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1. 发明申请

WO2013024234A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体加工设备
公开(公告)号：WO2013024234A1
公开(公告)日：2013-02-21
申请号：PCT/GB2011/051546
申请日：2011-08-16
申请人： P2i LTD , COULSON, Stephen Richard , HOPPER, Fred , KING, Charles Edmund
发明人： COULSON, Stephen Richard , HOPPER, Fred , KING, Charles Edmund
IPC分类号： H01J37/32
CPC分类号： H01J37/32137 , H01J37/32155 , H01J37/32165 , H01J37/32541 , H01J37/32577 , H01J37/32935 , H01J2237/3323 , H01J2237/3325
摘要： The present invention relates to an apparatus (10) for plasma processing an article (12), the apparatus comprising: a chamber (14) for receiving an article to be processed; electrode means (16) for generating an electric field in said chamber for establishing a plasma in said chamber so that said article can be processed; generation means (24) for generating alternating electrical energy for transmission to said electrode means (18); connection means for connecting said generation means to said electrode means (20); and control means for varying the location of nodes and anti- nodes of standing waves generated in said chamber during processing, so that a plurality of standing waves are generated over time which are not coincident with one another.
摘要翻译：本发明涉及一种用于等离子体处理物品（12）的设备（10），该设备包括：用于接收待处理物品的室（14）电极装置（16），用于在所述腔室中产生电场，用于在所述腔室中建立等离子体，从而可以对所述制品进行加工; 用于产生用于传输到所述电极装置（18）的交替电能的发生装置（24）; 用于将所述产生装置连接到所述电极装置的连接装置; 以及用于在处理期间改变在所述室中产生的驻波的节点和反节点的位置的控制装置，使得随着时间不同而产生多个驻波而不是彼此重合。

2. 发明申请

WO2009087102A3 ABATEMENT APPARATUS AND PROCESSING METHOD 审中-公开
标题翻译：减压装置和加工方法
公开(公告)号：WO2009087102A3
公开(公告)日：2009-12-30
申请号：PCT/EP2009000075
申请日：2009-01-09
申请人： P2I LTD , COULSON STEPHEN RICHARD
发明人： COULSON STEPHEN RICHARD
IPC分类号： F26B5/04 , F26B25/22
CPC分类号： F26B5/04 , F26B25/225
摘要： The present invention relates to a method of processing an article (16) to remove outgassing substances. The method comprises: placing an article in a closed processing region (12); reducing a pressure in the processing region so that the article (16) is exposed to a pressure to control a rate of outgassing from the article; and disposing outgases (15) released from the article. The present invention also relates to abatement apparatus (10) for processing an article (16) to remove outgassing substances. The apparatus comprises: a processing region (12); vacuum pumping means (20) for reducing a pressure in the processing region (12); control means (28) for controlling a rate of outgassing from the article (16); and disposal means (22) for disposing of outgases (15) released from the article.
摘要翻译：本发明涉及一种处理物品（16）以去除除气物质的方法。该方法包括：将物品放置在封闭处理区域（12）中; 降低处理区域中的压力，使得制品（16）暴露于压力下以控制制品脱气的速率; 和处理从物品释放的外部气体（15）。本发明还涉及用于处理物品（16）以去除除气物质的消减装置（10）。该设备包括：处理区域（12）;处理区域真空泵装置（20），用于降低处理区域（12）中的压力; 控制装置（28），用于控制来自物品（16）的放气速率; 和用于处理从物品释放的排气（15）的处理装置（22）。

3. 发明申请

WO2009087102A2 ABATEMENT APPARATUS AND PROCESSING METHOD 审中-公开
标题翻译：拍卖设备和处理方法
公开(公告)号：WO2009087102A2
公开(公告)日：2009-07-16
申请号：PCT/EP2009/000075
申请日：2009-01-09
申请人： P2I LIMITED , COULSON, Stephen, Richard
发明人： COULSON, Stephen, Richard
CPC分类号： F26B5/04 , F26B25/225
摘要： The present invention relates to a method of processing an article (16) to remove outgassing substances. The method comprises: placing an article in a closed processing region (12); reducing a pressure in the processing region so that the article (16) is exposed to a pressure to control a rate of outgassing from the article; and disposing outgases (15) released from the article. The present invention also relates to abatement apparatus (10) for processing an article (16) to remove outgassing substances. The apparatus comprises: a processing region (12); vacuum pumping means (20) for reducing a pressure in the processing region (12); control means (28) for controlling a rate of outgassing from the article (16); and disposal means (22) for disposing of outgases (15) released from the article.
摘要翻译：本发明涉及一种处理物品（16）以除去除气物质的方法。该方法包括：将物品放置在封闭的处理区域（12）中; 降低处理区域中的压力，使得物品（16）暴露于压力以控制来自制品的放气率; 并且处理从物品释放出的废物（15）。本发明还涉及用于处理物品（16）以除去除气物质的消减装置（10）。该装置包括：处理区域（12）; 用于减小处理区域（12）中的压力的真空泵送装置（20）; 控制装置（28），用于控制从制品（16）排气的速率; 以及用于处理从制品释放的废气（15）的处置装置（22）。

4. 发明申请

WO2005089961A1 COATING OF A POLYMER LAYER USING LOW POWDER PULSED PLASMA IN A PLASMA CHAMBER OF A LARGE VOLUME 审中-公开
标题翻译：使用低粉末脉冲等离子体在大容量的等离子体中涂覆聚合物层
公开(公告)号：WO2005089961A1
公开(公告)日：2005-09-29
申请号：PCT/GB2005/001017
申请日：2005-03-18
申请人： THE SECRETARY OF STATE OF DEFENCE , COULSON, Stephen, Richard , BURNETT, Ian , SAMBELL, John
发明人： COULSON, Stephen, Richard , BURNETT, Ian , SAMBELL, John
IPC分类号： B05D7/24
CPC分类号： H05H1/24 , B05D1/62 , B05D5/083 , B05D2506/00 , B05D2506/10
摘要： A method for depositing a polymeric material onto a substrate, said method comprising introducing an organic monomeric material in a gaseous state into a plasma deposition chamber, igniting a glow discharge within said chamber, and applying a high frequency voltage as a pulsed field, at a power of from 0.001 to 500w/m 3 for a sufficient period of time to allow a polymeric layer to form on the surface of the substrate. The method is particularly suitable for producing oil and water repellent coatings, in particular where the monomeric material contains haloalkyl compounds. Apparatus particularly adapted to carry out the method of the invention is also described and claimed.
摘要翻译：一种用于将聚合物材料沉积到基底上的方法，所述方法包括将气态的有机单体材料引入等离子体沉积室，点燃所述腔室内的辉光放电，以及施加高频电压作为脉冲场，功率为0.001至500w / m 3，持续足够的时间以允许在基底表面上形成聚合物层。该方法特别适用于生产防油和防水涂料，特别是其中单体材料含有卤代烷基化合物时。还描述和要求保护特别适于实施本发明的方法的装置。

5. 发明申请

WO2013011315A1 SURFACE COATINGS 审中-公开
标题翻译：表面涂料
公开(公告)号：WO2013011315A1
公开(公告)日：2013-01-24
申请号：PCT/GB2012/051723
申请日：2012-07-19
申请人： P2I LTD , COULSON, Stephen Richard , DE BLAQUIERE, Paul , EVANS, Delwyn , LEE, Warren
发明人： COULSON, Stephen Richard , DE BLAQUIERE, Paul , EVANS, Delwyn , LEE, Warren
IPC分类号： C08J7/18 , C08F2/52
CPC分类号： C08J7/18 , B05D1/62 , B05D5/083 , C08F2/52 , C09D4/00 , D06M10/025 , D06M14/18 , D06M2200/11 , D06M2200/12
摘要： A method of forming a liquid repellent coating on a surface of a substrate, where the surface is exposed to a monomer in a plasma deposition process under conditions that maintain the monomer in situ for a period of time to allow a polymeric layer to form on the surface, wherein the conditions comprise at least one cycle of varying pressure.
摘要翻译：在基板的表面上形成液体排斥涂层的方法，其中表面在等离子体沉积工艺中暴露于单体的条件下，在将单体原位保持一段时间以使聚合物层形成在表面，其中所述条件包括变化压力的至少一个循环。

6. 发明申请

WO2009010753A3 PLASMA DEPOSITION APPARATUS 审中-公开
标题翻译：等离子体沉积装置
公开(公告)号：WO2009010753A3
公开(公告)日：2009-06-11
申请号：PCT/GB2008002440
申请日：2008-07-17
申请人： P2I LTD , COULSON STEPHEN RICHARD , KING CHARLES EDMUND
发明人： COULSON STEPHEN RICHARD , KING CHARLES EDMUND
IPC分类号： B05D7/24 , C23C14/28
CPC分类号： H01J37/32449 , B05D1/62 , C23C16/4412 , C23C16/507 , C23C16/54 , Y10T428/31504
摘要： Apparatus (10) for coating a surface of an article (14) with a thin film polymer layer by plasma deposition, the apparatus comprising: a plurality of processing chambers (12a, 12b, 12c....12n) into each of which one or more articles can be placed; means (18, 19, 20, 21, 22) for supplying an active species to said processing chambers for forming a plasma in said chambers; a plurality of induction means (24) associated with respective processing chambers, each induction means being operable to induce an electrical field internally of an associated processing chamber for forming a plasma when said active species is supplied thereto so that a surface of said article can be coated with a thin film polymer layer by plasma deposition; means (26) for providing a time varying electric current in the induction means; and pressure control means (28) for selectively controlling pressure in said processing chambers such that pressure in any one or more of said chambers can be controlled independently of pressure in other of said chambers.
摘要翻译：用于通过等离子体沉积用薄膜聚合物层涂覆制品（14）的表面的设备（10），所述设备包括：多个处理室（12a，12b，12c ... 12n），每个处理室或者可以放置更多的物品; 用于向所述处理室提供活性物质以在所述室中形成等离子体的装置（18,19,20,21,22）与相应的处理室相关联的多个感应装置（24），每个感应装置可操作以在相关联的处理室内引起电场，用于在向所述活性物质供应所述活性物质时形成等离子体，使得所述物品的表面可以是通过等离子体沉积涂覆有薄膜聚合物层; 用于在所述感应装置中提供时变电流的装置（26）和压力控制装置（28），用于选择性地控制所述处理室中的压力，使得任何一个或多个所述室中的压力可以独立于所述室中的另一个室中的压力进行控制。

7. 发明申请

WO2009060194A2 PLASMA DEPOSITION APPARATUS 审中-公开
标题翻译：等离子体沉积装置
公开(公告)号：WO2009060194A2
公开(公告)日：2009-05-14
申请号：PCT/GB2008003739
申请日：2008-11-07
申请人： P2I LTD , COULSON STEPHEN RICHARD
发明人： COULSON STEPHEN RICHARD
IPC分类号： C23C16/04 , C23C16/505
CPC分类号： C23C16/045 , B05D1/62 , B05D7/22 , B29C2035/0855 , B29C2035/0861 , B29L2031/7542 , B29L2031/7544 , C23C16/505
摘要： Apparatus (10) is shown for plasma treating a surface of a small (channel 12) to modify the surface and change the functional effect. The apparatus comprises: a source (14) of active species for supply to an inlet (16) of a processing region (18) for forming a plasma in the processing region; means (20) for applying an electric field to the active species in the processing region so that a plasma is formed; and vacuum pumping means (22) for connection to an outlet (24) of the processing region. The vacuum pumping means are operable to provide a flow path (26) in the processing region from the inlet to the outlet thereof and to control pressure in the processing region. Apparatus (10) further comprises supporting means for supporting at least one small channel so that, in use, the flow path extends therethrough, and an internal surface of said at least one small channel is coated with a thin film polymer layer by plasma deposition.
摘要翻译：示出了用于等离子体处理小（通道12）的表面以修改表面并改变功能效果的装置（10）。该设备包括：用于供应到处理区域（18）的入口（16）的活性物质源（14），用于在处理区域中形成等离子体; 用于向处理区域中的活性物质施加电场以形成等离子体的装置（20）; 以及用于连接到处理区域的出口（24）的真空泵装置（22）。真空泵送装置可操作以在处理区域中从入口到出口提供流路（26）并控制处理区域中的压力。设备（10）还包括用于支撑至少一个小通道的支撑装置，使得在使用中流道延伸穿过其中，并且所述至少一个小通道的内表面通过等离子体沉积涂覆有薄膜聚合物层。

8. 发明申请

WO2005089961A9 COATING OF A POLYMER LAYER USING LOW POWER PULSED PLASMA IN A PLASMA CHAMBER OF A LARGE VOLUME 审中-公开
标题翻译：使用低功率脉冲等离子体在大容量的等离子体室中涂覆聚合物层
公开(公告)号：WO2005089961A9
公开(公告)日：2006-10-05
申请号：PCT/GB2005001017
申请日：2005-03-18
申请人： SECR DEFENCE , COULSON STEPHEN RICHARD , BURNETT IAN , SAMBELL JOHN
发明人： COULSON STEPHEN RICHARD , BURNETT IAN , SAMBELL JOHN
IPC分类号： B05D5/08 , B05D7/24
CPC分类号： H05H1/24 , B05D1/62 , B05D5/083 , B05D2506/00 , B05D2506/10
摘要： A method for depositing a polymeric material onto a substrate, said method comprising introducing an organic monomeric material in a gaseous state into a plasma deposition chamber, igniting a glow discharge within said chamber, and applying a high frequency voltage as a pulsed field, at a power of from 0.001 to 500w/m 3 for a sufficient period of time to allow a polymeric layer to form on the surface of the substrate. The method is particularly suitable for producing oil and water repellent coatings, in particular where the monomeric material contains haloalkyl compounds. Apparatus particularly adapted to carry out the method of the invention is also described and claimed.
摘要翻译：一种用于将聚合物材料沉积到基底上的方法，所述方法包括将气态的有机单体材料引入等离子体沉积室，点燃所述腔室内的辉光放电，以及施加高频电压作为脉冲场，功率为0.001至500w / m 3，持续足够的时间以允许在衬底的表面上形成聚合物层。该方法特别适用于生产防油和防水涂料，特别是在单体材料含有卤代烷基化合物的情况下。还描述和要求保护特别适于实施本发明的方法的装置。

9. 发明申请

WO2009060194A3 PLASMA DEPOSITION APPARATUS 审中-公开
公开(公告)号：WO2009060194A3
公开(公告)日：2009-05-14
申请号：PCT/GB2008/003739
申请日：2008-11-07
申请人： P2I LIMITED , COULSON, Stephen, Richard
发明人： COULSON, Stephen, Richard
IPC分类号： C23C16/04 , C23C16/505 , B05D7/22 , B05D7/24
摘要： Apparatus (10) is shown for plasma treating a surface of a small (channel 12) to modify the surface and change the functional effect. The apparatus comprises: a source (14) of active species for supply to an inlet (16) of a processing region (18) for forming a plasma in the processing region; means (20) for applying an electric field to the active species in the processing region so that a plasma is formed; and vacuum pumping means (22) for connection to an outlet (24) of the processing region. The vacuum pumping means are operable to provide a flow path (26) in the processing region from the inlet to the outlet thereof and to control pressure in the processing region. Apparatus (10) further comprises supporting means for supporting at least one small channel so that, in use, the flow path extends therethrough, and an internal surface of said at least one small channel is coated with a thin film polymer layer by plasma deposition.

10. 发明申请

WO2009040542A2 VAPOUR DELIVERY SYSTEM 审中-公开
标题翻译：蒸汽输送系统
公开(公告)号：WO2009040542A2
公开(公告)日：2009-04-02
申请号：PCT/GB2008/003271
申请日：2008-09-25
申请人： P2I LIMITED , COULSON, Stephen, Richard , KING, Charles, Edmund
发明人： COULSON, Stephen, Richard , KING, Charles, Edmund
IPC分类号： C23C16/448
CPC分类号： C23C16/4485 , B05D1/60 , B05D1/62 , Y10T137/0318 , Y10T137/86187
摘要： A delivery system (10) for delivering species to a processing chamber (14) for imparting a desired surface property to one or more large items - such as shoes - comprises: a first container (16) for filling with liquid species; a second container (18) for receiving liquid species from the first container (16); a first flow control means (20) for controlling a volume of liquid species which is allowed to flow from the first container to the second container (18); evaporation means (30) for evaporating liquid species in the second container; and a second flow control means (38) for controlling flow of evaporated species from the second container (18) to a processing chamber (14).
摘要翻译：用于将物质输送到处理室（14）以将一个或多个大物品（例如鞋子）赋予期望表面特性的递送系统（10）包括：用于填充液体物种的第一容器（16）用于从第一容器（16）接收液体物质的第二容器（18）; 用于控制允许从第一容器流到第二容器（18）的液体物质的体积的第一流量控制装置（20）; 用于蒸发第二容器中的液体物质的蒸发装置（30）以及第二流量控制装置（38），用于控制从第二容器（18）到处理室（14）的蒸发物质的流动。

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