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    • 2. 发明申请
    • Ferroelectric Oxide Artificial Lattice, Method For Fabricating The Same And Ferroelectric Storage Medium For Ultrahigh Density Data Storage Device
    • 铁电氧化物人造晶格,用于制造相同的方法和用于超高密度数据存储装置的铁电存储介质
    • US20070152253A1
    • 2007-07-05
    • US11420544
    • 2006-05-26
    • Jaichan LeeTaekjib Choi
    • Jaichan LeeTaekjib Choi
    • H01L29/94H01L21/00
    • H01L21/02197H01L21/022H01L21/02266H01L21/3142H01L21/31691
    • The present invention is related to a ferroelectric storage medium for ultrahigh density data storage device and a method for fabricating the same. A supercell having high anisotropy is formed by controlling crystal structure and symmetry of unit structure (supercell) of artificial lattice by using an ordered alignment of predetermined ions having orientation of (perpendicular) deposition direction. Unit atomic layers of oxides having different polarization characteristic are deposited so that the supercell itself shows electric polarization having only two, upward and downward directions as one block of supercell having single-directional polarization. Oxide artificial lattices can be formed so as to have solely 180 degree domain structure, thus a single electric domain having improved anisotropic characteristic can be formed, thereby allowing capability of ultrahigh density data storage and long term data retention.
    • 本发明涉及一种用于超高密度数据存储装置的铁电存储介质及其制造方法。 通过使用具有(垂直)沉积方向取向的预定离子的有序排列来控制人造晶格的单元结构(超晶胞)的晶体结构和对称性,形成具有高各向异性的超晶胞。 沉积具有不同偏振特性的氧化物的单元原子层,使得超单元本身显示仅具有两个上,下方向的电极化,作为具有单向极化的超单元的一个块。 氧化物人造晶格可以形成为仅具有180度域结构,因此可以形成具有改善的各向异性特征的单个电畴,从而允许超高密度数据存储和长期数据保留的能力。
    • 3. 发明授权
    • Ferroelectric oxide artificial lattice, method for fabricating the same and ferroelectric storage medium for ultrahigh density data storage device
    • 铁电氧化物人造晶格,其制造方法和用于超高密度数据存储装置的铁电存储介质
    • US07741633B2
    • 2010-06-22
    • US11420544
    • 2006-05-26
    • Jaichan LeeTaekjib Choi
    • Jaichan LeeTaekjib Choi
    • H01L31/00
    • H01L21/02197H01L21/022H01L21/02266H01L21/3142H01L21/31691
    • The present invention is related to a ferroelectric storage medium for ultrahigh density data storage device and a method for fabricating the same. A supercell having high anisotropy is formed by controlling crystal structure and symmetry of unit structure (supercell) of artificial lattice by using an ordered alignment of predetermined ions having orientation of (perpendicular) deposition direction. Unit atomic layers of oxides having different polarization characteristic are deposited so that the supercell itself shows electric polarization having only two, upward and downward directions as one block of supercell having single-directional polarization. Oxide artificial lattices can be formed so as to have solely 180 degree domain structure, thus a single electric domain having improved anisotropic characteristic can be formed, thereby allowing capability of ultrahigh density data storage and long term data retention.
    • 本发明涉及一种用于超高密度数据存储装置的铁电存储介质及其制造方法。 通过使用具有(垂直)沉积方向取向的预定离子的有序排列来控制人造晶格的单元结构(超晶胞)的晶体结构和对称性,形成具有高各向异性的超晶胞。 沉积具有不同偏振特性的氧化物的单元原子层,使得超单元本身显示仅具有两个上,下方向的电极化,作为具有单向极化的超单元的一个块。 氧化物人造晶格可以形成为仅具有180度域结构,因此可以形成具有改善的各向异性特征的单个电畴,从而允许超高密度数据存储和长期数据保留的能力。
    • 4. 发明授权
    • Dielectric device having multi-layer oxide artificial lattice with lattice directional feature
    • 具有晶格方向特征的多层氧化物人造晶格的介电器件
    • US06747357B2
    • 2004-06-08
    • US10135764
    • 2002-05-01
    • Jaichan LeeJuho KimLeejun KimYoung Sung Kim
    • Jaichan LeeJuho KimLeejun KimYoung Sung Kim
    • H01L2348
    • H01L28/56C23C14/088C23C14/28H01L21/02197H01L21/022H01L21/02266H01L21/31691H01L29/516
    • A dielectric device has a multi-layer oxide artificial lattice. The artificial lattice is a stacked structure with a plurality of dielectrics. The dielectric film is deposited at a single atomic layer thickness or at a unit lattice thickness. The dielectric film is formed by repeatedly depositing with layer-by-layer growth process at least two dielectric materials having dielectric constant different from each other at least one time in a range of the single atomic layer thickness to 20 nm or by depositing at least two dielectric materials in a predetermined alignment adapted for a functional device, thereby forming one artificial lattice having an identical directional feature. By utilizing the stress applied to an interfacial surface of the consisting layers in the artificial oxide lattice, the dielectric constant and tunability are greatly improved, so the artificial lattice can be adapted for high-speed switching and high-density semiconductor devices and high-frequency response telecommunication devices. In addition, the size of devices can be compacted and a low voltage drive can be achieved.
    • 电介质器件具有多层氧化物人造晶格。 人造晶格是具有多个电介质的堆叠结构。 电介质膜以单一原子层厚度或单位晶格厚度沉积。 电介质膜通过以逐层生长方法重复沉积至少两种在单原子层厚度至20nm的范围内至少一次彼此不同的介电常数的电介质材料,或通过沉积至少两个 以适于功能器件的预定对准的介电材料,从而形成具有相同方向特征的一个人造晶格。 通过利用施加在人造氧化物晶格中的组成层的界面的应力,介电常数和可调性大大提高,因此人造晶格可适用于高速开关和高密度半导体器件和高频 响应电信设备。 此外,可以压缩设备的尺寸并且可以实现低电压驱动。