11/24G01B11/0641G01B11/30
    • The present invention discloses a non-destructive method and apparatus for measuring the 3D topography of a sample having periodic microstructure deposited onto the surface, or deposited onto a film, or buried into the film or sample. In particular, the present invention relates to an optical system and method utilizing polarized light beam, diffracted from the repeated structure, to measure its spatial geometry giving parameters such as profile height, profile widths, sidewall angles, and arbitrary profile shape. The optical system employs a broadband or semi-monochromatic light source to produce a light beam that is polarized and focused onto the periodic structure being measured. The focused beam consists of a whole range of illumination angles that is provided to the structure simultaneously. Transmitted or reflected diffracted light generated by the interaction of the light with the periodic structure is collected by an imaging detector system. The detector records the diffraction light irradiance resolved into illumination angles, diffraction orders and wavelength. The data is applied to determine the geometrical profile of the periodic structure using a reconstruction algorithm that is based on comparisons between measured diffraction data and modeled diffraction irradiance of a profile model using Maxwell's equations. The reconstruction of the profile is performed by iterative adjustments of a profile seed model until the modeled diffraction irradiance matches the measured data within a predefined convergence tolerance.
    • 本发明公开了一种非破坏性方法和装置,用于测量具有沉积在表面上或沉积在薄膜上或埋入薄膜或样品中的周期性微结构的样品的3D形貌。 特别地,本发明涉及利用从重复结构衍射的偏振光束来测量其给出诸如轮廓高度,轮廓宽度,侧壁角度和任意轮廓形状等参数的空间几何的光学系统和方法。 光学系统采用宽带或半单色光源来产生被偏振并聚焦到被测量的周期结构上的光束。 聚焦光束由同时提供给结构的整个照明角度范围组成。 通过光与周期性结构的相互作用产生的透射或反射的衍射光由成像检测器系统收集。 检测器将衍射光照度分解为照射角度,衍射级数和波长。 应用数据来确定周期性结构的几何轮廓,使用重建算法,该重建算法基于使用Maxwell方程的轮廓模型的测量衍射数据和模型化衍射辐照度之间的比较。 轮廓的重建通过轮廓种子模型的迭代调整进行,直到建模的衍射辐照度与预定义的收敛公差内的测量数据相匹配。