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    • 1. 发明授权
    • Method and device for treating materials with plasma-inducing high energy radiation
    • 用等离子体诱导高能量辐射处理材料的方法和装置
    • US06326589B1
    • 2001-12-04
    • US09509033
    • 2000-03-17
    • Jorg BeersiekWolfgang Schulz
    • Jorg BeersiekWolfgang Schulz
    • B23K2603
    • B23K26/032B23K26/0643B23K26/0665B23K26/1423
    • A method for treating materials with plasma-inducing high-energy radiation, especially laser radiation, where an area of vapor capillaries (13) of a work piece (10) is observed with a depth definition detecting device over the entire thickness of the work piece and time-dependent measurement of plasma radiation intensity is carried out. In order to accurately monitor the quality of material treatment, the method is implemented in such a way that the momentary plasma intensities are measured at no less than two measurement points which are parallel to an axis (11) of inducing radiation (12). Predetermined capillary parameters are assigned to the measured plasma intensities and control of the material treatment is conducted depending on the capillary geometric parameters.
    • 一种用等离子体诱导高能辐射特别是激光辐射处理材料的方法,其中在工件的整个厚度上用深度定义检测装置观察到工件(10)的蒸气毛细管(13)的面积 并进行等离子体辐射强度的时间依赖性测量。 为了精确地监测材料处理的质量,该方法以不小于两个平行于诱导辐射的轴线(11)的测量点测量瞬时等离子体强度的方式实现。 预定的毛细管参数被分配给测量的等离子体强度,并且根据毛细管几何参数进行材料处理的控制。