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    • 1. 发明授权
    • Control by sample reflectivity
    • 通过样品反射率控制
    • US07903250B1
    • 2011-03-08
    • US12477571
    • 2009-06-03
    • Fabio A. FacciniTorsten R. KaackJiyou FuZhiming Jiang
    • Fabio A. FacciniTorsten R. KaackJiyou FuZhiming Jiang
    • G01N21/55
    • G01N21/55G01N21/9501
    • A method of performing an investigation of a substrate, by measuring a reflectivity of the substrate, comparing the reflectivity of the substrate to an anticipated reflectivity value, selectively subjecting the substrate to a laser beam for a predetermined duration and at a predetermined energy only when the reflectivity of the substrate is within a specified tolerance of the anticipated reflectivity value, selectively signaling a fault condition when the reflectivity of the substrate is not within the specified tolerance of the anticipated reflectivity value, and selectively performing the investigation of the substrate only when the reflectivity of the substrate is within the specified tolerance of the anticipated reflectivity value.
    • 通过测量衬底的反射率,将衬底的反射率与预期反射率值进行比较来选择性地对衬底进行预定的时间和激光束的处理的方法,只有当 衬底的反射率在预期反射率值的特定公差内,当衬底的反射率不在预期反射率值的规定公差内时选择性地发信号通知故障状态,并且仅当反射率 的基板在预期反射率值的规定公差内。
    • 2. 发明申请
    • Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
    • 使用对称和反对称散射测量信号测量覆盖层和轮廓不对称
    • US20060274310A1
    • 2006-12-07
    • US11325872
    • 2006-01-04
    • Daniel KandelKenneth GrossMichael FriedmannJiyou FuShankar KrishnanBoris Golovanevsky
    • Daniel KandelKenneth GrossMichael FriedmannJiyou FuShankar KrishnanBoris Golovanevsky
    • G01J4/00
    • G01N21/211G01N21/9501G01N21/956G03F7/70633
    • Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.
    • 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中,不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于ID光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中,测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器和分析器的单个偏振元件。 另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。
    • 3. 发明授权
    • Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
    • 使用对称和反对称散射测量信号测量覆盖层和轮廓不对称
    • US07277172B2
    • 2007-10-02
    • US11325872
    • 2006-01-04
    • Daniel KandelKenneth P. GrossMichael FriedmannJiyou FuShakar KrishnanBoris Golovanevsky
    • Daniel KandelKenneth P. GrossMichael FriedmannJiyou FuShakar KrishnanBoris Golovanevsky
    • G01J4/00G01N21/86
    • G01N21/211G01N21/9501G01N21/956G03F7/70633
    • Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a 1D grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.
    • 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中,不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于1D光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中,测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器和分析器的单个偏振元件。 另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。