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    • 3. 发明申请
    • LIGHT-ABSORBING POLYMER, METHOD FOR SYNTHESIZING THE SAME, AND FILM-FORMING COMPOSITION AND ANTIREFLECTION FILM PREPARED USING SAID POLYMER
    • 光吸收聚合物,其合成方法和成膜组合物和使用合成聚合物制备的抗反馈膜
    • WO1998012238A1
    • 1998-03-26
    • PCT/JP1997003255
    • 1997-09-16
    • CLARIANT INTERNATIONAL LTD.KANG, Wen-BingTOKIDA, AkihikoARAMAKI, KayoTANAKA, HatsuyukiKIMURA, Ken
    • CLARIANT INTERNATIONAL LTD.
    • C08F08/14
    • C08F8/34C08F8/30C09D5/32G03F7/091
    • A light-absorbing polymer comprising an organic chromophore reaction-bonded through a methylene or alkylene group to the carboxyl groups of a copolymer comprising repeating units having a dicarboxylic acid or carboxylic anhydride group on its backbone. In the light-absorbing polymer, the remaining carboxyl groups may be amidated and/or imidated with an aromatic compound having a reactive amino group. An antireflection film which is insoluble in a resist solvent and has good step coverage can be prepared from the light-absorbing polymer by dissolving the same, optionally together with an aromatic compound having a reactive amino group for improving properties, in the same solvent as the resist solvent, coating a substrate with the solution, and baking the coating. Coating of the antireflection film with a photoresist followed by irradiation with a radiation, such as a far-ultraviolet radiation, can provide a high-resolution resist image which is not affected by a standing wave in the preparation of an integrated circuit device.
    • 一种光吸收聚合物,其包含通过亚甲基或亚烷基与包含其主链上具有二羧酸或羧酸酐基团的重复单元的共聚物的羧基反应键合的有机发色团。 在光吸收聚合物中,剩余的羧基可以用具有反应性氨基的芳族化合物酰胺化和/或酰亚胺化。 可以通过将光吸收性聚合物通过将其与具有用于改善性能的具有反应性氨基的芳香族化合物一起溶解在与吸收聚合物相同的溶剂中来制备不溶于抗蚀剂溶剂并且具有良好的阶梯覆盖度的抗反射膜, 抗溶剂,用溶液涂覆基材,并烘烤涂层。 用光致抗蚀剂涂覆抗反射膜,然后用诸如远紫外线辐射的辐射照射可以提供在制备集成电路器件时不受驻波影响的高分辨率抗蚀剂图像。
    • 5. 发明申请
    • HIGH-STRENGTH HOT-ROLLED STEEL SHEET EXCELLENT IN SHAPE FIXABILITY AND METHOD OF PRODUCING THE SAME
    • 高强度热轧钢板,其形状优异的生产能力及其生产方法
    • WO2005005670A1
    • 2005-01-20
    • PCT/JP2004/009465
    • 2004-06-28
    • NIPPON STEEL CORPORATIONUSINORSUGIURA, NatsukoTAKAHASHI, ManabuYOSHINAGA, NaokiKIMURA, Ken
    • SUGIURA, NatsukoTAKAHASHI, ManabuYOSHINAGA, NaokiKIMURA, Ken
    • C21D9/46
    • C22C38/06B21B1/26B21B2001/228B21B2001/383C21D8/0226C21D2211/002C21D2211/005C22C38/02C22C38/04C22C38/12C22C38/14
    • A high-strength hot-rolled steel sheet excellent in shape fixability having ferrite or bainite as the phase of the largest volume percentage, satisfying all of the following at least at 1/2 sheet thickness: a mean value of X-ray random intensity ratio in the orientation component group of {100} to {223} to X-ray random diffraction intensity ratio of at least 2.5; a mean value of X-ray random intensity ratio in the three crystal orientation components of {554} , {111} , and {111} to X-ray random diffraction intensity ratio of 3.5 or less; an X-ray intensity ratio to X-ray random diffraction intensity ratio at {100} of at least the X-ray random intensity to X-ray random diffraction intensity ratio at {211} ; and an X-ray random intensity ratio to X-ray random intensity ratio diffraction intensity ratio at {100} of at least 2.5, having at least one of an r-value of the rolling direction and an r-value of a direction perpendicular to the rolling direction of not more than 0.7, having an anisotropy ΔuEl of uniform elongation of not more than 4%, having an anisotropy ΔLE1 of local elongation of at least 2%, and having an ΔuEl of not more than the ΔLE1.
    • 一种铁素体或贝氏体作为最大体积百分比的相位具有优异的定形性的高强度热轧钢板,满足以下所有以下至少1/2片厚度:X射线随机强度比的平均值 在{100} <011>〜{223} <110>的取向成分组中X射线随机衍射强度比为2.5以上; {554} 225,{111} <112>和{111} <110>的三个晶体取向成分的X射线随机强度比的X射线随机强度比的平均值与3.5以下的X射线随机衍射强度比 ; 至少在{211} <011>的X射线随机强度与X射线随机衍射强度比的{100} <011>的X射线强度比与X射线随机衍射强度比的X射线强度比。 并且在{100} <011>下的X射线随机强度比与X射线随机强度比衍射强度比至少为2.5,具有轧制方向的r值和r值的至少一个 具有垂直于轧制方向的方向不大于0.7,具有不大于4%的均匀伸长率的各向异性DeltauE1,具有至少2%的局部伸长率的各向异性ΔLE1,并且具有不大于ΔLE1的DeltauE1。