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1. 发明申请

US20100020395A1 PROJECTION TYPE IMAGE DISPLAY APPARATUS 有权
标题翻译：投影类型图像显示设备
公开(公告)号：US20100020395A1
公开(公告)日：2010-01-28
申请号：US12506883
申请日：2009-07-21
申请人： Norihiro WATANABE , Atsushi Michimori , Kazuo Kadowaki , Takumi Kijima
发明人： Norihiro WATANABE , Atsushi Michimori , Kazuo Kadowaki , Takumi Kijima
IPC分类号： G03B21/60 , G02B27/48
CPC分类号： G03B21/60 , G02B3/08 , G02B5/02 , G02B27/48 , Y10T156/10
摘要： A projection type image display apparatus includes an optical engine that emits a light according to image signal, a Fresnel lens on which the light emitted by the optical engine is incident and emitting the light as a parallel light, and a diffusion member that diffuses the parallel light emitted by the Fresnel lens. The projection type image display apparatus further includes a driving unit that moves the Fresnel lens or the diffusion member in a plane parallel to an emitting surface of the Fresnel lens or the diffusion member, a frame the supports the Fresnel lens, the diffusion member and the driving unit, a resilient supporting body that supports a weight of the Fresnel lens or the diffusion member with respect to the frame, and a holding unit that holds the Fresnel lens or the diffusion member so as to be movable in the plane parallel to the emitting surface of the Fresnel lens or the diffusion member.
摘要翻译：投射型图像显示装置包括：根据图像信号发射光的光学引擎，由光学引擎发射的光入射到其上并将光作为平行光发射的菲涅耳透镜;以及扩散部件，菲涅尔透镜发出的光。投影型图像显示装置还包括驱动单元，该驱动单元使菲涅尔透镜或扩散构件在平行于菲涅尔透镜或扩散构件的发射表面的平面内移动，框架支撑菲涅尔透镜，扩散构件和驱动单元，支撑相对于框架的菲涅耳透镜或扩散构件的重量的弹性支撑体，以及保持单元，其保持菲涅耳透镜或扩散构件，以便能够平行于发射区域的平面中移动菲涅尔透镜或漫射构件的表面。

2. 发明申请

US20090011341A1 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
标题翻译：反射掩蔽空白用于EUV LITHOGRAPHY
公开(公告)号：US20090011341A1
公开(公告)日：2009-01-08
申请号：US12205967
申请日：2008-09-08
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/22
摘要： To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness.A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the absorber layer, the B content is at least 1 at % and less than 5 at %, the Si content is from 1 to 25 at %, and the compositional ratio of Ta to N (Ta:N) is from 8:1 to 1:1.
摘要翻译：为了提供具有吸收层的EUV光刻用的反射掩模板，其对EUV光和图案检查光的波长范围内的光呈现低反射率，并且易于控制以具有所需的膜组成和膜厚度。一种用于EUV光刻的反射掩模板，包括基板和用于反射EUV光的反射层和用于吸收在基板上依次形成的EUV光的吸收层，其中吸收层包含钽（Ta），硼（B），硅（Si）和氮（N），并且在吸收层中，B含量为至少1原子％且小于5原子％，Si含量为1至25原子％，Ta的组成比至N（Ta：N）为8:1至1:1。

3. 发明申请

US20080182183A1 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 有权
标题翻译：反射掩蔽空白用于EUV LITHOGRAPHY
公开(公告)号：US20080182183A1
公开(公告)日：2008-07-31
申请号：US12028250
申请日：2008-02-08
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
IPC分类号： G03F1/00 , G03F7/26
CPC分类号： G03F1/24 , G03F1/46 , G03F1/58
摘要： To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness.A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %, and wherein the absorber layer has a content of N being 0 to at most 35 at. %.
摘要翻译：为了提供EUV光刻用的反射掩模板，其具有在EUV光或光的波长区域具有低反射率的吸收层，用于检查图案，并且易于控制以具有期望的层组成和厚度。用于EUV光刻的反射掩模板，其包括基板，以及反射层，用于反射EUV光和吸收层，以吸收在基板上依次形成的EUV光，其中吸收层包含钽（Ta）和铪（ Hf），并且在吸收层中，Hf的含量为20〜60at。％，Ta的含量为40〜80。％，并且其中所述吸收层的N含量为0至至多35at。％。

4. 发明授权

US5917630A Controlling apparatus for remote control operation 失效
标题翻译：遥控操作控制装置
公开(公告)号：US5917630A
公开(公告)日：1999-06-29
申请号：US658230
申请日：1996-06-04
申请人： Kazuo Kadowaki , Jun Nosaka , Tadamitsu Isonaka , Kouichi Katsumi , Chiaki Nobuoka , Takanori Iida , Akio Kirimura , Mitsue Takamori
发明人： Kazuo Kadowaki , Jun Nosaka , Tadamitsu Isonaka , Kouichi Katsumi , Chiaki Nobuoka , Takanori Iida , Akio Kirimura , Mitsue Takamori
IPC分类号： H04B10/00 , G08C23/04 , H03J9/06 , H04B10/11 , H04B10/114 , H04Q9/00
CPC分类号： G08C23/04 , H03J9/06
摘要： A remote control apparatus for use with an equipment which includes a master apparatus and a slave apparatus remotely located from the master apparatus. The master apparatus transmits a control signal to the slave apparatus so as to remotely control the slave apparatus. The master apparatus has a light-transmitting section therein which projects outwardly of the master apparatus. The light-transmitting section transmits a light signal representing a control signal generated in the master apparatus. The slave apparatus has a light-receiving section therein which receives the light signal. The light-transmitting section may be detachably mounted to the master apparatus. The light-transmitting section may be adapted to rotate relative to the master apparatus after the light-transmitting section has been mounted to the master apparatus. The light-transmitting section may include a plurality of light-emitting elements so that light is emitted over a wide area.
摘要翻译：一种用于与主设备远程定位的主设备和从设备的设备一起使用的遥控设备。主装置向从属装置发送控制信号，以远程控制从装置。主装置在其中具有向主装置向外突出的透光部分。透光部发送表示在主装置中生成的控制信号的光信号。从设备具有接收光信号的光接收部分。光传输部分可以可拆卸地安装到主设备。透光部分可以适于在光传输部分已经安装到主设备之后相对于主设备旋转。透光部可以包括多个发光元件，使得光在广泛的区域上发射。

5. 发明申请

US20110225983A1 COOLING DEVICE 审中-公开
标题翻译：冷却装置
公开(公告)号：US20110225983A1
公开(公告)日：2011-09-22
申请号：US13013115
申请日：2011-01-25
申请人： Takashi Kojima , Taisuke Murata , Kazuo Kadowaki
发明人： Takashi Kojima , Taisuke Murata , Kazuo Kadowaki
IPC分类号： F25B21/02
CPC分类号： H01L23/38 , H01L23/427 , H01L2924/0002 , H01S5/02469 , H01L2924/00
摘要： An object of the present invention is to provide a cooling device that is easy to attach and that ensures intimate contact at a contact surface between a heat absorbing surface of a Peltier element and an object to be cooled and a contact surface between a heat radiating surface of the Peltier element and a cooling part. A cooling device according to the present invention includes a Peltier element having a heat absorbing surface and a heat radiating surface that are opposite each other; a heat absorbing plate having a first Peltier element attaching surface and located with the first Peltier element attaching surface facing the heat absorbing surface of the Peltier element; a heat radiating plate having a second Peltier element attaching surface and located with the second Peltier element attaching surface facing the heat radiating surface of the Peltier element; heat conducting members having viscosity or elasticity and provided between the heat absorbing surface and the first Peltier element attaching surface and between the heat radiating surface and the second Peltier element attaching surface; and a spacer provided between the heat absorbing plate and the heat radiating plate in parallel with the Peltier element and defining an opposing distance between the first and second Peltier element attaching surfaces.
摘要翻译：本发明的一个目的是提供一种容易附着并确保珀尔帖元件的吸热表面与待冷却物体之间的接触表面和与散热表面之间的接触表面的紧密接触的冷却装置的珀耳帖元件和冷却部件。根据本发明的冷却装置包括具有彼此相对的吸热表面和散热表面的珀耳帖元件; 吸热板，其具有第一珀耳帖元件安装表面，并且位于所述第一珀耳帖元件附接表面面对所述珀耳帖元件的吸热表面; 散热板，具有第二珀尔帖元件安装表面，并且位于与珀耳帖元件的散热表面相对的第二珀耳帖元件附接表面; 具有粘性或弹性的导热构件，设置在吸热面与第一珀耳帖元件安装面之间，散热面与第二珀耳帖元件安装面之间; 以及间隔件，其设置在所述吸热板和所述散热板之间，与所述珀耳帖元件平行并且限定所述第一和第二珀耳帖元件附接表面之间的相对距离。

6. 发明授权

US08003282B2 Reflective mask blank for EUV lithography, and substrate with functional film for the mask blank 有权
标题翻译：用于EUV光刻的反光掩模板，以及具有掩模板功能膜的基板
公开(公告)号：US08003282B2
公开(公告)日：2011-08-23
申请号：US12483785
申请日：2009-06-12
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/38 , G21K1/062 , Y10T428/24355
摘要： Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film.A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal state of at least a surface of the conductive film being amorphous, the sheet resistance of the conductive film being at most 27 Ω/□, and the surface roughness (rms) of the conductive film being at most 0.5 nm.
摘要翻译：提供一种具有用于EUV掩模坯料的导电膜的基板，其中防止了由于静电卡盘和基板之间的磨损而产生的颗粒; 以及具有多层反射膜的基板和使用这种具有导电膜的基板的EUV掩模板。具有用于制造用于EUV光刻的反射掩模板的导电膜的基板，含有铬（Cr）和氮（N）的导电膜，导电膜中的N的平均浓度为至少0.1原子％以下 40原子％以上，导电膜的至少表面的晶体状态为无定形，导电膜的薄层电阻为27〜OHgr /□以下，导电膜的表面粗糙度（rms）为最多 0.5nm。

7. 发明授权

US07906259B2 Reflective mask blank for EUV lithography 有权
标题翻译： EUV光刻用反光罩
公开(公告)号：US07906259B2
公开(公告)日：2011-03-15
申请号：US12205967
申请日：2008-09-08
申请人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
发明人： Kazuyuki Hayashi , Kazuo Kadowaki , Takashi Sugiyama , Masaki Mikami
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/22
摘要： To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness. A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the absorber layer, the B content is at least 1 at % and less than 5 at %, the Si content is from 1 to 25 at %, and the compositional ratio of Ta to N (Ta:N) is from 8:1 to 1:1.
摘要翻译：为了提供具有吸收层的EUV光刻用的反射掩模板，其对EUV光和图案检查光的波长范围内的光呈现低反射率，并且易于控制以具有所需的膜组成和膜厚度。一种用于EUV光刻的反射掩模板，包括基板和用于反射EUV光的反射层和用于吸收在基板上依次形成的EUV光的吸收层，其中吸收层包含钽（Ta），硼（B），硅（Si）和氮（N），并且在吸收层中，B含量为至少1原子％且小于5原子％，Si含量为1至25原子％，Ta的组成比至N（Ta：N）为8:1至1:1。

8. 发明授权

US07189460B2 High reflectance mirror 失效
标题翻译：高反射镜
公开(公告)号：US07189460B2
公开(公告)日：2007-03-13
申请号：US10875270
申请日：2004-06-25
申请人： Naoko Shin , Takuji Oyama , Kazuo Kadowaki
发明人： Naoko Shin , Takuji Oyama , Kazuo Kadowaki
IPC分类号： B32B9/00
CPC分类号： G02B5/0858 , C23C14/024 , C23C14/086 , Y10T428/31678
摘要： A high reflectance mirror having a high reflectance in a visible-light region, being excellent in durability such as a moisture resistance, a saltwater resistance, etc. and having small dependence on incident angle (i.e., the fluctuation of the reflectance depending on an incident angle of light is little) is provided.The high reflectance mirror comprises a substrate and a silver film, a low refractive index film and a high refractive index film laminated on the substrate in this order wherein an adhesion improving film is formed on the silver film surface on the opposite side of the substrate, the extinction coefficient of the low refractive index film is at most 0.01, the extinction coefficient of the high refractive index film is at most 0.01, the adhesion improving film is an oxide film and the extinction coefficient of the adhesion improving film is at most 0.1.
摘要翻译：在可见光区域具有高反射率的高反射率反射镜，耐湿性，耐盐水性等耐久性优异并且对入射角的依赖性小（即，取决于事件的反射率的波动）光的角度很小）。高反射镜包括基板和基板上层叠有低折射率膜和高折射率膜的基板，在该基板的相反侧的银膜表面上形成有粘附改善膜，低折射率膜的消光系数为0.01以下，高折射率膜的消光系数为0.01以下，粘合改善膜为氧化膜，粘合改善膜的消光系数为0.1以下。

9. 发明申请

US20110194578A1 LASER LIGHT-SOURCE APPARATUS AND PROJECTOR APPARATUS 有权
标题翻译：激光灯装置和投影仪
公开(公告)号：US20110194578A1
公开(公告)日：2011-08-11
申请号：US13021108
申请日：2011-02-04
申请人： Tatsuro HIROSE , Taisuke Murata , Kazuo Kadowaki
发明人： Tatsuro HIROSE , Taisuke Murata , Kazuo Kadowaki
IPC分类号： H01S3/04
CPC分类号： H01S5/02469 , H01S5/02208 , H01S5/02256 , H01S5/02292 , H01S5/4093 , H04N9/3129 , H04N9/3144 , H04N9/3161
摘要： A laser light-source apparatus according to the present invention is equipped with: a laser-driving circuit board, thermal insulators that are placed on the laser-driving circuit board; a heat receiving plate that is placed on the thermal insulators and thermally insulated from the laser-driving circuit board, a laser light-source module that is installed on the heat receiving plate so as to be thermally connected to the heat receiving plate and is also electrically connected to the laser-driving circuit board so as to be driven thereby, and a heat sink that is thermally connected to the heat receiving plate via a heat pipe.
摘要翻译：根据本发明的激光光源装置装备有：激光驱动电路板，放置在激光驱动电路板上的绝热体; 放置在热绝缘体上并与激光驱动电路板热绝缘的热接收板，安装在受热板上以与热接收板热连接的激光光源模块，也是电连接到激光驱动电路板以被驱动，以及散热器，其通过热管与热接收板热连接。

10. 发明申请

US20100328622A1 PROJECTION DISPLAY APPARATUS 审中-公开
标题翻译：投影显示设备
公开(公告)号：US20100328622A1
公开(公告)日：2010-12-30
申请号：US12732776
申请日：2010-03-26
申请人： Norihiro WATANABE , Satoru Okagaki , Atsushi Michimori , Norichika Sugano , Kazuo Kadowaki , Tomomi Matsui
发明人： Norihiro WATANABE , Satoru Okagaki , Atsushi Michimori , Norichika Sugano , Kazuo Kadowaki , Tomomi Matsui
IPC分类号： G03B21/10
CPC分类号： G03B21/10
摘要： A projection image display apparatus is provided which is capable of preventing misregistration in an on-screen image. A main frame assembly holds together an optical engine that modulates light emitted from a light source and a screen on which light emitted from the optical engine is projected, and the main frame assembly is configured to be supported by a bottom frame formed by a separate structure, whereby distortion having occurred at the bottom frame is caused not to transmit to the main frame assembly.
摘要翻译：提供了能够防止屏幕上图像不对准的投影图像显示装置。主框架组件将调制从光源发出的光和从光学引擎发射的光投射的屏幕的光学引擎固定在一起，并且主框架组件被构造成由由单独的结构形成的底部框架支撑使得在底部框架处发生的变形不会传递到主框架组件。

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