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1. 发明授权

US07889339B1 Complementary waveplate rotating compensator ellipsometer 有权
标题翻译：互补波片旋转补偿器椭偏仪
公开(公告)号：US07889339B1
公开(公告)日：2011-02-15
申请号：US12170367
申请日：2008-07-09
申请人： Klaus Flock , Jeff T. Fanton
发明人： Klaus Flock , Jeff T. Fanton
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01J4/00 , G01N2021/213
摘要： Ellipsometry using two waveplates of complementary retardation in a dual rotating compensator configuration is disclosed. Two waveplates of complementary retardation may be used to increase the useful spectral range of a rotating compensator ellipsometer, in particular towards the deep Ultraviolet (UV) spectrum. The improved rotating compensating ellipsometer disclosed herein enables a user to select specific and different waveplate retardations for the purpose of increasing the operating wavelength range of the rotating compensating ellipsometer.
摘要翻译：公开了使用双旋转补偿器配置中的互补延迟的两个波片的椭偏仪。可以使用互补延迟的两个波片来增加旋转补偿椭偏仪的有用光谱范围，特别是对于深紫外（UV）光谱。本文公开的改进的旋转补偿椭偏仪使得用户能够选择特定和不同的波片延迟，以增加旋转补偿椭偏仪的工作波长范围。

2. 发明授权

US09404872B1 Selectably configurable multiple mode spectroscopic ellipsometry 有权
标题翻译：可选择配置的多模光谱椭偏仪
公开(公告)号：US09404872B1
公开(公告)日：2016-08-02
申请号：US13538552
申请日：2012-06-29
申请人： Haiming Wang , Guorong V. Zhuang , Shankar Krishnan , Klaus Flock , Johannes D. de Veer
发明人： Haiming Wang , Guorong V. Zhuang , Shankar Krishnan , Klaus Flock , Johannes D. de Veer
IPC分类号： G01J4/00 , G01N21/55 , G01N21/88 , G01N21/21
CPC分类号： G01N21/8806 , G01N21/211 , G01N21/274 , G01N21/93 , G01N21/9501 , G01N21/95607 , G01N2021/213
摘要： The present invention may include an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light reflected from the surface of the sample, a selectably configurable optical system comprising: a rotatable polarizing element disposed in the illumination arm of the optical system, an analyzing element disposed in the collection arm of the optical system, and a rotatable-translatable compensator element disposed in the collection arm of the optical system, and a control system communicatively configured to selectably configure the optical system in the a rotating compensator (RCSE) mode, a rotating polarizer (RPSE) mode, or a rotating polarizer and compensator (RPRC) mode.
摘要翻译：本发明可以包括被配置为照亮样品的表面的照明源，被配置为检测从样品的表面反射的光的至少一部分的检测器，可选择地配置的光学系统，包括：可旋转偏振元件，其设置在光学系统的照明臂，设置在光学系统的收集臂中的分析元件和设置在光学系统的收集臂中的可旋转平移补偿元件，以及通信地配置为可选择地将光学系统配置在旋转补偿器（RCSE）模式，旋转偏振器（RPSE）模式或旋转偏振器和补偿器（RPRC）模式。

3. 发明授权

US07889340B1 Normal incidence ellipsometer with complementary waveplate rotating compensators 有权
标题翻译：具有互补波片旋转补偿器的正常入射椭偏仪
公开(公告)号：US07889340B1
公开(公告)日：2011-02-15
申请号：US12170371
申请日：2008-07-09
申请人： Klaus Flock , Jeff T. Fanton
发明人： Klaus Flock , Jeff T. Fanton
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01J4/00 , G01N2021/213
摘要： In embodiments of the present invention a second, different waveplate is introduced into a single rotating compensator normal incidence ellipsometer. The second waveplate provides a quarter wavelength retardation that is different from and complementary to that of the first waveplate in order to increase the spectral range for which useful retardation is available, especially towards the deep UV spectrum. The sensitivity for the system may also be increased in the conventional spectral range, since each of the two waveplates may be optimized for its own, somewhat more narrow spectral range of operation. With the proper choice of two waveplates of different retardation, the useful spectral range may be extended from typically 190-820 nm to 150-1000 nm, and beyond if necessary, while increasing the sensitivity within the conventional wavelength range at the same time.
摘要翻译：在本发明的实施例中，将第二不同的波片引入到单个旋转补偿器法向入射椭偏仪中。第二波片提供与第一波片的波长相差和互补的四分之一波长延迟，以便增加有用的延迟可用的光谱范围，特别是对于深紫外光谱。在常规光谱范围内，系统的灵敏度也可能增加，因为两个波片中的每一个可以针对其本身的稍微更窄的光谱操作范围进行优化。通过适当选择不同延迟的两个波片，有用的光谱范围可以从典型的190-820nm扩展到150-1000nm，并且如果需要可以延长，同时在常规波长范围内同时增加灵敏度。

4. 发明授权

US09146156B2 Light source tracking in optical metrology system 有权
标题翻译：光学测量系统中的光源跟踪
公开(公告)号：US09146156B2
公开(公告)日：2015-09-29
申请号：US13285712
申请日：2011-10-31
申请人： Guorong V. Zhuang , Shankar Krishnan , Johannes D. de Veer , Klaus Flock , David Y. Wang , Lawrence D. Rotter
发明人： Guorong V. Zhuang , Shankar Krishnan , Johannes D. de Veer , Klaus Flock , David Y. Wang , Lawrence D. Rotter
IPC分类号： G01B11/26 , G01J3/02 , G01N21/47 , G01J3/06 , G01J3/10
CPC分类号： G01J3/0264 , G01B2210/56 , G01J3/0208 , G01J3/0278 , G01J3/06 , G01J3/10 , G01N21/4785
摘要： The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.
摘要翻译：本发明可以包括将诊断样本加载到样本台上，将来自设置在多轴平台上的照明源的光聚焦到诊断样本上，利用检测器收集从诊断样品的表面反射的一部分光，其中照明源和检测器通过光学系统光学直接耦合，获取指示来自诊断样本的照明源位置漂移的一组诊断参数，通过比较所获取的诊断参数集合来确定照明源位置漂移的大小到在先前测量的对准条件下从诊断样本获得的初始参数集合，确定照明源位置漂移的方向; 以及提供照明源位置调整参数，其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

5. 发明申请

US20130033704A1 LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 有权
标题翻译：光学系统系统中的光源跟踪
公开(公告)号：US20130033704A1
公开(公告)日：2013-02-07
申请号：US13285712
申请日：2011-10-31
申请人： Guorong V. Zhuang , Shankar Krishnan , Johannes D. de Veer , Klaus Flock , David Y. Wang , Lawrence D. Rotter
发明人： Guorong V. Zhuang , Shankar Krishnan , Johannes D. de Veer , Klaus Flock , David Y. Wang , Lawrence D. Rotter
IPC分类号： G01C1/00
CPC分类号： G01J3/0264 , G01B2210/56 , G01J3/0208 , G01J3/0278 , G01J3/06 , G01J3/10 , G01N21/4785
摘要： The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.
摘要翻译：本发明可以包括将诊断样本加载到样本台上，将来自设置在多轴平台上的照明源的光聚焦到诊断样本上，利用检测器收集从诊断样品的表面反射的一部分光，其中照明源和检测器通过光学系统光学直接耦合，获取指示来自诊断样本的照明源位置漂移的一组诊断参数，通过比较所获取的诊断参数集合来确定照明源位置漂移的大小到在先前测量的对准条件下从诊断样本获得的初始参数集合，确定照明源位置漂移的方向; 以及提供照明源位置调整参数，其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

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