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1. 发明授权

US06335148B2 Method for manufacturing TFT LCD device 有权
标题翻译： TFT液晶显示装置的制造方法
公开(公告)号：US06335148B2
公开(公告)日：2002-01-01
申请号：US09740497
申请日：2000-12-19
申请人： Seok Lyul Lee , Jung Mok Jun , Seung Min Lee
发明人： Seok Lyul Lee , Jung Mok Jun , Seung Min Lee
IPC分类号： G03F700
CPC分类号： G02F1/1368 , G02F1/134363
摘要： Disclosed is a method for manufacturing a thin film transistor LCD device, in which a counter and a gate bus line are made in a single photolithography process, and a channel of a thin film transistor, a source electrode, a drain electrode, ohmic contacts for the source and drain electrodes are made in a single photolithography process. The method involves the steps of forming a first photoresist layer on said deposited metal layer for the gate bus line; exposing said first photoresist layer to a scanning light, so that the portion of the first photoresist layer disposed over a counter electrode region for forming said counter electrode may be partially lightened; patterning said first photoresist layer so that an area of the metal layer for the gate bus line lying under the partially lightened portion of the first photoresist layer may not be exposed; patterning said metal layer for the gate bus line by using said patterned first photoresist layer as a barrier layer so that said counter electrode region and a gate bus line region may be defined; patterning said transparent conductive layer for the counter electrode by using said patterned metal layer as a barrier layer so that said counter electrode may be formed; patterning said metal layer for the gate bus line by using said patterned first photoresist layer as a barrier layer so that said gate bus line may be formed.
摘要翻译：公开了一种用于制造薄膜晶体管LCD器件的方法，其中在单个光刻工艺中制造计数器和栅极总线，以及薄膜晶体管，源极，漏极，欧姆接触的通道源电极和漏电极由单个光刻工艺制成。该方法包括在用于栅极总线的所述沉积金属层上形成第一光致抗蚀剂层的步骤; 将所述第一光致抗蚀剂层暴露于扫描光，使得设置在用于形成所述对电极的对电极区域上的第一光致抗蚀剂层的部分可以被部分减轻; 图案化所述第一光致抗蚀剂层，使得位于第一光致抗蚀剂层的部分减轻部分下方的栅极总线的金属层的面积可能不暴露; 通过使用所述图案化的第一光致抗蚀剂层作为阻挡层来图案化用于栅极总线的所述金属层，使得可以限定所述对电极区域和栅极总线区域; 通过使用所述图案化金属层作为阻挡层来图案化用于对电极的透明导电层，从而可形成所述对电极; 通过使用所述图案化的第一光致抗蚀剂层作为阻挡层来图案化用于栅极总线的所述金属层，使得可以形成所述栅极总线。

2. 发明授权

US09116391B2 Liquid crystal display 有权
公开(公告)号：US09116391B2
公开(公告)日：2015-08-25
申请号：US13698473
申请日：2012-09-13
申请人： Hyunsic Choi , Hui Li , Zhiqiang Xu , Jung Mok Jun
发明人： Hyunsic Choi , Hui Li , Zhiqiang Xu , Jung Mok Jun
IPC分类号： G02F1/1337 , G02F1/13363 , G02B5/30 , G02F1/1343 , G02F1/1335
摘要： An embodiment of the present invention relates to a liquid crystal display. An upper surface alignment layer in the liquid crystal display is arranged to comprise, in the direction from a color filter substrate to a liquid crystal layer, a first upper surface alignment layer, a color washout compensation film layer and a second upper surface alignment layer; an alignment direction of the color washout compensation film layer is opposite to the pre-alignment direction of the liquid crystal layer. In the technical solution, the color washout compensation film layer is used to rectify the color washout problem occurring when the screen of a liquid crystal display screen of a fringe field switching mode is viewed from both the left side and right sides.

3. 发明申请

US20130194530A1 LIQUID CRYSTAL DISPLAY 有权
标题翻译：液晶显示器
公开(公告)号：US20130194530A1
公开(公告)日：2013-08-01
申请号：US13698473
申请日：2012-09-13
申请人： Hyunsic Choi , Hui Li , Zhiqiang Xu , Jung Mok Jun
发明人： Hyunsic Choi , Hui Li , Zhiqiang Xu , Jung Mok Jun
IPC分类号： G02F1/13363
CPC分类号： G02F1/13363 , G02B5/3016 , G02B5/3083 , G02F1/133723 , G02F1/134363 , G02F2001/133565 , G02F2001/133633 , G02F2001/133738
摘要： An embodiment of the present invention relates to a liquid crystal display. An upper surface alignment layer in the liquid crystal display is arranged to comprise, in the direction from a color filter substrate to a liquid crystal layer, a first upper surface alignment layer, a color washout compensation film layer and a second upper surface alignment layer; an alignment direction of the color washout compensation film layer is opposite to the pre-alignment direction of the liquid crystal layer. In the technical solution, the color washout compensation film layer is used to rectify the color washout problem occurring when the screen of a liquid crystal display screen of a fringe field switching mode is viewed from both the left side and right sides.
摘要翻译：本发明的实施例涉及一种液晶显示器。液晶显示器中的上表面取向层被配置为在从滤色器基板到液晶层的方向上包括第一上表面取向层，彩色冲洗补偿膜层和第二上表面取向膜; 彩色冲洗补偿膜层的取向方向与液晶层的预取向相反。在技术方案中，使用彩色冲洗补偿膜层来校正当从左侧和右侧观看边缘场切换模式的液晶显示屏的屏幕时发生的彩色冲洗问题。

4. 发明授权

US06500702B2 Method for manufacturing thin film transistor liquid crystal display 有权
标题翻译：制造薄膜晶体管液晶显示器的方法
公开(公告)号：US06500702B2
公开(公告)日：2002-12-31
申请号：US09736905
申请日：2000-12-13
申请人： Deuk Su Lee , Jung Mok Jun
发明人： Deuk Su Lee , Jung Mok Jun
IPC分类号： H01L2184
CPC分类号： H01L27/1288 , H01L27/1255
摘要： The present invention discloses a method for manufacturing thin film transistor liquid crystal display including the following steps so as to form simultaneously a via hole for contacting a drain electrode and a pixel electrode mutually and the channel of thin film transistor: forming sequentially gate insulation layer, amorphous silicon layer for channel and doped semiconductor layer for ohmic contact, and metal layer for source/drain electrode on the back substrate where the gate electrode and the storage capacitor electrode have been formed; patterning the metal layer for source/drain electrode and the doped semiconductor layer for ohmic contact through a second photolithograph process so that the source electrode, the drain electrode, and the ohmic contacts thereof may be formed; forming a passivation layer on the back substrate where the source electrode and the drain electrode have been formed; patterning the passivation layer, the amorphous silicon layer for channel, and the gate insulation layer through a third photolithograph process so that a part of the drain electrode and the back substrate portion between the storage capacitor electrode and the thin film transistor may be exposed.
摘要翻译：本发明公开了一种制造薄膜晶体管液晶显示器的方法，包括以下步骤，以便同时形成用于使漏电极和像素电极相互接触的通孔和薄膜晶体管的沟道：依次形成栅极绝缘层，用于欧姆接触的沟道和掺杂半导体层的非晶硅层和在其上形成栅极电极和存储电容器电极的背面基板上的源极/漏极的金属层; 通过第二光刻工艺图案化用于源/漏电极的金属层和用于欧姆接触的掺杂半导体层，从而可以形成源极，漏电极及其欧姆接触; 在形成有源电极和漏电极的背面基板上形成钝化层; 通过第三光刻工艺图案化钝化层，非晶硅层和栅极绝缘层，使得存储电容器电极和薄膜晶体管之间的一部分漏电极和后基板部分可能暴露。

5. 发明授权

US6040882A Liquid crystal display device having "H" character common electrode and method of fabricating thereof 失效
标题翻译：具有“H”字符公共电极的液晶显示器及其制造方法
公开(公告)号：US6040882A
公开(公告)日：2000-03-21
申请号：US951410
申请日：1997-10-16
申请人： Jung-Mok Jun , Seok-Lyul Lee
发明人： Jung-Mok Jun , Seok-Lyul Lee
IPC分类号： G02F1/1345 , G02F1/1343 , G02F1/1362
CPC分类号： G02F1/136213
摘要： Pairs of liquid crystal display pixel electrodes are fabricated to commonly share a capacitor electrode in the shape of an "H" character which overlaps along periphery portions of the corresponding two pixel electrodes, except for periphery portions thereof respectively connected to corresponding switching devices.
摘要翻译：一对液晶显示像素电极被制造成共用一个“H”字形形状的电容器电极，它们分别与相应的两个像素电极的周边部分重叠，除了其周边部分分别连接到相应的开关装置。

6. 发明授权

US06653028B2 Photo mask for fabricating a thin film transistor liquid crystal display 有权
标题翻译：用于制造薄膜晶体管液晶显示器的光罩
公开(公告)号：US06653028B2
公开(公告)日：2003-11-25
申请号：US09870978
申请日：2001-05-31
申请人： Deuk Su Lee , Jung Mok Jun
发明人： Deuk Su Lee , Jung Mok Jun
IPC分类号： G03F900
CPC分类号： H01L21/32139 , G03F1/50
摘要： The present invention discloses a photo mask employing in a TFT-LCD fabrication using 4-mask process. The disclosed photo mask comprises a transparent substrate and a shielding pattern formed thereon, wherein the shielding pattern includes a pair of first shielding patterns each having the rectangular shape disposed with separation to cover source and drain formation regions, a pair of second shielding patterns of a bar type disposed between the first shielding patterns and third shielding patterns of a bar type disposed on lower and upper portions of the first and the second shielding patterns to make a clear division between a light transmittance region and a light shielding region on the edge of a channel region.
摘要翻译：本发明公开了一种采用使用4掩模工艺的TFT-LCD制造中的光掩模。所公开的光掩模包括透明基板和形成在其上的屏蔽图案，其中所述屏蔽图案包括一对第一屏蔽图案，每个第一屏蔽图案具有分开设置成覆盖源极和漏极形成区域的矩形形状，一对第二屏蔽图案棒状，设置在第一屏蔽图案和布置在第一和第二屏蔽图案的下部和上部上的条形的第三屏蔽图案之间，以在透光区域和遮光图案的边缘上的遮光区域之间进行清晰的划分渠道区域。

7. 发明授权

US6046063A Method of manufacturing liquid crystal display 有权
标题翻译：制造液晶显示器的方法
公开(公告)号：US6046063A
公开(公告)日：2000-04-04
申请号：US276420
申请日：1999-03-25
申请人： Jung Mok Jun , Bong Yeol Ryu , Jung Yeal Lee
发明人： Jung Mok Jun , Bong Yeol Ryu , Jung Yeal Lee
IPC分类号： G02F1/1343 , H01L21/77 , H01L21/84 , H01L27/12 , H01L21/00
CPC分类号： H01L27/12 , H01L27/124 , H01L27/1248
摘要： A method of manufacturing liquid crystal display (LCD), comprising the steps of: forming a bottom indium tin oxide (ITO) in a pixel area of a transparent insulating substrate; forming a gate line and a storage line spaced with each other, the storage line including a first part having a first width and a second part having a second width, the second part is formed in the central portion of the pixel region and the first part is formed in the both sides of the second part and is directly contacted with the bottom ITO; depositing a gate insulating layer over the entire surface of the substrate; forming a semiconductor layer on the gate insulating layer over the gate line; forming a data line being in perpendicular to the gate line, source and drain electrodes being overlapped with both side portions of the semiconductor layer and a conductive pattern being disposed over the second part of the storage line; depositing an organic insulating layer having lower dielectric constant on the entire surface of the substrate by a spin coating method; etching the organic insulating layer to form a contact hole so as to expose the conductive pattern; forming a top ITO on the organic insulating layer over the entire pixel area to be overlapped with portions of the gate line and the data line, the top ITO being in contact with the conductive pattern through the contact hole.
摘要翻译：一种制造液晶显示器（LCD）的方法，包括以下步骤：在透明绝缘基板的像素区域中形成底部氧化铟锡（ITO）; 形成彼此间隔开的栅极线和存储线，所述存储线包括具有第一宽度的第一部分和具有第二宽度的第二部分，所述第二部分形成在所述像素区域的中心部分中，并且所述第一部分形成在第二部分的两侧并与底部ITO直接接触; 在衬底的整个表面上沉积栅极绝缘层; 在栅极线上的栅极绝缘层上形成半导体层; 形成垂直于栅极线的数据线，源极和漏极与半导体层的两个侧面重叠，并且导电图案设置在存储线的第二部分上; 通过旋涂法在基板的整个表面上沉积具有较低介电常数的有机绝缘层; 蚀刻有机绝缘层以形成接触孔，以暴露导电图案; 在整个像素区域上在有机绝缘层上形成顶部ITO以与栅极线和数据线的部分重叠，顶部ITO通过接触孔与导电图案接触。

8. 发明授权

US5844641A Liquid crystal display device having storage capacitors and additional opaque electrodes 失效
标题翻译：具有存储电容器和附加不透明电极的液晶显示装置
公开(公告)号：US5844641A
公开(公告)日：1998-12-01
申请号：US953859
申请日：1997-10-16
申请人： Jung-Mok Jun , Seok-Lyul Lee
发明人： Jung-Mok Jun , Seok-Lyul Lee
IPC分类号： G02F1/1343 , G02F1/1335 , G02F1/136 , G02F1/1362 , G02F1/1368 , H01L29/786 , G02F1/1333
CPC分类号： G02F1/136213 , G02F1/133512
摘要： Disclosed is a liquid crystal display device having opaque electrodes at both edge portions of a pixel electrode. The LCD device includes a plurality of gate signal lines, each having a plurality of projected portions; a plurality of data signal lines, being perpendicular to the length direction of the gate signal line; a plurality of thin film transistors corresponding respectively to unit pixel region; a plurality of pixel electrodes formed on the insulating layer within respective unit pixel regions, being overlapped with the projected portion of the adjacent gate signal; and a plurality of opaque electrodes formed below said insulating layer, being arranged parallel to the data signal lines, each extending from both edge portions of each pixel electrode parallel to the data lines to selected positions between said each pixel electrode and both data lines adjacent thereto, each electrically connected with said each pixel electrode through a contact plug formed in said insulating layer.
摘要翻译：公开了一种在像素电极的两个边缘部分具有不透明电极的液晶显示装置。 LCD装置包括多个栅极信号线，每条栅极信号线具有多个突出部分; 多个数据信号线，垂直于栅极信号线的长度方向; 分别对应于单位像素区域的多个薄膜晶体管; 形成在各个单位像素区域内的绝缘层上的多个像素电极与相邻栅极信号的投影部分重叠; 以及形成在所述绝缘层下面的多个不透明电极，平行于数据信号线布置，每个不同的像素电极的平行于数据线的两个边缘部分延伸到所述每个像素电极与与其相邻的两个数据线之间的选定位置每个通过形成在所述绝缘层中的接触塞与所述每个像素电极电连接。

9. 发明授权

US09146421B2 Liquid crystal display 有权
标题翻译：液晶显示器
公开(公告)号：US09146421B2
公开(公告)日：2015-09-29
申请号：US13698473
申请日：2012-09-13
申请人： Hyunsic Choi , Hui Li , Zhiqiang Xu , Jung Mok Jun
发明人： Hyunsic Choi , Hui Li , Zhiqiang Xu , Jung Mok Jun
IPC分类号： G02F1/1337 , G02F1/13363 , G02B5/30 , G02F1/1343 , G02F1/1335
CPC分类号： G02F1/13363 , G02B5/3016 , G02B5/3083 , G02F1/133723 , G02F1/134363 , G02F2001/133565 , G02F2001/133633 , G02F2001/133738
摘要： An embodiment of the present invention relates to a liquid crystal display. An upper surface alignment layer in the liquid crystal display is arranged to comprise, in the direction from a color filter substrate to a liquid crystal layer, a first upper surface alignment layer, a color washout compensation film layer and a second upper surface alignment layer; an alignment direction of the color washout compensation film layer is opposite to the pre-alignment direction of the liquid crystal layer. In the technical solution, the color washout compensation film layer is used to rectify the color washout problem occurring when the screen of a liquid crystal display screen of a fringe field switching mode is viewed from both the left side and right sides.
摘要翻译：本发明的实施例涉及一种液晶显示器。液晶显示器中的上表面取向层被配置为在从滤色器基板到液晶层的方向上包括第一上表面取向层，彩色冲洗补偿膜层和第二上表面取向膜; 彩色冲洗补偿膜层的取向方向与液晶层的预取向相反。在技术方案中，使用彩色冲洗补偿膜层来校正当从左侧和右侧观看边缘场切换模式的液晶显示屏的屏幕时发生的彩色冲洗问题。

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