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    • 1. 发明授权
    • Bistable element
    • 双稳态元素
    • US08774572B2
    • 2014-07-08
    • US13551245
    • 2012-07-17
    • Kiichi Hamamoto
    • Kiichi Hamamoto
    • G02B6/42
    • G02F3/024G02F1/3523G02F2001/217H01S5/0601H01S5/0653H01S5/1007H01S5/22H01S5/2275
    • A bistable element (100) comprising: a multi-mode interference optical waveguide (1), has two ports on one edge face (1a) thereof, and has one port on the other edge face (1b) thereof; a first group of optical waveguides (2), and each of which is composed of two optical waveguides each having one edge face connected to each port arranged on the one edge face (1a) side of the multi-mode interference optical waveguide (1); and a second group of optical waveguides (3), and each of which is composed of one optical waveguide having one edge face connected to each port arranged on the other edge face (1b) side of the multi-mode interference optical waveguide (1). The multi-mode interference optical waveguide (1) has a saturable absorption region (22) where the absorption coefficient is reduced to cause the saturation of the amount of absorbed light when the intensity of incident light becomes high.
    • 一种双稳态元件(100),包括:多模干涉光波导(1),在其一个边缘面(1a)上具有两个端口,并且在其另一个边缘面(1b)上具有一个端口; 第一组光波导(2),并且每个光波导由两个光波导组成,每个光波导具有连接到布置在多模干涉光波导(1)的一个边缘面(1a)侧的每个端口的一个边缘面, ; 以及第二组光波导(3),其中每一个由一个光波导构成,该光波导具有连接到多模干涉光波导(1)的另一边缘面(1b)侧的每个端口的一个边缘面, 。 多模干涉光波导(1)具有饱和吸收区域(22),其中吸收系数降低时,当入射光的强度变高时,吸收光量的饱和。
    • 2. 发明授权
    • Semiconductor optical integrated circuits and method for fabricating the
same
    • 半导体光集成电路及其制造方法
    • US5770466A
    • 1998-06-23
    • US400570
    • 1995-03-08
    • Tatsuya SasakiMitsuhiro KitamuraKiichi HamamotoShotaro KitamuraKeiro KomatsuYasutaka Sakata
    • Tatsuya SasakiMitsuhiro KitamuraKiichi HamamotoShotaro KitamuraKeiro KomatsuYasutaka Sakata
    • H01S5/026H01S5/0625H01S5/10H01S5/125H01S5/20H01S5/227H01S5/40H01L21/20
    • H01S5/4031H01S5/026H01S5/06256H01S2304/04H01S5/0265H01S5/06258H01S5/1003H01S5/125H01S5/2077H01S5/2272H01S5/4025H01S5/4068H01S5/4087
    • A semiconductor optical monolithic integration device has a semiconductor substrate including an active region and a passive region. Epitaxial layers including a multiple quantum well structure have a variation in band gap energy and thickness along a waveguide direction. The epitaxial layers in the active region are selectively grown by a metal organic vapor phase epitaxy on a first selective growth area defined by a first mask pattern provided in the active region except in the passive region. The first mask pattern has a variation in width along the waveguide direction. The epitaxial layers are simultaneously and non-selectively grown on an entire surface of the passive region by the metal organic vapor phase epitaxy and the epitaxial layers have a mesa structure in the active region and a plane structure in the passive region. A cladding layer having a ridged structure is selectively grown by a metal organic vapor phase epitaxy on a second selective growth area defined by a second mask pattern provided in the active and passive regions. The second mask pattern has a constant width. In the active region, the ridged cladding layer completely embeds the mesa structure epitaxial layers and in the passive region the ridged cladding layer are provided on the plane structure epitaxial layers.
    • 半导体光学单片集成器件具有包括有源区和被动区的半导体衬底。 包括多量子阱结构的外延层具有沿着波导方向的带隙能量和厚度的变化。 有源区中的外延层通过金属有机气相外延选择性地生长在由除了被动区域之外的有源区域中提供的第一掩模图案限定的第一选择性增长区域上。 第一掩模图案沿波导方向具有宽度变化。 外延层通过金属有机气相外延在无源区的整个表面上同时且非选择性地生长,并且外延层在有源区中具有台面结构和在被动区中具有平面结构。 通过在由有源和无源区域中提供的第二掩模图案限定的第二选择性增长区域上的金属有机气相外延选择性地生长具有脊状结构的覆层。 第二掩模图案具有恒定的宽度。 在有源区域中,脊状覆层完全嵌入台面结构外延层,并且在无源区域中,脊状覆层设置在平面结构外延层上。
    • 3. 发明授权
    • Semiconductor optical integrated circuits
    • 半导体光集成电路
    • US5565693A
    • 1996-10-15
    • US179049
    • 1994-01-07
    • Tatsuya SasakiMitsuhiro KitamuraKiichi HamamotoShotaro KitamuraKeiro KomatsuYasutaka Sakata
    • Tatsuya SasakiMitsuhiro KitamuraKiichi HamamotoShotaro KitamuraKeiro KomatsuYasutaka Sakata
    • H01S5/026H01S5/0625H01S5/10H01S5/125H01S5/20H01S5/227H01S5/40H01L33/00
    • H01S5/4031H01S5/026H01S5/06256H01S2304/04H01S5/0265H01S5/06258H01S5/1003H01S5/125H01S5/2077H01S5/2272H01S5/4025H01S5/4068H01S5/4087
    • A semiconductor optical monolithic integration device comprises a semiconductor substrate including an active region and a passive region. Epitaxial layers including a multiple quantum well structure have a variation in band gap energy and thickness along a waveguide direction. The epitaxial layers in the active region are selectively grown by a metal organic vapor phase epitaxy on a first selective growth area defined by a first mask pattern provided in the active region except in the passive region. The first mask pattern has a variation in width along the waveguide direction. The epitaxial layers are simultaneously and non-selectively grown on the entirety of the passive region by metal organic vapor phase epitaxy and epitaxial layers having a mesa structure in the active region and a plane structure in the passive region are formed. A cladding layer having a ridged structure is selectively grown by a metal organic vapor phase epitaxy on a second selective growth area defined by a second mask pattern provided in both the active and passive regions. The second mask pattern has a constant width. In the active region the ridged cladding layer completely embeds the mesa structure epitaxial layers and in the passive region the ridged cladding layer is provided on the plane structure epitaxial layers.
    • 半导体光学单片集成器件包括包括有源区和无源区的半导体衬底。 包括多量子阱结构的外延层具有沿着波导方向的带隙能量和厚度的变化。 有源区中的外延层通过金属有机气相外延选择性地生长在由除了被动区域之外的有源区域中提供的第一掩模图案限定的第一选择性增长区域上。 第一掩模图案沿波导方向具有宽度变化。 外延层通过金属有机气相外延在整个无源区上同时且非选择性地生长,并且在有源区中具有台面结构并形成无源区中的平面结构的外延层。 具有脊状结构的包覆层通过金属有机气相外延选择性地生长在由在有源区域和被动区域中提供的第二掩模图案限定的第二选择性增长区域上。 第二掩模图案具有恒定的宽度。 在有源区域中,脊状覆层完全嵌入台面结构外延层,并且在无源区域中,脊状覆层设置在平面结构外延层上。
    • 4. 发明申请
    • ANALYZING ELEMENT AND ANALYZING APPARATUS USING SAME
    • 分析元件和使用相同的分析仪器
    • US20090103852A1
    • 2009-04-23
    • US12293294
    • 2007-03-16
    • Kiichi Hamamoto
    • Kiichi Hamamoto
    • G02B6/00
    • G01N21/031A61B5/097G01N33/497
    • An analyzing element (10) is provided with a sample chamber (11) into which a gas or liquid sample is introduced; detection light waveguides (12a, 12b) arranged adjacent to the sample chamber (11) for guiding detection light for detecting a sample; and a detection light inputting section (13) for inputting the detection light, which is traveling in a direction along the detection light waveguides (12a, 12b), into the detection light waveguides (12a, 12b) from the end surface of the detection light waveguides (12a, 12b). The detection light waveguides (12a, 12b) have an exposed surface (14) exposed in the sample chamber (11).
    • 分析元件(10)设置有样品室(11),气体或液体样品被引入其中; 与所述样品室(11)相邻布置的用于引导用于检测样品的检测光的检测光波导(12a,12b) 以及检测光输入部(13),用于将沿着检测光波导(12a,12b)的方向行进的检测光从检测光的端面输入到检测光波导(12a,12b) 波导(12a,12b)。 检测光波导(12a,12b)具有暴露在样品室(11)中的暴露表面(14)。
    • 7. 发明授权
    • Semiconductor optical amplifier and semiconductor laser
    • 半导体光放大器和半导体激光器
    • US06813068B2
    • 2004-11-02
    • US10127557
    • 2002-04-23
    • Kiichi Hamamoto
    • Kiichi Hamamoto
    • H01S300
    • H01S5/50H01S5/1064H01S5/227
    • A semiconductor optical amplifier includes (a) a single-mode waveguide region which provides a single-mode to a guided light-wave, (b) a first multi-mode interference waveguide region which has a greater waveguide width than that of the single-mode waveguide region, is optically connected to the single-mode waveguide region, and provides a mode including a multi-mode, to the guided light-wave, and (c) a second multi-mode interference waveguide region which has a greater waveguide width than that of the first multi-mode interference waveguide region, is optically connected to the first multi-mode interference waveguide region, and provides a mode including a multi-mode, to the guided light-wave.
    • 半导体光放大器包括(a)向导光波提供单模的单模波导区域,(b)第一多模干涉波导区域,其波导宽度大于单导波导区域, 模式波导区域光学连接到单模波导区域,并且向导光波提供包括多模的模式,以及(c)具有较大波导宽度的第二多模干涉波导区域 与第一多模干涉波导区域相比,光学连接到第一多模干涉波导区域,并且向引导光波提供包括多模式的模式。
    • 8. 发明申请
    • SUPER-LUMINESCENT LIGHT EMITTING DIODE
    • 超级发光二极管
    • US20100040323A1
    • 2010-02-18
    • US12450347
    • 2008-03-21
    • Kiichi Hamamoto
    • Kiichi Hamamoto
    • G02B6/12G02B6/26
    • H01L33/0045
    • To provide a super luminescent light emitting diode comprising an optical waveguide structure which supplies particularly-high optical output. The super-luminescent light emitting diode includes: a first optical waveguide, of which one end is optically connected to one end of a multimode interference optical waveguide, and of which the other end forms a first light emitting edge; and a second optical waveguide, of which one end is optically connected to the other end of the multimode interference optical waveguide, and of which the other end forms a second light emitting edge. Each of the first and second optical waveguides has a width smaller than the width of the multimode interference optical waveguide.
    • 提供一种包括提供特别高的光输出的光波导结构的超发光发光二极管。 超发光发光二极管包括:第一光波导,其一端光学连接到多模干涉光波导的一端,另一端形成第一发光边缘; 以及第二光波导,其一端光学连接到多模干涉光波导的另一端,另一端形成第二发光边缘。 第一和第二光波导中的每一个具有小于多模干涉光波导的宽度的宽度。
    • 10. 发明授权
    • Semiconductor waveguide photodetector
    • 半导体波导光电探测器
    • US06661960B2
    • 2003-12-09
    • US09135527
    • 1998-08-18
    • Kiichi Hamamoto
    • Kiichi Hamamoto
    • G02B610
    • G02B6/12007G02B6/136G02B6/2813
    • A semiconductor waveguide photodetector having a high receiving efficiency has single mode light transmitted as the incident light signal. The semiconductor waveguide photodetector includes a 1×1 multi mode interference (MMI) light waveguide region, and two single mode waveguide regions, each of which is connected at an end to the multi mode region. The length of the multi mode waveguide region is about 100 &mgr;m and the lengths of the single mode waveguide region are about 10 &mgr;m. The width of multimode waveguide region is 6 &mgr;m and those of single mode waveguide regions are 1.5 &mgr;m. The semiconductor waveguide photodetector detects and filters the incident light in the same material within the multiple mode region.
    • 具有高接收效率的半导体波导光电检测器具有作为入射光信号传输的单模光。 半导体波导光电检测器包括1x1多模干涉(MMI)光波导区域和两个单模波导区域,每个单模波导区域在多模式区域的末端连接。 多模波导区域的长度约为100微米,单模波导区域的长度约为10微米。 多模波导区域的宽度为6μm,单模波导区域的宽度为1.5μm。 半导体波导光电检测器在多模式区域内检测并过滤相同材料中的入射光。