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1. 发明申请

US20070040133A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070040133A1
公开(公告)日：2007-02-22
申请号：US11371235
申请日：2006-03-09
申请人： Joeri Lof , Joannes De Smit , Roelof Aeilko Ritsema , Klaus Simon , Theodorus Modderman , Johannes Catharinus Mulkens , Hendricus Johannes Meijer , Erik Roelof Loopstra
发明人： Joeri Lof , Joannes De Smit , Roelof Aeilko Ritsema , Klaus Simon , Theodorus Modderman , Johannes Catharinus Mulkens , Hendricus Johannes Meijer , Erik Roelof Loopstra
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
摘要翻译：在测量站产生衬底表面的图。然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。因此，映射不会发生在液体环境中。

2. 发明申请

US20060141373A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060141373A1
公开(公告)日：2006-06-29
申请号：US11020561
申请日：2004-12-27
申请人： Franciscus Casper Bijnen , Joannes De Smit
发明人： Franciscus Casper Bijnen , Joannes De Smit
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70291 , G03F7/70791 , G03F9/7003
摘要： A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.
摘要翻译：一种系统和方法使用具有单独的，不分开的对准标记的图案的基板，即标记彼此分开和不同，并且每个标记不分为组成部分。标记的图案分布在基板的一个区域上，并且该方法还包括以下步骤：使用照明系统和单独可控元件的阵列提供辐射束，以在其横截面中赋予光束图案，提供投影系统以将图案化的光束投影到基板上，以及提供移动系统以实现基板和投影系统之间的相对移动。还提供了能够分别检测对准标记的检测系统，并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置，使用移动系统将基板相对定位并且使用投影系统将图案化的辐射束投影到基板的目标部分上。该图案包括一行或多行简单对准标记，例如斑点和短线性标记。

3. 发明申请

US20050024609A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050024609A1
公开(公告)日：2005-02-03
申请号：US10860662
申请日：2004-06-04
申请人： Joannes De Smit , Vadim Banine , Theodorus Josephus Bisschops , Marcel Mathijs Dierichs , Theodorus Modderman
发明人： Joannes De Smit , Vadim Banine , Theodorus Josephus Bisschops , Marcel Mathijs Dierichs , Theodorus Modderman
IPC分类号： G03F7/20 , H01L21/027 , G03B27/00 , G03F7/00
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

4. 发明申请

US20060139597A1 Methods and systems for lithographic gray scaling 有权
标题翻译：光刻灰度法的方法和系统
公开(公告)号：US20060139597A1
公开(公告)日：2006-06-29
申请号：US11024030
申请日：2004-12-29
申请人： Joeri Lof , Pieter De Jager , Joannes De Smit
发明人： Joeri Lof , Pieter De Jager , Joannes De Smit
IPC分类号： G03B27/52
CPC分类号： G03F7/70283
摘要： Improved gray scaling imaging methods and systems include a group of elements within an array of individually controllable elements that project a part of a radiation beam onto a lens in an array of microlenses, and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale.
摘要翻译：改进的灰度成像方法和系统包括在独立可控元件阵列内的一组元件，其将辐射束的一部分投影到微透镜阵列中的透镜上，并且是可单独控制的，使得任何数量的独立可控元件可以打开或关闭以生成灰度级。

5. 发明申请

US20050264778A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050264778A1
公开(公告)日：2005-12-01
申请号：US10857614
申请日：2004-06-01
申请人： Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译：公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。

6. 发明申请

US20070268471A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070268471A1
公开(公告)日：2007-11-22
申请号：US11710408
申请日：2007-02-26
申请人： Joeri Lof , Hans Butler , Sjoerd Donders , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Mulkens , Roelof Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Helmar Santen
发明人： Joeri Lof , Hans Butler , Sjoerd Donders , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Mulkens , Roelof Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Helmar Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

8. 发明申请

US20070132970A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070132970A1
公开(公告)日：2007-06-14
申请号：US11448990
申请日：2006-06-08
申请人： Joeri Lof , Erik Bijlaart , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Roelof Ritsema , Frank Van Schaik , Thimotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Bijlaart , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Roelof Ritsema , Frank Van Schaik , Thimotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

9. 发明申请

US20060023189A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060023189A1
公开(公告)日：2006-02-02
申请号：US11239493
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

10. 发明申请

US20060138358A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060138358A1
公开(公告)日：2006-06-29
申请号：US11022923
申请日：2004-12-28
申请人： Joeri Lof , Joannes De Smit
发明人： Joeri Lof , Joannes De Smit
IPC分类号： G21K5/10
CPC分类号： G03F7/70275 , G03F7/70258 , G03F7/70291
摘要： A projection system comprises an array of lenses MLA, each lens transmitting a unique part of a patterned beam. Measuring devices measure a distance between the array of lenses MLA and a substrate W. A controller controls an actuator to adjust a position (e.g., height and/or tilt) of the microlens array MLA.
摘要翻译：投影系统包括透镜阵列MLA，每个透镜透射图案化束的唯一部分。测量装置测量透镜阵列MLA和基底W之间的距离。控制器控制致动器来调节微透镜阵列MLA的位置（例如，高度和/或倾斜）。

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