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1. 发明授权

US07001497B2 Process and apparatus for positioning replacement anodes in electrolytic cells 有权
标题翻译：将替代阳极定位在电解槽中的工艺和设备
公开(公告)号：US07001497B2
公开(公告)日：2006-02-21
申请号：US10423654
申请日：2003-04-25
申请人： Jean Pierre Gagné , Gilles Dufour , Bertrand St-Laurent , Claude Gauthier , Jacques Denis , Robin Boulianne , Pierre Bouchard , Jacques Pelletier
发明人： Jean Pierre Gagné , Gilles Dufour , Bertrand St-Laurent , Claude Gauthier , Jacques Denis , Robin Boulianne , Pierre Bouchard , Jacques Pelletier
IPC分类号： C25D21/00
CPC分类号： C25C3/06 , C25C7/06
摘要： A spent anode is replaced with a new anode in an electrolysis cell having an anode bus bar and an anode rod contacting the bus bar. A desired distance (D4) from the bus bar to a reference point on or adjacent to an anode rod for the new anode is calculated, the spent anode is replaced with a new anode so that the reference point on the new anode rod is spaced from the bus bar by an actual distance (D5), and the actual distance (D5) is measured at least once by means of a vision system. The actual distance (D5) is preferably adjusted using a feedback control loop in a computer so that D5 approaches the desired distance (D4).
摘要翻译：在具有阳极汇流条和阳极杆接触汇流条的电解池中，废阳极被替换为新阳极。计算从母线到与新阳极的阳极棒相邻或相邻的参考点的期望距离（D 4），废阳极被新阳极替代，使得新阳极棒上的参考点间隔开从母线到实际距离（D 5），并且通过视觉系统至少测量一次实际距离（D 5）。实际距离（D 5）优选使用计算机中的反馈控制回路进行调整，使得D 5接近期望距离（D 4）。

2. 发明授权

US4534842A Process and device for producing a homogeneous large-volume plasma of high density and of low electronic temperature 失效
标题翻译：用于生产高密度和低电子温度的均匀大容量等离子体的方法和装置
公开(公告)号：US4534842A
公开(公告)日：1985-08-13
申请号：US620136
申请日：1984-06-13
申请人： Yves Arnal , Jacques Pelletier , Claude Pomot
发明人： Yves Arnal , Jacques Pelletier , Claude Pomot
IPC分类号： C23C8/36 , C23C16/511 , H01J37/32 , H05H1/11 , C25B11/04 , C23C15/00
CPC分类号： H01J37/32192 , C23C16/511 , C23C8/36 , H01J37/32623 , H01J37/32688 , H01J37/32697 , H05H1/11
摘要： The invention relates to the production of plasma. The process according to the invention comprises the steps of: maintaining a gaseous medium in an enclosure at a pressure in the range of 10.sup.-5 to 10.sup.-1 Torr; exciting this gaseous medium in the enclosure by means of UHF waves in the range of one to ten gigahertz, producing a plasma; and maintaining this plasma in the enclosure by means of a magnetic confinement shell comprising many elongated magnetic elements arranged parallel to each other inside the enclosure near the respective interior surfaces, the faces of the magnetic elements which face the interior of the enclosure having alternating polarities. It is more particularly applicable to the microelectronics industry.
摘要翻译：本发明涉及等离子体的生产。根据本发明的方法包括以下步骤：将气体介质保持在10-5至10-1乇范围内的压力下; 通过UHF波在1至10千兆赫的范围内激发该外壳中的气态介质，产生等离子体; 并且通过磁性限制壳将该等离子体保持在壳体内，磁性限制壳体包括在相应的内表面附近的外壳内彼此平行布置的许多细长磁性元件，磁性元件的面向具有交替极性的内部的表面。更特别适用于微电子工业。

3. 发明授权

US07585421B2 Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters 有权
标题翻译：制造包含通孔的片材的方法及其在微型和亚微米级过滤器的生产中的应用
公开(公告)号：US07585421B2
公开(公告)日：2009-09-08
申请号：US10501103
申请日：2003-01-07
申请人： Thierry Lagarde , Jacques Pelletier , Ana Lacoste , Yves Alban-Marie Arnal
发明人： Thierry Lagarde , Jacques Pelletier , Ana Lacoste , Yves Alban-Marie Arnal
IPC分类号： H01B13/00
CPC分类号： B01D67/0034 , B01D39/16 , B01D67/003 , B01D67/0062 , B01D69/02 , B01D71/022 , B01D2323/34 , B01D2325/021 , G03F7/0015 , Y10T428/24273
摘要： The method comprises the following steps: preparing a sheet having thickness of 5 μm to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.
摘要翻译：该方法包括以下步骤：制备厚度为5μm至几十微米的片，适于通过光刻操作进行蚀刻; 在片材的表面上形成掩模，掩模呈现蚀刻选择性S为至少5; 在掩模上沉积感光树脂层; 通过光刻法在树脂层中形成通孔; 通过掩模通过树脂层中的孔蚀刻; 并且从掩模中的孔各向异性地蚀刻片材，以便在长宽比大于5的片材中形成孔。本发明可应用于制造微米和亚微米过滤器。

4. 发明授权

US07574974B2 Device for production of a plasma sheet 有权
标题翻译：用于制造等离子体片的装置
公开(公告)号：US07574974B2
公开(公告)日：2009-08-18
申请号：US10516998
申请日：2003-06-03
申请人： Thierry Léon Lagarde , Ana Lacoste , Jacques Pelletier , Yves Alban-Marie Arnal
发明人： Thierry Léon Lagarde , Ana Lacoste , Jacques Pelletier , Yves Alban-Marie Arnal
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32211 , H01J37/32192 , H01J37/32678 , H05H1/46
摘要： The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave energy, one of the ends of which is connected to a production source (7) of microwave energy, the other end (8) of which is directed to the gas to be excited within the housing. The device is characterised in that each basic plasma excitation device is arranged in the wall (3) of the housing, each applicator (4) having a central core (5) which is essentially flush with the wall of the housing. The central core and the thickness of the wall (3) of the housing are separated by a space (6) coaxial to the central core, said space being totally filled, at least at the end of each applicator, by a dielectric material (14), such that said material is essentially flush with the level of the wall of the housing.
摘要翻译：本发明涉及一种用于在壳体内生产等离子体（16）的装置，包括用于在微波光谱中产生能量的装置，用于激发等离子体，所述装置包括至少一个具有同轴的等离子体激发装置微波能量的施加器（4），其一端连接到微波能量的生产源（7），另一端（8）被引导到在壳体内被激发的气体。该装置的特征在于，每个基本等离子体激发装置布置在壳体的壁（3）中，每个施加器（4）具有基本上与壳体的壁齐平的中心芯（5）。壳体的壁（3）的中心芯和厚度由与中心芯同轴的空间（6）分开，所述空间至少在每个施加器的端部由介电材料（14）完全填充），使得所述材料基本上与壳体的壁的水平面齐平。

5. 发明申请

US20050062387A1 Electron source 失效
标题翻译：电子源
公开(公告)号：US20050062387A1
公开(公告)日：2005-03-24
申请号：US10497894
申请日：2002-12-06
申请人： Ana Lacoste , Jacques Pelletier , Yves Arnal
发明人： Ana Lacoste , Jacques Pelletier , Yves Arnal
IPC分类号： H05H1/46 , H01J3/02 , H01J37/077 , H01J17/26 , H01J27/16
CPC分类号： H01J37/077 , H01J3/025 , H01J2237/0041
摘要： The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/β {square root}2πcme/mi exp (−½), wherein: β is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.
摘要翻译：本发明涉及提供可调节能量电子束的源，包括由具有第一值（S1）的内表面的外壳（1）和具有第二值的表面的抽出栅极（2）组成的等离子体室（P）值（S2），门电位与外壳不同，可调。本发明的特征在于，等离子体被激发并限制在多极或多极磁结构中，第二值（S2）超过第一值（S1）的比接近于：D = 1 /β（平方根）2picme / mi exp（-½），其中：β是等离子体P的电子比例，me是电子质量，mi是带正电荷的离子的质量。

6. 发明授权

US06707254B1 Low temperature plasma sterilising system and method 失效
标题翻译：低温等离子灭菌系统及方法
公开(公告)号：US06707254B1
公开(公告)日：2004-03-16
申请号：US09926638
申请日：2002-03-19
申请人： Michel Moisan , Stéphane Moreau , Maryam Tabrizian , Jacques Pelletier , Jean Barbeau , L'Hocine Yahia
发明人： Michel Moisan , Stéphane Moreau , Maryam Tabrizian , Jacques Pelletier , Jean Barbeau , L'Hocine Yahia
IPC分类号： H01J1722
CPC分类号： A61L2/10 , A61L2/14
摘要： A system and a method for sterilizing objects, in particular medical instruments and accessories, using gas plasma, also called ionized gas. The gases used to form the plasma do not require to exhibit an intrinsic sterilizing activity. The sterilizing properties result from the passage through an electric field generating the plasma, an electric field which is provided by microwaves, a gas stream including oxygen in molecular form (O2) or as a gas element, and atomic or molecular species capable of emitting UV radiation once they have been energized. The system and method provide the advantage of making it possible to treat heat-sensitive and thermolabile objects at temperatures less than 50° C. using gases presenting no risks for the operator.
摘要翻译：一种使用气体等离子体（也称为电离气体）对物体特别是医疗仪器和附件进行消毒的系统和方法。用于形成等离子体的气体不需要表现出固有的灭菌活性。灭菌特性是由于产生等离子体的电场通过，由微波提供的电场，包含分子形式（O 2）的氧气或气体元素的气流以及能够发射紫外线的原子或分子物质辐射一旦被激活。该系统和方法提供了使得可以在低于50℃的温度下处理热敏和不耐热物体的优点，使用对操作者没有风险的气体。

7. 发明授权

US4745337A Method and device for exciting a plasma using microwaves at the electronic cyclotronic resonance 失效
标题翻译：在电子回旋共振下使用微波激发等离子体的方法和装置
公开(公告)号：US4745337A
公开(公告)日：1988-05-17
申请号：US871107
申请日：1986-06-05
申请人： Michel Pichot , Jacques Pelletier , Yves Arnal
发明人： Michel Pichot , Jacques Pelletier , Yves Arnal
IPC分类号： H01J37/32 , H05H1/11 , H05H1/18 , H05H1/46 , H01J27/00 , B23K9/00
CPC分类号： H01J37/32623 , H01J37/32678 , H01J37/32688 , H05H1/11 , H05H1/18 , H05H1/46
摘要： Method and device for exciting a plasma using microwaves at the electronic cyclotronic resonance.The device for exciting a gaseous medium by microwaves comprises at least a co-axial structure for introducing the microwave power inside a multipolar confinement structure and at least one antenna coupled to said co-axial structure for the localized introduction of the microwave energy inside said multipolar magnetic confinement structure which comprises a set of permanent magnets creating a network of surfaces having a constant magnetic field and presenting locally an intensity which corresponds to the electronic cyclotronic resonance, and said antenna being positioned on said network of surfaces of constant magnetic field in an area of intensity corresponding to the electronic cyclotronic resonance.The invention finds an application in the creation of a homogenous, isotropic plasma of large volume and high density, which is free of fields in the area of use.
摘要翻译：在电子回旋共振下使用微波激发等离子体的方法和装置。用于通过微波激发气体介质的装置包括用于将微波功率引入多极限制结构内的至少一个同轴结构和耦合到所述同轴结构的至少一个天线，用于将微波能量局部引入所述多极磁约束结构，其包括一组永磁体，其形成具有恒定磁场的表面网络，并且局部呈现对应于电子回旋共振的强度，并且所述天线位于所述恒定磁场的表面网络上的区域的强度对应于电子回旋共振。本发明可以应用于产生大体积，高密度的均质，各向同性的等离子体，其在使用领域中没有现场。

8. 发明授权

US4249981A Device for forming a web of parallel threads 失效
标题翻译：用于形成平行线的网的装置
公开(公告)号：US4249981A
公开(公告)日：1981-02-10
申请号：US973533
申请日：1978-12-26
申请人： Jacques Pelletier , Regis Berliet
发明人： Jacques Pelletier , Regis Berliet
IPC分类号： D04H3/045 , D04H3/04
CPC分类号： D04H3/045
摘要： The invention relates to a device for producing weft webs consisting of parallel spaced threads, in which at least one weft thread is fed around positioning, holding and advancing elements which consist of continuous endless belts which support a plurality of juxtaposed blocks which have a length corresponding substantially to the desired spacing between two consecutive weft threads. The blocks are in contact with one another in the rectilinear portions of the endless belt and spaced in the curved portion as they pass around drive rollers. At least one reciprocating thread guide has a free end which passes between the blocks in the curved portion of each endless belt, to feed thread between the blocks.
摘要翻译：本发明涉及一种用于生产纬线的装置，其由平行隔开的螺纹组成，其中至少一根纬纱被供给围绕定位，保持和前进的元件，所述元件由连续的环形带组成，所述连续环形带支撑多个并列的块，基本上达到两条连续纬纱之间的所需间距。这些块在环形带的直线部分中彼此接触，并且当其绕过驱动辊时在弯曲部分间隔开。至少一个往复导纱器具有自由端，该自由端在每个环形带的弯曲部分中的块之间通过，以在块之间供给线。

9. 发明授权

US09750120B2 Coaxial microwave applicator for plasma production 有权
公开(公告)号：US09750120B2
公开(公告)日：2017-08-29
申请号：US14413559
申请日：2013-07-10
申请人： UNIVERSITE JOSEPH FOURIER—GRENOBLE 1 , Jacques Pelletier
发明人： Ana Lacoste , Jacques Pelletier
IPC分类号： C23C14/28 , H05H1/46 , C23C14/35 , C23C14/34 , H01J37/34 , H05H1/18
CPC分类号： H05H1/46 , C23C14/3471 , C23C14/357 , H01J37/3405 , H01J2237/327 , H05H1/18 , H05H2001/4622 , H05H2001/463 , H05H2242/10
摘要： The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetization. The magnetization of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetization of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

10. 发明授权

US07911120B2 Source for providing an electron beam of settable power 失效
标题翻译：用于提供可设置电源的电子束的源
公开(公告)号：US07911120B2
公开(公告)日：2011-03-22
申请号：US10497894
申请日：2002-12-06
申请人： Ana Lacoste , Jacques Pelletier , Yves Alban-Marie Arnal
发明人： Ana Lacoste , Jacques Pelletier , Yves Alban-Marie Arnal
IPC分类号： H01J7/24
CPC分类号： H01J37/077 , H01J3/025 , H01J2237/0041
摘要： The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/β √2πme/mi exp (−½), wherein: β is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.
摘要翻译：本发明涉及提供可调节能量电子束的源，包括由具有第一值（S1）的内表面的外壳（1）和具有第二值的表面的抽出栅极（2）组成的等离子体室（P）值（S2），门电位与外壳不同，可调。本发明的特征在于等离子体被激发并限制在多极或多极磁结构中，第二值（S2）超过第一值（S1）的比接近于：D = 1 /＆bgr; √2＆pgr; me / mi exp（-½），其中：＆bgr; 是等离子体P的电子的比例，me是电子质量，mi是带正电荷的离子的质量。

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