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1. 发明授权

US07463402B2 Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography 有权
标题翻译：使用时间和/或功率调制实现光掩模光刻中的剂量灰度级
公开(公告)号：US07463402B2
公开(公告)日：2008-12-09
申请号：US11328179
申请日：2006-01-10
申请人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Azat Latypov , Gerald Volpe
发明人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Azat Latypov , Gerald Volpe
IPC分类号： G02B26/00 , G03B27/54
CPC分类号： G03F7/70558 , G03F7/70208 , G03F7/70283 , G03F7/70291
摘要： In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
摘要翻译：在光刻应用中，期望控制例如印刷线的位置或宽度。控制这些图案及其分辨率的有效方法是尽可能多地获得灰度级。本发明包括灰度调色方法，其中曝光时间的调制增加了对象上的灰度级数。此外，本发明包括灰度调节方法，其中调制曝光光束的功率提供了额外的灰度级。

2. 发明申请

US20070291240A1 Altering pattern data based on measured optical element characteristics 有权
标题翻译：基于测量的光学元件特性改变图案数据
公开(公告)号：US20070291240A1
公开(公告)日：2007-12-20
申请号：US11454803
申请日：2006-06-19
申请人： Jason D. Hintersteiner , Wenceslao A. Cebuhar , Patricius Aloysius Jacobus Tinnemans
发明人： Jason D. Hintersteiner , Wenceslao A. Cebuhar , Patricius Aloysius Jacobus Tinnemans
IPC分类号： G03B27/68
CPC分类号： G03B27/68 , G03B27/42 , G03F7/70291 , G03F7/706
摘要： A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.
摘要翻译：使用系统和方法来补偿在投影系统中形成的图像中的失真或像差。对应于要在基板上形成的特征产生图案数据。测量投影光学系统的像差和失真中的至少一个。基于测量步骤改变图案数据。改变的图案数据被传送到图案形成装置，以控制耦合到图案形成装置的单独可控元件。照明系统的场和光瞳的一个或两个中的非均匀性也可以被测量并用于改变图案数据。

3. 发明授权

US07936445B2 Altering pattern data based on measured optical element characteristics 有权
标题翻译：基于测量的光学元件特性改变图案数据
公开(公告)号：US07936445B2
公开(公告)日：2011-05-03
申请号：US11454803
申请日：2006-06-19
申请人： Jason D. Hintersteiner , Wenceslao A. Cebuhar , Patricius Aloysius Jacobus Tinnemans
发明人： Jason D. Hintersteiner , Wenceslao A. Cebuhar , Patricius Aloysius Jacobus Tinnemans
IPC分类号： G03B27/54
CPC分类号： G03B27/68 , G03B27/42 , G03F7/70291 , G03F7/706
摘要： A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.
摘要翻译：使用系统和方法来补偿在投影系统中形成的图像中的失真或像差。对应于要在基板上形成的特征产生图案数据。测量投影光学系统的像差和失真中的至少一个。基于测量步骤改变图案数据。改变的图案数据被传送到图案形成装置，以控制耦合到图案形成装置的单独可控元件。照明系统的场和光瞳的一个或两个中的非均匀性也可以被测量并用于改变图案数据。

4. 发明授权

US06989920B2 System and method for dose control in a lithographic system 有权
公开(公告)号：US06989920B2
公开(公告)日：2006-01-24
申请号：US10447214
申请日：2003-05-29
申请人： Jason D. Hintersteiner , Karel van der Mast , Arno Bleeker
发明人： Jason D. Hintersteiner , Karel van der Mast , Arno Bleeker
IPC分类号： G02B26/00 , G03B27/72 , G01J3/30 , G01N21/86 , G03C5/00
CPC分类号： G03F7/70041 , G03F7/70558
摘要： A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).

5. 发明授权

US07567368B2 Systems and methods for minimizing scattered light in multi-SLM maskless lithography 有权
标题翻译：用于在多SLM无掩模光刻中最小化散射光的系统和方法
公开(公告)号：US07567368B2
公开(公告)日：2009-07-28
申请号：US11029724
申请日：2005-01-06
申请人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Stan Janik , Yuli Vladimirsky
发明人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Stan Janik , Yuli Vladimirsky
IPC分类号： G02F1/00
CPC分类号： G03F7/70291 , G03F7/70308 , G03F7/70941
摘要： The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
摘要翻译：本发明涉及一种光刻系统，其中来自具有一个或多个图案生成装置的图案发生器的散射光被阻挡在诸如晶片或显示器之类的物体上。该系统包括具有多个图案生成装置的图案生成器，用于引导来自图案生成装置的光的投影系统和位于物体窗口处或附近的孔。孔径具有与图案生成装置的配置匹配的轮廓。还提供了一种用于在使用多个图案生成装置的光刻系统中阻挡散射光的方法。

6. 发明授权

US07158307B2 Efficiently illuminating a modulating device 有权
标题翻译：有效地照亮调制装置
公开(公告)号：US07158307B2
公开(公告)日：2007-01-02
申请号：US11335599
申请日：2006-01-20
申请人： Scott Coston , Wenceslao A. Cebuhar , Jason D. Hintersteiner
发明人： Scott Coston , Wenceslao A. Cebuhar , Jason D. Hintersteiner
IPC分类号： G02B27/10
CPC分类号： G03F7/70158 , B41J2/451 , G02B27/0905 , G03F7/70083 , G03F7/70183 , G03F7/70291
摘要： An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s). Thus, using the PDE and the FDE increases optical efficiency of light impinging on the pattern generator and substantially reduces or eliminates stray light caused by light impinging on undesired areas of the pattern generator.
摘要翻译：照明方法和系统使用光源和照明光学器件来照亮图案发生器。照明光学器件可以包括至少两个装置。例如，如果使用第一和第二衍射和/或折射装置，则可以是瞳孔限定元件（PDE），并且可以是场限定元件（FDE）。在另一示例中，可以使用第三衍射或折射元件来使进入照明系统的光均匀。当仅使用两个时，PDE形成一个或多个具有确定的轮廓的光束。 FDE引导具有限定轮廓的一个或多个光束，使得每个定向光束在尺寸和形状上基本对应于图案发生器上的期望的照明区域。定向光束被引导以基本上仅在期望的照明区域上照射。因此，使用PDE和FDE提高了照射在图案发生器上的光的光学效率，并且基本上减少或消除了光照射在图案发生器的不需要的区域上的杂散光。

7. 发明授权

US07061591B2 Maskless lithography systems and methods utilizing spatial light modulator arrays 失效
标题翻译：无掩模光刻系统和利用空间光调制器阵列的方法
公开(公告)号：US07061591B2
公开(公告)日：2006-06-13
申请号：US10449908
申请日：2003-05-30
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Jason D. Hintersteiner
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Jason D. Hintersteiner
IPC分类号： G03B27/32 , G03B27/72 , G03C5/00
CPC分类号： G03F7/70466 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
摘要翻译：在对象上写入图案的无掩模光刻系统。该系统可以包括照明系统，物体，空间光调制器（SLM）和控制器。在对象接收到光之前，SLM可以对来自照明系统的光进行图案化。 SLM可以包括一个前导集合和一组尾随SLM。前导和后置集合中的SLM根据对象的扫描方向而改变。控制器可以基于光脉冲周期信息，关于SLM的物理布局信息和对象的扫描速度中的至少一个来向SLM发送控制信号。该系统还可以使用各种方法校正剂量不均匀性。

8. 发明授权

US07006295B2 Illumination system and method for efficiently illuminating a pattern generator 失效
标题翻译：用于有效照明图案发生器的照明系统和方法
公开(公告)号：US07006295B2
公开(公告)日：2006-02-28
申请号：US10808436
申请日：2004-03-25
申请人： Scott Coston , Wenceslao A. Cebuhar , Jason D. Hintersteiner
发明人： Scott Coston , Wenceslao A. Cebuhar , Jason D. Hintersteiner
IPC分类号： G02B27/10
CPC分类号： G03F7/70158 , B41J2/451 , G02B27/0905 , G03F7/70083 , G03F7/70183 , G03F7/70291
摘要： An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s). Thus, using the PDE and the FDE increases optical efficiency of light impinging on the pattern generator and substantially reduces or eliminates stray light caused by light impinging on undesired areas of the pattern generator.
摘要翻译：照明方法和系统使用光源和照明光学器件来照亮图案发生器。照明光学器件可以包括至少两个装置。例如，如果使用第一和第二衍射和/或折射装置，则可以是瞳孔限定元件（PDE），并且可以是场限定元件（FDE）。在另一示例中，可以使用第三衍射或折射元件来使进入照明系统的光均匀。当仅使用两个时，PDE形成一个或多个具有确定的轮廓的光束。 FDE引导具有限定轮廓的一个或多个光束，使得每个定向光束在尺寸和形状上基本对应于图案发生器上的期望的照明区域。定向光束被引导以基本上仅在期望的照明区域上照射。因此，使用PDE和FDE提高了照射在图案发生器上的光的光学效率，并且基本上减少或消除了光照射在图案发生器的不需要的区域上的杂散光。

9. 发明授权

US06985280B2 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography 有权
公开(公告)号：US06985280B2
公开(公告)日：2006-01-10
申请号：US10981590
申请日：2004-11-05
申请人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Azat Latypov , Gerald Volpe
发明人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Azat Latypov , Gerald Volpe
IPC分类号： G02B26/00 , G02B26/08 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70558 , G03F7/70208 , G03F7/70283 , G03F7/70291
摘要： In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.

10. 发明授权

US07859735B2 Systems and methods for minimizing scattered light in multi-SLM maskless lithography 有权
标题翻译：用于在多SLM无掩模光刻中最小化散射光的系统和方法
公开(公告)号：US07859735B2
公开(公告)日：2010-12-28
申请号：US12500231
申请日：2009-07-09
申请人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Stan Janik , Yuli Vladimirsky
发明人： Wenceslao A. Cebuhar , Jason D. Hintersteiner , Stan Janik , Yuli Vladimirsky
IPC分类号： G02F1/00
CPC分类号： G03F7/70291 , G03F7/70308 , G03F7/70941
摘要： A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.
摘要翻译：提供光刻方法。该方法包括产生辐射束，图案化辐射束的部分，将图案化的辐射束投射到衬底，并阻挡来自衬底的辐射束的散射光。

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