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1. 发明专利

AU2003289593A1 MOLDING SYSTEM FOR MOLDING MICRO PATTERN STRUCTURE HAVING MICRO HEATING ELEMENT AND METHOD FOR FABRICATING MOLD INSERT FOR MOLDING MICRO PATTERN STRUCTURE USED THEREIN 未知
公开(公告)号：AU2003289593A1
公开(公告)日：2004-07-22
申请号：AU2003289593
申请日：2003-12-31
申请人： KANG SHINILL
发明人： KANG SHINILL
IPC分类号： B29C45/73 , B29C33/38 , B29C45/26 , B29C45/77 , B29C45/78 , G11B7/26 , B29C45/14
摘要： A molding system for molding a micro pattern structure includes a mold; a mold insert 6 having a micro pattern, the mold insert 6 being fixed to the mold; and a micro heating element 30 having a micro heater 32 between the mold and the mold insert 6 , the micro heater 32 being formed in an integrated manner by using a MEMS process; wherein the amount of Joule's heat produced by the micro heater 32 is controlled by controlling the amount of electricity applied to the micro heater 32 so as to control a temperature of the mold insert 6 . A method for fabricating the mold insert 6 for molding the micro pattern structure, the mold insert 6 being heated by a micro heater 32 , includes the steps of: coating a photoresist on a back side of either the mold insert 6 or a plate 40 fixed onto the mold insert 6 ; patterning the photoresist by removing a part of the photoresist corresponding to the micro heater 32 using a lithography process; coating a material for forming the micro heater 32 ; and removing the residual photoresist.

2. 发明公开

EP1654764A4 IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME 审中-公开
标题翻译：图像传感器及其制造方法
公开(公告)号：EP1654764A4
公开(公告)日：2007-03-28
申请号：EP04724451
申请日：2004-03-30
申请人： OPTOMECHA CO LTD , KANG SHINILL
发明人： KANG SHINILL
IPC分类号： H01L27/146 , H01L31/0216 , H01L31/0232 , H01L31/10
CPC分类号： H01L27/14627 , H01L27/14605 , H01L27/14621 , H01L27/14625 , H01L27/14629 , H01L27/14685 , H01L31/02162 , H01L31/02327
摘要： An image sensor includes a substrate in which photoelectric elements have been formed, and an array of optical path conversion elements formed at a light so that the optical path converted light may be incident on the substrate, wherein each of the optical path conversion elements has different tangent line gradients on the corresponding parts of incident surfaces according to distances from the center of the image sensor in order to compensate for differences of incident angles of incident light according to the distances from the center of the image sensor. In addition, a method for fabricating the image sensor fabricates the optical path conversion elements according to a photolithography process using a gray scale mask, combinations of the photolithography process and a reactive ion etching process, or combinations of the photolithography process, the reactive ion etching process, and an UV-molding process.

3. 发明申请

WO2008147124A1 ORGANIC ELECTROLUMINESCENT DEVICE 审中-公开
标题翻译：有机电致发光器件
公开(公告)号：WO2008147124A1
公开(公告)日：2008-12-04
申请号：PCT/KR2008/003021
申请日：2008-05-29
申请人： INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY , KANG, Shinill
发明人： KANG, Shinill
IPC分类号： H05B33/02
CPC分类号： H01L51/5275 , H01L27/3244 , H01L2251/5315
摘要： An organic electroluminescent device of a top emission type includes a lower substrate, an organic electroluminescent diode provided over the lower substrate and emitting light by an applied driving current, and an encapsulation substrate provided over the organic electroluminescent diode and encapsulating the organic electroluminescent diode, wherein one or more micro lenses are provided under the encapsulation substrate for each sub-pixel so as to change an orientation angle of light emitted upward from the organic electroluminescent diode. The micro lens has a convex or concave shape facing the organic electroluminescent diode. The micro lens has a spheric or aspheric lens surface. The micro lens has a rectangular outer circumference corresponding to the sub-pixel. The plurality of the micro lenses is provided for each sub-pixel along a long-axis of the sub-pixel. The micro lens is a refraction lens including a Fresnel lens or a diffraction lens.
摘要翻译：顶部发射型的有机电致发光器件包括下基板，设置在下基板上并通过施加的驱动电流发光的有机电致发光二极管，以及设置在有机电致发光二极管上并封装有机电致发光二极管的封装基板，其中在每个子像素的封装衬底之下设置一个或多个微透镜，以便改变从有机电致发光二极管向上发射的光的取向角。微透镜具有面向有机电致发光二极管的凸形或凹形。微透镜具有球面或非球面透镜表面。微透镜具有对应于子像素的矩形外圆周。沿着子像素的长轴为每个子像素设置多个微透镜。微透镜是包括菲涅尔透镜或衍射透镜的折射透镜。

4. 发明申请

WO2008102929A1 CONTINUOUS LITHOGRAPHY APPARATUS AND METHOD USING ULTRAVIOLET NANOIMPRINTING 审中-公开
标题翻译：连续光刻设备和使用超紫外线纳米复印的方法
公开(公告)号：WO2008102929A1
公开(公告)日：2008-08-28
申请号：PCT/KR2007/001942
申请日：2007-04-20
申请人： INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY , KANG, Shinill , AHN, Suho
发明人： KANG, Shinill , AHN, Suho
IPC分类号： H01L21/027
CPC分类号： G03F7/2035 , B29C43/003 , B29C43/222 , B29C43/305 , B29C43/46 , B29C2035/0827 , B29C2043/025 , B29C2043/463 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H05K1/0393 , H05K3/0079 , H05K3/061 , H05K2203/0113 , H05K2203/0143 , H05K2203/1545
摘要： A continuous lithography apparatus performs a lithography process while performing a continuous transport. The apparatus can include an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a second removing part for removing an exposed portion of the conductive layer; and a third removing part for removing a remaining portion of the photosensitive layer, wherein the ultraviolet nanoimprinting part and the first to third removing parts are arranged along a route of the continuous transport. The apparatus can include an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a metal layer forming part for forming a metal layer on an exposed portion of the conductive layer; a third removing part for removing a remaining portion of the photosensitive layer; and a fourth removing part for removing an exposed portion of the conductive layer, wherein the ultraviolet nanoimprinting part, the first removing part, the metal layer forming part, the third removing part and the fourth removing part are arranged along a route of the continuous transport. A continuous lithography method performs a lithography process while performing a continuous transport.
摘要翻译：连续光刻设备在进行连续传送的同时执行光刻处理。该装置可以包括用于在感光层上进行紫外线纳米压印的紫外线纳米压印部件，其使用图案化的辊压机在导电层上形成，以在感光层上形成图案; 用于去除感光层的残留层的第一去除部分; 用于去除所述导电层的暴露部分的第二去除部分; 以及用于去除感光层的剩余部分的第三去除部分，其中紫外线纳米压印部分和第一至第三去除部分沿着连续传输的路线布置。该装置可以包括用于在感光层上进行紫外线纳米压印的紫外线纳米压印部件，其使用图案化的辊压机在导电层上形成，以在感光层上形成图案; 用于去除感光层的残留层的第一去除部分; 用于在导电层的暴露部分上形成金属层的金属层形成部分; 用于去除感光层的剩余部分的第三去除部分; 以及用于去除导电层的露出部分的第四去除部分，其中紫外线纳米压印部分，第一去除部分，金属层形成部分，第三去除部分和第四去除部分沿着连续传输的路线布置。连续光刻方法在进行连续传送的同时执行光刻工艺。

5. 发明申请

WO2007108663A1 LENTILLE DE FRESNEL ET DEL L'UTILISANT 审中-公开
公开(公告)号：WO2007108663A1
公开(公告)日：2007-09-27
申请号：PCT/KR2007/001423
申请日：2007-03-23
申请人： INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY , KANG, Shinill , KIM, Byungwook
发明人： KANG, Shinill , KIM, Byungwook
IPC分类号： G02B3/08
CPC分类号： G02B3/08 , H01L33/58
摘要： L'invention porte sur une lentille de Fresnel dont l'angle de traînée θ est identique à l'angle de rayonnement Φ, et sur une DEL l'utilisant. Ladite lentille 50b, disposée devant la DEL 10 modifie le cheminement optique de sa lumière. Une couche fluorescente 30 recouvrant la DEL 10 est traversée par sa lumière. La DEL 10 émet une lumière bleue. La couche fluorescente 30, faite d'un matériau fluorescent de YAG:Ce, est plus épaisse dans le sens transversal de la DEL 10 que dans son sens longitudinal. Un réflecteur 20 en coupelle où est placée la DEL 10 renvoie vers l'avant sa lumière émise latéralement.
摘要翻译：欧莱雅发明博物馆 est identiqueàl'angle de rayonnement F，et sur une del l'utilisant。 Ladite lentille 50b，depéedevant la DEL 10 modifie le cheminement optique de salumière。 Une couche fluorescente 30 recouvrant la DEL 10 esttraverséepar salumière。 La DEL 10émetunelumièrebleue。 La couche fluorescente 30，faest d'unmatériaufluorescent de YAG：Ce，est plusépaissedans le sens transversal de la DEL 10 que dans son sens longitudinal。 Unréflecteur20 en coupelleoùestplacéela DEL 10 renvoie vers l'avant salumièreémiselatéralement。

6. 发明申请

WO2004058479A1 MOLDING SYSTEM FOR MOLDING MICRO PATTERN STRUCTURE HAVING MICRO HEATING ELEMENT AND METHOD FOR FABRICATING MOLD INSERT FOR MOLDING MICRO PATTERN STRUCTURE USED THEREIN 审中-公开
标题翻译：用于模制具有微加热元件的微型结构的模制系统和用于模制用于模制的微型模式结构的模具插件的方法
公开(公告)号：WO2004058479A1
公开(公告)日：2004-07-15
申请号：PCT/KR2003/002939
申请日：2003-12-31
申请人： KANG, Shinill
发明人： KANG, Shinill
IPC分类号： B29C45/73
CPC分类号： B29C45/2632 , B29C33/3842 , B29C45/2642 , B29C45/77 , B29C45/78 , B29C2945/76006 , B29C2945/7604 , B29C2945/76294 , B29C2945/76454 , B29C2945/76458 , B29C2945/76525 , B29C2945/76531 , B29C2945/76732 , B29C2945/76772 , B29C2945/76946 , B29D17/005 , B29L2017/005 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B7/263
摘要： A molding system for molding a micro pattern structure includes a mold; a mold insert 6 having a micro pattern, the mold insert 6 being fixed to the mold; and a micro heating element 30 having a micro heater 32 between the mold and the mold insert 6, the micro heater 32 being formed in an integrated manner by using a MEMS process; wherein the amount of Joule’s heat produced by the micro heater 32 is controlled by controlling the amount of electricity applied to the micro heater 32 so as to control a temperature of the mold insert 6. A method for fabricating the mold insert 6 for molding the micro pattern structure, the mold insert 6 being heated by micro heater 32, includes the steps of : coating a photoresist on a back side of either the mold insert 6 or a plate 40 fixed onto the mold insert 6; patterning the photoresist by removing a part of the photoresist corresponding to the micro heater 32 using a lithography process; coating a material for forming the micro heater 32; and removing the residual photoresist.
摘要翻译：用于模制微图案结构的模制系统包括模具; 具有微图案的模具插入件6，模具插入件6固定到模具上; 微加热元件30在模具和模具插入件6之间具有微加热器32，微加热器32通过使用MEMS工艺以集成的方式形成; 其中通过控制施加到微加热器32的电量来控制由微加热器32产生的焦耳热量，以便控制模具插入件6的温度。一种制造用于模制微型加热器的模具插入件6的方法图案结构，模具插入件6由微加热器32加热，包括以下步骤：在固定在模具插入件6上的模具插入件6或板40的后侧涂覆光致抗蚀剂; 通过使用光刻工艺去除对应于微加热器32的一部分光致抗蚀剂图案化; 涂覆用于形成微加热器32的材料; 并除去残留的光致抗蚀剂。

7. 发明申请

WO2009145376A1 LIGHT EMITTING DIODE MODULE HAVING LENS AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：具有透镜的发光二极管模块及其制造方法
公开(公告)号：WO2009145376A1
公开(公告)日：2009-12-03
申请号：PCT/KR2008/003059
申请日：2008-05-30
申请人： INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY , KANG, Shinill , KIM, Byungwook
发明人： KANG, Shinill , KIM, Byungwook
IPC分类号： H01L33/00
CPC分类号： H01L33/58
摘要： A method of manufacturing a lens integrated light emitting diode (LED) module includes the steps of: (a) mounting an LED module array 100 having a lead frame 110 and a plurality of LED module parts 120 provided on the lead frame onto a holding jig 200; (b) injecting fluid resin 320 into a plurality of lens cavities 310 formed on a mold 300; (c) joining the mold 300 to the holding jig 200; and (d) curing the fluid resin 320 to integrally form a lens 400 on an LED module. A process for separately manufacturing a lens and equipment for aligning a lens with a housing are not necessary, which serves to shorten the manufacturing process and lower the manufacturing cost. A process of bonding a lens to a housing can be removed, which serves to increase light emitting efficiency and make light distribution uniform.
摘要翻译：一种制造透镜集成发光二极管（LED）模块的方法包括以下步骤：（a）将设置在引线框架上的引线框架110和多个LED模块部件120的LED模块阵列100安装到保持夹具上 200; （b）将流体树脂320注入形成在模具300上的多个透镜腔310中; （c）将模具300连接到保持夹具200; 和（d）固化流体树脂320以在LED模块上一体地形成透镜400。用于单独制造用于使透镜与壳体对准的透镜和设备的方法不是必需的，这用于缩短制造过程并降低制造成本。可以去除将透镜粘合到壳体的过程，其用于提高发光效率并使光分布均匀。

8. 发明申请

WO2009082150A3 FORMING METHOD OF MAGNETIC PATTERN AND MANUFACTURING METHOD OF PATTERNED MEDIA USING THE SAME 审中-公开
标题翻译：磁性图案的形成方法及使用该方法制作图案媒体的方法
公开(公告)号：WO2009082150A3
公开(公告)日：2009-09-11
申请号：PCT/KR2008007582
申请日：2008-12-22
申请人： IND ACADEMIC COOP , HONG JONGILL , KANG SHINILL
发明人： HONG JONGILL , KANG SHINILL
IPC分类号： G11B5/84
CPC分类号： G11B5/855
摘要： The present invention relates to a method for fabricating a magnetic pattern and a method for manufacturing a patterned media through fabrication of the magnetic pattern. The method for fabricating the magnetic pattern according to an embodiment of the present invention comprises the steps of (a) coating a pattern forming layer for fabricating a magnetic pattern on a substrate; (b) forming a mask layer that has a designed opening pattern with a nano imprinting process using a stamp that has a nanostructure pattern on the pattern forming layer; and (c) converting an area of the pattern forming layer that corresponds to the predetermined opening pattern into a magnetic area by irradiating a predetermined hydrogen ion beam onto the mask layer.
摘要翻译：制造磁性图案的方法和制造图案介质的方法技术领域本发明涉及制造磁性图案的方法和通过制造磁性图案制造图案化介质的方法。根据本发明实施例的制造磁性图案的方法包括以下步骤：（a）在基板上涂布用于制造磁性图案的图案形成层; （b）利用在图案形成层上具有纳米结构图案的印模，利用纳米压印工艺形成具有设计的开口图案的掩模层; （c）通过将预定的氢离子束照射到掩模层上，将图案形成层的与预定开口图案对应的区域转换成磁性区域。

9. 发明申请

WO2009005317A2 LENS UNIT COMPOSED OF DIFFERENT MATERIALS AND CAMERA MODULE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：由不同材料和相机模块组成的镜头单元及用于制造相同模块的方法
公开(公告)号：WO2009005317A2
公开(公告)日：2009-01-08
申请号：PCT/KR2008/003935
申请日：2008-07-03
申请人： OPTOMECHA CO., LTD. , KANG, Shinill , LIM, Ji Seok , CHOI, Min Seok
发明人： KANG, Shinill , LIM, Ji Seok , CHOI, Min Seok
IPC分类号： G02B3/00
CPC分类号： G02B7/022 , B29D11/00432
摘要： A lens unit composed of different materials includes a base and a lens. A part of a camera module of a different material from the lens is used as the base. The lens of optical resin is directly replicated on the base such that the lens is integrally formed on the base. A camera module is provided with the lens unit. The lens/lenses is/are formed on the single base/multiple bases to form the lens unit/units, using a die whose surface contacting the base slopes in relation to its central axis to allow the base to self-align.
摘要翻译：由不同材料构成的镜头单元包括基座和镜头。使用与镜头不同材质的相机模块的一部分作为底座。光学树脂的透镜直接复制在底座上，使得透镜整体形成在底座上。相机模块与镜头单元一起提供。使用其表面接触基座的表面相对于其中心轴线倾斜以允许基座自对准的模具，在单个基座/多个基座上形成透镜/透镜以形成透镜单元/单元。

10. 发明申请

WO2009069940A1 DEVICE AND METHOD FOR FABRICATING LENS 审中-公开
标题翻译：用于制作镜片的装置和方法
公开(公告)号：WO2009069940A1
公开(公告)日：2009-06-04
申请号：PCT/KR2008/006975
申请日：2008-11-26
申请人： OPTOMECHA CO., LTD. , KANG, Shinill , LIM, Ji Seok , CHOI, Min Seok
发明人： KANG, Shinill , LIM, Ji Seok , CHOI, Min Seok
IPC分类号： B29C35/08
CPC分类号： B29C35/0894 , B29C2035/0827 , B29D11/00442 , B29L2011/0016
摘要： A device for fabricating a lens includes a mold which molds UV curable resin applied onto a base; an UV source which irradiates the UV curable resin with UV light; and an irradiation rate controller which controls, according to position, irradiation rates at which the UV curable resin is irradiated with the UV light. Preferably, the irradiation rate controller controls the irradiation rates such that an irradiation rate at which a central area of the UV curable resin is irradiated is higher than an irradiation rate at which a peripheral area of the UV curable resin is irradiated. Preferably, the mold provides an empty space around the UV curable resin. According to one embodiment, the irradiation rate controller is a mask which has a higher transmittance to the UV light at a central area than at a peripheral area. According to another embodiment, the irradiation rate controller is a diaphragm which expands an irradiation area from the central area of the UV curable resin to the peripheral area of the UV curable resin. According to still another embodiment, the irradiation rate controller is an optical system whose focal length can be controlled. According to still another embodiment, the irradiation rate controller moves an irradiation area in a radial direction from the central area of the UV curable resin to the peripheral area of the UV curable resin.
摘要翻译：用于制造透镜的装置包括：将施加到基底上的UV固化树脂模制的模具; 用UV光照射UV固化树脂的UV源; 以及照射速度控制器，其根据位置控制用UV光照射UV固化树脂的照射速率。优选地，照射速度控制器控制照射速率，使得照射紫外线固化树脂的中心区域的照射速率高于照射紫外线固化树脂的周边区域的照射速度。优选地，模具提供围绕UV可固化树脂的空白空间。根据一个实施例，照射速度控制器是对中心区域的UV光具有比周边区域更高的透射率的掩模。根据另一实施例，照射速度控制器是将UV固化树脂的中心区域的照射区域扩展到UV固化树脂的周边区域的隔膜。根据另一个实施例，照射速度控制器是可以控制其焦距的光学系统。根据另一实施例，照射速度控制器将从UV固化树脂的中心区域的径向的照射区域移动到UV固化树脂的周边区域。

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