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    • 1. 发明申请
    • METHOD AND APPARATUS FOR OPTICALLY MEASURING THE TOPOGRAPHY OF NEARLY PLANAR PERIODIC STRUCTURES
    • 用于光学测量近期平面周期结构的地形的方法和装置
    • WO2004008069A1
    • 2004-01-22
    • PCT/DK2003/000457
    • 2003-07-01
    • LUKA OPTOSCOPE ApSLARSEN, Niels, AgersnapHANSEN, Poul-Erik
    • LARSEN, Niels, AgersnapHANSEN, Poul-Erik
    • G01B11/30
    • G01B11/24G01B11/0641G01B11/30
    • The present invention discloses a non-destructive method and apparatus for measuring the 3D topography of a sample having periodic microstructure deposited onto the surface, or deposited onto a film, or buried into the film or sample. In particular, the present invention relates to an optical system and method utilizing polarized light beam, diffracted from the repeated structure, to measure its spatial geometry giving parameters such as profile height, profile widths, sidewall angles, and arbitrary profile shape. The optical system employs a broadband or semi-monochromatic light source to produce a light beam that is polarized and focused onto the periodic structure being measured. The focused beam consists of a whole range of illumination angles that is provided to the structure simultaneously. Transmitted or reflected diffracted light generated by the interaction of the light with the periodic structure is collected by an imaging detector system. The detector records the diffraction light irradiance resolved into illumination angles, diffraction orders and wavelength. The data is applied to determine the geometrical profile of the periodic structure using a reconstruction algorithm that is based on comparisons between measured diffraction data and modeled diffraction irradiance of a profile model using Maxwell's equations. The reconstruction of the profile is performed by iterative adjustments of a profile seed model until the modeled diffraction irradiance matches the measured data within a predefined convergence tolerance.
    • 本发明公开了一种非破坏性方法和装置,用于测量具有沉积在表面上或沉积在薄膜上或埋入薄膜或样品中的周期性微结构的样品的3D形貌。 特别地,本发明涉及利用从重复结构衍射的偏振光束来测量其给出诸如轮廓高度,轮廓宽度,侧壁角度和任意轮廓形状等参数的空间几何的光学系统和方法。 光学系统采用宽带或半单色光源来产生被偏振并聚焦到被测量的周期结构上的光束。 聚焦光束由同时提供给结构的整个照明角度范围组成。 通过光与周期性结构的相互作用产生的透射或反射的衍射光由成像检测器系统收集。 检测器将衍射光照度分解为照射角度,衍射级数和波长。 应用数据来确定周期性结构的几何轮廓,使用重建算法,该重建算法基于使用Maxwell方程的轮廓模型的测量衍射数据和模型化衍射辐照度之间的比较。 轮廓的重建通过轮廓种子模型的迭代调整进行,直到建模的衍射辐照度与预定义的收敛公差内的测量数据相匹配。
    • 2. 发明公开
    • METHOD AND APPARATUS FOR OPTICALLY MEASURING THE TOPOGRAPHY OF NEARLY PLANAR PERIODIC STRUCTURES
    • 装置和方法进行定期的地形进行光学测量,几乎平面结构
    • EP1527320A1
    • 2005-05-04
    • EP03735331.5
    • 2003-07-01
    • Luka Optoscope ApS
    • LARSEN, Niels, AgersnapHANSEN, Poul-Erik
    • G01B11/30
    • G01B11/24G01B11/0641G01B11/30
    • The present invention discloses a non-destructive method and apparatus for measuring the 3D topography of a sample having periodic microstructure deposited onto the surface, or deposited onto a film, or buried into the film or sample. In particular, the present invention relates to an optical system and method utilizing polarized light beam, diffracted from the repeated structure, to measure its spatial geometry giving parameters such as profile height, profile widths, sidewall angles, and arbitrary profile shape. The optical system employs a broadband or semi-monochromatic light source to produce a light beam that is polarized and focused onto the periodic structure being measured. The focused beam consists of a whole range of illumination angles that is provided to the structure simultaneously. Transmitted or reflected diffracted light generated by the interaction of the light with the periodic structure is collected by an imaging detector system. The detector records the diffraction light irradiance resolved into illumination angles, diffraction orders and wavelength. The data is applied to determine the geometrical profile of the periodic structure using a reconstruction algorithm that is based on comparisons between measured diffraction data and modeled diffraction irradiance of a profile model using Maxwell's equations. The reconstruction of the profile is performed by iterative adjustments of a profile seed model until the modeled diffraction irradiance matches the measured data within a predefined convergence tolerance.