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    • 3. 发明申请
    • Semiconductor laser device and method of fabricating the same
    • 半导体激光器件及其制造方法
    • US20040032895A1
    • 2004-02-19
    • US10641462
    • 2003-08-14
    • KABUSHIKI KAISHI TOSHIBA
    • Makoto OkadaKoichi Gen-Ei
    • H01S005/00
    • H01S5/4031H01S5/0287H01S5/4087
    • A monolithic two-wavelength semiconductor laser device includes a front end face film 19 on a resonator front end face 18, and a high-reflectivity end face film 22 as a multilayered film on a resonator rear end face 21. The front end face film 19 is formed using a low-refractive-index material, and the film thickness is so set that the reflectivity is 20%. The high-reflectivity end face film 22 is formed by alternately stacking thin films of low- and high-refractive-index materials, and the film thickness is so set that the reflectivity is 80%. The film thickness of each of these two end face films is calculated by an optical length dnull(1/4nullj)nullnullm by using a mean value nullmnull(null1nullnull2)/2 of the oscillation wavelengths of the two semiconductor laser diodes. This makes it possible to obtain an end face film having a desired reflectivity and capable of being formed at once, and to fabricate a two-wavelength semiconductor laser device having high reliability, meeting the required performance, and also having high productivity.
    • 单片双波长半导体激光装置包括谐振器前端面18上的前端面膜19和谐振器后端面21上作为多层膜的高反射率端面膜22.前端面膜19 使用低折射率材料形成,并且膜厚度被设定为反射率为20%。 高反射率端面膜22是通过交替层叠低折射率材料和高折射率材料的薄膜形成的,膜厚设定为反射率为80%。 通过使用两个半导体激光器的振荡波长的平均值lambdam =(λ1+λ2)/ 2,通过光学长度d =(1/4 + j)×lambdam来计算这两个端面膜中的每一个的膜厚度 二极管。 这使得可以获得具有期望的反射率并能够立即形成的端面膜,并且制造具有高可靠性,满足所需性能并且还具有高生产率的双波长半导体激光器件。
    • 7. 发明授权
    • Power monitoring system
    • 电力监控系统
    • US08837664B2
    • 2014-09-16
    • US14062376
    • 2013-10-24
    • Kabushiki Kaishi Toshiba
    • Hirotaka SakaiNaotaka OdaTadashi MiyazakiToshifumi Sato
    • G01C17/00G21C17/108G21C1/04
    • G21C17/108
    • The power monitoring system has: a local power range monitor (LPRM) unit that has a plurality of local power channels to obtain local neutron distribution in a nuclear reactor core; an averaged power range monitor (APRM) unit that receives power output signals from the LPRM unit and obtains average output power signal of the reactor core as a whole; and an oscillation power range monitor (OPRM) unit that receives the power output signals from the LPRM unit and monitors power oscillations of the reactor core. The output signals from the LPRM unit to the APRM unit and the output signals from the LPRM unit to the OPRM unit are independent.
    • 功率监测系统具有:具有多个局部功率通道以在核反应堆堆芯中获得局部中子分布的局部功率范围监视器(LPRM)单元; 平均功率范围监视器(APRM)单元,其从LPRM单元接收功率输出信号,并获得整个反应堆堆芯的平均输出功率信号; 以及振荡功率范围监视器(OPRM)单元,其接收来自LPRM单元的功率输出信号并监测反应堆堆芯的功率振荡。 从LPRM单元到APRM单元的输出信号和从LPRM单元到OPRM单元的输出信号是独立的。
    • 10. 发明申请
    • PATTERN INSPECTION EQUIPMENT, PATTERN INSPECTION METHOD, AND STORAGE MEDIUM STORING PATTERN INSPECTION PROGRAM
    • 模式检验设备,图案检查方法和存储介质存储模式检查程序
    • US20010012390A1
    • 2001-08-09
    • US09122779
    • 1998-07-27
    • KABUSHIKI KAISHI TOSHIBA
    • TOSHIYUKI WATANABE
    • G06K009/00
    • G06T7/0006G06T2207/30121G06T2207/30148
    • Pattern inspection equipment has at least a measured data generation unit for generating measured data from patterns that have been delineated on a sample according to design data, a reference data generation unit for generating reference data used to inspect the patterns from gradational data expressed in multiple gradation levels, and a fault decision circuit for comparing the measured data with the reference data. The reference data generation unit has a multi-valued pattern development circuit for developing the design data into the gradational data and a fine adjustment circuit for finely shifting the positions or adjusting the curvatures of pattern edges in the pattern constructed with the gradational data. The fine adjustment of the pattern edges is necessary to cope with slightly displaced edges and rounded corners of the actual patterns on the sample. These slightly displaced edges and rounded corners are caused through mask manufacturing processes and are frequently smaller than the size of a sensor pixel. To adjust the reference data to the displaced edges, a size modification circuit detects a maximum value in a specified area in the gradational data and modifies the size of the pattern constructed with the gradational data. To adjust the reference data to match with the actual rounded corners, a corner rounding circuit rounds corners in the pattern constructed with the gradational data. Also provided is a pattern inspection method for developing the design data into the gradational data, adjusting the gradational data to displaced edges and rounded corners of the actual patterns and preparing the reference data, and testing the patterns for faults. Further provided is a storage medium for storing a pattern inspection program for realizing the pattern inspection method.
    • 模式检查设备至少具有测量数据生成单元,用于根据设计数据从已经在样本上划定的模式生成测量数据;参考数据生成单元,用于生成用于根据以多个等级表示的分级数据检查模式的参考数据 电平,以及用于将测量数据与参考数据进行比较的故障判定电路。 参考数据生成单元具有用于将设计数据发展成渐变数据的多值图案开发电路和用于精细移位位置或调整由渐变数据构成的图案中的图案边缘的曲率的微调电路。 图案边缘的精细调整是必要的,以应对样品上实际图案的稍微偏移的边缘和圆角。 这些略微偏移的边缘和圆角是通过掩模制造工艺引起的,并且通常小于传感器像素的尺寸。 为了将参考数据调整到移位边缘,尺寸修改电路检测渐变数据中指定区域中的最大值,并修改由渐变数据构成的图案的大小。 为了调整参考数据以与实际的圆角匹配,一个圆角圆形回转线使用渐变数据构造的图案中的角落圆。 还提供了一种用于将设计数据开发到等级数据的模式检查方法,将等级数据调整到实际模式的偏移边缘和圆角,并准备参考数据,并测试故障模式。 还提供了一种用于存储用于实现图案检查方法的图案检查程序的存储介质。