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    • 4. 发明申请
    • METHOD OF FABRICATING SEMICONDUCTOR DEVICE
    • 制造半导体器件的方法
    • US20150024587A1
    • 2015-01-22
    • US14277330
    • 2014-05-14
    • Kyoungmi KimMyung-Sun KimJaeho KimHyounghee KimNamuk ChoiJungsik Choi
    • Kyoungmi KimMyung-Sun KimJaeho KimHyounghee KimNamuk ChoiJungsik Choi
    • H01L21/768H01L21/027
    • H01L21/76879H01L21/0274H01L21/31144H01L21/32139H01L21/76807H01L21/76838H01L27/11548H01L27/11575H01L2221/1021
    • A method of fabricating a semiconductor device is provided. An etch-target layer is formed on a substrate. A photoresist layer is formed on the etch-target layer. A first exposure process is performed using a first photo mask to form a plurality of first-irradiated patterns in the photoresist layer. The first photo mask includes a plurality of first transmission regions. Each first transmission region has different optical transmittance. A second exposure process is performed using a second photo mask to form a plurality of second-irradiated patterns in the photoresist layer. The second photo mask includes a plurality of second transmission regions. Each second transmission region has different optical transmittance. A photoresist pattern is formed from the photoresist layer by removing the plurality of first-irradiated and second-irradiated patterns from the photoresist layer. A lower structure is formed from the etch-target layer by etching the etch-target layer using the photoresist pattern.
    • 提供一种制造半导体器件的方法。 在基板上形成蚀刻靶层。 在蚀刻靶层上形成光致抗蚀剂层。 使用第一光掩模进行第一曝光处理,以在光致抗蚀剂层中形成多个第一照射图案。 第一光掩模包括多个第一透射区域。 每个第一透射区域具有不同的透光率。 使用第二光掩模进行第二曝光处理,以在光致抗蚀剂层中形成多个第二照射图案。 第二光掩模包括多个第二透射区域。 每个第二透射区域具有不同的透光率。 通过从光致抗蚀剂层去除多个第一次照射和第二次照射的图案,从光致抗蚀剂层形成光刻胶图案。 通过使用光致抗蚀剂图案蚀刻蚀刻目标层,从蚀刻目标层形成下部结构。
    • 5. 发明授权
    • Display apparatus
    • 显示装置
    • US08693173B2
    • 2014-04-08
    • US12957070
    • 2010-11-30
    • Yunjoo KimJaeho KimDoyoung Kim
    • Yunjoo KimJaeho KimDoyoung Kim
    • H05K5/00
    • H04N5/64G02B5/0231G02B5/0242G02B6/0021G02B6/0036G02B6/0061G02F1/133602G02F1/133605
    • A display apparatus is provided. The display apparatus may include a front panel, wherein an entire front surface of the front panel is made of a transparent material. The display apparatus may also include at least one frame attached to a rear surface of the front panel to support the front panel, a display module attached to the frame to output a three-dimensional (3D) image, a layer on a front surface of the front panel, wherein light output from the layer and light output from the display module have a phase difference of 10 nm or less. The display apparatus may further include a rear housing to accommodate the display module and the frame such that a portion of the display module and a portion of the frame are shielded from view from outside of the display apparatus, and wherein the front panel covers whole of the front surface of the display module, and the light transparent material covers whole of the front surface of the front panel and enables the image output by the display module to be viewed from outside of the display apparatus.
    • 提供一种显示装置。 显示装置可以包括前面板,其中前面板的整个前表面由透明材料制成。 显示装置还可以包括附接到前面板的后表面以支撑前面板的至少一个框架,附接到框架的显示模块以输出三维(3D)图像,在前面板的前表面上的层 所述前面板,其中从所述层输出的光和从所述显示模块输出的光具有10nm或更小的相位差。 显示装置还可以包括后壳体,以容纳显示模块和框架,使得显示模块的一部分和框架的一部分从显示装置的外部被屏蔽,并且其中前面板覆盖整个 显示模块的前表面和透光材料覆盖前面板的整个前表面,并且能够从显示装置的外部观看显示模块的图像输出。