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    • 2. 发明申请
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US20060141373A1
    • 2006-06-29
    • US11020561
    • 2004-12-27
    • Franciscus Casper BijnenJoannes De Smit
    • Franciscus Casper BijnenJoannes De Smit
    • G03F9/00G03C5/00
    • G03F7/70291G03F7/70791G03F9/7003
    • A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.
    • 一种系统和方法使用具有单独的,不分开的对准标记的图案的基板,即标记彼此分开和不同,并且每个标记不分为组成部分。 标记的图案分布在基板的一个区域上,并且该方法还包括以下步骤:使用照明系统和单独可控元件的阵列提供辐射束,以在其横截面中赋予光束图案, 提供投影系统以将图案化的光束投影到基板上,以及提供移动系统以实现基板和投影系统之间的相对移动。 还提供了能够分别检测对准标记的检测系统,并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置,使用移动系统将基板相对定位 并且使用投影系统将图案化的辐射束投影到基板的目标部分上。 该图案包括一行或多行简单对准标记,例如斑点和短线性标记。