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1. 发明授权

US08067147B2 Removable pellicle for immersion lithography 有权
标题翻译：浸没光刻用可拆卸防护薄膜
公开(公告)号：US08067147B2
公开(公告)日：2011-11-29
申请号：US10596647
申请日：2004-12-22
申请人： Peter Dirksen , Robert Duncan Morton , Peter Zandbergen , David Van Steenwinckel , Yuri Aksenov , Jeroen Herman Lammers , Johannes Van Wingerden , Laurent Marinier
发明人： Peter Dirksen , Robert Duncan Morton , Peter Zandbergen , David Van Steenwinckel , Yuri Aksenov , Jeroen Herman Lammers , Johannes Van Wingerden , Laurent Marinier
IPC分类号： G03F7/00
CPC分类号： G03F7/70341 , G03F7/70983
摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.
摘要翻译：一种照射方法来照射浸没在流体（L3）中的抗蚀剂（L2）的感光层，包括施加可去除的透明层（L4，L5），通过浸没流体将辐射投射到抗蚀剂上，并通过透明使得流体中的缺陷如投射在表面上而失焦，随后去除透明层。透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。因此，照射可以更完整，并且缺陷减少。对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。辐射可以用于任何目的，包括检查，加工，图案化等。可以将透明层的去除与显影抗蚀剂层的步骤组合。

2. 发明申请

US20110127625A1 RESONATOR 有权
标题翻译：谐振器
公开(公告)号：US20110127625A1
公开(公告)日：2011-06-02
申请号：US12888185
申请日：2010-09-22
申请人： Casper van der AVOORT , Jozef Thomas Martinus van BEEK , Johannes van WINGERDEN , Joep BONTEMPS , Robert James Pascoe LANDER
发明人： Casper van der AVOORT , Jozef Thomas Martinus van BEEK , Johannes van WINGERDEN , Joep BONTEMPS , Robert James Pascoe LANDER
IPC分类号： H01L29/84 , H01L21/30
CPC分类号： H03H9/02448 , H03H3/0076 , H03H9/2447 , H03H9/2473 , H03H9/2489
摘要： A resonator comprising a beam formed from a first material having a first Young's modulus and a first temperature coefficient of the first Young's modulus, and a second material having a second Young's modulus and a second temperature coefficient of the second Young's modulus, a sign of the second temperature coefficient being opposite to a sign of the first temperature coefficient at least within operating conditions of the resonator, wherein the ratio of the cross sectional area of the first material to the cross sectional area of the second material varies along the length of the beam, the cross sectional areas being measured substantially perpendicularly to the beam.
摘要翻译：一种谐振器，包括由具有第一杨氏模量和第一杨氏模量的第一温度系数的第一材料形成的梁，以及具有第二杨氏模量和第二杨氏模量的第二温度系数的第二材料，所述第二温度系数至少在所述谐振器的操作条件下与所述第一温度系数的符号相反，其中所述第一材料的横截面积与所述第二材料的横截面面积的比率沿着所述梁的长度变化横截面面积基本上垂直于梁测量。

3. 发明申请

US20050211375A1 Method of manufacturing a semiconductor device 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20050211375A1
公开(公告)日：2005-09-29
申请号：US11096125
申请日：2005-03-30
申请人： Dirk Knotter , Johannes Van Wingerden , Madelon Rovers
发明人： Dirk Knotter , Johannes Van Wingerden , Madelon Rovers
IPC分类号： C23F1/24 , C09K13/04 , C09K13/08 , G03F7/09 , H01L21/00 , H01L21/027 , H01L21/28 , H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/3213 , H01L29/423 , H01L29/49 , H01L29/78 , H01L21/8242
CPC分类号： C09K13/08 , H01L21/0276 , H01L21/31111 , H01L21/67075 , H01L21/67086
摘要： The invention relates to a method of manufacturing a semiconductor device comprising the step of removing a silicon and nitrogen containing material by means of wet etching with an aqueous solution comprising hydrofluoric acid in a low concentration, the aqueous solution being applied under elevated pressure to reach a temperature above 100° C.
摘要翻译：本发明涉及一种制造半导体器件的方法，包括通过用包含低浓度的氢氟酸的水溶液湿法蚀刻除去含硅和氮的材料的步骤，该水溶液在升高的压力下被施加到温度高于100℃

4. 发明申请

US20110186941A1 DEVICE WITH MICROSTRUCTURE AND METHOD OF FORMING SUCH A DEVICE 有权
标题翻译：具有微结构的装置和形成这种装置的方法
公开(公告)号：US20110186941A1
公开(公告)日：2011-08-04
申请号：US12916454
申请日：2010-10-29
申请人： Johannes van WINGERDEN , Greja Johanna Adriana Maria VERHEIJDEN , Gerhard KOOPS , Jozef Thomas Martinus van BEEK
发明人： Johannes van WINGERDEN , Greja Johanna Adriana Maria VERHEIJDEN , Gerhard KOOPS , Jozef Thomas Martinus van BEEK
IPC分类号： H01L29/66 , H01L21/02
CPC分类号： B81C1/00293 , B81C2203/0136 , B81C2203/0145
摘要： Disclosed is a device comprising a substrate carrying a microscopic structure in a cavity capped by a capping layer including a material of formula SiNxHy, wherein x>1.33 and y>0. A method of forming such a device is also disclosed.
摘要翻译：公开了一种装置，其包括在由包含式SiN x H y的材料的覆盖层封盖的空腔中承载微观结构的基板，其中x> 1.33且y> 0。还公开了一种形成这种装置的方法。

5. 发明授权

US07659041B2 Lithographic method of manufacturing a device 有权
标题翻译：制造器件的平版印刷方法
公开(公告)号：US07659041B2
公开(公告)日：2010-02-09
申请号：US11367810
申请日：2006-03-01
申请人： Peter Dirksen , Casparus Anthonius Henricus Juffermans , Johannes Van Wingerden
发明人： Peter Dirksen , Casparus Anthonius Henricus Juffermans , Johannes Van Wingerden
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： H01L21/32139 , G03F1/26 , G03F1/36 , G03F7/0035
摘要： For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.
摘要翻译：为了光刻制造具有非常高密度的器件，通过新的方法将设计掩模图案（120）分布在多个子图案（120a，120b，120c）上。子图案不包括“禁止”结构（135）并且可以通过常规设备传送到待图案化的基底层。为了传送，使用新的层叠层，其包括用于每个子图案的一对处理层（22; 26）和无机抗反射层（24; 28）。在第一处理层（26）已经被图案化为第一子图案之后，其被涂覆有用第二子图案曝光的新抗蚀剂层（30）和在第一子图案下方的第二处理层（22）用第二子图案处理处理层。

6. 发明申请

US20070064215A1 Removable pellicle for immersion lithography 有权
标题翻译：浸没光刻用可拆卸防护薄膜
公开(公告)号：US20070064215A1
公开(公告)日：2007-03-22
申请号：US10596647
申请日：2004-12-22
申请人： Peter Dirksen , Robert Morton , Peter Zandbergen , David Van Steelwinckel , Yuri Aksenov , Jeroen Lammers , Johannes Van Wingerden , Laurent Marinier
发明人： Peter Dirksen , Robert Morton , Peter Zandbergen , David Van Steelwinckel , Yuri Aksenov , Jeroen Lammers , Johannes Van Wingerden , Laurent Marinier
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03F7/70983
摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.
摘要翻译：一种照射方法来照射浸入流体（L 3）中的抗蚀剂（L 2）等感光层，包括涂敷可移除的透明层（L 4，L 5），通过浸渍流体将辐射投射到抗蚀剂上并且通过透明层，使得流体中的缺陷如投影在表面上而失焦，并随后去除透明层。透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。因此，照射可以更完整，并且缺陷减少。对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。辐射可以用于任何目的，包括检查，加工，图案化等。可以将透明层的去除与显影抗蚀剂层的步骤组合。

7. 发明申请

US20060160029A1 Lithographic method of manufacturing a device 有权
标题翻译：制造器件的平版印刷方法
公开(公告)号：US20060160029A1
公开(公告)日：2006-07-20
申请号：US11367810
申请日：2006-03-01
申请人： Peter Dirksen , Casparus Juffermans , Johannes Van Wingerden
发明人： Peter Dirksen , Casparus Juffermans , Johannes Van Wingerden
IPC分类号： G03F7/00
CPC分类号： H01L21/32139 , G03F1/26 , G03F1/36 , G03F7/0035
摘要： For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.
摘要翻译：为了光刻制造具有非常高密度的器件，通过新的方法将设计掩模图案（120）分布在多个子图案（120a，120b，120c）上。子图案不包括“禁止”结构（135）并且可以通过常规设备传送到待图案化的基底层。为了传送，使用新的层叠层，其包括用于每个子图案的一对处理层（22; 26）和无机抗反射层（24; 28）。在第一处理层（26）已经被图案化为第一子图案之后，其被涂覆有用第二子图案曝光的新抗蚀剂层（30）和在第一子图案下方的第二处理层（22）用第二子图案处理处理层。

8. 发明授权

US06887796B2 Method of wet etching a silicon and nitrogen containing material 失效
标题翻译：湿法蚀刻含硅和氮的材料的方法
公开(公告)号：US06887796B2
公开(公告)日：2005-05-03
申请号：US10475874
申请日：2002-04-18
申请人： Dirk Maarten Knotter , Johannes Van Wingerden , Madelon Gertruda Josephina Rovers
发明人： Dirk Maarten Knotter , Johannes Van Wingerden , Madelon Gertruda Josephina Rovers
IPC分类号： C23F1/24 , C09K13/04 , C09K13/08 , G03F7/09 , H01L21/00 , H01L21/027 , H01L21/28 , H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/3213 , H01L29/423 , H01L29/49 , H01L29/78 , H01L21/461
CPC分类号： C09K13/08 , H01L21/0276 , H01L21/31111 , H01L21/67075 , H01L21/67086
摘要： The invention relates to a method of manufacturing a semiconductor device comprising the step of removing a silicon and nitrogen containing material by means of wet etching with an aqueous solution comprising hydrofluoric acid in a low concentration, the aqueous solution being applied under elevated pressure to reach a temperature above 100° C.
摘要翻译：本发明涉及一种制造半导体器件的方法，包括通过用包含低浓度的氢氟酸的水溶液湿法蚀刻除去含硅和氮的材料的步骤，该水溶液在升高的压力下被施加到温度高于100℃

9. 发明授权

US08409996B2 Method of manufacturing a bulk acoustic wave device 有权
标题翻译：制造体声波装置的方法
公开(公告)号：US08409996B2
公开(公告)日：2013-04-02
申请号：US12968020
申请日：2010-12-14
申请人： Frederik Willem Maurits Vanhelmont , Rensinus Cornelis Strijbos , Andreas Bernardus Maria Jansman , Robertus Adrianus Maria Wolters , Johannes van Wingerden , Fredericus Christiaan van den Heuvel
发明人： Frederik Willem Maurits Vanhelmont , Rensinus Cornelis Strijbos , Andreas Bernardus Maria Jansman , Robertus Adrianus Maria Wolters , Johannes van Wingerden , Fredericus Christiaan van den Heuvel
IPC分类号： H01L21/302
CPC分类号： H03H9/564 , H03H3/04 , H03H9/02228
摘要： A method of manufacturing a Bulk Acoustic Wave device by providing an active layer formed of an electro-mechanical transducer material, providing a first electrode on the active layer, defining a first electrode portion of the device, whereby a remaining portion of the device is defined around the first electrode, providing a stop-layer on the first electrode, depositing a first dielectric layer on the resultant structure, and planarizing the first dielectric layer until the stop-layer on the first electrode is exposed.
摘要翻译：通过提供由机电换能器材料形成的有源层来制造体声波器件的方法，在有源层上提供第一电极，限定器件的第一电极部分，从而定义器件的剩余部分围绕第一电极，在第一电极上提供停止层，在所得结构上沉积第一电介质层，并平坦化第一电介质层，直到第一电极上的停止层露出。

10. 发明申请

US20120091546A1 Microphone 审中-公开
标题翻译：麦克风
公开(公告)号：US20120091546A1
公开(公告)日：2012-04-19
申请号：US13265535
申请日：2010-04-20
申请人： Geert Langereis , Twan Van Lippen , Freddy Roozeboom , Hilco Suy , Klaus Reimann , Jozef Thomas Martinus Van Beek , Casper Van Der Avoort , Johannes Van Wingerden , Kim Phan Le , Martijn Goosens , Peter Gerard Steeneken
发明人： Geert Langereis , Twan Van Lippen , Freddy Roozeboom , Hilco Suy , Klaus Reimann , Jozef Thomas Martinus Van Beek , Casper Van Der Avoort , Johannes Van Wingerden , Kim Phan Le , Martijn Goosens , Peter Gerard Steeneken
IPC分类号： H01L29/84 , H01L21/02
CPC分类号： H04R19/005 , B81B3/0072 , B81B2201/0257 , B81B2203/0127 , H04R7/18 , H04R19/04 , H04R31/006
摘要： A microphone comprises a substrate (20), a microphone membrane (10) defining an acoustic input surface and a backplate (11) supported with respect to the membrane with a fixed spacing between the backplate (11) and the membrane (10). A microphone periphery area comprises parallel corrugations (24) in the membrane (10) and backplate (11). By using the same corrugated suspension for both the membrane and the backplate, the sensitivity to body noise is optimally suppressed.
摘要翻译：麦克风包括基板（20），限定声输入表面的麦克风膜（10）和相对于膜支撑的背板（11），所述背板（11）在背板（11）和膜（10）之间具有固定的间隔。麦克风外围区域包括膜（10）和背板（11）中的平行波纹（24）。通过对膜和背板使用相同的波纹悬挂，对身体噪声的敏感性被最佳地抑制。

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