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1. 发明公开

EP2834832A2 INTEGRATED OPTICAL AND CHARGED PARTICLE INSPECTION APPARATUS 有权转让
标题翻译： INTEGRIERTE OPTISCHE INSPEKTIONSVORRICHTUNGFÜRGELADENE TEILCHEN
公开(公告)号：EP2834832A2
公开(公告)日：2015-02-11
申请号：EP13728546.6
申请日：2013-04-02
申请人： Delmic B.V. , Hoogenboom, Jacob Pieter , Kruit, Pieter , Liv, Nalan M. Sc , Zonnevylle, Aernout Christian
发明人： HOOGENBOOM, Jacob Pieter , KRUIT, Pieter , LIV, Nalan M. SC , ZONNEVYLLE, Aernout Christian
IPC分类号： H01J37/22
CPC分类号： H01J37/222 , G01C21/32 , G01C21/3484 , H01J37/22 , H01J37/226 , H01J37/228 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2806
摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.
摘要翻译：用于检查样品的装置装备有带电粒子柱，用于产生聚焦的带电粒子束以观察或改变样品，以及光学显微镜以观察样品上的感兴趣区域，如通过带电粒子束或相反亦然。该装置容纳有一个处理单元，该处理单元适于和装备以表示用柱产生的图像和用显微镜产生的图像。该单元还适于执行将图像中的一个图像中的感兴趣区域相互关联的对准过程，其中对准过程涉及检测由带电粒子束引起的光学图像的变化。

2. 发明申请

WO2013151421A2 INTEGRATED OPTICAL AND CHARGED PARTICLE INSPECTION APPARATUS 审中-公开
标题翻译：集成的光学和带电粒子检测设备
公开(公告)号：WO2013151421A2
公开(公告)日：2013-10-10
申请号：PCT/NL2013000019
申请日：2013-04-02
申请人： DELMIC B V , HOOGENBOOM JACOB PIETER , KRUIT PIETER , LIV NALAN M SC , ZONNEVYLLE AERNOUT CHRISTIAN
发明人： HOOGENBOOM JACOB PIETER , KRUIT PIETER , LIV NALAN M SC , ZONNEVYLLE AERNOUT CHRISTIAN
CPC分类号： H01J37/222 , G01C21/32 , G01C21/3484 , H01J37/22 , H01J37/226 , H01J37/228 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2806
摘要： The invention relates to an apparatus for inspecting a sample, equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa, the apparatus accommodated with a processing unit adapted and equipped for representing an image as generated with said column and an image as generated with said microscope, the unit further adapted for performing an alignment procedure mutually correlating a region of interest in one of said images wherein the alignment procedure involves detecting a change in the optical image as caused therein by the charged particle beam.
摘要翻译：本发明涉及一种用于检查样本的设备，该设备配备有带电粒子柱以产生带电粒子的聚焦束以观察或修改样本，以及用于观察样本上的感兴趣区域的光学显微镜，如由所述装置容纳有处理单元，所述处理单元适于并配备为表示由所述柱产生的图像和由所述显微镜产生的图像，所述单元还适于执行对准过程，所述对准过程使感兴趣区域在所述图像之一中，其中所述对准过程包括检测由所述带电粒子束引起的光学图像的变化。

3. 发明申请

WO2012165955A4 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 审中-公开
标题翻译：带电粒子多波束装置
公开(公告)号：WO2012165955A4
公开(公告)日：2013-04-04
申请号：PCT/NL2012050376
申请日：2012-05-30
申请人： MAPPER LITHOGRAPHY IP BV , ZONNEVYLLE AERNOUT CHRISTIAAN , KRUIT PIETER
发明人： ZONNEVYLLE AERNOUT CHRISTIAAN , KRUIT PIETER
IPC分类号： H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
摘要翻译：本发明涉及用于在带电粒子多小波束装置中操纵多个带电粒子小射束中的一个或多个带电粒子束的方法和设备。该操纵器装置包括平面衬底，该平面衬底包括在衬底的平面中的一排通孔，这些通孔中的每一个被布置用于使至少一个带电粒子小射束通过，其中每个通孔设置有一个或布置在通孔周围的更多电极以及用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置为通过开口为每个个体的一个或多个电极提供at 至少基本上模拟可调电压。

4. 发明申请

WO2006126872A1 APPARATUS FOR THE GENERATION OF PARALLEL BEAMLETS 审中-公开
标题翻译：并联光束产生装置
公开(公告)号：WO2006126872A1
公开(公告)日：2006-11-30
申请号：PCT/NL2006/000260
申请日：2006-05-24
申请人： TECHNISCHE UNIVERSITEIT DELFT , KRUIT, Pieter , DRUGGEN, Matheus, Johannes van
发明人： KRUIT, Pieter , DRUGGEN, Matheus, Johannes van
IPC分类号： H01J37/04 , H01J37/30 , H01J37/26
CPC分类号： H01J37/3007 , H01J37/04 , H01J37/26 , H01J2237/31774
摘要： The invention relates to an apparatus for the generation of parallel beamlets, comprising a source for particles or radiation, a collimator and, placed between the source and the collimator, a beam splitter for dividing the beam from the source into beamlets, wherein a first macrolens is provided between the source and the beam splitter for forming a substantially parallel beam of rays or beam of particles, and in that between the beam splitter and the collimator, immediately after the beam splitter, a second macro- lens is provided.
摘要翻译：本发明涉及一种用于产生平行子束的装置，其包括用于粒子或辐射的源，准直器，以及放置在源极和准直器之间的分束器，用于将来自光源的光束分成子束，其中第一光束设置在源和分束器之间，用于形成基本上平行的射线束或粒子束，并且在分束器和准直器之间，在分束器之后，提供第二宏观透镜。

5. 发明申请

WO2006096052A3 MICRO X-RAY SOURCE 审中-公开
公开(公告)号：WO2006096052A3
公开(公告)日：2006-09-14
申请号：PCT/NL2006/000118
申请日：2006-03-08
申请人： TECHNISCHE UNIVERSITEIT DELFT , KRUIT, Pieter , HAGEN, Cornelis, Wouter , MULDER, Elvira, Hendrika
发明人： KRUIT, Pieter , HAGEN, Cornelis, Wouter , MULDER, Elvira, Hendrika
IPC分类号： H01J35/08 , H01J35/12
摘要： The invention relates to a micro X-ray source comprising a target acting as anode, and a cathode, which during operation interacts with the target and functions as electron source, wherein the target is embodied as a metal foil possessing a spot where the electrons from the electron source arrive, the metal foil being locally thinner at the spot.

6. 发明申请

WO2004107050A3 CHARGED PARTICLE BEAMLET EXPOSURE SYSTEM 审中-公开
标题翻译：充电颗粒光束曝光系统
公开(公告)号：WO2004107050A3
公开(公告)日：2005-04-21
申请号：PCT/NL2004000381
申请日：2004-05-27
申请人： MAPPER LITHOGRAPHY IP BV , KRUIT PIETER , WIELAND MARCO JAN-JACO
发明人： KRUIT PIETER , WIELAND MARCO JAN-JACO
IPC分类号： H01J37/08 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/045 , H01J2237/0453 , H01J2237/0492 , H01J2237/1501
摘要： The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising: - a first aperture means comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam for forming a charged particle beamlet; - a lens system comprising at least one lens for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens; - a deflector means, substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, and - a second aperture means comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.
摘要翻译：本发明涉及一种用于带电粒子束曝光装置的带电粒子光学系统，所述系统包括： - 第一孔径装置，其包括至少第一基本上圆形的孔，用于部分屏蔽发射的带电粒子束以形成带电粒子束 ; - 透镜系统，包括至少一个透镜，用于聚焦所述透镜的图像焦平面内或附近的来自所述第一孔的带电粒子束; - 基本上位于所述图像焦平面中的偏转器装置，包括至少一个子束偏转器，用于在接收到控制信号时偏转通过的带电粒子子束;以及 - 第二孔装置，包括至少一个第二基本上圆形的孔定位在第一孔的共轭平面中，并且所述第二孔与所述第一孔和所述小梁偏转器对准，用于在所述子束偏转器偏转时阻挡所述带电粒子子束，否则传递。

7. 发明申请

WO2012165955A2 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 审中-公开
标题翻译：充电颗粒多波束装置
公开(公告)号：WO2012165955A2
公开(公告)日：2012-12-06
申请号：PCT/NL2012/050376
申请日：2012-05-30
申请人： MAPPER LITHOGRAPHY IP B.V. , ZONNEVYLLE, Aernout Christiaan , KRUIT, Pieter
发明人： ZONNEVYLLE, Aernout Christiaan , KRUIT, Pieter
IPC分类号： H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
摘要翻译：本发明涉及一种用于在带电粒子多子束装置中操纵多个带电粒子束的一个或多个带电粒子束的方法和装置。所述操纵器装置包括平面基板，所述平面基板包括在所述基板的平面中的通孔的阵列，这些通孔中的每一个布置成使所述至少一个带电粒子束通过，其中每个所述通孔开有一个或布置在通孔周围的更多电极和用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置用于通过开口提供每个个体的一个或多个电极，最小的模拟可调电压。

8. 发明申请

WO2012062854A1 LITHOGRAPHY SYSTEM AND METHOD OF REFRACTING 审中-公开
标题翻译：折射系统和折射方法
公开(公告)号：WO2012062854A1
公开(公告)日：2012-05-18
申请号：PCT/EP2011/069840
申请日：2011-11-10
申请人： MAPPER LITHOGRAPHY IP B.V. , VAN VEEN, Alexander, Hendrik, Vincent , ZHANG, Yanxia , BERGLUND, Gun Sari Mari , KRUIT, Pieter
发明人： VAN VEEN, Alexander, Hendrik, Vincent , ZHANG, Yanxia , BERGLUND, Gun Sari Mari , KRUIT, Pieter
IPC分类号： H01J37/04 , H01J37/22 , H01J37/317 , H01J37/09 , H01J37/24
CPC分类号： H01J37/09 , H01J2237/002 , H01J2237/0453 , H01J2237/1534 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
摘要翻译：一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。

9. 发明申请

WO2011034428A1 CHARGED PARTICLE OPTICAL SYSTEM WITH MULTIPLE BEAMS 审中-公开
标题翻译：带有多光束的带电粒子光学系统
公开(公告)号：WO2011034428A1
公开(公告)日：2011-03-24
申请号：PCT/NL2010/050603
申请日：2010-09-17
申请人： MAPPER LITHOGRAPHY IP B.V. , KRUIT, Pieter , ZONNEVYLLE, Aernout, Christiaan
发明人： KRUIT, Pieter , ZONNEVYLLE, Aernout, Christiaan
IPC分类号： H01J37/317 , H01J37/147
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line,said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets,wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis,wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及多束带电粒子光学系统，其包括：用于产生多个带电粒子子束的带电粒子源，以及用于将来自带电粒子源的带电粒子子束朝向目标，其中每个带电粒子小射束限定小射束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦对应的并且其中每个小透镜限定小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中对应的带电粒子小射束的小射束中心线穿过所述带电粒子小射束离轴小静电小透镜与小透镜光轴相距一定距离。

10. 发明申请

WO2009106397A1 PROJECTION LENS ARRANGEMENT 审中-公开
标题翻译：投影镜头布置
公开(公告)号：WO2009106397A1
公开(公告)日：2009-09-03
申请号：PCT/EP2009/050843
申请日：2009-01-26
申请人： MAPPER LITHOGRAPHY IP B.V. , WIELAND, Jan, Jaco , KAMPHERBEEK, Bert, Jan , VAN VEEN, Alexander, Hendrik, Vincent , KRUIT, Pieter , STEENBRINK, Stijn, Willem, Herman, Karel
发明人： WIELAND, Jan, Jaco , KAMPHERBEEK, Bert, Jan , VAN VEEN, Alexander, Hendrik, Vincent , KRUIT, Pieter , STEENBRINK, Stijn, Willem, Herman, Karel
IPC分类号： H01J37/12 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/3177 , H01J2237/0435 , H01J2237/1205 , H01J2237/121 , H01J2237/151
摘要： A projection lens arrangement (10) for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates (12, 13, 14) and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses. The projection lens systems are arranged at a pitch in the range of about 1 to 3 times the diameter of the plate apertures, and each projection lens system is for demagnifying and focusing one or more of the charged particle beamlets (21) on to the target plane, each projection lens system has an effective focal length in the range of about 1 to 5 times the pitch, and demagnifies the charged particle beamlets by at least 25 times.
摘要翻译：一种用于带电粒子多子束系统的投影透镜装置（10），所述投影透镜装置包括一个或多个板（12,13,14）和一个或多个投影透镜阵列。每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。投影透镜系统以等于板孔直径的1至3倍的间距布置，并且每个投影透镜系统用于将一个或多个带电粒子子束（21）放大并聚焦到目标上平面，每个投影透镜系统具有在距离的约1至5倍的范围内的有效焦距，并且将带电粒子子束减小至少25倍。

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