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1. 发明专利

IL231779A Binding molecule having influenza a virus-neutralizing activity produced from human b cell 未知
公开(公告)号：IL231779A
公开(公告)日：2019-01-31
申请号：IL23177914
申请日：2014-03-27
申请人： KI SUNG KWON , KYE SOOK YI , HYUN JOO LEE , JAE WON JEON , HWANG KEUN JUN , MIN SEOK CHANG , CELLTRION INC , SHIN JAE CHANG , CELL TRION INC
发明人： KI SUNG KWON , KYE SOOK YI , HYUN JOO LEE , JAE WON JEON , HWANG KEUN JUN , MIN SEOK CHANG , SHIN JAE CHANG
摘要： The present invention relates to a binding molecule having influenza A virus-neutralizing activity derived from a human B cell, and the binding molecule having the influenza A virus-neutralizing activity, according to the present invention, is a binding molecule that is derived from a B cell that is selected from the blood of a patient infected with an influenza A virus, and has neutralizing activity against influenza A viruses, and thus is useful in preventing and treating disease derived from the influenza A virus, and can be useful in diagnosing the influenza A virus by using the binding molecule according to the present invention.

2. 发明专利

IL241881A Composition comprising at least two influenza a virus-neutralizing-binding molecules 未知
公开(公告)号：IL241881A
公开(公告)日：2021-03-25
申请号：IL24188115
申请日：2015-10-06
申请人： CELLTRION INC , SHIN JAE CHANG , KI SUNG KWON , KYE SOOK YI , SEUNG SUH HONG , SUNG HWAN KIM , EUN BEOM LEE , JAE WON LEE , SO JUNG LEE , JI YOUNG SHIN , MYUNG SAM CHO
发明人： SHIN JAE CHANG , KI SUNG KWON , KYE SOOK YI , SEUNG SUH HONG , SUNG HWAN KIM , EUN BEOM LEE , JAE WON LEE , SO JUNG LEE , JI YOUNG SHIN , MYUNG SAM CHO
IPC分类号： A61K31/13 , A61K31/196 , A61K31/215 , A61K31/4965 , A61K31/7012 , A61K38/16 , A61K38/17 , A61K39/00 , A61K39/395 , A61K45/06 , A61K47/50 , A61K47/68 , A61P31/16 , A61P31/18 , A61P43/00 , C07K16/10 , G01N33/569
摘要： The present invention provides a composition comprising at least two influenza A virus-neutralizing binding molecules that bind to an epitope in the stem region of influenza A virus hemagglutinin (HA) protein, the method comprising: i) a first binding molecule capable of neutralizing at least one influenza A virus subtype selected from the group consisting of H1, H2, H5 and H9; ii) a second binding molecule capable of neutralizing at least one influenza A virus subtype selected from the group consisting of H1, H3, H5, H7 and H9. The mixed composition of the present invention can effectively neutralize the multiple influenza subtypes of both phylogenetic group 1 and phylogenetic group 2 and can be used in combination with a chemical compound. Thus, the composition of the present invention is very useful for the prevention and treatment of a disease by influenza virus.

3. 发明专利

IL231779D0 Binding molecule having influenza a virus-neutralizing activity produced from human b cell 未知
公开(公告)号：IL231779D0
公开(公告)日：2014-05-28
申请号：IL23177914
申请日：2014-03-27
申请人： KI SUNG KWON , KYE SOOK YI , HYUN JOO LEE , JAE WON JEON , HWANG KEUN JUN , MIN SEOK CHANG , CELLTRION INC , SHIN JAE CHANG , CELL TRION INC
IPC分类号： C07K20060101
摘要： The present invention relates to a binding molecule having influenza A virus-neutralizing activity derived from a human B cell, and the binding molecule having the influenza A virus-neutralizing activity, according to the present invention, is a binding molecule that is derived from a B cell that is selected from the blood of a patient infected with an influenza A virus, and has neutralizing activity against influenza A viruses, and thus is useful in preventing and treating disease derived from the influenza A virus, and can be useful in diagnosing the influenza A virus by using the binding molecule according to the present invention.

4. 发明申请

US20090294752A1 HIGHLY INTEGRATED PHASE CHANGE MEMORY DEVICE HAVING MICRO-SIZED DIODES AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：具有微尺寸二极管的高度集成相变存储器件及其制造方法
公开(公告)号：US20090294752A1
公开(公告)日：2009-12-03
申请号：US12344805
申请日：2008-12-29
申请人： Ki Sung Kwon , Jun Hyung Park
发明人： Ki Sung Kwon , Jun Hyung Park
IPC分类号： H01L47/00 , H01L21/336
CPC分类号： H01L27/2463 , H01L27/2409 , H01L45/06 , H01L45/1233 , H01L45/144
摘要： A highly integrated phase change memory device and a method for manufacturing the same is disclosed. The highly integrated phase change memory device includes a semiconductor substrate having a cell area and a peripheral area with impurity regions formed in the cell area and extending in parallel to each other in a first direction to form a striped pattern. A gate electrode is formed in the peripheral area and dummy gate electrodes are formed in the cell area and extending in a second direction perpendicular to the first direction of the impurity regions. An interlayer dielectric layer pattern exposes portions of the cell area and the peripheral area and a PN diode is formed in a space defined by a pair of dummy gate electrodes and a pair of interlayer dielectric layer patterns.
摘要翻译：公开了一种高度集成的相变存储器件及其制造方法。高度集成的相变存储器件包括具有单元区域和外围区域的半导体衬底，其中杂质区域形成在单元区域中并沿着第一方向彼此平行地延伸以形成条纹图案。在周边区域中形成栅电极，在单元区域形成虚拟栅电极，并沿与杂质区第一方向正交的第二方向延伸。层间介质层图案暴露单元区域和周边区域的部分，并且在由一对虚拟栅极电极和一对层间介电层图案限定的空间中形成PN二极管。

5. 发明申请

US20080020295A1 EXPOSURE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME 审中-公开
标题翻译：曝光掩模和使用其制造半导体器件的方法
公开(公告)号：US20080020295A1
公开(公告)日：2008-01-24
申请号：US11617658
申请日：2006-12-28
申请人： Soon Ho Oh , Ki Sung Kwon
发明人： Soon Ho Oh , Ki Sung Kwon
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/26 , G03F1/36
摘要： A method for manufacturing a semiconductor device comprises forming a photoresist pattern by an exposure process with an exposure mask including a shifter pattern and further performing a reflow process on the photoresist pattern to obtain a line/space pattern having a wave type with a uniform a pattern line-width and an improved profile.
摘要翻译：一种制造半导体器件的方法包括通过具有包括移位器图案的曝光掩模的曝光处理形成光致抗蚀剂图案，并进一步对光致抗蚀剂图案进行回流处理，以获得具有均匀图案的波型的线/空间图案线宽和改进的轮廓。

6. 发明授权

US07282969B2 Low divide ratio programmable frequency divider and method thereof 失效
标题翻译：低分频比可编程分频器及其方法
公开(公告)号：US07282969B2
公开(公告)日：2007-10-16
申请号：US11380917
申请日：2006-04-28
申请人： Sung Cheol Shin , Yoo Hwan Kim , Ki Sung Kwon , Soo Woong Lee , Jin Taek Lee , Yo Sub Moon
发明人： Sung Cheol Shin , Yoo Hwan Kim , Ki Sung Kwon , Soo Woong Lee , Jin Taek Lee , Yo Sub Moon
IPC分类号： H03K21/00
CPC分类号： H03K23/68 , H03L7/1978
摘要： The invention provides a low divide ratio programmable frequency divider of a fractional-N type applied to a digital MOPLL tuner and a method thereof. In the invention, a divide ratio assigner assigns divide data as a main divide ratio and a pulse swallow value according to a first or a second dividing operation mode in response to a mode selection signal. A prescaler operates on the first or second divide operation mode in response to the mode selection signal. Also, a main counter divides a frequency from the prescaler by the main divide ratio. Further, a pulse swallow counter counts a clock of the main counter while outputting a pulse swallow signal to the prescaler. The pulse swallow signal has a swallow level if a counting value corresponds to the pulse swallow value, and a non-swallow level if the counting value does not correspond to the pulse swallow value.
摘要翻译：本发明提供一种应用于数字MOPLL调谐器的分数N型的低分频比可编程分频器及其方法。在本发明中，分频比分配器响应于模式选择信号，根据第一或第二分频操作模式分配除数数据作为主分频比和脉冲吞咽值。预分频器响应于模式选择信号在第一或第二除法运算模式下操作。另外，主计数器将预分频器的频率除以主分频比。此外，脉冲吞咽计数器计数主计数器的时钟，同时向预分频器输出脉冲吞咽信号。如果计数值对应于脉冲吞咽值，则脉冲吞咽信号具有吞咽水平，如果计数值与脉冲吞咽值不对应，则为非吞咽水平。

7. 发明授权

US06887852B1 Pharmaceutical preparation of recombinant factor VIII lyophilized without albumin as a stabilizer 有权
标题翻译：重组因子VIII的药物制剂冻干，无白蛋白作为稳定剂
公开(公告)号：US06887852B1
公开(公告)日：2005-05-03
申请号：US10912167
申请日：2004-08-06
申请人： Sang Hoon Paik , Yong Nam Shin , Jean Man Kim , Jae Wook Huh , Jung Sik Lee , Ki Sung Kwon , Ji Hyun Chun
发明人： Sang Hoon Paik , Yong Nam Shin , Jean Man Kim , Jae Wook Huh , Jung Sik Lee , Ki Sung Kwon , Ji Hyun Chun
IPC分类号： A61K38/16 , A61K9/19 , A61K38/37 , A61K47/18 , C07K14/755 , A61K38/00 , A61K35/14 , C12P21/02
CPC分类号： A61K9/19 , A61K38/37 , A61K47/183 , C07K14/755
摘要： Disclosed is a lyophilized preparation of recombinant factor VIII used as a therapeutic preparation of hemophilia A. The lyophilized preparation of recombinant factor VIII is prepared by performing lyophilization using a mixture comprising 6 to 100 mM of L-arginine, 3.5 to 50 mM of L-isoleucine, and 10 to 100 mM of L-glutamic acid as a stabilizer for stabilizing the recombinant factor VIII which exhibits an unstable activity during lyophilization, rather than using human blood derived albumin.
摘要翻译：公开了用作血友病A的治疗制剂的重组因子VIII的冻干制剂。重组因子VIII的冻干制剂通过使用包含6至100mM L-精氨酸，3.5至50mM L- 异亮氨酸和10至100mM的L-谷氨酸作为稳定重组因子VIII的稳定剂，其在冻干期间表现出不稳定的活性，而不是使用人血清白蛋白。

8. 发明授权

US08313876B2 Exposure mask and method for manufacturing semiconductor device using the same 失效
标题翻译：用于制造使用其的半导体器件的曝光掩模和方法
公开(公告)号：US08313876B2
公开(公告)日：2012-11-20
申请号：US12696964
申请日：2010-01-29
申请人： Soon Ho Oh , Ki Sung Kwon
发明人： Soon Ho Oh , Ki Sung Kwon
IPC分类号： G03F1/00 , G03F1/26
CPC分类号： G03F1/26 , G03F1/32 , G03F1/36 , G03F7/40
摘要： A method for manufacturing a semiconductor device comprises forming a photoresist pattern by an exposure process with an exposure mask including a shifter pattern and further performing a reflow process on the photoresist pattern to obtain a line/space pattern having a wave type with a uniform a pattern line-width and an improved profile.
摘要翻译：一种制造半导体器件的方法包括通过具有包括移位器图案的曝光掩模的曝光处理形成光致抗蚀剂图案，并进一步对光致抗蚀剂图案进行回流处理，以获得具有均匀图案的波型的线/空间图案线宽和改进的轮廓。

9. 发明申请

US20100136466A1 EXPOSURE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME 失效
标题翻译：曝光掩模和使用其制造半导体器件的方法
公开(公告)号：US20100136466A1
公开(公告)日：2010-06-03
申请号：US12696964
申请日：2010-01-29
申请人： Soon Ho OH , Ki Sung Kwon
发明人： Soon Ho OH , Ki Sung Kwon
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/26 , G03F1/32 , G03F1/36 , G03F7/40
摘要： A method for manufacturing a semiconductor device comprises forming a photoresist pattern by an exposure process with an exposure mask including a shifter pattern and further performing a reflow process on the photoresist pattern to obtain a line/space pattern having a wave type with a uniform a pattern line-width and an improved profile.
摘要翻译：一种制造半导体器件的方法包括通过具有包括移位器图案的曝光掩模的曝光处理形成光致抗蚀剂图案，并进一步对光致抗蚀剂图案进行回流处理，以获得具有均匀图案的波型的线/空间图案线宽和改进的轮廓。

10. 发明申请

US20100062605A1 METHOD OF FORMING A CONTACT HOLE FOR A SEMICONDUCTOR DEVICE 失效
标题翻译：形成半导体器件接触孔的方法
公开(公告)号：US20100062605A1
公开(公告)日：2010-03-11
申请号：US12493714
申请日：2009-06-29
申请人： Jun Hyung PARK , Ki Sung KWON
发明人： Jun Hyung PARK , Ki Sung KWON
IPC分类号： H01L21/311
CPC分类号： H01L21/3081 , H01L21/3086 , H01L21/76816
摘要： Forming contact holes of a semiconductor device includes forming a reaction layer that is provided with a reaction pattern on a semiconductor substrate. Subsequently, a self-assembled monolayer is formed by injecting a polymer from a functional group that is capable of being chemically bonded to the reaction pattern. A coating layer is then formed on substantially all of the structure that includes the self-assembled monolayer. Afterwards, the contact holes are formed on the semiconductor substrate by performing an etching process.
摘要翻译：形成半导体器件的接触孔包括在半导体衬底上形成具有反应图案的反应层。随后，通过从能够化学键合到反应图案的官能团注入聚合物形成自组装单层。然后在包括自组装单层的基本上所有的结构上形成涂层。之后，通过进行蚀刻处理，在半导体基板上形成接触孔。

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