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1. 发明授权

US06178065B1 Thin film magnetic head and manufacturing method of the head 失效
标题翻译：薄膜磁头及其制造方法
公开(公告)号：US06178065B1
公开(公告)日：2001-01-23
申请号：US09081864
申请日：1998-05-21
申请人： Koichi Terunuma , Yasufumi Uno , Tetsuya Mino , Koji Matsukuma
发明人： Koichi Terunuma , Yasufumi Uno , Tetsuya Mino , Koji Matsukuma
IPC分类号： G11B533
CPC分类号： G11B5/3967 , G11B5/3116 , G11B5/312 , G11B5/313 , G11B5/3146 , G11B5/3163
摘要： A thin film magnetic head has a recording gap layer made of a nonmagnetic material, lower and upper magnetic pole layers made of a magnetic material, the lower and upper magnetic pole layers sandwiching the recording gap layer, and a magnetic material side layer deposited via a nonmagnetic material side layer on at least a part of a side surface of at least the upper magnetic pole layer.
摘要翻译：薄膜磁头具有由非磁性材料制成的记录间隙层，由磁性材料制成的下磁极层和上磁极层，夹着记录间隙层的下磁极层和上磁极层，以及经由磁性材料层至少在上磁极层的侧表面的至少一部分上的非磁性材料侧层。

2. 发明授权

US06586049B2 Patterning method using mask and manufacturing method for composite type thin film magnetic head using the patterning method 失效
标题翻译：使用图案化方法使用掩模和复合型薄膜磁头的制造方法的图案化方法
公开(公告)号：US06586049B2
公开(公告)日：2003-07-01
申请号：US09732894
申请日：2000-12-11
申请人： Yasufumi Uno , Toru Inoue , Tetsuya Mino , Koji Matsukuma
发明人： Yasufumi Uno , Toru Inoue , Tetsuya Mino , Koji Matsukuma
IPC分类号： B05D512
CPC分类号： C23F4/00 , G11B5/3116 , G11B5/3163 , G11B5/3967
摘要： A method of patterning at least one object layer, includes a step of forming a mask on the object layer, and a step of selectively etching the object layer using the mask. The mask is made of a magnetic metallic compound with a basic metal of nickel or cobalt containing at least group 3B element and/or group 5B element.
摘要翻译：图案化至少一个物体层的方法包括在物体层上形成掩模的步骤，以及使用掩模选择性地蚀刻物体层的步骤。掩模由具有至少3B族元素和/或5B族元素的镍或钴的碱性金属的磁性金属化合物制成。

3. 发明授权

US06169642A Thin-film magnetic head having a three-layer pole tip structure 失效
标题翻译：具有三层极尖结构的薄膜磁头
公开(公告)号：US06169642A
公开(公告)日：2001-01-02
申请号：US09150205
申请日：1998-09-09
申请人： Tetsuya Mino , Yasufumi Uno , Koji Matsukuma , Koichi Terunuma , Masahiro Kondo
发明人： Tetsuya Mino , Yasufumi Uno , Koji Matsukuma , Koichi Terunuma , Masahiro Kondo
IPC分类号： G11B5147
CPC分类号： G11B5/3967 , G11B5/3156 , Y10T29/49046 , Y10T29/49048
摘要： A thin-film magnetic head having an air bearing surface, includes a three-layer pole tip structure consisting of a lower pole tip element, a recording gap layer and an upper pole tip element, the structure having side surfaces, a rear surface and top surface, a lower auxiliary pole, a part of which contacts to the lower pole tip element, an upper auxiliary pole, a part of which contacts to the upper pole tip element, the upper auxiliary pole being magnetically connected at its rear portion with respect to the air bearing surface to the lower auxiliary pole so as to form a yoke together with the lower auxiliary pole, a lower insulating layer, surrounding the side surfaces and the rear surfaces of the three-layer pole tip structure, the lower insulating layer being located between the lower and upper auxiliary poles and having a top surface, a coil conductor formed on the top surface of the lower insulating layer, and an upper insulating layer covering the coil conductor, a part of the upper insulating layer being located between the lower insulating layer and the upper auxiliary pole. The top surface of the lower insulating layer is leveled lower than the top surface of the three-layer pole tip structure over at least a region within which the coil conductor is formed.
摘要翻译：具有空气轴承表面的薄膜磁头包括由下极端元件，记录间隙层和上极端元件组成的三层极尖端结构，该结构具有侧表面，后表面和顶部表面，下辅助极，其一部分接触下极端元件，上辅助极，其一部分接触上极尖端元件，上辅助极在其后部相对于空气支承面到下辅助极，以与下辅助极一起形成轭，下绝缘层围绕三层极尖结构的侧表面和后表面，下绝缘层位于在上下辅助极之间并且具有顶表面，形成在下绝缘层的顶表面上的线圈导体和覆盖线圈导体的上绝缘层，u的一部分绝缘层位于下绝缘层和上辅助极之间。下绝缘层的顶表面在形成线圈导体的至少一个区域上比三层极尖端结构的顶表面平坦。

4. 发明授权

US6151193A Thin film magnetic head 失效
标题翻译：薄膜磁头
公开(公告)号：US6151193A
公开(公告)日：2000-11-21
申请号：US58894
申请日：1998-04-13
申请人： Koichi Terunuma , Yasufumi Uno , Tetsuya Mino , Koji Matsukuma
发明人： Koichi Terunuma , Yasufumi Uno , Tetsuya Mino , Koji Matsukuma
IPC分类号： G11B5/31 , G11B5/39 , G11B5/187
CPC分类号： G11B5/3967 , G11B5/3109 , G11B5/3116 , G11B5/3146
摘要： A first pole tip 212 at a write element 2 is provided projecting above a first yoke 211. A second pole tip 222 is adhered onto a gap film 23 that is adhered onto the first pole tip 212. The front end portion of a second yoke 221 is laminated on the second pole tip 222. At least either the first pole tip 212 or the second pole tip 222 is constituted of a material having a higher saturation magnetic flux density than that of permalloy. At least either the first yoke 211 or the second yoke 221 is constituted of a material having a higher resistivity than that of permalloy.
摘要翻译：写入元件2上的第一极端212设置在第一磁轭211的上方突出。第二极尖222粘附到粘附到第一极尖212上的间隙膜23上。第二磁轭221的前端部层压在第二极端222上。第一极尖212或第二极尖222中的至少一个由具有比坡莫合金高的饱和磁通密度的材料构成。第一磁轭211或第二磁轭221中的至少一个由比坡莫合金电阻率高的材料构成。

5. 发明授权

US06604275B1 Method of manufacturing thin-film magnetic head 失效
标题翻译：制造薄膜磁头的方法
公开(公告)号：US06604275B1
公开(公告)日：2003-08-12
申请号：US09702865
申请日：2000-11-01
申请人： Tetsuya Mino , Yasufumi Uno , Koji Matsukuma , Koichi Terunuma , Masahiro Kondo
发明人： Tetsuya Mino , Yasufumi Uno , Koji Matsukuma , Koichi Terunuma , Masahiro Kondo
IPC分类号： G11B5127
CPC分类号： G11B5/3967 , G11B5/3156 , Y10T29/49046 , Y10T29/49048
摘要： A method of manufacturing a thin-film magnetic head, includes the steps of: forming, on a lower auxiliary pole, a three-layer pole tip structure consisting of a lower pole tip element, a recording gap layer and an upper pole tip element; depositing a lower insulating layer on the three-layer pole tip structure; polishing the lower insulating layer by chemical-mechanical polishing so that a top surface of the lower insulating layer is leveled lower than a top of the three-layer pole tip structure over at least a region within which a coil conductor is formed; forming the coil conductor on the lower insulating layer; forming an upper insulating to cover the coil conductor; and forming an upper auxiliary pole so that a part of which contacts to the upper pole tip element.
摘要翻译：一种制造薄膜磁头的方法，包括以下步骤：在下辅助极上形成由下极尖端元件，记录间隙层和上极尖端元件组成的三层极尖端结构; 在三层极尖结构上沉积下绝缘层; 通过化学机械抛光来研磨下绝缘层，使得下绝缘层的顶表面至少在形成线圈导体的区域之上平坦于三层极尖端结构的顶部; 在下绝缘层上形成线圈导体; 形成上绝缘体以覆盖线圈导体; 以及形成上部辅助极，使得其一部分接触上极尖端元件。

6. 发明授权

US06188543B1 Thin film magnetic head 失效
标题翻译：薄膜磁头
公开(公告)号：US06188543B1
公开(公告)日：2001-02-13
申请号：US09063791
申请日：1998-04-22
申请人： Koichi Terunuma , Yasufumi Uno , Tetsuya Mino , Koji Matsukuma
发明人： Koichi Terunuma , Yasufumi Uno , Tetsuya Mino , Koji Matsukuma
IPC分类号： G11B531
CPC分类号： G11B5/3967 , G11B5/012 , G11B5/3109 , G11B5/3113
摘要： A thin film magnetic head includes a recording gap layer, and lower and upper magnetic pole layers made of polycrystalline magnetic substances, deposited to sandwich the recording gap layer. An average particle size D of crystal substances at least in a region of the upper magnetic pole layer, near the recording gap layer with respect to a recording track width W is set to D≦W/20.
摘要翻译：薄膜磁头包括记录间隙层和由多晶磁性物质制成的下部和上部磁极层，沉积以夹持记录间隙层。至少在上磁极层的记录间隙层的相对于记录磁迹宽度W附近的晶体物质的平均粒径D设定为D <= W / 20。

7. 发明授权

US06713368B2 Etching mask and magnetic head device 失效
标题翻译：蚀刻面具和磁头设备
公开(公告)号：US06713368B2
公开(公告)日：2004-03-30
申请号：US09921560
申请日：2001-08-06
申请人： Koji Matsukuma
发明人： Koji Matsukuma
IPC分类号： H01L21302
CPC分类号： G11B5/3163 , G11B5/3116 , G11B5/312 , G11B5/3967 , Y10S438/942 , Y10S438/975
摘要： An etching mask is made of a metal such as Permalloy (NiFe) and has a T-shaped cross section made up of a vertical bar having width W1 and a lateral bar having width W2. Through ion beam etching with the etching mask, the region in the surface of a workpiece not covered with the mask is selectively removed by the ion beams applied thereto. In the mask the vertical bar has a region obstructed by the lateral bar and a redeposit portion. As a result, the region of the vertical bar near the interface between the workpiece and the vertical bar that substantially determines the pattern width does not change in width. Consequently, a pattern of the workpiece on which etching has been performed has the top width and bottom width substantially equal to width W1 of the vertical bar of the mask. The pattern is rectangular in cross section.
摘要翻译：蚀刻掩模由诸如坡莫合金（NiFe）的金属制成，并且具有由具有宽度W1的纵向条和宽度W2的横向条构成的T形横截面。通过利用蚀刻掩模的离子束蚀刻，被掩模被覆盖的工件的表面中的区域被施加到其上的离子束选择性地去除。在面罩中，垂直杆具有被侧杆阻挡的区域和再沉积部分。结果，基本上确定图案宽度的工件和垂直条之间的界面附近的垂直条的区域的宽度不变。因此，已经进行了蚀刻的工件的图案的顶部宽度和底部宽度基本上等于掩模的垂直条的宽度W1。该图案的横截面为矩形。

8. 发明授权

US06303392B1 Etching mask, method of making same, etching method, magnetic head device and method of manufacturing same 有权
标题翻译：蚀刻掩模，其制造方法，蚀刻方法，磁头装置及其制造方法
公开(公告)号：US06303392B1
公开(公告)日：2001-10-16
申请号：US09219707
申请日：1998-12-23
申请人： Koji Matsukuma
发明人： Koji Matsukuma
IPC分类号： H01L2100
CPC分类号： G11B5/3163 , G11B5/3116 , G11B5/312 , G11B5/3967 , Y10S438/942 , Y10S438/975
摘要： An etching mask is made of a metal such as Permalloy (NiFe) and has a T-shaped cross section made up of a vertical bar having width W1 and a lateral bar having width W2. Through ion beam etching with the etching mask, the region in the surface of a workpiece not covered with the mask is selectively removed by the ion beams applied thereto. In the mask the vertical bar has a region obstructed by the lateral bar and a redeposit portion. As a result, the region of the vertical bar near the interface between the workpiece and the vertical bar that substantially determines the pattern width does not change in width. Consequently, a pattern of the workpiece on which etching has been performed has the top width and bottom width substantially equal to width W1 of the vertical bar of the mask. The pattern is rectangular in cross section.
摘要翻译：蚀刻掩模由诸如坡莫合金（NiFe）的金属制成，并且具有由具有宽度W1的纵向条和宽度W2的横向条构成的T形横截面。通过利用蚀刻掩模的离子束蚀刻，被掩模被覆盖的工件的表面中的区域被施加到其上的离子束选择性地去除。在面罩中，垂直杆具有被侧杆阻挡的区域和再沉积部分。结果，基本上确定图案宽度的工件和垂直条之间的界面附近的垂直条的区域的宽度不变。因此，已经进行了蚀刻的工件的图案的顶部宽度和底部宽度基本上等于掩模的垂直条的宽度W1。该图案的横截面为矩形。

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