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1. 发明授权

US08731138B2 High-resolution X-ray diffraction measurement with enhanced sensitivity 有权
$High-resolution X-ray diffraction measurement with enhanced sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US08731138B2
公开(公告)日：2014-05-20
申请号：US13547073
申请日：2012-07-12
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
IPC分类号： G01N23/20 , G01N23/203 , G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

2. 发明申请

US20110164730A1 High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity 有权
$High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US20110164730A1
公开(公告)日：2011-07-07
申请号：US12683436
申请日：2010-01-07
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Ofengenden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Ofengenden , David Berman , Matthew Wormington
IPC分类号： G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

3. 发明授权

US07483513B2 Measurement of properties of thin films on sidewalls 有权
标题翻译：测量侧壁薄膜的性能
公开(公告)号：US07483513B2
公开(公告)日：2009-01-27
申请号：US11487433
申请日：2006-07-17
申请人： Isaac Mazor , Boris Yokhin
发明人： Isaac Mazor , Boris Yokhin
IPC分类号： G01N23/20
CPC分类号： G01N23/20
摘要： A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.
摘要翻译：用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便检测散射X射线中的衍射光谱作为方位角的函数。分析衍射光谱以确定特征的尺寸。

4. 发明授权

US07110491B2 Measurement of critical dimensions using X-ray diffraction in reflection mode 有权
$Measurement of critical dimensions using X-ray diffraction in reflection mode$
标题翻译：在反射模式下使用X射线衍射测量临界尺寸
公开(公告)号：US07110491B2
公开(公告)日：2006-09-19
申请号：US11018352
申请日：2004-12-22
申请人： Isaac Mazor , Boris Yokhin
发明人： Isaac Mazor , Boris Yokhin
IPC分类号： G01N23/20
CPC分类号： G01N23/20
摘要： A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.
摘要翻译：用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上，并以反射模式接收从表面散射的X射线，以便检测散射X射线中的衍射光谱作为方位角的函数。分析衍射光谱以确定特征的尺寸。

5. 发明申请

US20060023836A1 Enhancement of X-ray reflectometry by measurement of diffuse reflections 有权
公开(公告)号：US20060023836A1
公开(公告)日：2006-02-02
申请号：US10902177
申请日：2004-07-30
申请人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
发明人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
IPC分类号： G01N23/20
CPC分类号： G01N23/203 , G01B15/02
摘要： A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

6. 发明申请

US20050069090A1 Optical alignment of X-ray microanalyzers 有权
标题翻译： X射线微量分析仪的光学校准
公开(公告)号：US20050069090A1
公开(公告)日：2005-03-31
申请号：US10673996
申请日：2003-09-29
申请人： Tzachi Rafaeli , Isaac Mazor
发明人： Tzachi Rafaeli , Isaac Mazor
IPC分类号： G01N23/223 , A61B6/08 , G01N23/22
CPC分类号： G01N23/22
摘要： A method for X-ray analysis of a sample includes aligning an optical radiation source with an X-ray excitation source, so that a spot on the sample that is irradiated by an X-ray beam generated by the X-ray excitation source is illuminated with optical radiation generated by the optical radiation source. Optical radiation that is reflected from the sample is used to generate a first signal, which is indicative of an alignment of the spot on the sample. The X-ray beam is aligned, responsively to the first signal, so that the spot coincides with a target area of the sample. X-ray photons received from the spot on the sample, after aligning the X-ray beam, are used in generating a second signal that is indicative of a characteristic of the target area.
摘要翻译：用于样品的X射线分析的方法包括使光辐射源与X射线激发源对准，使得由X射线激发源产生的X射线束照射的样品上的斑点被照亮具有由光辐射源产生的光辐射。从样品反射的光辐射用于产生第一信号，其表示样品上的斑点的对准。响应于第一信号将X射线束对准，使得斑点与样品的目标区域重合。在对准X射线束之后从样品上的点接收的X射线光子用于产生指示目标区域的特征的第二信号。

7. 发明授权

US06512814B2 X-ray reflectometer 有权
公开(公告)号：US06512814B2
公开(公告)日：2003-01-28
申请号：US09833902
申请日：2001-04-12
申请人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
发明人： Boris Yokhin , Alexander Dikopoltsev , Isaac Mazor , David Berman
IPC分类号： G01T136
CPC分类号： G01T1/36
摘要： Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

8. 发明授权

US06381303B1 X-ray microanalyzer for thin films 有权
标题翻译：用于薄膜的X射线微量分析仪
公开(公告)号：US06381303B1
公开(公告)日：2002-04-30
申请号：US09408894
申请日：1999-09-29
申请人： Long Vu , Boris Yokhin , Isaac Mazor , Amos Gvirtzman
发明人： Long Vu , Boris Yokhin , Isaac Mazor , Amos Gvirtzman
IPC分类号： G01N23223
CPC分类号： G01N23/20
摘要： Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 &mgr;m on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot.
摘要翻译：用于样品的X射线微量分析的装置包括X射线源，其在样品的表面上照射尺寸小于500μm的斑点。第一X射线检测器相对于样品的表面以高角度捕获从样品发射的荧光X射线，其响应于照射。第二个X射线检测器以相对于样品表面的掠角捕获来自斑点的X射线。处理电路响应于由此捕获的X射线，从第一和第二X射线检测器接收相应的信号，并组合分析信号以确定样品在斑点区域内的表面层的性质。

9. 发明授权

US06351516B1 Detection of voids in semiconductor wafer processing 有权
标题翻译：检测半导体晶片加工中的空隙
公开(公告)号：US06351516B1
公开(公告)日：2002-02-26
申请号：US09461670
申请日：1999-12-14
申请人： Isaac Mazor , Long Vu
发明人： Isaac Mazor , Long Vu
IPC分类号： G01N23223
CPC分类号： H01L21/76877 , G01N23/223 , G01N2223/076 , G01N2223/648 , H01L22/12
摘要： A method for testing the deposition and/or the removal of a material within a recess on the surface of a sample. An excitation beam is directed onto a region of the sample in a vicinity of the recess, and an intensity of X-ray fluorescence, emitted from the region in a spectral range in which the material is known to fluoresce, is measured. A quantity of the material that is deposited within the recess is determined responsive to the measured intensity.
摘要翻译：一种用于测试在样品表面上的凹槽内的材料的沉积和/或去除的方法。激发光束被引导到在凹部附近的样品的区域上，并且测量从该材料已知发荧光的光谱范围内的区域发射的X射线荧光强度。根据测量的强度确定沉积在凹部内的一定量的材料。

10. 发明申请

US20120281814A1 High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity 有权
$High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US20120281814A1
公开(公告)日：2012-11-08
申请号：US13547073
申请日：2012-07-12
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
IPC分类号： G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

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