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1. 发明申请

WO2013024234A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体加工设备
公开(公告)号：WO2013024234A1
公开(公告)日：2013-02-21
申请号：PCT/GB2011/051546
申请日：2011-08-16
申请人： P2i LTD , COULSON, Stephen Richard , HOPPER, Fred , KING, Charles Edmund
发明人： COULSON, Stephen Richard , HOPPER, Fred , KING, Charles Edmund
IPC分类号： H01J37/32
CPC分类号： H01J37/32137 , H01J37/32155 , H01J37/32165 , H01J37/32541 , H01J37/32577 , H01J37/32935 , H01J2237/3323 , H01J2237/3325
摘要： The present invention relates to an apparatus (10) for plasma processing an article (12), the apparatus comprising: a chamber (14) for receiving an article to be processed; electrode means (16) for generating an electric field in said chamber for establishing a plasma in said chamber so that said article can be processed; generation means (24) for generating alternating electrical energy for transmission to said electrode means (18); connection means for connecting said generation means to said electrode means (20); and control means for varying the location of nodes and anti- nodes of standing waves generated in said chamber during processing, so that a plurality of standing waves are generated over time which are not coincident with one another.
摘要翻译：本发明涉及一种用于等离子体处理物品（12）的设备（10），该设备包括：用于接收待处理物品的室（14）电极装置（16），用于在所述腔室中产生电场，用于在所述腔室中建立等离子体，从而可以对所述制品进行加工; 用于产生用于传输到所述电极装置（18）的交替电能的发生装置（24）; 用于将所述产生装置连接到所述电极装置的连接装置; 以及用于在处理期间改变在所述室中产生的驻波的节点和反节点的位置的控制装置，使得随着时间不同而产生多个驻波而不是彼此重合。

2. 发明申请

WO2010046636A3 VACUUM PROCESSING APPARATUS 审中-公开
公开(公告)号：WO2010046636A3
公开(公告)日：2010-04-29
申请号：PCT/GB2009/002499
申请日：2009-10-19
申请人： P2I LIMITED , KING, Charles, Edmund
发明人： KING, Charles, Edmund
IPC分类号： C23C14/56 , B01J3/00 , A43B1/00 , H01J37/32
摘要： The present invention relates to an apparatus (10) for vacuum processing articles (12). The apparatus comprises a processing region (14) in which articles can be vacuum processed at a processing pressure and a loading region (18) into which articles can be loaded into the apparatus at ambient pressure. A plurality of article carriers (20) are provided for carrying articles from the loading region to the processing region along an enclosed passage (24) so that articles can be vacuum processed. The carriers (20) comprise respective sealing means (26) for sealing against an inner surface of the passage when carrying articles along the passage. The sealing means (26) resist the flow of gas or vapour past the sealing means along the passage from the loading region to the processing region so that articles loaded at ambient pressure in the loading region and carried to the processing region can be vacuum processed at processing pressure.

3. 发明申请

WO1993012190A1 CONDUCTIVE ADHESIVE COMPOSITIONS BASED ON THERMALLY DEPOLYMERISABLE POLYMERS 审中-公开
标题翻译：基于热可聚合聚合物的导电粘合剂组合物
公开(公告)号：WO1993012190A1
公开(公告)日：1993-06-24
申请号：PCT/GB1992002290
申请日：1992-12-10
申请人： COOKSON GROUP PLC , WAGLAND, Alison, Mary , PRICE, Andrew, David , PATERSON, Geoffrey, Andrew , KING, Charles, Edmund , SOUTAR, Andrew, M'Intosh
发明人： COOKSON GROUP PLC
IPC分类号： C09J169/00
CPC分类号： H01L24/29 , C08L2666/54 , C09J167/02 , C09J169/00 , C09J201/00 , H01B1/20 , H01B1/22 , H01B1/24 , H01L23/4828 , H01L24/83 , H01L2224/29 , H01L2224/29101 , H01L2224/2919 , H01L2224/2929 , H01L2224/29339 , H01L2224/29386 , H01L2224/8319 , H01L2224/838 , H01L2924/00013 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01023 , H01L2924/01029 , H01L2924/01047 , H01L2924/0105 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/0781 , H01L2924/10253 , H01L2924/14 , H05K3/321 , H01L2924/00 , H01L2924/3512 , H01L2924/00014 , H01L2924/05032 , H01L2224/29099 , H01L2224/29199 , H01L2224/29299
摘要： An electrically or thermally conductive adhesive composition which comprises at least one thermally depolymerisable polymer which decomposes to volatile or gaseous products at a temperature in the range of from 100 DEG C to 350 DEG C and silver, gold, aluminium nitride, alumina, aluminium, copper, nickel, silicon, diamond or silver coated-particles, or a mixture thereof.
摘要翻译：一种导电或导热的粘合剂组合物，其包含至少一种在100℃至350℃的温度范围内分解为挥发性或气态产物的可热解聚合的聚合物，以及银，金，氮化铝，氧化铝，铝，铜，镍，硅，金刚石或银涂层颗粒，或其混合物。

4. 发明申请

WO1993011905A1 SOLDER PASTE FORMULATIONS FOR USE IN THE ELECTRONICS INDUSTRY 审中-公开
标题翻译：用于电子工业的焊膏配方
公开(公告)号：WO1993011905A1
公开(公告)日：1993-06-24
申请号：PCT/GB1992002214
申请日：1992-11-30
申请人： COOKSON GROUP PLC , PATERSON, Geoffrey, Andrew , KING, Charles, Edmund , MACKIE, Andrew, Christopher
发明人： COOKSON GROUP PLC
IPC分类号： B23K35/36
CPC分类号： B23K35/3612 , B23K35/22
摘要： A stable solder paste or cream for use in the electronics industry which comprises: i) a nonaqueous vehicle; and ii) a solder power filler material, characterized in that the vehicle is an emulsion of two or more immiscible organic liquids of at least 60 vol % disperse phase, one of which liquids is a polar organic solvent, or a mixture thereof, and the other of which liquid is an aliphatic hydrocarbon, or a mixture thereof, and in that the solder paste or cream mixture, when reflowed at a temperature in the range of up to 270 DEG C, yields less than 2.5 wt % organic residues based on the weight of the solder paste or cream.
摘要翻译：用于电子工业的稳定的焊膏或霜剂，其包括：i）非水性载体; 和ii）焊料功率填充材料，其特征在于，所述载体是两种或更多种至少60体积％分散相的不混溶有机液体的乳液，其中一种液体是极性有机溶剂或其混合物，并且其他液体是脂族烃或其混合物，并且当焊膏或奶油混合物在高达270℃的温度下回流时，产生小于2.5重量％的有机残余物，基于锡膏或奶油的重量。

5. 发明申请

WO2013024235A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体加工设备
公开(公告)号：WO2013024235A1
公开(公告)日：2013-02-21
申请号：PCT/GB2011/051548
申请日：2011-08-16
申请人： P2I LTD , KING, Charles Edmund
发明人： KING, Charles Edmund
IPC分类号： H01J37/32 , C23C16/509
CPC分类号： H01J37/32082 , H01J37/32165 , H01J37/32376 , H01J2237/3323 , H01J2237/3325
摘要： The present invention relates to an apparatus (10) for plasma processing an article(12), the apparatus comprisingra chamber(14) for receiving an article to be processed; electrode means (16) for generating an electricand/or magneticfield in said chamberwhen energised by alternating electrical energyfor establishing a plasma in said chamber so that said article can be processed; andvarying frequency generatingmeans (20) for generating alternating electrical energy for transmission tothe electrode means, said alternating electrical energy being generated at a plurality of different frequencies in succession, one frequency after another frequency, thereby producing a succession of standing waves in said chamber of a plurality of different wavelengths.
摘要翻译：本发明涉及一种用于等离子体处理物品（12）的设备（10），该设备包括用于接收待处理物品的室（14）电极装置（16），用于当通过交替的电能激发时在所述室中产生电和/或磁场，以在所述室中建立等离子体，使得可以处理所述制品; 和用于产生用于传输到电极装置的交替电能的变化频率产生装置（20），所述交替电能以多个不同的频率连续产生，一个频率再次频率，从而在所述腔室中产生一系列驻波多个不同的波长。

6. 发明申请

WO2009040542A2 VAPOUR DELIVERY SYSTEM 审中-公开
标题翻译：蒸汽输送系统
公开(公告)号：WO2009040542A2
公开(公告)日：2009-04-02
申请号：PCT/GB2008/003271
申请日：2008-09-25
申请人： P2I LIMITED , COULSON, Stephen, Richard , KING, Charles, Edmund
发明人： COULSON, Stephen, Richard , KING, Charles, Edmund
IPC分类号： C23C16/448
CPC分类号： C23C16/4485 , B05D1/60 , B05D1/62 , Y10T137/0318 , Y10T137/86187
摘要： A delivery system (10) for delivering species to a processing chamber (14) for imparting a desired surface property to one or more large items - such as shoes - comprises: a first container (16) for filling with liquid species; a second container (18) for receiving liquid species from the first container (16); a first flow control means (20) for controlling a volume of liquid species which is allowed to flow from the first container to the second container (18); evaporation means (30) for evaporating liquid species in the second container; and a second flow control means (38) for controlling flow of evaporated species from the second container (18) to a processing chamber (14).
摘要翻译：用于将物质输送到处理室（14）以将一个或多个大物品（例如鞋子）赋予期望表面特性的递送系统（10）包括：用于填充液体物种的第一容器（16）用于从第一容器（16）接收液体物质的第二容器（18）; 用于控制允许从第一容器流到第二容器（18）的液体物质的体积的第一流量控制装置（20）; 用于蒸发第二容器中的液体物质的蒸发装置（30）以及第二流量控制装置（38），用于控制从第二容器（18）到处理室（14）的蒸发物质的流动。

7. 发明申请

WO2009040536A1 VAPOUR DELIVERY SYSTEM 审中-公开
标题翻译：蒸汽输送系统
公开(公告)号：WO2009040536A1
公开(公告)日：2009-04-02
申请号：PCT/GB2008/003257
申请日：2008-09-25
申请人： P2I LIMITED , COULSON, Stephen, Richard , KING, Charles, Edmund
发明人： COULSON, Stephen, Richard , KING, Charles, Edmund
IPC分类号： C23C16/448
CPC分类号： C23C16/4485
摘要： A delivery system (10) for delivering species (12) to a processing chamber (14), so as to coat the surface of a large item, thereby imparting specific properties thereto, comprises: a species container (16) for containing species supplied from a source (18) of liquid species; evaporation means (20) for evaporating liquid species in said container; flow guide means (22, 24) for guiding flow of evaporated species to a processing chamber; and monitoring means (28) for measuring a rate over time of evaporation of species from said container so that flow of evaporated species delivered to said processing chamber can be monitored.
摘要翻译：一种用于将物质（12）输送到处理室（14）以便涂覆大件物品的表面从而赋予其特定性能的输送系统（10）包括：物料容器（16），用于容纳从液体物质来源（18）用于蒸发所述容器中的液体物质的蒸发装置（20）用于将蒸发的物质的流引导到处理室的流动引导装置（22,24）以及用于测量来自所述容器的物质蒸发时间的速率的监测装置（28），从而可以监测输送到所述处理室的蒸发物质流。

8. 发明申请

WO2009010753A2 PLASMA DEPOSITION APPARATUS 审中-公开
标题翻译：等离子体沉积装置
公开(公告)号：WO2009010753A2
公开(公告)日：2009-01-22
申请号：PCT/GB2008/002440
申请日：2008-07-17
申请人： P2I LIMITED , COULSON, Stephen, Richard , KING, Charles, Edmund
发明人： COULSON, Stephen, Richard , KING, Charles, Edmund
IPC分类号： B05D7/24
CPC分类号： H01J37/32449 , B05D1/62 , C23C16/4412 , C23C16/507 , C23C16/54 , Y10T428/31504
摘要： Apparatus (10) for coating a surface of an article (14) with a thin film polymer layer by plasma deposition, the apparatus comprising: a plurality of processing chambers (12a, 12b, 12c....12n) into each of which one or more articles can be placed; means (18, 19, 20, 21, 22) for supplying an active species to said processing chambers for forming a plasma in said chambers; a plurality of induction means (24) associated with respective processing chambers, each induction means being operable to induce an electrical field internally of an associated processing chamber for forming a plasma when said active species is supplied thereto so that a surface of said article can be coated with a thin film polymer layer by plasma deposition; means (26) for providing a time varying electric current in the induction means; and pressure control means (28) for selectively controlling pressure in said processing chambers such that pressure in any one or more of said chambers can be controlled independently of pressure in other of said chambers.
摘要翻译：用于通过等离子体沉积用薄膜聚合物层涂覆物品（14）的表面的设备（10），所述设备包括：多个处理室（12a，12b，12c ... 12n），其中每个处理室或更多的物品可以放置; 用于向所述处理室供应活性物质以在所述室中形成等离子体的装置（18,19,20,21,22）; 多个与相应处理室相关联的感应装置（24），每个感应装置可操作以在所述活性物质被供应时在相关联的处理室的内部感应电场，以形成等离子体，使得所述制品的表面可以通过等离子体沉积涂覆薄膜聚合物层; 用于在感应装置中提供时变电流的装置（26）; 以及用于选择性地控制所述处理室中的压力的压力控制装置（28），使得可以独立于所述其它室中的压力来控制任何一个或多个所述室中的压力。

9. 发明申请

WO2012017305A1 MANUFACTURE OF HIGH DENSITY INDIUM TIN OXIDE (ITO) SPUTTERING TARGET 审中-公开
标题翻译：高密度氧化锡（ITO）溅射靶的制造
公开(公告)号：WO2012017305A1
公开(公告)日：2012-02-09
申请号：PCT/IB2011/001818
申请日：2011-08-05
申请人： ADVANCED TECHNOLOGY MATERIALS LIMITED , BALUCH, Dosten , KING, Charles, Edmund
发明人： BALUCH, Dosten , KING, Charles, Edmund
IPC分类号： C23C14/35 , C23C14/08
CPC分类号： C23C14/3414 , C04B35/457 , C04B35/6261 , C04B35/6263 , C04B2235/32 , C04B2235/3286 , C04B2235/3293 , C04B2235/3294 , C04B2235/3298 , C04B2235/3409 , C04B2235/44 , C04B2235/446 , C04B2235/447 , C04B2235/5409 , C04B2235/6027 , C04B2235/606 , C04B2235/6585 , C04B2235/77 , C23C14/086
摘要： A process for manufacturing indium tin oxide (ITO) sputtering targets is provided. The process includes: precipitating indium and tin hydroxides, calcining the hydroxides to produce granulated ITO powder, preparing an aqueous slurry of the ITO powder with additives such as special sintering aids, dispersing agent and binders, milling the slurry to obtain a slip, preparing compacted ITO green bodies by casting the slip using porous moulds or drying the slip to yield granulated ITO powder and cold isostatic pressing the powder, and sintering the green body to yield ITO target of high density greater than 99% of theoretical.
摘要翻译：提供了制造铟锡氧化物（ITO）溅射靶的工艺。该方法包括：沉淀铟和锡氢氧化物，煅烧氢氧化物以制备粒状ITO粉末，用添加剂如特殊烧结助剂，分散剂和粘合剂制备ITO粉末的水性浆料，研磨浆料以获得滑移，制备压实 ITO生坯通过多孔模具浇铸滑移或干燥滑移以产生粒状ITO粉末和冷等静压压粉，并烧结生坯以产生高于理论值的99％的高密度ITO靶。

10. 发明申请

WO2010046636A2 VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：真空处理装置
公开(公告)号：WO2010046636A2
公开(公告)日：2010-04-29
申请号：PCT/GB2009002499
申请日：2009-10-19
申请人： P2I LTD , KING CHARLES EDMUND
发明人： KING CHARLES EDMUND
IPC分类号： C23C14/56 , A43B1/00 , B01J3/00 , H01J37/32
CPC分类号： C23C14/566 , A43B7/12 , A43D95/06 , A43D95/10 , Y10T137/86083
摘要： The present invention relates to an apparatus (10) for vacuum processing articles (12). The apparatus comprises a processing region (14) in which articles can be vacuum processed at a processing pressure and a loading region (18) into which articles can be loaded into the apparatus at ambient pressure. A plurality of article carriers (20) are provided for carrying articles from the loading region to the processing region along an enclosed passage (24) so that articles can be vacuum processed. The carriers (20) comprise respective sealing means (26) for sealing against an inner surface of the passage when carrying articles along the passage. The sealing means (26) resist the flow of gas or vapour past the sealing means along the passage from the loading region to the processing region so that articles loaded at ambient pressure in the loading region and carried to the processing region can be vacuum processed at processing pressure.
摘要翻译：本发明涉及一种用于真空处理物品（12）的设备（10）。该设备包括处理区域（14）和装载区域（18），物品可以在处理压力下被真空处理，装载区域（18）中的物品可以在环境压力下被装载到装置中。提供了多个物品载体（20），用于沿着封闭通道（24）将物品从装载区域运送到处理区域，从而物品可以被真空处理。载体（20）包括相应的密封装置（26），用于在沿通道运送物品时密封通道的内表面。密封装置（26）阻止沿着从装载区域到处理区域的通道经过密封装置的气体或蒸汽的流动，从而可以在装载区域中的环境压力下装载并运送到处理区域的物品可以在处理压力。

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