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1. 发明公开

EP1756244A1 CERIUM OXIDE ABRASIVE AND SLURRY CONTAINING THE SAME 有权
标题翻译：氧化铈的研磨和含有泥浆
公开(公告)号：EP1756244A1
公开(公告)日：2007-02-28
申请号：EP06715744.6
申请日：2006-01-24
申请人： LG Chem, Ltd. , Kim, Jong-pil
发明人： NHO, Jun-seok , OH, Myoung-hwan , KIM, Jang-Yul , CHO, Seung-beom
IPC分类号： C09K3/14
CPC分类号： B82Y30/00 , C01F17/0043 , C01P2004/03 , C01P2004/04 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C09K3/1409 , C09K3/1463
摘要： Disclosed are a cerium oxide abrasive for selectively polishing various SiO2 films and SiO2-Si3N4 films; and a slurry containing the same. The cerium oxide abrasive and the polishing slurry of the present invention have a high polishing rate and are also free from microscratches in a polished surface upon polishing since polycrystalline cerium oxide having a mean crystalline particle size of 5 nm or less is synthesized by using hexagonal cerium carbonate having a hexagonal crystal structure as a raw material of cerium.

2. 发明公开

EP1689317A1 ASSISTANT FOR IMPLANT STENT 审中-公开
标题翻译：工具进行支架植入术
公开(公告)号：EP1689317A1
公开(公告)日：2006-08-16
申请号：EP04808289.5
申请日：2004-12-02
申请人： Kim, Jong-Pil
发明人： Kim, Jong-Pil
IPC分类号： A61C8/00
CPC分类号： A61C1/084
摘要： The present invention relates to an assistant for implant stent. The assistant for implant stent of the present invention comprises a body with a predetermined length and a drill insertion hole bored through the body from a top surface to a bottom surface thereof. The body comprises a support portion with a predetermined thickness and a sectional area greater than that of the body. The support portion is formed on the top surface of the body.

3. 发明公开

EP1756244A4 CERIUM OXIDE ABRASIVE AND SLURRY CONTAINING THE SAME 有权
标题翻译：氧化铈的研磨和含有泥浆
公开(公告)号：EP1756244A4
公开(公告)日：2008-03-26
申请号：EP06715744
申请日：2006-01-24
申请人： LG CHEMICAL LTD , KIM JONG PIL
发明人： NHO JUN-SEOK , OH MYOUNG-HWAN , KIM JANG-YUL , CHO SEUNG-BEOM
IPC分类号： C09K3/14 , B24B37/00 , B82Y10/00 , B82Y30/00 , B82Y99/00 , C01F17/00 , H01L21/304
CPC分类号： B82Y30/00 , C01F17/0043 , C01P2004/03 , C01P2004/04 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C09K3/1409 , C09K3/1463
摘要： Disclosed are a cerium oxide abrasive for selectively polishing various SiO2 films and SiO2-Si3N4 films; and a slurry containing the same. The cerium oxide abrasive and the polishing slurry of the present invention have a high polishing rate and are also free from microscratches in a polished surface upon polishing since polycrystalline cerium oxide having a mean crystalline particle size of 5 nm or less is synthesized by using hexagonal cerium carbonate having a hexagonal crystal structure as a raw material of cerium.

4. 发明专利

AU2003264563A1 CIGARETTE IGNITION DEVICE THAT DOES NOT NEED MATCH 未知
公开(公告)号：AU2003264563A1
公开(公告)日：2005-04-11
申请号：AU2003264563
申请日：2003-09-24
申请人： KIM JONG PIL
发明人： KIM JONG PIL
IPC分类号： A24D1/08

5. 发明申请

WO2012165871A3 ARTIFICIAL LAWN STRUCTURE AND METHOD AND APPARATUS FOR MANUFACTURING SAME 审中-公开
标题翻译：人造法律结构及其制造方法和装置
公开(公告)号：WO2012165871A3
公开(公告)日：2013-02-07
申请号：PCT/KR2012004289
申请日：2012-05-31
申请人： KOLON GLOTECH INC , KIM JUNG HUN , KWON YOUNG HOON , KIM JONG PIL
发明人： KIM JUNG HUN , KWON YOUNG HOON , KIM JONG PIL
IPC分类号： E01C13/08
CPC分类号： E01C13/08 , B32B5/26 , B32B2262/0253 , D03D27/12 , D03D39/00 , D03D39/04 , D05C17/02 , D10B2321/02 , D10B2505/18 , D10B2507/00
摘要： The present invention relates to an artificial lawn structure, and to a method and apparatus for manufacturing same. The apparatus for manufacturing an artificial lawn structure according to the present invention comprises: a fabric-supplying unit which supplies a first fabric and a second fabric constituting a first structure; a weaving unit which tufts a pile yarn on the first structure so as to weave a second structure in which a portion of the pile yarn is exposed beneath the first structure; and a heat-fusion unit which compresses the second structure using a tension and heat-fuses the exposed pile yarn, which is beneath the second structure, using heat.
摘要翻译：本发明涉及一种人造草坪结构体及其制造方法和装置。根据本发明的用于制造人造草坪结构的装置包括：织物供应单元，其供应构成第一结构的第一织物和第二织物; 编织单元，其在第一结构上簇绒绒毛，以便编织第二结构，其中一部分绒头纱线暴露在第一结构下方; 以及热熔单元，其使用张力来压缩第二结构，并且利用热对第二结构下方的暴露绒毛线进行加热熔化。

6. 发明申请

WO2012165919A2 POLYMER RESIN-COPPER COMPLEX, AND PREPARATION METHOD THEREOF 审中-公开
标题翻译：聚合物树脂复合物及其制备方法
公开(公告)号：WO2012165919A2
公开(公告)日：2012-12-06
申请号：PCT/KR2012004372
申请日：2012-06-01
申请人： TAESUNG POLITECH CO LTD , KOREA BASIC SCIENCE INST , JEONG EUH-DUCK , HAN HYUN-JU , HWANG BO-RAM , JIN JONG-SUNG , HA MYOUNG-GYU , KIM HYUN-GYU , HONG TAE-EUN , HONG KYONG-SOO , KIM JONG-PIL , BAE JONG-SEONG , JUNG HONG-DAE , LEE SU-JONG
发明人： JEONG EUH-DUCK , HAN HYUN-JU , HWANG BO-RAM , JIN JONG-SUNG , HA MYOUNG-GYU , KIM HYUN-GYU , HONG TAE-EUN , HONG KYONG-SOO , KIM JONG-PIL , BAE JONG-SEONG , JUNG HONG-DAE , LEE SU-JONG
IPC分类号： B32B15/08 , B32B15/20 , C23C28/00
CPC分类号： C23C28/30
摘要： The present invention relates to a polymer resin-copper complex which comprises i) copper, ii) nickel formed on the copper, and iii) a polymer resin which is treated with a triazine thiol-based derivative and then coupled to the nickel; and the result of X-ray photoelectron spectroscopy (XPS) analysis of the complex is that Ni content is less than 5% of the total content, which includes NiO and Ni2O3. According to the present invention, the complex improves the adhesive force between a metal and a resin, and as for tensile strength, even after thermal shock tensile strength is maintained. In addition, by using nickel and a triazing thiol-based derivative and utilizing methods, such as pretreatment, appropriate surface roughening, heat treatment, surface coating and the like, to increase binding force to a resin, it is possible to provide a metal-resin complex with excellent binding force between a metal and a resin.
摘要翻译：本发明涉及一种聚合物树脂 - 铜络合物，它包括：i）铜，ii）在铜上形成的镍，和iii）用三嗪硫醇基衍生物处理然后与镍偶合的聚合物树脂; 复合物的X射线光电子能谱（XPS）分析结果表明，Ni含量小于总含量的5％，包括NiO和Ni2O3。根据本发明，复合物改善了金属和树脂之间的粘合力，以及拉伸强度，即使在热冲击后仍保持拉伸强度。此外，通过使用镍和三聚硫醇基衍生物，并且利用预处理，适当的表面粗糙化，热处理，表面涂覆等方法，增加对树脂的结合力，可以提供金属 - 树脂复合物，具有优异的金属和树脂之间的结合力。

7. 发明申请

WO2009110729A1 CMP SLURRY AND A POLISHING METHOD USING THE SAME 审中-公开
标题翻译： CMP浆料和使用其的抛光方法
公开(公告)号：WO2009110729A1
公开(公告)日：2009-09-11
申请号：PCT/KR2009/001036
申请日：2009-03-03
申请人： LG CHEM, LTD. , KIM, Jong-Pil , CHO, Seung-Beom , NOH, Jun-Seok , KIM, Jang-Yul
发明人： KIM, Jong-Pil , CHO, Seung-Beom , NOH, Jun-Seok , KIM, Jang-Yul
IPC分类号： C09G1/02 , H01L21/302
CPC分类号： H01L21/31053 , C09G1/02
摘要： The present invention relates to a CMP slurry that is able to reduce dishing generation, when it is applied to polishing or planarization of silicon oxide layer, for example, and a polishing method. The CMP slurry includes a polishing abrasive, a linear anionic polymer, a compound including a phosphoric acid group, and water, and the ratio of CMP polishing speed to a silicon oxide layer : CMP polishing speed to a silicon nitride layer is 30:1 to 50:1.
摘要翻译：本发明涉及当其用于例如氧化硅层的抛光或平面化时能够减少凹陷产生的CMP浆料，以及抛光方法。 CMP浆料包括抛光磨料，线性阴离子聚合物，包含磷酸基团和水的化合物，CMP抛光速度与氧化硅层的比例：CMP抛光速度与氮化硅层的比例为30:1至 50：1。

8. 发明申请

WO2008136593A1 CERIUM OXIDE POWDER FOR ABRASIVE AND CMP SLURRY COMPRISING THE SAME 审中-公开
标题翻译：用于磨料和CMP浆料的氧化铝粉末包括它
公开(公告)号：WO2008136593A1
公开(公告)日：2008-11-13
申请号：PCT/KR2008/002460
申请日：2008-04-30
申请人： LG CHEM, LTD. , OH, Myoung-Hwan , CHO, Seung-Beom , NHO, Jun-Seok , KIM, Jong-Pil , KIM, Jang-Yul
发明人： OH, Myoung-Hwan , CHO, Seung-Beom , NHO, Jun-Seok , KIM, Jong-Pil , KIM, Jang-Yul
IPC分类号： C01F17/00
CPC分类号： C01F17/0043 , C01F17/005 , C01P2002/72 , C01P2004/03 , C01P2004/10 , C01P2004/20 , C09K3/1454 , C09K3/1463
摘要： Disclosed are cerium oxide powder for an abrasive; CMP slurry including the same; and a shallow trench isolation (STI) process using the CMP slurry. At least two kinds of cerium oxides prepared by using cerium carbonates having different crystal structures are mixed in an appropriate ratio and used as an abrasive for CMP slurry, thereby adjusting required polishing properties of the CMP slurry. Also, in a disclosed method of preparing a cerium carbonate, the crystal structure of the cerium carbonate can be easily controlled. Based on the finding that in a cerium oxide for an abrasive, the kind of improved polishing property depends on the crystal structure of a cerium carbonate, at least one from among polishing properties, such as the polishing rate of a silicon oxide layer, the polishing rate of a silicon nitride layer, the polishing selectivity between the silicon oxide layer and the silicon nitride layer, and WIWNU, can be adjusted by using at least two kinds of cerium oxides selected from the group including ( i ) a cerium oxide prepared by using a lanthanite- (Ce) crystal structured cerium carbonate, (ii) a cerium oxide prepared by using an orthorhombic crystal structured cerium carbonate, and (iii) a cerium oxide prepared by using a hexagonal crystal structured cerium carbonate, as an abrasive for CMP slurry, and adjusting the mixing ratio of the cerium oxides.
摘要翻译：公开了用于研磨剂的氧化铈粉末; 包括CMP的CMP浆料; 和使用CMP浆料的浅沟槽隔离（STI）工艺。通过使用具有不同晶体结构的碳酸铈制备的至少两种氧化铈以适当的比例混合，并用作CMP浆料的研磨剂，从而调节CMP浆料的所需抛光性能。此外，在公开的碳酸铈的制备方法中，可以容易地控制碳酸铈的晶体结构。基于在研磨剂的氧化铈中发现，改善的研磨性能的种类取决于碳酸铈的晶体结构，从抛光性能，例如氧化硅层的研磨速度，抛光氮化硅层的速率，氧化硅层和氮化硅层之间的抛光选择性以及WIWNU可以通过使用选自以下的至少两种氧化铈来调节：（i）通过使用制备的氧化铈（Ce）晶体结构的碳酸铈，（ii）通过使用正交晶体结构的碳酸铈制备的氧化铈，和（iii）通过使用六方晶结晶的碳酸铈制备的氧化铈作为CMP浆料的研磨剂，并调节氧化铈的混合比。

9. 发明申请

WO2008114965A1 METHOD FOR PREPARING CERIUM CARBONATE POWDER USING UREA 审中-公开
标题翻译：使用尿素制备碳酸钙粉末的方法
公开(公告)号：WO2008114965A1
公开(公告)日：2008-09-25
申请号：PCT/KR2008/001452
申请日：2008-03-14
申请人： LG CHEM, LTD. , OH, Myoung-Hwan , CHO, Seung-Beom , NHO, Jun-Seok , KIM, Jong-Pil , KIM, Jang-Yul , SHIN, Dong-Mok
发明人： OH, Myoung-Hwan , CHO, Seung-Beom , NHO, Jun-Seok , KIM, Jong-Pil , KIM, Jang-Yul , SHIN, Dong-Mok
IPC分类号： C01F17/00
CPC分类号： C01F17/005 , C01P2002/72
摘要： In a method for preparing cerium carbonate powder by mixing a cerium precursor solution with a urea solution and carrying out a precipitation reaction, wherein the cerium carbonate powder has a hexagonal crystal structure, by using at least one type of organic solvent as a solvent for either or both the cerium precursor solution and the urea solution, and adjusting temperature of the precipitation reaction within a range of 120°C to 300°C. Also, the method can yield cerium carbonate powder, cerium oxide powder from the cerium carbonate powder, and CMP slurry including the cerium oxide powder as an abrasive. In the method, urea as a precipitant can improve the uniformity of a reaction, and thus it is possible to easily and inexpensively obtain cerium carbonate powder with a hexagonal crystal structure without the danger by high-temperature high-pressure and the need for an expensive system in hydrothermal synthesis.
摘要翻译：在通过将铈前体溶液与尿素溶液混合并进行沉淀反应制备碳酸铈粉末的方法中，其中所述碳酸铈粉末具有六方晶系结构，通过使用至少一种有机溶剂作为溶剂用于任一种或铈前体溶液和尿素溶液两者，并将沉淀反应的温度调节在120℃至300℃的范围内。此外，该方法可以产生碳酸铈粉末，来自碳酸铈粉末的氧化铈粉末和包含氧化铈粉末作为研磨剂的CMP浆料。在该方法中，作为沉淀剂的尿素可以提高反应的均匀性，因此可以容易且廉价地获得六方晶系结构的碳酸铈粉末，而不会受到高温高压的危险，并且需要昂贵的水热合成系统。

10. 发明申请

WO2006028302A1 CAEV-BASED VECTOR SYSTEMS 审中-公开
标题翻译：基于CAEV的矢量系统
公开(公告)号：WO2006028302A1
公开(公告)日：2006-03-16
申请号：PCT/KR2004/002274
申请日：2004-09-07
申请人： VECTORCORE A CO.,LTD , LEE, Sukyung , KIM, Yeon-Soo , KIM, Jong-pil
发明人： LEE, Sukyung , KIM, Yeon-Soo , KIM, Jong-pil
IPC分类号： C12N15/63
CPC分类号： C12N15/86 , A61K48/00 , C12N2740/10043 , C12N2800/108 , C12N2810/6081 , C12N2830/38 , C12N2830/42 , C12N2840/20
摘要： This invention relates to caprine arthritis encephalitis virus-based vectors and vector systems that are useful in the delivery of nucleic acids to both non-dividing and dividing cells. Methods for delivering nucleic acids to both non-dividing and dividing cells using the vector systems are also disclosed.
摘要翻译：本发明涉及可用于向不分裂细胞和分裂细胞递送核酸的基于山羊关节炎脑炎病毒的载体和载体系统。还公开了使用载体系统向不分裂细胞和分裂细胞递送核酸的方法。

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