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1. 发明申请

US20060170617A1 System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode 有权
公开(公告)号：US20060170617A1
公开(公告)日：2006-08-03
申请号：US11046236
申请日：2005-01-31
申请人： Azat Latypov , Wenceslao Cebuhar , Jason Hintersteiner
发明人： Azat Latypov , Wenceslao Cebuhar , Jason Hintersteiner
IPC分类号： G09G3/00
CPC分类号： G03F7/70116
摘要： A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.

2. 发明申请

US20050046819A1 Maskless lithography systems and methods utilizing spatial light modulator arrays 审中-公开
标题翻译：无掩模光刻系统和利用空间光调制器阵列的方法
公开(公告)号：US20050046819A1
公开(公告)日：2005-03-03
申请号：US10950644
申请日：2004-09-28
申请人： Arno Bleeker , Wenceslao Cebuhar , Jason Hintersteiner , Andrew McCullough , Solomon Wasserman
发明人： Arno Bleeker , Wenceslao Cebuhar , Jason Hintersteiner , Andrew McCullough , Solomon Wasserman
IPC分类号： G02F1/13 , G03F1/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70466 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
摘要翻译：在对象上写入图案的无掩模光刻系统。该系统可以包括照明系统，物体，空间光调制器（SLM）和控制器。在对象接收到光之前，SLM可以对来自照明系统的光进行图案化。 SLM可以包括一个前导集合和一组尾随SLM。前导和后置集合中的SLM根据对象的扫描方向而改变。控制器可以基于光脉冲周期信息，关于SLM的物理布局信息和对象的扫描速度中的至少一个来向SLM发送控制信号。该系统还可以使用各种方法校正剂量不均匀性。

3. 发明申请

US20060114546A1 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography 有权
标题翻译：使用时间和/或功率调制来实现光掩模光刻中的剂量灰度
公开(公告)号：US20060114546A1
公开(公告)日：2006-06-01
申请号：US11328179
申请日：2006-01-10
申请人： Wenceslao Cebuhar , Jason Hintersteiner , Azat Latypov , Gerald Volpe
发明人： Wenceslao Cebuhar , Jason Hintersteiner , Azat Latypov , Gerald Volpe
IPC分类号： G02B26/00
CPC分类号： G03F7/70558 , G03F7/70208 , G03F7/70283 , G03F7/70291
摘要： In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
摘要翻译：在光刻应用中，期望控制例如印刷线的位置或宽度。控制这些图案及其分辨率的有效方法是尽可能多地获得灰度级。本发明包括灰度调色方法，其中曝光时间的调制增加了对象上的灰度级数。此外，本发明包括灰度调节方法，其中调制曝光光束的功率提供了额外的灰度级。

4. 发明申请

US20050094245A1 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography 有权
标题翻译：使用时间和/或功率调制来实现光掩模光刻中的剂量灰度
公开(公告)号：US20050094245A1
公开(公告)日：2005-05-05
申请号：US10981590
申请日：2004-11-05
申请人： Wenceslao Cebuhar , Jason Hintersteiner , Azat Latypov , Gerald Volpe
发明人： Wenceslao Cebuhar , Jason Hintersteiner , Azat Latypov , Gerald Volpe
IPC分类号： G02B5/00 , G03F7/20 , H01L21/027 , G02B26/00
CPC分类号： G03F7/70558 , G03F7/70208 , G03F7/70283 , G03F7/70291
摘要： In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
摘要翻译：在光刻应用中，期望控制例如印刷线的位置或宽度。控制这些图案及其分辨率的有效方法是尽可能多地获得灰度级。本发明包括灰度调色方法，其中曝光时间的调制增加了对象上的灰度级数。此外，本发明包括灰度调节方法，其中调制曝光光束的功率提供了额外的灰度级。

5. 发明申请

US20060114438A1 Maskless lithography systems and methods utilizing spatial light modulator arrays 有权
公开(公告)号：US20060114438A1
公开(公告)日：2006-06-01
申请号：US11331064
申请日：2006-01-13
申请人： Arno Bleeker , Wenceslao Cebuhar , Jason Hintersteiner , Andrew McCullough , Solomon Wasserman
发明人： Arno Bleeker , Wenceslao Cebuhar , Jason Hintersteiner , Andrew McCullough , Solomon Wasserman
IPC分类号： G03B27/54
CPC分类号： G03F7/70466 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

6. 发明申请

US20060146308A1 Systems and methods for minimizing scattered light in multi-SLM maskless lithography 有权
公开(公告)号：US20060146308A1
公开(公告)日：2006-07-06
申请号：US11029724
申请日：2005-01-06
申请人： Wenceslao Cebuhar , Jason Hintersteiner , Stan Janik , Yuli Vladimirsky
发明人： Wenceslao Cebuhar , Jason Hintersteiner , Stan Janik , Yuli Vladimirsky
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70308 , G03F7/70941
摘要： The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.

7. 发明申请

US20060119947A1 Efficiently illuminating a modulating device 有权
标题翻译：有效地照亮调制装置
公开(公告)号：US20060119947A1
公开(公告)日：2006-06-08
申请号：US11335599
申请日：2006-01-20
申请人： Scott Coston , Wenceslao Cebuhar , Jason Hintersteiner
发明人： Scott Coston , Wenceslao Cebuhar , Jason Hintersteiner
IPC分类号： G02B27/10
CPC分类号： G03F7/70158 , B41J2/451 , G02B27/0905 , G03F7/70083 , G03F7/70183 , G03F7/70291
摘要： An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s). Thus, using the PDE and the FDE increases optical efficiency of light impinging on the pattern generator and substantially reduces or eliminates stray light caused by light impinging on undesired areas of the pattern generator.
摘要翻译：照明方法和系统使用光源和照明光学器件来照亮图案发生器。照明光学器件可以包括至少两个装置。例如，如果使用第一和第二衍射和/或折射装置，则可以是瞳孔限定元件（PDE），并且可以是场限定元件（FDE）。在另一示例中，可以使用第三衍射或折射元件来使进入照明系统的光均匀。当仅使用两个时，PDE形成一个或多个具有确定的轮廓的光束。 FDE引导具有限定轮廓的一个或多个光束，使得每个定向光束在尺寸和形状上基本对应于图案发生器上的期望的照明区域。定向光束被引导以基本上仅在期望的照明区域上照射。因此，使用PDE和FDE提高了照射在图案发生器上的光的光学效率，并且基本上减少或消除了光照射在图案发生器的不需要的区域上的杂散光。

8. 发明申请

US20050270613A1 System and method for dose control in a lithographic system 有权
标题翻译：光刻系统中剂量控制的系统和方法
公开(公告)号：US20050270613A1
公开(公告)日：2005-12-08
申请号：US11192188
申请日：2005-07-29
申请人： Jason Hintersteiner , Karel van der Mast , Arno Bleeker
发明人： Jason Hintersteiner , Karel van der Mast , Arno Bleeker
IPC分类号： G02F1/13 , G03F7/20 , H01L21/027 , G02F1/00
CPC分类号： G03F7/70041 , G03F7/70558
摘要： A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).
摘要翻译：系统和方法被用于例如在光刻或无掩模光刻机中使用的照明系统中的脉冲到脉冲剂量控制。该系统和方法可以用于降低光刻激光器中有效的激光脉冲到脉冲变化，从而允许使用最小数目的脉冲（例如少至一个脉冲）进行充分的剂量控制。

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