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1. 发明申请

WO2009082150A3 FORMING METHOD OF MAGNETIC PATTERN AND MANUFACTURING METHOD OF PATTERNED MEDIA USING THE SAME 审中-公开
标题翻译：磁性图案的形成方法及使用该方法制作图案媒体的方法
公开(公告)号：WO2009082150A3
公开(公告)日：2009-09-11
申请号：PCT/KR2008007582
申请日：2008-12-22
申请人： IND ACADEMIC COOP , HONG JONGILL , KANG SHINILL
发明人： HONG JONGILL , KANG SHINILL
IPC分类号： G11B5/84
CPC分类号： G11B5/855
摘要： The present invention relates to a method for fabricating a magnetic pattern and a method for manufacturing a patterned media through fabrication of the magnetic pattern. The method for fabricating the magnetic pattern according to an embodiment of the present invention comprises the steps of (a) coating a pattern forming layer for fabricating a magnetic pattern on a substrate; (b) forming a mask layer that has a designed opening pattern with a nano imprinting process using a stamp that has a nanostructure pattern on the pattern forming layer; and (c) converting an area of the pattern forming layer that corresponds to the predetermined opening pattern into a magnetic area by irradiating a predetermined hydrogen ion beam onto the mask layer.
摘要翻译：制造磁性图案的方法和制造图案介质的方法技术领域本发明涉及制造磁性图案的方法和通过制造磁性图案制造图案化介质的方法。根据本发明实施例的制造磁性图案的方法包括以下步骤：（a）在基板上涂布用于制造磁性图案的图案形成层; （b）利用在图案形成层上具有纳米结构图案的印模，利用纳米压印工艺形成具有设计的开口图案的掩模层; （c）通过将预定的氢离子束照射到掩模层上，将图案形成层的与预定开口图案对应的区域转换成磁性区域。

2. 发明申请

WO2009113833A2 WAFER SCALE LENS ARRAY, MOLDING APPARATUS THEREOF AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译： WAFER SCALE LENS ARRAY，其成型设备及其制造方法
公开(公告)号：WO2009113833A2
公开(公告)日：2009-09-17
申请号：PCT/KR2009001267
申请日：2009-03-13
申请人： IND ACADEMIC COOP , KANG SHINILL , LIM JI SEOK , CHOI MIN SEOK , KIM HO KWAN
发明人： KANG SHINILL , LIM JI SEOK , CHOI MIN SEOK , KIM HO KWAN
IPC分类号： G02B3/00
CPC分类号： G02B3/0031
摘要： The present invention provides a wafer scale lens array which prevents a substrate from getting bent or damaged and minimizes the required force for separating a mold member, and a manufacturing method thereof. The disclosed manufacturing method of the wafer scale lens array comprises the steps of: applying a certain thickness of optical polymer lens material on the surface of a substrate; molding plural lens units which comprise the optical section by pressurizing the optical polymer with a mold member; hardening the lens unit only by applying an ultraviolet ray-blocking layer on a residual layer which comprises the non-optical section and scanning ultraviolet rays thereon through the mold member; making a lens unit array on the substrate whereon plural lens units are independently and evenly arrayed due to separation of the mold member from the substrate and cleaning and removal of the unhardened residual layer.
摘要翻译：本发明提供了一种防止基板弯曲或损坏并最小化分离模具所需的力的晶片级透镜阵列及其制造方法。所公开的晶片级透镜阵列的制造方法包括以下步骤：在衬底的表面上施加一定厚度的光学聚合物透镜材料; 通过用模具加压所述光学聚合物来模制包括所述光学部分的多个透镜单元; 仅通过在包括非光学部分的残余层上并通过模具扫描紫外线施加紫外线阻挡层来硬化透镜单元; 在基板上制造透镜单元阵列，其中多个透镜单元由于模具构件与基板的分离而被独立且均匀排列，并且清洁和去除未硬化的残留层。

3. 发明专利

AU2003289593A1 MOLDING SYSTEM FOR MOLDING MICRO PATTERN STRUCTURE HAVING MICRO HEATING ELEMENT AND METHOD FOR FABRICATING MOLD INSERT FOR MOLDING MICRO PATTERN STRUCTURE USED THEREIN 未知
公开(公告)号：AU2003289593A1
公开(公告)日：2004-07-22
申请号：AU2003289593
申请日：2003-12-31
申请人： KANG SHINILL
发明人： KANG SHINILL
IPC分类号： B29C45/73 , B29C33/38 , B29C45/26 , B29C45/77 , B29C45/78 , G11B7/26 , B29C45/14
摘要： A molding system for molding a micro pattern structure includes a mold; a mold insert 6 having a micro pattern, the mold insert 6 being fixed to the mold; and a micro heating element 30 having a micro heater 32 between the mold and the mold insert 6 , the micro heater 32 being formed in an integrated manner by using a MEMS process; wherein the amount of Joule's heat produced by the micro heater 32 is controlled by controlling the amount of electricity applied to the micro heater 32 so as to control a temperature of the mold insert 6 . A method for fabricating the mold insert 6 for molding the micro pattern structure, the mold insert 6 being heated by a micro heater 32 , includes the steps of: coating a photoresist on a back side of either the mold insert 6 or a plate 40 fixed onto the mold insert 6 ; patterning the photoresist by removing a part of the photoresist corresponding to the micro heater 32 using a lithography process; coating a material for forming the micro heater 32 ; and removing the residual photoresist.

4. 发明公开

EP1654764A4 IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME 审中-公开
标题翻译：图像传感器及其制造方法
公开(公告)号：EP1654764A4
公开(公告)日：2007-03-28
申请号：EP04724451
申请日：2004-03-30
申请人： OPTOMECHA CO LTD , KANG SHINILL
发明人： KANG SHINILL
IPC分类号： H01L27/146 , H01L31/0216 , H01L31/0232 , H01L31/10
CPC分类号： H01L27/14627 , H01L27/14605 , H01L27/14621 , H01L27/14625 , H01L27/14629 , H01L27/14685 , H01L31/02162 , H01L31/02327
摘要： An image sensor includes a substrate in which photoelectric elements have been formed, and an array of optical path conversion elements formed at a light so that the optical path converted light may be incident on the substrate, wherein each of the optical path conversion elements has different tangent line gradients on the corresponding parts of incident surfaces according to distances from the center of the image sensor in order to compensate for differences of incident angles of incident light according to the distances from the center of the image sensor. In addition, a method for fabricating the image sensor fabricates the optical path conversion elements according to a photolithography process using a gray scale mask, combinations of the photolithography process and a reactive ion etching process, or combinations of the photolithography process, the reactive ion etching process, and an UV-molding process.

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