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1. 发明申请

US20050138062A1 Method, computer program, apparatus and system for the selective communication of data sets 审中-公开
标题翻译：方法，计算机程序，用于数据集的选择性通信的装置和系统
公开(公告)号：US20050138062A1
公开(公告)日：2005-06-23
申请号：US10999809
申请日：2004-11-29
申请人： Max Mergenthaler , Jurgen Preuninger
发明人： Max Mergenthaler , Jurgen Preuninger
IPC分类号： G06F17/30 , H04L29/02
CPC分类号： G06Q30/02
摘要： Method for selectively communicating data sets. The method includes the steps of detecting at least one data set of a first user, the data set being communicated via an at least unidirectional connection, detecting at least one data set of at least one second user, comparing at least one part of the detected data sets, and if a matching result is been determined, communicating at least one part of the data set of the first user to the second user, and/or communicating at least one part of the data set of the second user to the first user. Also, a computer program, an apparatus, and a system for selectively communicating data sets.
摘要翻译：选择性地传送数据集的方法。该方法包括以下步骤：检测第一用户的至少一个数据集，所述数据集经由至少单向连接进行通信，检测至少一个第二用户的至少一个数据集，比较所检测到的至少一个部分数据集，并且如果确定了匹配结果，则将第一用户的数据集的至少一部分传送给第二用户，和/或将第二用户的数据集的至少一部分传送给第一用户。另外，一种用于选择性地传送数据集的计算机程序，装置和系统。

2. 发明授权

US06809800B2 Apparatus for patterning a semiconductor wafer 失效
标题翻译：用于图案化半导体晶片的装置
公开(公告)号：US06809800B2
公开(公告)日：2004-10-26
申请号：US10424039
申请日：2003-04-25
申请人： Oliver Genz , Jurgen Preuninger , Gerhard Kunkel
发明人： Oliver Genz , Jurgen Preuninger , Gerhard Kunkel
IPC分类号： G03B2752
CPC分类号： G03F7/70358 , G03F7/70725
摘要： An apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.
摘要翻译：一种用于对半导体晶片（130）的表面进行图案化的设备（100）。舞台（148）耦合到电动机（150），其适于以第一速度A在水平方向上移动舞台（148）和半导体晶片（130）。掩模（140）设置在半导体晶片（130），所述掩模（140）联接到电动机（142），所述电动机适于以第二速度B在水平方向上移动所述掩模（140）。所述第一和第二速度的比率不同于如果使用透镜（120），其可以不同于1：1。掩模（140）和晶片（130）可以分别在不同速度B和A的曝光过程期间在相同的水平方向上移动，以提供掩模（140）图案到晶片上的放大或缩小 130）表面。

3. 发明授权

US06558883B2 Apparatus and method for patterning a semiconductor wafer 有权
公开(公告)号：US06558883B2
公开(公告)日：2003-05-06
申请号：US09801413
申请日：2001-03-08
申请人： Oliver Genz , Jurgen Preuninger , Gerhard Kunkel
发明人： Oliver Genz , Jurgen Preuninger , Gerhard Kunkel
IPC分类号： G03F720
CPC分类号： G03F7/70358 , G03F7/70725
摘要： A method and apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.

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