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    • 2. 发明申请
    • DEVICE AND PROCESS FOR WET TREATING A PERIPHERAL AREA OF A WAFER-SHAPED ARTICLE
    • 湿法处理波浪形文字的外围区域的设备和方法
    • US20100288312A1
    • 2010-11-18
    • US12743474
    • 2008-11-12
    • Dieter FrankJurgen ParzefallAlexander Schwarzfurtner
    • Dieter FrankJurgen ParzefallAlexander Schwarzfurtner
    • B08B3/00
    • H01L21/67051H01L21/6708
    • A device for wet treating a peripheral area of a wafer-shaped article includes holding elements for holding and rotating the wafer-shaped article at its edge, a first and a second liquid treatment units for supplying liquid towards the peripheral area. The holding elements include rollers for driving the wafer-shaped article at its edge. The first liquid treatment unit includes a first liquid carrier for providing a first liquid to wet a first section of the peripheral area, a first liquid supply nozzle for supplying liquid to the first liquid carrier, and a first liquid discharging channel for removing liquid from the first liquid carrier. The second liquid treatment unit includes, a second liquid carrier for providing a second liquid to wet a second section of the peripheral area, a second liquid supply nozzle for supplying liquid to the second liquid carrier, a second liquid discharging channel for removing liquid from the second liquid carrier, and a second gas treatment section with a gas supply nozzle for supplying gas towards the peripheral area, which has been treated with the second liquid for removing most of the second liquid from the peripheral area, and with a gas discharge channel for discharging gas and removed liquid.
    • 用于湿处理晶片状物品的周边区域的装置包括用于在其边缘保持和旋转晶片状物品的保持元件,用于向周边区域供应液体的第一和第二液体处理单元。 保持元件包括用于在其边缘处驱动晶片状物品的辊。 第一液体处理单元包括用于提供第一液体以润湿周边区域的第一部分的第一液体载体,用于向第一液体载体供给液体的第一液体供给喷嘴和用于从第一液体载体中除去液体的第一液体排出通道 第一液载体。 第二液体处理单元包括用于提供第二液体以润湿周边区域的第二部分的第二液体载体,用于向第二液体载体供应液体的第二液体供应喷嘴,用于从第二液体载体中除去液体的第二液体排出通道 第二液体载体和第二气体处理部,其具有用于向周边区域供应气体的气体供给喷嘴,所述气体供给喷嘴已经用用于从周边区域除去大部分第二液体的第二液体处理,并且具有气体排出通道 排出气体并除去液体。